利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

163 条记录 (耗时 0.033 秒)

    Process solutions containing surfactants
    82.
    发明申请
    Process solutions containing surfactants 审中-公开
    含有表面活性剂的工艺溶液

    公开(公告)号：US20070010412A1

    公开(公告)日：2007-01-11

    申请号：US11520983

    申请日：2006-09-14

    申请人： Peng Zhang ,  Danielle Curzi ,  Eugene Karwacki ,  Leslie Barber

    发明人： Peng Zhang ,  Danielle Curzi ,  Eugene Karwacki ,  Leslie Barber

    IPC分类号： C11D7/32

    CPC分类号： G03F7/322 ,  G03F7/0048 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/3021 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40 ,  G03F7/425 ,  Y10S134/902

    摘要： Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce post-development defects such as pattern collapse when employed as a rinse solution either during or after the development of the patterned photoresist layer. Also disclosed is a method for reducing the number of pattern collapse defects on a plurality of photoresist coated substrates employing the process solution of the present invention.

    摘要翻译： 使用包含一种或多种表面活性剂的工艺溶液来减少半导体器件制造中的缺陷数量。 在某些优选实施方案中，当在图案化光致抗蚀剂层的显影期间或之后，当用作冲洗溶液时，本发明的工艺溶液可以减少显影后缺陷，例如图案塌陷。 还公开了一种减少使用本发明的工艺溶液的多个光致抗蚀剂涂覆的基材上的图案塌陷缺陷的数量的方法。

    Method and apparatus for modifying an encoded signal
    84.
    发明申请
    Method and apparatus for modifying an encoded signal 审中-公开
    修改编码信号的方法和装置

    公开(公告)号：US20060217972A1

    公开(公告)日：2006-09-28

    申请号：US11342259

    申请日：2006-01-27

    申请人： Rafid Sukkar ,  Richard Younce ,  Peng Zhang ,  Michael Horning ,  Robert Cochran ,  Stephen Griffith ,  Leni Thomas ,  Brian McConnell

    发明人： Rafid Sukkar ,  Richard Younce ,  Peng Zhang ,  Michael Horning ,  Robert Cochran ,  Stephen Griffith ,  Leni Thomas ,  Brian McConnell

    IPC分类号： G10L19/00

    CPC分类号： G10L21/02

    摘要： Signal Quality Enhancement is performed directly in a coded domain. Coded Domain-Signal Quality Enhancement (CD-SQE) is applied to an encoded signal populated substantially with encoded signal bits to produce an enhanced encoded signal. The enhanced encoded signal is outputted. Thus, the signal does not have to go through intermediate decoder/re-encoder(s), which can degrade overall speech quality. Computational resources required for a complete re-encoding are not needed. Overall delay of the system is minimized. The CD-SQE system can be used in any network in which signals are communicated in a coded domain, such as a Third Generation (3G) wireless network.

    摘要翻译： 信号质量增强直接在编码域中执行。 编码域信号质量增强（CD-SQE）被应用于基本上用编码信号位填充的编码信号，以产生增强的编码信号。 输出增强编码信号。 因此，信号不必经过中间解码器/重新编码器，这可能降低整体语音质量。 不需要完全重新编码所需的计算资源。 系统的整体延迟最小化。 CD-SQE系统可以用于在诸如第三代（3G）无线网络的编码域中传送信号的任何网络中。

    Immersion lithography fluids
    86.
    发明申请
    Immersion lithography fluids 审中-公开
    浸没光刻液

    公开(公告)号：US20050161644A1

    公开(公告)日：2005-07-28

    申请号：US10764227

    申请日：2004-01-23

    申请人： Peng Zhang ,  Bridgette Budhlall ,  Gene Parris ,  Leslie Barber

    发明人： Peng Zhang ,  Bridgette Budhlall ,  Gene Parris ,  Leslie Barber

    IPC分类号： H01L21/027 ,  G03F7/004 ,  G03F7/20 ,  G03B11/00

    CPC分类号： G03F7/2041

    摘要： Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating wavelength ranging from 140 nm to 248 nm are disclosed herein.

    摘要翻译： 可以加入到浸渍流体中的合适的添加剂，包含至少一种选自水性流体，非水性流体及其混合物的载体介质的浸液，以及包含至少一种载体介质和至少一种可用于 本文公开了在140nm至248nm范围内的工作波长的浸没式光刻技术。

    Methods and apparatuses for facilitating utilization of cloud services
    89.
    发明授权
    Methods and apparatuses for facilitating utilization of cloud services 有权

    公开(公告)号：US09979797B2

    公开(公告)日：2018-05-22

    申请号：US14417448

    申请日：2012-07-27

    申请人： Peng Zhang

    发明人： Peng Zhang

    IPC分类号： H04L29/08 ,  H04W4/18

    CPC分类号： H04L67/32 ,  H04L67/04 ,  H04L67/10 ,  H04L67/18 ,  H04L67/28 ,  H04W4/18

    摘要： A method, apparatus and computer program product are to facilitate the utilization of cloud computing resources by a mobile terminal. From the standpoint of a mobile hub, a request for cloud services is received that has been issued by an application executed by a mobile terminal. An application agent is then created based upon the application that issued the request and a request is caused to be transmitted to a cloud service provider in response to the request for cloud services. A response is then received from the cloud service provider and a response is caused to be provided to the mobile terminal based upon the response from the cloud service provider.

    Halogen free syntheses of aminosilanes by catalytic dehydrogenative coupling
    90.
    发明授权
    Halogen free syntheses of aminosilanes by catalytic dehydrogenative coupling 有权
    通过催化脱氢偶联无卤素合成氨基硅烷

    公开(公告)号：US09382269B2

    公开(公告)日：2016-07-05

    申请号：US14491581

    申请日：2014-09-19

    申请人： Antonio Sanchez ,  Gennadily Itov ,  Peng Zhang ,  Matthew Damien Stephens

    发明人： Antonio Sanchez ,  Gennadily Itov ,  Peng Zhang ,  Matthew Damien Stephens

    IPC分类号： C07F7/04 ,  C07F7/10

    CPC分类号： C07F7/025 ,  C07F7/10 ,  H01L21/02219 ,  H01L21/02617

    摘要： Compounds and method of preparation of Si—X and Ge—X compounds (X═N, P, As and Sb) via dehydrogenative coupling between the corresponding unsubstituted silanes and amines (including ammonia) or phosphines catalyzed by metallic catalysts is described. This new approach is based on the catalytic dehydrogenative coupling of a Si—H and a X—H moiety to form a Si—X containing compound and hydrogen gas (X═N, P, As and Sb). The process can be catalyzed by transition metal heterogenous catalysts such as Ru(0) on carbon, Pd(0) on MgO) as well as transition metal organometallic complexes that act as homogeneous catalysts. The —Si—X products produced by dehydrogenative coupling are inherently halogen free. Said compounds can be useful for the deposition of thin films by chemical vapor deposition or atomic layer deposition of Si-containing films.

    摘要翻译： 描述了通过金属催化剂催化的相应的未取代的硅烷和胺（包括氨）或膦之间的脱氢偶联制备Si-X和Ge-X化合物（X = N，P，As和Sb）的化合物和方法。 这种新方法是基于Si-H和X-H部分的催化脱氢偶合形成含Si-X的化合物和氢气（X = N，P，As和Sb）。 该过程可以通过过渡金属异质催化剂如碳上的Ru（0），MgO上的Pd（0））以及作为均相催化剂的过渡金属有机金属络合物催化。 由脱氢偶联产生的-Si-X产物固有地是无卤素的。 所述化合物可用于通过化学气相沉积或含Si膜的原子层沉积沉积薄膜。