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156 条记录 (耗时 0.048 秒)

    Imaging systems
    82.
    发明授权
    Imaging systems 有权
    成像系统

    公开(公告)号：US07375897B2

    公开(公告)日：2008-05-20

    申请号：US11298019

    申请日：2005-12-09

    申请人： Karl-Heinz Schuster

    发明人： Karl-Heinz Schuster

    IPC分类号： G02B3/00 ,  G02B9/00 ,  G02B5/30

    CPC分类号： G03F7/70966 ,  G02B27/283 ,  G03F7/70566

    摘要： In certain aspects, the disclosure relates to an imaging system, particularly an objective or an illumination device of a microlithography projection-exposure apparatus having an optical axis (OA), with at least one optical element of an optically uniaxial crystal material whose optical crystallographic axis is substantially parallel to the optical axis (OA) of the imaging system and which at a working wavelength has an ordinary refractive index no and an extraordinary refractive index ne, with the extraordinary refractive index ne being smaller than the ordinary refractive index no; wherein the optical element is arranged in the ray path pattern in such a way that, at least for rays of the working wavelength which meet the optical element at an angle that falls within an angular range from the optical axis, the p-polarized component is reflected more strongly than the s-polarized component.

    摘要翻译： 在某些方面，本发明涉及一种成像系统，特别是具有光轴（OA）的微光刻投影曝光设备的物镜或照明装置，其具有光学单轴晶体材料的至少一个光学元件，光学单轴晶体材料的光学晶轴 基本上平行于成像系统的光轴（OA），并且其在工作波长具有普通的折射率n 和非常折射率n ，与 非常折射率小于正常折射率n 0; 其中所述光学元件布置在所述光线路径图案中，使得至少对于以与所述光轴成角度范围内的角度相遇所述光学元件的所述工作波长的射线，所述p偏振分量为 反射比s偏振分量更强。

    Projection objective of a microlithographic exposure apparatus
    83.
    发明授权
    Projection objective of a microlithographic exposure apparatus 有权
    微光刻曝光设备的投影目标

    公开(公告)号：US07277231B2

    公开(公告)日：2007-10-02

    申请号：US11097398

    申请日：2005-04-01

    申请人： Karl-Heinz Schuster ,  Hans-Juergen Rostalski ,  Aurelian Dodoc

    发明人： Karl-Heinz Schuster ,  Hans-Juergen Rostalski ,  Aurelian Dodoc

    IPC分类号： G02B1/06

    CPC分类号： G03F7/70266 ,  G02B3/12 ,  G02B13/143 ,  G02B27/0068 ,  G03F7/70883 ,  G03F7/70958

    摘要： A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.

    摘要翻译： 微光刻投影曝光装置的投影物镜具有校正装置，该校正装置可以校正光诱导的成像误差，而不需要为此而移除光学元件。 校正装置包括第一光学元件和第二光学元件，其面向第一光学元件的表面设置有用于改善投影物镜的成像特性的局部表面变形。 在密封形成在第一光学元件和第二光学元件之间的中间空间的壁中，设置有可以用流体填充中间空间的开口。 通过改变与表面相邻的流体的折射率，可以以直接的方式修改表面变形的影响。

    Very-high aperture projection objective
    86.
    发明申请
    Very-high aperture projection objective 有权
    非常高的孔径投影物镜

    公开(公告)号：US20070019301A1

    公开(公告)日：2007-01-25

    申请号：US11528379

    申请日：2006-09-28

    申请人： Karl-Heinz Schuster

    发明人： Karl-Heinz Schuster

    IPC分类号： G02B3/00

    CPC分类号： G03F7/70975 ,  G02B13/00 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

    摘要： A very-high aperture, purely refractive projection objective is designed as a two-belly system with an object-side belly, an image-side belly and a waist (7) situated therebetween. The system diaphragm (5) is seated in the image-side belly at a spacing in front of the image plane. Arranged between the waist and the system diaphragm in the region of divergent radiation is a negative group (LG5) which has an effective curvature with a concave side pointing towards the image plane. The system is distinguished by a high numerical aperture, low chromatic aberrations and compact, material-saving design.

    摘要翻译： 非常高的光圈，纯折射投影物镜被设计为具有物体侧腹部，图像侧腹部和腰部（7）在其间的双腹系统。 系统隔膜（5）以图像平面前方的间隔位于图像侧腹部。 在发散辐射区域之间在腰部和系统隔膜之间布置有负组（LG 5），其具有指向图像平面的凹面的有效曲率。 该系统具有高数值孔径，低色差和紧凑的节省材料的特点。

    Polarization-optimized illumination system
    88.
    发明申请
    Polarization-optimized illumination system 审中-公开
    极化优化照明系统

    公开(公告)号：US20060203341A1

    公开(公告)日：2006-09-14

    申请号：US11434904

    申请日：2006-05-17

    申请人： Karl-Heinz Schuster

    发明人： Karl-Heinz Schuster

    IPC分类号： G02B27/28 ,  G02B5/30

    CPC分类号： G03F7/70075 ,  G02B27/283 ,  G03F7/70566 ,  G03F7/70958

    摘要： An illumination system for a projection exposure machine, operating with ultraviolet light, for microlithography has an angle-conserving light mixing device with at least one integrator rod that has an entrance surface for receiving light from a light source, and an exit surface for outputting exit light mixed by the integrator rod. At least one prism arrangement for receiving exit light and for varying the state of polarization of the exit light is placed downstream of the integrator rod. A preferred prism arrangement has a polarization splitter surface, aligned transversely to the direction of propagation of the exit light, which passes light fractions with p-polarization without hindrance, and reflects fractions with s-polarization. The separated beams with orthogonal polarization are parallelized by means of a reflecting surface aligned parallel to the polarization splitter surface, and the same state of polarization is set for both partial beams by means of a suitable retarder.

    摘要翻译： 一种用于微光刻的用于紫外光的投影曝光机的照明系统具有角度保守的光混合装置，其具有至少一个积分杆，该积分杆具有用于接收来自光源的光的入射表面和用于输出出射的出射表面 光通过积分杆混合。 用于接收出射光并用于改变出射光的偏振状态的至少一个棱镜装置被放置在积分杆的下游。 优选的棱镜装置具有偏振分离器表面，其横向于出射光的传播方向对准，其以无偏振的方式通过具有p-偏振的光分数，并且反射具有s偏振的分数。 具有正交偏振的分离的光束通过平行于偏振分离器表面的反射表面平行化，并且通过合适的延迟器为两个部分光束设置相同的偏振状态。

    Projection exposure method and projection exposure system
    89.
    发明授权
    Projection exposure method and projection exposure system 有权
    投影曝光方法和投影曝光系统

    公开(公告)号：US07092069B2

    公开(公告)日：2006-08-15

    申请号：US10886696

    申请日：2004-07-09

    申请人： Karl-Heinz Schuster

    发明人： Karl-Heinz Schuster

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G02B7/04

    CPC分类号： B82Y10/00 ,  G02B7/28 ,  G02B13/14 ,  G03F7/70325 ,  G03F7/70341 ,  G03F9/7026

    摘要： In a method for manufacturing semiconductor devices and other finely structured parts, a projection objective (5) is used in order to project the image of a pattern arranged in the object plane of the projection objective onto a photosensitive substrate which is arranged in the region of the image plane (12) of the projection objective. In this case, there is set between an exit surface (15), assigned to the projection objective, for exposing light and an incoupling surface (11), assigned to the substrate, for exposing light a small finite working distance (16) which is at least temporarily smaller in size and exposure time interval than a maximum extent of an optical near field of the light emerging from the exit surface. As a result, projection objectives with very high numerical apertures in the region of NA>0.8 or more can be rendered useful for contactless projection lithography.

    摘要翻译： 在制造半导体器件和其它精细构造的部件的方法中，使用投影物镜（5），以将布置在投影物镜的物平面中的图案的图像投影到感光基片上，该光敏基片布置在 投影物镜的图像平面（12）。 在这种情况下，设置在分配给投影物镜的出射表面（15）和用于曝光的转移表面（11）之间，用于将光分配给基板，用于使光暴露小的有限工作距离（16） 尺寸和曝光时间间隔至少比从出射表面出射的光的光学近场的最大程度更小。 结果，在NA> 0.8或更大的区域具有非常高的数值孔径的投影物镜可以用于非接触式投影光刻。