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    EUV light source
    81.
    发明申请
    EUV light source 有权

    公开(公告)号：US20070125970A1

    公开(公告)日：2007-06-07

    申请号：US11646938

    申请日：2006-12-27

    Applicant: Igor Fomenkov ,  Alexander Ershov

    Inventor： Igor Fomenkov ,  Alexander Ershov

    IPC: G01J3/10

    CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

    Liquid Cooled Mirror for Use in Extreme Ultraviolet Lithography
    82.
    发明申请
    Liquid Cooled Mirror for Use in Extreme Ultraviolet Lithography 有权
    液体冷却镜用于极紫外光刻

    公开(公告)号：US20070091485A1

    公开(公告)日：2007-04-26

    申请号：US11382342

    申请日：2006-05-09

    Applicant: Alton Phillips ,  Derek Coon ,  Douglas Watson

    Inventor： Alton Phillips ,  Derek Coon ,  Douglas Watson

    IPC: G02B5/08

    CPC classification number: G02B5/10 ,  G02B7/1815 ,  G03F7/70783 ,  G03F7/70891 ,  G03F7/70983 ,  G21K1/06 ,  G21K2201/065

    Abstract: Methods and apparatus for internally or directly cooling a mirror using a fluid with laminar flow properties are disclosed. According to one aspect of the present invention, an internally cooled mirror includes an optical surface that absorbs light, and at least one microchannel formed beneath the optical surface. The mirror also includes a port that supplied a fluid to the microchannel. The fluid is subjected to a laminar flow and absorbs heat associated with the absorbed light.

    Abstract translation: 公开了使用具有层流性质的流体内部或直接冷却反射镜的方法和装置。 根据本发明的一个方面，内部冷却镜包括吸收光的光学表面和形成在光学表面下方的至少一个微通道。 镜子还包括向微通道供应流体的端口。 流体经受层流并吸收与吸收的光相关的热量。

    Lithographic apparatus and device manufacturing method
    84.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US20050105066A1

    公开(公告)日：2005-05-19

    申请号：US10960784

    申请日：2004-10-08

    Applicant: Dominicus Adrianus Franken

    Inventor： Dominicus Adrianus Franken

    IPC: G02B7/00 ,  G02B7/182 ,  G02B7/198 ,  G03B27/52 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

    CPC classification number: G03F7/70891 ,  G21K1/06 ,  G21K2201/065

    Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one of the patterning device, or the projection system, and the illumination system includes a reflector assembly that includes a reflector substrate with a reflective surface for reflecting part of incident radiation, and a heat exchanger system that is constructed and arranged to exchange heat with the reflector substrate. The heat exchanger system includes a thermally active element that is disposed in a recess of the reflector substrate at a side of the reflector substrate that is different from the reflective surface.

    Abstract translation: 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于使投影光束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 图案形成装置或投影系统中的至少一个以及照明系统包括反射器组件，该反射器组件包括具有用于反射入射辐射的一部分的反射表面的反射器基板，以及构造和布置成交换热量的热交换器系统 与反射器基板。 热交换器系统包括热活性元件，该热活性元件设置在反射器基板的与反射表面不同的一侧的凹部中。

    Low surface distortion monochromator
    87.
    发明授权
    Low surface distortion monochromator 失效
    低表面失真单色器

    公开(公告)号：US5168924A

    公开(公告)日：1992-12-08

    申请号：US723081

    申请日：1991-06-28

    Applicant: William D. Taylor

    Inventor： William D. Taylor

    IPC: G02B7/18 ,  G21K1/06

    CPC classification number: G02B7/1815 ,  G21K1/06 ,  G21K2201/065

    Abstract: A monochromator 18 has a thin faceplate which reduces temperature-induced distortion in a strain-free region by placing it close to a two-level heat exchanger 46, 64. The heat exchanger has a first level 46 in juxtaposition with the faceplate 22 for efficient heat extraction, and a second level 64 which establishes a constant temperature plane along a neutral bending axis of the monochromator 18. The first level heat exchanger is operated at a temperature below the zero CTE point of the silicon faceplate so that the integrated CTE of the faceplate is approximately zero. Pumps 30 and 32 are disposed respectively at the coolant inlets 26 and outlets 28 for fine-tuning the coolant pressure so that a minimal pressure across the faceplate 22 may be established to minimize bending moments on the thin faceplate. The upper and lower heat exchangers 46, 64 are comprised of a plurality of micro-channels which are divided into groups, each group associated with a macro-channel 40, 60 and a return plenum 48, 68 which tapers down to an orifice 50, 72, which is connected to a return header 52, 74. The sizes of the orifices 50, 72 may be adjusted to control the amount of coolant flow through each macro channel so that the cooling provided may be matched to the heat absorbed by the faceplate.

    Mechanically actuated double crystal monochromater
    88.
    发明授权
    Mechanically actuated double crystal monochromater 失效
    机械致动双晶单色仪

    公开(公告)号：US5157702A

    公开(公告)日：1992-10-20

    申请号：US627844

    申请日：1990-12-14

    Applicant: Frederic H. Middleton ,  John W. Hicks

    Inventor： Frederic H. Middleton ,  John W. Hicks

    IPC: G21K1/06

    CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/065

    Abstract: A double-crystal X-ray monochromator includes entrance and exit crystal assemblies mounted on a support structure to provide full parallelism of the crystals while one crystal is rotated and the other rotated and translated with respect to the first, allowing selection of the wavelength of X-rays to be passed through the monochromator. The monochromator is mounted in an ultra-high vacuum chamber by supports which pass through the vacuum chamber to support the monochromator independently of the vacuum chamber. Bearings supporting the monochromator provide very low friction to linear movement and rotation to allow high precision to be obtained. To compensate for the heating of the entrance crystal due to impingement of high energy X-rays on the crystal, the entrance crystal is cooled using a radiation heat transfer system which provides no physical contact between the radiator connected to the entrance crystal assembly and the heat transfer structure on the vacuum chamber. The exit crystal may be heated so that its temperature can be matched to that of the entrance crystal to allow the precision alignment of the crystals to be maintained.

    Abstract translation: 双晶X射线单色仪包括安装在支撑结构上的入口和出射晶体组件，以提供晶体的完全平行度，而一个晶体旋转并且另一个晶体相对于第一晶体旋转和平移，允许选择X的波长 - 要通过单色仪的数据。 单色器通过支撑件安装在超高真空室中，支撑件通过真空室，以独立于真空室支撑单色器。 支撑单色仪的轴承为线性运动和旋转提供非常低的摩擦，以获得高精度。 为了补偿由于高能X射线在晶体上的撞击导致的入口晶体的加热，入射晶体使用辐射传热系统进行冷却，辐射传热系统在连接到入口晶体组件的散热器与热量之间不产生物理接触 在真空室上传输结构。 出口晶体可以被加热，使得它的温度可以与入口晶体的温度相匹配，以保持晶体的精确对准。

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