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    Process for the Production of Double-Layer Heat-Sensitive Imageable Elements
    2.
    发明申请
    Process for the Production of Double-Layer Heat-Sensitive Imageable Elements 审中-公开
    双层热敏成像元件生产工艺

    公开(公告)号：US20070292809A1

    公开(公告)日：2007-12-20

    申请号：US10574870

    申请日：2004-10-11

    申请人： Celin Savariar-Hauck ,  Gerhard Hauck ,  Dietmar Frank

    发明人： Celin Savariar-Hauck ,  Gerhard Hauck ,  Dietmar Frank

    IPC分类号： B41C1/10 ,  B41M5/36

    CPC分类号： B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41M5/368

    摘要： The invention relates to a process for the production of a heat-sensitive imageable element comprising: (a) providing a substrate, (b) applying a first coating solution, comprising at least one photothermal conversion material, at least one polymer A soluble or swellable in an aqueous alkaline developer and at least one solvent, (c) drying, (d) applying a second coating solution, comprising at least one cross-linkable polyfunctional enolether, at least one polymer B comprising hydroxy groups and/or carboxy groups, and at least one solvent, wherein the polymer used in the first coating solution does not dissolve in this solvent, wherein the second coating solution does not contain a photothermal conversion material, and (e) drying at a temperature of at least 60° C.

    摘要翻译： 本发明涉及一种用于生产热敏可成像元件的方法，包括：（a）提供基底，（b）施​​加包含至少一种光热转换材料的第一涂层溶液，至少一种可溶或可膨胀的聚合物A 在水性碱性显影剂和至少一种溶剂中，（c）干燥，（d）施加包含至少一个可交联的多官能烯烃的至少一种包含羟基和/或羧基的聚合物B的第二涂料溶液，以及 至少一种溶剂，其中在第一涂布溶液中使用的聚合物不溶于该溶剂，其中第二涂布溶液不含光热转换材料，和（e）在至少60℃的温度下干燥。

    Lithographic Printing Plate Precursors with Oligomeric Or Polymeric Sensitizers
    3.
    发明申请
    Lithographic Printing Plate Precursors with Oligomeric Or Polymeric Sensitizers 失效
    具有低聚物或聚合物敏化剂的平版印刷版前体

    公开(公告)号：US20070269745A1

    公开(公告)日：2007-11-22

    申请号：US11718809

    申请日：2005-11-11

    申请人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

    发明人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

    IPC分类号： G03C1/00

    CPC分类号： G03F7/029 ,  G03F7/031 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/127 ,  Y10S522/904 ,  Y10S522/913

    摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer

    摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由聚合的烯属不饱和基团，（ii）至少一种敏化剂，和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于，所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p 1是芳族或杂芳族单元或两者的组合，使得 在结构（I）中的两个基团Z之间存在共轭n系，每个Z独立地表示杂原子，每个R 1和R 2独立地选自 卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各R R 4，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或 1〜4的整数，n的值为1，AS为脂肪族间隔物

    Heat-sensitive positive working lithographic printing plate precursor
    4.
    发明授权
    Heat-sensitive positive working lithographic printing plate precursor 失效
    热敏正性平版印刷版前体

    公开(公告)号：US07270930B2

    公开(公告)日：2007-09-18

    申请号：US10567245

    申请日：2004-08-09

    申请人： Gerhard Hauck ,  Dietmar Frank

    发明人： Gerhard Hauck ,  Dietmar Frank

    IPC分类号： G03F7/039 ,  G03F7/14 ,  G03F7/30

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/106 ,  Y10S430/165

    摘要： Heat-sensitive element comprising a) an optionally pretreated substrate; b) a positive working coating comprising (i) at least 40 wt.-%, based on the dry weight of the coating, of at least one polymer soluble in aqueous alkaline developer selected from novolak resins, functionalized novolak resins, polyvinylphenol resins, polyvinyl cresols and poly(meth)acrylates with phenolic and/or sulfonamide side groups, (ii) 01-20 wt.-%, based on the dry weight of the coating, of at least one (C4-C20 alkyl)phenol novolak resin insoluble in aqueous alkaline developer, and (iii) optionally at least one further component selected from polymer particles, surfactants, contrast dyes and pigments, inorganic fillers, antioxidants, print-out dyes, carboxylic acid derivatives of cellulose polymers, plasticizers and substances capable of absorbing radiation of a wavelength from the range of 650 to 1,300 nm and converting it into heat.

    摘要翻译： 热敏元件包括：a）任选预处理的基材; b）正性工作涂层，其包含（i）基于涂层的干重至少40重量％的至少一种可溶于含水碱性显影剂的聚合物，其选自酚醛清漆树脂，官能化酚醛清漆树脂，聚乙烯基苯酚树脂，聚乙烯基 甲酚和具有酚和/或磺酰胺侧基的聚（甲基）丙烯酸酯，（ii）基于涂层的干重为01-20重量％的至少一种（C 4 H 4） -C 20 C 20烷基）苯酚酚醛清漆树脂，和（iii）任选的至少一种选自聚合物颗粒，表面活性剂，造影剂和颜料的其它组分，无机填料，抗氧化剂， 纤维素聚合物的羧酸衍生物，增塑剂和能够吸收650〜1300nm波长的辐射并将其转化成热的物质。

    Flat bed platesetter system
    5.
    发明授权
    Flat bed platesetter system 失效
    平床制版机系统

    公开(公告)号：US07363856B1

    公开(公告)日：2008-04-29

    申请号：US09913780

    申请日：2000-02-17

    申请人： Michel Moulin

    发明人： Michel Moulin

    IPC分类号： B41C3/08 ,  B41N6/00 ,  B41N3/00 ,  B41M5/00 ,  B41M5/26

    CPC分类号： H04N1/128 ,  G03F7/2055 ,  G06K15/1238 ,  G06K15/1271 ,  H04N1/121

    摘要： The present invention provides a flat bed platesetter system and a method for its use, particularly for imaging printing plates. For providing a precise, continuous, rapid and format-independent system which is reliable, the present invention suggests to move the printing plate relative to a stationary bridge carrying a radiant energy emitting head by means of a low inertia carriage member effectively connecting the printing plate and drive means.

    摘要翻译： 本发明提供一种平板印版机系统及其使用方法，特别是用于成像印版。 为了提供可靠的精确，连续，快速和格式独立的系统，本发明建议通过低惯性滑架构件相对于承载辐射能发射头的固定桥移动印版，该低惯性滑架部件有效地连接印版 和驱动手段。

    Method and apparatus for laser induced thermal transfer printing
    6.
    发明授权
    Method and apparatus for laser induced thermal transfer printing 失效
    用于激光诱导热转印的方法和装置

    公开(公告)号：US07439995B2

    公开(公告)日：2008-10-21

    申请号：US11259754

    申请日：2005-10-26

    申请人： Mohammad Zaki Ali ,  Jianbing Huang

    发明人： Mohammad Zaki Ali ,  Jianbing Huang

    IPC分类号： B41J2/325

    CPC分类号： B41M5/38221

    摘要： An apparatus and method for providing substantially intimate rolling contact between a portion of a donor sheet and a portion of an acceptor element in a laser-induced thermal transfer printer comprises a rotatably mounted cylindrical drum, an acceptor element affixed to and supported by the cylindrical drum, a rotatably mounted dispensing roller for dispensing a donor sheet, and a rotatably mounted receiving roller for receiving the donor sheet, so that the donor sheet is extended between the dispensing roller and the receiving roller. A plurality of rotatably mounted contact rollers configured to bring a portion of the donor sheet extended between the dispensing roller and the receiving roller into contact with a portion of the acceptor element is also included.

    摘要翻译： 一种用于在激光诱导的热转印打印机中在供体片的一部分和受主元件的一部分之间提供基本上紧密的滚动接触的装置和方法包括可旋转地安装的圆柱形鼓，受体元件，其被固定并由圆柱形鼓 ，用于分配供体片的可旋转地安装的分配辊和用于接收供体片的可旋转地安装的接收辊，使得供体片在分配辊和接收辊之间延伸。 多个可旋转地安装的接触辊被构造成使得在分配辊和接收辊之间延伸的供体片的一部分与受体元件的一部分接触。

    Process for the prevention of coating defects
    7.
    发明申请
    Process for the prevention of coating defects 审中-公开
    防止涂层缺陷的工艺

    公开(公告)号：US20050069809A1

    公开(公告)日：2005-03-31

    申请号：US10937041

    申请日：2004-09-09

    申请人： Gerhard Hauck ,  Ulrike Dallmann ,  Toshko Ignatov

    发明人： Gerhard Hauck ,  Ulrike Dallmann ,  Toshko Ignatov

    IPC分类号： B05D1/12 ,  B05D5/00 ,  C09D5/32 ,  C09D7/12 ,  C09D133/08 ,  C09D163/04 ,  G03C1/76 ,  G03F7/004 ,  G03F7/16

    CPC分类号： G03F7/16

    摘要： The present invention relates to a coating process comprising (a) providing a coating solution comprising one or more polar organic solvents, (b) contacting the coating solution with particles which (i) are solid at room temperature, (ii) are insoluble in polar organic solvents, (iii) have an average particle size in the range of 0.1 μm to 2 mm and (iv) comprise one or more organic materials as a main component, (c) applying the coating solution onto a substrate, and (d) drying.

    摘要翻译： 本发明涉及一种涂覆方法，其包括（a）提供包含一种或多种极性有机溶剂的涂布溶液，（b）使涂覆溶液与（i）在室温下为固体的颗粒接触，（ii）不溶于极性 有机溶剂，（iii）的平均粒径在0.1μm至2mm的范围内，（iv）包含一种或多种有机材料作为主要成分，（c）将涂布溶液涂布在基材上，（d） 烘干。

    Modified Polymers and Their Use in the Production of Lithographic Printing Plate Precursors
    9.
    发明申请
    Modified Polymers and Their Use in the Production of Lithographic Printing Plate Precursors 有权
    改性聚合物及其在平版印刷版前体的制备中的应用

    公开(公告)号：US20070269727A1

    公开(公告)日：2007-11-22

    申请号：US11570079

    申请日：2005-06-15

    申请人： Celin Savariar-Hauck ,  Alan Monk ,  Rene Ullrich

    发明人： Celin Savariar-Hauck ,  Alan Monk ,  Rene Ullrich

    IPC分类号： B41M5/36 ,  B41C1/10

    CPC分类号： B41M5/368 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    摘要： Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with —COOH, —SO3H, —P03H2 and/or —PO4H2 in the side chains, wherein the polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, and (ii) a salt with an inorganic or organic cation, wherein the modified polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, said layer being soluble in aqueous alkaline developer, but is rendered insoluble in aqueous alkaline developer by IR radiation.

    摘要翻译： 辐射敏感的负性工作元件包括（a）具有亲水表面的基底和（b）基底的亲水表面上的层，其中所述层包含可通过使（i）聚合物与-COOH反应获得的改性聚合物， SO 3 H，-P 3 H 2和/或-PO 4 H 2，其中所述聚合物可溶于碱性水溶液中，并且所述溶解度不被IR辐射改变，和（ii）与无机或有机阳离子的盐，其中所述改性聚合物 可溶于碱性水溶液中，溶解度不受IR辐射改变，所述层可溶于含水碱性显影剂，但通过IR辐射使其不溶于含水碱性显影剂。