Cu-Ni-Si-based copper alloy plate having excellent deep drawing workability and method of manufacturing the same
    10.
    发明授权
    Cu-Ni-Si-based copper alloy plate having excellent deep drawing workability and method of manufacturing the same 有权
    具有优异的深拉深加工性的Cu-Ni-Si系铜合金板及其制造方法

    公开(公告)号:US09435016B2

    公开(公告)日:2016-09-06

    申请号:US13808351

    申请日:2010-07-07

    摘要: The Cu—Ni—Si-based copper alloy plate contains 1.0 mass % to 3.0 mass % of Ni, and Si at a concentration of ⅙ to ¼ of the mass % concentration of Ni with a remainder of Cu and inevitable impurities, in which, when the average value of the aspect ratio (the minor axis of crystal grains/the major axis of crystal grains) of each crystal grains in an alloy structure is 0.4 to 0.6, the average value of GOS in the all crystal grains is 1.2° to 1.5°, and the ratio (Lσ/L) of the total special grain boundary length Lσ of special grain boundaries to the total grain boundary length L of crystal grain boundaries is 60% to 70%, the spring bending elastic limit becomes 450 N/mm2 to 600 N/mm2, the solder resistance to heat separation is favorable and deep drawing workability is excellent at 150° C. for 1000 hours.

    摘要翻译: Cu-Ni-Si系铜合金板含有1.0质量%〜3.0质量%的Ni,Si的质量%浓度为⅙〜¼的Si,余量为Cu和不可避免的杂质, 当合金结构中每个晶粒的纵横比(晶粒的短轴/晶粒的长轴)的平均值为0.4至0.6时,所有晶粒中GOS的平均值为1.2°至 1.5°,特殊晶界的总特殊晶界长度Lσ与晶界的总晶界长L的比(Lσ/ L)为60%〜70%,弹性弯曲弹性极限为450N / mm2〜600N / mm2,耐热焊接性良好,在150℃,1000小时时深冲加工性优异。