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公开(公告)号：US09212090B2
公开(公告)日：2015-12-15
申请号：US13383530
申请日：2010-07-13
CPC分类号： G02B1/18 , B01J21/063 , B01J21/066 , B01J35/004 , B01J37/0244 , B01J37/341 , B01J37/347 , C03C17/3417 , C03C17/3435 , C03C17/3447 , C03C2217/212 , C03C2217/213 , C03C2217/23 , C03C2217/281 , C03C2217/71 , C03C2217/734 , G02B27/0006 , Y10T428/24942
摘要： One subject of the invention is a material comprising a substrate coated on at least one portion of at least one of its faces with a stack comprising a photocatalytic layer, the geometrical thickness of which is between 2 and 30 nm, and at least one pair of respectively high and low refractive index layers positioned underneath said photocatalytic layer so that in the or each pair, the or each high refractive index layer is closest to the substrate, said material being such that the optical thickness, for a wavelength of 350 nm, of the or each high refractive index layer, except the photocatalytic layer, is between 170 and 300 nm and the optical thickness, for a wavelength of 350 nm, of the or each low refractive index layer is between 30 and 90 nm.
摘要翻译： 本发明的一个主题是一种材料，其包括涂覆在其至少一个表面的至少一部分上的基底，该叠层包括光催化层，其几何厚度为2至30nm，以及至少一对 分别位于所述光催化层下面的高和低折射率层，使得在每一对或每对中，高折射率层或每个高折射率层最靠近基板，所述材料使得对于波长为350nm的光学厚度为 除了光催化层之外，每个高折射率层或每个高折射率层在170和300nm之间，并且每个低折射率层的每个低折射率层的光学厚度在350nm的波长为30nm和90nm之间。
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公开(公告)号：US09102565B2
公开(公告)日：2015-08-11
申请号：US13394249
申请日：2010-09-07
申请人： Anne Durandeau , Andriy Kharchenko , Bruno Mauvernay , Emilie Thollas , Etienne Sandre-Chardonnal , Pierre-Alain Gillet , Ulrich Billert
发明人： Anne Durandeau , Andriy Kharchenko , Bruno Mauvernay , Emilie Thollas , Etienne Sandre-Chardonnal , Pierre-Alain Gillet , Ulrich Billert
CPC分类号： C03C17/3435 , C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3649 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/71 , Y10T428/265
摘要： The subject of the invention is a material comprising a glass substrate coated on at least one of its faces with a thin-film multilayer comprising, starting from said substrate, at least one lower dielectric layer, at least one functional layer made of a metal or metal nitride, at least one upper dielectric layer and at least one layer of titanium oxide at least partially crystallized in the anatase form, said metal or metal nitride being based on Nb, NbN, W, WN, Ta, TaN or any of their alloys or solid solutions.
摘要翻译： 本发明的主题是一种材料，其包括涂覆在其至少一个表面上的玻璃基板，薄膜多层包括从所述基板开始的至少一个下介电层，至少一个由金属制成的功能层或 金属氮化物，至少一个上介电层和至少一层氧化钛，其以锐钛矿形式至少部分结晶，所述金属或金属氮化物基于Nb，NbN，W，WN，Ta，TaN或它们的任何合金 或固体溶液。
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3.发明申请PROCESS FOR TEXTURING THE SURFACE OF A SUBSTRATE HAVING A GLASS FUNCTION, AND GLASS PRODUCT HAVING A TEXTURED SURFACE 审中-公开用于纹理具有玻璃功能的基底的表面的工艺以及具有纹理表面的玻璃制品公开(公告)号：US20100209673A1
公开(公告)日：2010-08-19
申请号：US12669806
申请日：2008-07-11
CPC分类号： C03C15/00 , B44C1/227 , B44C5/0407 , C03C17/007 , C03C17/09 , C03C17/30 , C03C17/34 , C03C2217/425 , C03C2217/77 , C03C2218/152 , C03C2218/33 , C03C2218/355 , Y10T428/24612
摘要： Surface texturing process, i.e. one for the formation of at least one array of features with a characteristic dimension on at least one surface portion of a substrate having a glass function, characterized in that a solution containing at least one precursor of a material to be deposited is dissociated, at atmospheric pressure, within a flame, said flame being directed toward said surface portion so as to deposit, in the form of a plurality of nodules based on said material, a mask, said mask of said material being subjected to an etching step.
摘要翻译： 表面纹理化工艺，即用于形成具有玻璃功能的衬底的至少一个表面部分上的特征尺寸的至少一个特征阵列的表面纹理化工艺，其特征在于，含有至少一种待沉积材料的前体的溶液 在大气压力下在火焰内解离，所述火焰指向所述表面部分，以便以基于所述材料的多个结节的形式沉积掩模，所述材料的所述掩模经受蚀刻 步。
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4.发明授权公开(公告)号：US08470434B2
公开(公告)日：2013-06-25
申请号：US12523174
申请日：2008-01-14
申请人： Bernard Nghiem , Emilie Viasnoff , Bertrand Kuhn , David Le Bellac , Anne Durandeau , Fabrice Abbott , Eddy Royer , Georges Zagdoun , Olivier Dubois
发明人： Bernard Nghiem , Emilie Viasnoff , Bertrand Kuhn , David Le Bellac , Anne Durandeau , Fabrice Abbott , Eddy Royer , Georges Zagdoun , Olivier Dubois
IPC分类号： C03C17/34
CPC分类号： C03C17/3417 , C03C2217/91 , C03C2218/152 , C23C16/029 , C23C16/40 , C23C16/401 , C23C16/407
摘要： The invention relates to a transparent glass substrate, associated with a transparent electro-conductive layer capable of constituting an electrode of a photovoltaic cell and composed of a doped oxide, characterized by the interposition, between the glass substrate and the transparent electroconductive layer, of a mixed layer of one or more first nitride(s) or oxynitride(s), or oxide(s) or oxycarbide(s) having good adhesive properties with glass, and one or more second nitride(s) or oxynitride(s) or oxide(s) or oxycarbide(s) capable of constituting, possibly in the doped state, a transparent electroconductive layer; a method for producing this substrate; a photovoltaic cell, a tempered and/or curved glass, a shaped heating glass, a plasma screen and a flat lamp electrode having this substrate.
摘要翻译： 本发明涉及一种透明玻璃基板，其与能够构成光伏电池的电极并由掺杂氧化物组成的透明导电层相关联，其特征在于在玻璃基板和透明导电层之间插入一个 具有与玻璃具有良好粘合性质的一种或多种第一氮化物或氧氮化物或氧化物或氧化碳的混合层，以及一种或多种第二氮化物或氧氮化物或氧化物 能够构成可能处于掺杂状态的透明导电层的一种或多种或多种碳氧化物; 制造该基板的方法; 光伏电池，回火和/或弯曲玻璃，成形加热玻璃，等离子体屏幕和具有该基板的扁平灯电极。
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公开(公告)号：US20120149556A1
公开(公告)日：2012-06-14
申请号：US13383530
申请日：2010-07-13
CPC分类号： G02B1/18 , B01J21/063 , B01J21/066 , B01J35/004 , B01J37/0244 , B01J37/341 , B01J37/347 , C03C17/3417 , C03C17/3435 , C03C17/3447 , C03C2217/212 , C03C2217/213 , C03C2217/23 , C03C2217/281 , C03C2217/71 , C03C2217/734 , G02B27/0006 , Y10T428/24942
摘要： One subject of the invention is a material comprising a substrate coated on at least one portion of at least one of its faces with a stack comprising a photocatalytic layer, the geometrical thickness of which is between 2 and 30 nm, and at least one pair of respectively high and low refractive index layers positioned underneath said photocatalytic layer so that in the or each pair, the or each high refractive index layer is closest to the substrate, said material being such that the optical thickness, for a wavelength of 350 nm, of the or each high refractive index layer, except the photocatalytic layer, is between 170 and 300 nm and the optical thickness, for a wavelength of 350 nm, of the or each low refractive index layer is between 30 and 90 nm.
摘要翻译： 本发明的一个主题是一种材料，其包括涂覆在其至少一个表面的至少一部分上的基底，该叠层包括光催化层，其几何厚度为2至30nm，以及至少一对 分别位于所述光催化层下面的高和低折射率层，使得在每一对或每对中，高折射率层或每个高折射率层最靠近基板，所述材料使得对于波长为350nm的光学厚度为 除了光催化层之外，每个高折射率层或每个高折射率层在170和300nm之间，并且每个低折射率层的每个低折射率层的光学厚度在350nm的波长为30nm和90nm之间。
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公开(公告)号：US20110117293A1
公开(公告)日：2011-05-19
申请号：US12937119
申请日：2009-04-10
申请人： Anne Durandeau , Andriy Karchenko , Nicolas Nadaud
发明人： Anne Durandeau , Andriy Karchenko , Nicolas Nadaud
CPC分类号： C03C17/2456 , C03C17/3441 , C03C17/3482 , C03C17/36 , C03C17/3607 , C03C17/3649 , C03C17/3689 , C03C2217/71 , C03C2218/32 , C03C2218/322 , C03C2218/328
摘要： The subject of the invention is a process for obtaining a material comprising a substrate and at least one at least partially crystalline titanium-oxide-based thin film deposited on a first side of said substrate, said process comprising the following steps: said at least one titanium-oxide-based thin film is deposited; said at least one titanium-oxide-based thin film is subjected to a crystallization treatment, supplying energy capable of raising each point of said at least one titanium-oxide-based thin film to a temperature of at least 300° C. while maintaining a temperature not exceeding 150° C. at any point on the opposite side of said substrate to said first side; said crystallization treatment being preceded by a deposition step, in which an energy-providing film is deposited above and/or below said titanium-oxide-based thin film, said energy-providing film being capable of absorbing the energy supplied during said crystallization treatment more effectively than said at least one titanium oxide film and/or of creating additional energy during said crystallization treatment, and of transmitting at least some of said energy to said at least one titanium-oxide-based thin film during said crystallization treatment.
摘要翻译： 本发明的主题是一种获得材料的方法，该材料包括沉积在所述基材的第一面上的基材和至少一种至少部分结晶的氧化钛基薄膜，所述方法包括以下步骤：所述至少一种 沉积氧化钛基薄膜; 所述至少一种氧化钛基薄膜经过结晶处理，将能够将所述至少一种氧化钛基薄膜的每一点提高至300℃以上的能量，同时保持 在与所述第一侧相对的所述基板的相对侧的任何点处的温度不超过150℃; 所述结晶处理之前是沉积步骤，其中在所述氧化钛基薄膜上方和/或下方沉积能量提供膜，所述能量提供膜能够吸收在所述结晶处理期间提供的能量更多 在所述结晶处理期间有效地比所述至少一种氧化钛膜和/或产生额外的能量，并且在所述结晶处理期间将至少一些所述能量传递到所述至少一种氧化钛基薄膜。
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公开(公告)号：US06924037B1
公开(公告)日：2005-08-02
申请号：US10088089
申请日：2000-11-17
CPC分类号： G02B1/115 , B32B17/10 , B32B17/10036 , B32B17/10174 , B32B17/10761 , C03C17/3417 , C03C17/3435 , C03C17/3441 , C03C2217/734 , G02B1/116 , B32B2367/00
摘要： A transparent substrate including an antireflection coating, made from a stack of thin layers of dielectric material having alternately high and low refractive indices. This stack includes a high-index first layer having a refractive index n, of between 1.8 and 2.2 and a geometrical thickness e1 of between 5 and 50 nm, a low-index second layer having a refractive index n2 of between 1.35 and 1.65 and a geometrical thickness e2 of between 5 and 50 nm, a high-index third layer having a refractive index n3 of between 1.8 and 2.2 and a geometrical thickness e3 of between 70 and 120 nm, and a low-index fourth layer having a refractive index n4 of between 1.35 and 1:65 and a geometrical thickness e4 of at least 80 nm.
摘要翻译： 一种透明基板，包括由具有交替的高折射率和低折射率的介电材料薄层堆叠制成的抗反射涂层。 该叠层包括折射率n在1.8和2.2之间的高折射率第一层和5至50nm之间的几何厚度e 1 1，具有折射率的低折射率第二层 n 2范围在1.35至1.65之间，几何厚度e 2 2在5至50nm之间，折射率为n 3的高折射率第三层， / SUB>在1.8和2.2之间，几何厚度e 3 N在70和120nm之间，低折射率的第四层的折射率为n≥4< 1.35和1:65，几何厚度e 4至少为80nm。
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公开(公告)号：US09011649B2
公开(公告)日：2015-04-21
申请号：US13496090
申请日：2010-09-30
CPC分类号： C03C17/002 , C03C17/245 , C03C2217/71 , C03C2218/154 , C03C2218/322 , C23C14/0635 , C23C14/0641 , C23C14/14 , C23C14/185 , C23C14/541 , C23C14/5813 , C23C14/5853 , Y10S977/755 , Y10S977/891 , Y10T428/24917
摘要： The subject of the invention is a process for obtaining a substrate coated on at least part of its surface with at least one film of oxide of a metal M the physical thickness of which is 30 nm or less, said oxide film not being part of a multilayer comprising at least one silver film, said process comprising the following steps: at least one intermediate film of a material chosen from the metal M, a nitride of the metal M, a carbide of the metal M and an oxygen-substoichiometric oxide of the metal M is deposited by sputtering, said intermediate film not being deposited above or beneath a titanium-oxide-based film, the physical thickness of said intermediate film being 30 nm or less; and at least part of the surface of said intermediate film is oxidized using a heat treatment, during which said intermediate film is in direct contact with an oxidizing atmosphere, especially air, the temperature of said substrate during said heat treatment not exceeding 150° C.
摘要翻译： 本发明的主题是用至少一种金属M的氧化物的至少一部分获得涂覆在其表面的至少一部分的基板的方法，其物理厚度为30nm以下，所述氧化膜不是 所述方法包括以下步骤：选自金属M，金属M的氮化物，金属M的碳化物和氧化合物的氧化物的至少一种中间膜 金属M通过溅射沉积，所述中间膜不沉积在氧化钛基膜之上或之下，所述中间膜的物理厚度为30nm或更小; 并且所述中间膜的表面的至少一部分通过热处理而被氧化，在此期间所述中间膜与氧化气氛，特别是空气直接接触，所述热处理期间所述基板的温度不超过150℃。
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公开(公告)号：US08580355B2
公开(公告)日：2013-11-12
申请号：US12937119
申请日：2009-04-10
CPC分类号： C03C17/2456 , C03C17/3441 , C03C17/3482 , C03C17/36 , C03C17/3607 , C03C17/3649 , C03C17/3689 , C03C2217/71 , C03C2218/32 , C03C2218/322 , C03C2218/328
摘要： The subject of the invention is a process for obtaining a material comprising a substrate and at least one at least partially crystalline titanium-oxide-based thin film deposited on a first side of said substrate, said process comprising the following steps: said at least one titanium-oxide-based thin film is deposited; said at least one titanium-oxide-based thin film is subjected to a crystallization treatment, supplying energy capable of raising each point of said at least one titanium-oxide-based thin film to a temperature of at least 300° C. while maintaining a temperature not exceeding 150° C. at any point on the opposite side of said substrate to said first side; said crystallization treatment being preceded by a deposition step, in which an energy-providing film is deposited above and/or below said titanium-oxide-based thin film, said energy-providing film being capable of absorbing the energy supplied during said crystallization treatment more effectively than said at least one titanium oxide film and/or of creating additional energy during said crystallization treatment, and of transmitting at least some of said energy to said at least one titanium-oxide-based thin film during said crystallization treatment.
摘要翻译： 本发明的主题是一种获得材料的方法，该材料包括沉积在所述基材的第一面上的基材和至少一种至少部分结晶的氧化钛基薄膜，所述方法包括以下步骤：所述至少一种 沉积氧化钛基薄膜; 所述至少一种氧化钛基薄膜经过结晶处理，将能够将所述至少一种氧化钛基薄膜的每一点提高至300℃以上的能量，同时保持 在与所述第一侧相对的所述基板的相对侧的任何点处的温度不超过150℃; 所述结晶处理之前是沉积步骤，其中在所述氧化钛基薄膜上方和/或下方沉积能量提供膜，所述能量提供膜能够吸收在所述结晶处理期间提供的能量更多 在所述结晶处理期间有效地比所述至少一种氧化钛膜和/或产生额外的能量，并且在所述结晶处理期间将至少一些所述能量传递到所述至少一种氧化钛基薄膜。
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公开(公告)号：US07923626B2
公开(公告)日：2011-04-12
申请号：US10495438
申请日：2002-11-27
申请人： Ulf Blieske , Anne Durandeau
发明人： Ulf Blieske , Anne Durandeau
IPC分类号： H01L31/0236
CPC分类号： C03C17/3411 , C03C17/23 , C03C17/245 , C03C2217/77 , H01L31/022466 , H01L31/02366 , Y02E10/50
摘要： The invention relates to a glass substrate (1) provided with an electrode comprising at least one metal oxide-based transparent conducting layer (3), characterized in that said layer has an RMS roughness of at least 3 nm, especially of at least 5 nm and/or a mean feature size for this roughness of at least 50 nm.
摘要翻译： 本发明涉及一种设置有包括至少一个基于金属氧化物的透明导电层（3）的电极的玻璃基板（1），其特征在于所述层的RMS粗糙度至少为3nm，特别是至少5nm 和/或该粗糙度的至少50nm的平均特征尺寸。
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