SOLAR CELL FRONT ELECTRODE WITH AN ANTIREFLECTION COATING
    4.
    发明申请
    SOLAR CELL FRONT ELECTRODE WITH AN ANTIREFLECTION COATING 审中-公开
    具有抗反射涂层的太阳能电池前电极

    公开(公告)号:US20110315211A1

    公开(公告)日:2011-12-29

    申请号:US13120312

    申请日:2009-09-24

    摘要: A carrier substrate, includes a substrate especially having a glass function, transparent at least in the visible and near-infrared ranges and receiving a conducting electrode which is transparent at least in the visible and near-infrared ranges, this electrode carrier substrate being intended to constitute, in combination with functional elements, a solar cell. This carrier substrate is such that: the electrode includes a micromesh made of conducting material having submillimeter-sized openings; and this micromesh is in contact with an at least slightly conducting antireflection coating facing that one of the functional elements with which it is intended to be in contact. An aspect of the present invention also relates to the use of such a carrier substrate as constituent element of a solar cell and to a process for fabricating the substrate.

    摘要翻译: 载体衬底包括特别是具有玻璃功能的衬底,至少在可见光和近红外范围内是透明的,并且接收至少在可见光和近红外范围内透明的导电电极,该电极载体衬底旨在 与功能元件结合构成太阳能电池。 该载体基板使得:电极包括由具有亚毫米尺寸的开口的导电材料制成的微型薄膜; 并且该微型电极与面向其旨在接触的功能元件之一的至少轻微导电的抗反射涂层接触。 本发明的一个方面还涉及这种载体衬底作为太阳能电池的构成元件的用途以及制造衬底的工艺。

    Method for manufacturing a submillimetric electrically conductive grid coated with an overgrid
    6.
    发明授权
    Method for manufacturing a submillimetric electrically conductive grid coated with an overgrid 有权
    制造涂覆有过网格的亚毫米级导电栅格的方法

    公开(公告)号:US08808790B2

    公开(公告)日:2014-08-19

    申请号:US13120580

    申请日:2009-09-25

    摘要: A method of manufacturing a submillimetric electroconductive grid coated with an overgrid on a substrate includes: the production of a mask having submillimetric openings by the deposition of a solution of colloidal polymeric nanoparticles that are stabilized and dispersed in a solvent, the polymeric particles having a glass transition temperature Tg and the drying of the masking layer at a temperature below the Tg until the mask, with straight edges, is obtained, the formation of the electroconductive grid by a deposition of electroconductive material, referred to as grid material, a heat treatment of the masking layer with the grid material at a temperature greater than or equal to 0.8 times Tg, thus creating a space between the edges of mask zones and the lateral edges of the grid; a deposition of a layer, referred to as an overlayer, made of a material referred to as overlayer material, on the grid and in the space between the edges of mask zones and the lateral edges of the grid; a removal of the masking layer. The invention also relates to the grid thus obtained.

    摘要翻译: 在衬底上制造涂覆有过度网格的亚毫米级导电网格的方法包括:通过沉积稳定并分散在溶剂中的胶体聚合物纳米颗粒的溶液来生产具有亚毫米开口的掩模,所述聚合物颗粒具有玻璃 转变温度Tg和在低于Tg的温度下的掩蔽层的干燥,直到获得具有直边缘的掩模,通过沉积导电材料形成导电栅格,称为栅格材料,热处理 具有栅极材料的屏蔽层在大于或等于0.8倍Tg的温度下,从而在掩模区域的边缘和栅格的侧边缘之间产生空间; 被称为覆盖层的被称为覆层材料的层的沉积在栅格上以及在掩模区的边缘和栅格的侧边之间的空间中; 去除掩模层。 本发明还涉及如此得到的电网。

    METHOD FOR MANUFACTURING A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID, AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID
    8.
    发明申请
    METHOD FOR MANUFACTURING A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID, AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID 审中-公开
    低电导率电导网的制造方法以及次导电导电网

    公开(公告)号:US20110247859A1

    公开(公告)日:2011-10-13

    申请号:US13120567

    申请日:2009-09-25

    摘要: The manufacture of a submillimetric grid includes the production of a mask having submillimetric openings, referred to as a network mask, on the main face, from a solution of colloidal nanoparticles with a given glass transition temperature Tg, the drying of the masking layer at a temperature below the Tg; the formation of the electroconductive grid from the network mask including in this order: deposition of at least one electroconductive material, referred to as grid material, having an electricity resistivity of less than 10−5 ohm.cm; removal of the masking layer, revealing the mother grid; optional deposition, by electrodeposition, of an electroconductive material, referred to as overgrid material, the surface subjacent to the mother grid then being dielectric; a detachment, of the mother grid or the overgrid, of a thickness of at least 500 nm. The invention also relates to the detached grid.

    摘要翻译: 亚毫米格栅的制造包括在具有给定的玻璃化转变温度Tg的胶体纳米颗粒的溶液中生产具有亚毫米开口的掩模,称为网罩,在主表面上,掩蔽层在一个 温度低于Tg; 从网络掩模形成包括以下顺序的导电栅格:沉积至少一种导电材料,称为网格材料,其电阻率小于10-5欧姆·厘米; 去除掩蔽层,露出母格; 通过电沉积可选地沉积称为过网状材料的导电材料,与母格栅相邻的表面为电介质; 至少500nm的厚度的母格或网格的分离。 本发明还涉及分离格栅。

    TEMPORARY PROTECTION OF GLASS
    10.
    发明申请
    TEMPORARY PROTECTION OF GLASS 审中-公开
    玻璃的临时保护

    公开(公告)号:US20110177324A1

    公开(公告)日:2011-07-21

    申请号:US12993978

    申请日:2009-05-25

    摘要: One subject of the invention is a glass substrate coated with a continuous temporary protection film, said film essentially consisting of a stack of discernible colloidal polymer particles. Another subject of the invention is a process for coating a glass substrate with a continuous temporary protection film, in which process an aqueous dispersion of colloidal particles of at least one water-insoluble solid polymer is deposited on at least one surface of said substrate and then the film thus obtained is dried at a temperature above the glass transition temperature of said at least one polymer but not exceeding 50° C.

    摘要翻译: 本发明的一个主题是涂覆有连续临时保护膜的玻璃基底,所述膜基本上由可辨别的胶体聚合物颗粒的堆叠组成。 本发明的另一主题是用连续的临时保护膜涂覆玻璃基底的方法,其中至少一种不溶于水的固体聚合物的胶体颗粒的水分散体沉积在所述基底的至少一个表面上,然后 由此获得的膜在高于所述至少一种聚合物的玻璃化转变温度但不超过50℃的温度下干燥。