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    LEAD-CONTAINING SPACE GLASS, ITS PRODUCTION AND ITS USE
    1.
    发明申请
    LEAD-CONTAINING SPACE GLASS, ITS PRODUCTION AND ITS USE 有权
    含铅空间玻璃及其生产及其使用

    公开(公告)号：US20100323874A1

    公开(公告)日：2010-12-23

    申请号：US12819252

    申请日：2010-06-21

    申请人： Burkhard Speit ,  Silke Wolff ,  Thorsten Doehring

    发明人： Burkhard Speit ,  Silke Wolff ,  Thorsten Doehring

    IPC分类号： C03C3/108 ,  C03C3/07 ,  C03C3/072 ,  C03C3/102 ,  C03C3/105 ,  C03B5/225

    CPC分类号： C03C3/07 ,  C03C3/072 ,  C03C3/102 ,  G02B13/143

    摘要： The optical glasses have increased refractive indices and are useful for making space-saving and light-weight imaging optics with lenses of different glass types for use in different objects travelling in space. The optical glasses are suitable for production of optics having low total weight, which is decisive for space applications. These space glasses have high UV- and VIS-transmittance in a range of between 300 and 800 nm and high stability of transmittance over a period of years, because their aging has been greatly limited.

    摘要翻译： 光学眼镜具有增加的折射率，并且可用于制造具有不同玻璃类型的透镜的节省空间和重量轻的成像光学元件，用于在空间中行进的不同物体中。 光学眼镜适合于生产总重量较低的光学元件，这对于空间应用是决定性的。 这些太空眼镜在300至800nm的范围内具有高的UV和VIS透光率，并且由于其老化受到极大的限制，因此在多年的时间内具有高的透光率稳定性。

    Methods for making wafers with low-defect surfaces, wafers obtained thereby and electronic components made from the wafers
    2.
    发明授权
    Methods for making wafers with low-defect surfaces, wafers obtained thereby and electronic components made from the wafers 失效
    制造具有低缺陷表面的晶片的方法，由此获得的晶片和由晶片制成的电子部件

    公开(公告)号：US07367865B2

    公开(公告)日：2008-05-06

    申请号：US11069118

    申请日：2005-03-01

    申请人： Peter Blaum ,  Burkhard Speit ,  Ingo Koehler ,  Bernd Ruediger ,  Wolfram Beier

    发明人： Peter Blaum ,  Burkhard Speit ,  Ingo Koehler ,  Bernd Ruediger ,  Wolfram Beier

    IPC分类号： H01L21/70

    CPC分类号： B24B37/30 ,  B24B37/042

    摘要： The electronic semiconductor component has a crystalline wafer substrate with an active surface and a semiconductor layer coating the active surface. So that the semiconductor layer has a few surface defects the crystalline wafer substrate is a sapphire or silicon carbide single crystal and the active surface has a pit density of less than 500 pit/cm2, preferably less than 100 pit/cm2. The polishing method for obtaining the active surface with these pit densities includes polishing with a polishing agent, such as a silicon suspension, and a polishing tool, which is pressed on the active surface with a pressure of preferably from 0.05 to 0.2 kg/cm2 and moved over the active surface with polishing motions distributed statistically and uniformly over a 360° angle during polishing.

    摘要翻译： 电子半导体部件具有具有有源面的晶片基板和涂覆有源面的半导体层。 为了使半导体层具有几个表面缺陷，晶片衬底是蓝宝石或碳化硅单晶，并且活性表面的凹坑密度小于500凹坑/ cm 2，优选小于100 凹坑/ cm 2。 用于获得具有这些凹坑密度的活性表面的抛光方法包括用抛光剂如硅悬浮液和抛光工具进行抛光，抛光工具以优选0.05-0.2kg / cm 2的压力压在活性表面上， SUP> 2并且在抛光期间在360°角度上统计均匀地分布抛光运动而在有源表面上移动。

    Method and apparatus for measuring the position of a phase interface during crystal growth
    3.
    发明授权
    Method and apparatus for measuring the position of a phase interface during crystal growth 失效
    在晶体生长期间测量相界面的位置的方法和装置

    公开(公告)号：US06932864B2

    公开(公告)日：2005-08-23

    申请号：US10128856

    申请日：2002-04-23

    申请人： Lutz Parthier ,  Frank-Thomas Lentes ,  Gunther Wehrhan ,  Burkhard Speit ,  Hans-Joerg Axmann

    发明人： Lutz Parthier ,  Frank-Thomas Lentes ,  Gunther Wehrhan ,  Burkhard Speit ,  Hans-Joerg Axmann

    IPC分类号： G01B11/00 ,  C30B11/00 ,  C30B29/12 ,  C30B15/20 ,  C30B19/10

    CPC分类号： C30B11/006

    摘要： In the method and apparatus for measuring the position of the phase interface during growth of a crystal from a melt in a crystal growth container according to the VGF method an incident optical signal is propagated to the phase interface between the melt and the crystal through a window (16) in the container (10) and a received optical signal reflected from the phase interface (14) is measured to determine the position of the phase interface. The position of the phase interface is established from the reflected signal by triangulation with a confocal optic system, by interferometric balancing or by transit time of the optical signal. The window (16) is preferably mounted in a preferably tilted orientation at the end of a tube (15), which is immersed in the melt (12).

    摘要翻译： 在根据VGF方法在晶体生长容器中从熔体生长晶体期间测量相界面的位置的方法和装置中，入射光信号通过窗口传播到熔体和晶体之间的相界面 （10）中的（16）并且从相位界面（14）反射的接收的光信号被测量以确定相位界面的位置。 通过用共焦光学系统进行三角测量，通过干涉平衡或光信号的传播时间，从反射信号建立相位接口的位置。 窗口（16）优选地在浸在熔体（12）中的管（15）的端部处以优选倾斜的方向安装。

    Methods for growing large-volume single crystals from calcium fluoride and their uses
    4.
    发明授权
    Methods for growing large-volume single crystals from calcium fluoride and their uses 失效
    从氟化钙生长大容量单晶的方法及其用途

    公开(公告)号：US06364946B2

    公开(公告)日：2002-04-02

    申请号：US09798631

    申请日：2001-03-02

    申请人： Joerg Staeblein ,  Andreas Weisleder ,  Gunther Wehrhan ,  Burkhard Speit ,  Lutz Parthier

    发明人： Joerg Staeblein ,  Andreas Weisleder ,  Gunther Wehrhan ,  Burkhard Speit ,  Lutz Parthier

    IPC分类号： C30B1104

    CPC分类号： C30B33/00 ,  C30B29/12 ,  Y10T117/10

    摘要： The method for making a uniform, large-size single crystal of calcium fluoride includes placing a single precursor crystal of calcium fluoride in a tempering vessel provided with a cover; introducing calcium fluoride powder into the tempering vessel and subsequently heating the single precursor crystal, preferably in intimate contact with the calcium fluoride powder, in the tempering vessel together with the calcium fluoride powder for two or more hours at temperatures above 1150° C. to temper the precursor crystal and thus form the uniform, large-scale single crystal of calcium fluoride. The uniform large-sized single crystals of calcium fluoride can be used to make improved lens, prism, light-conducting rod, optical window or other optical component for DUV photolithography, steppers, excimer lasers, wafers, computer chips and electronic devices containing the wafers and chips.

    摘要翻译： 制造均匀，大尺寸的氟化钙单晶的方法包括将氟化钙的单一前体晶体放置在设置有盖的回火容器中; 将氟化钙粉末引入回火容器中，随后在回火容器中与氟化钙粉末一起加热单一前体晶体，优选与氟化钙粉末紧密接触，与氟化钙粉末一起在高于1150℃的温度下搅拌两个或更多小时以回火 前体晶体，从而形成均匀，大规模的氟化钙单晶。 均匀的大尺寸单晶氟化钙可用于制造用于DUV光刻，步进器，准分子激光器，晶片，计算机芯片和包含晶片的电子器件的改进的透镜，棱镜，导光杆，光学窗口或其他光学部件 与芯片。

    Aluminophosphate glass containing copper(II) oxide
    5.
    发明授权
    Aluminophosphate glass containing copper(II) oxide 失效
    含二氧化铜（II）的铝磷酸盐玻璃

    公开(公告)号：US5173212A

    公开(公告)日：1992-12-22

    申请号：US773010

    申请日：1991-10-04

    申请人： Burkhard Speit ,  Ansgar Karnehm ,  Magdalena Winkler-Trudewig

    发明人： Burkhard Speit ,  Ansgar Karnehm ,  Magdalena Winkler-Trudewig

    IPC分类号： C03C3/066 ,  C03C3/068 ,  C03C3/17 ,  C03C3/19 ,  C03C3/21 ,  C03C4/08 ,  G02B5/20 ,  G02B5/22

    CPC分类号： C03C3/21 ,  Y10S501/904 ,  Y10S501/905

    摘要： An aluminophosphate glass containing copper(II) oxide having a low transmission in the near infrared range with a steep absorption edge as well as a very uniform high transparency in the visible range is particularly suitable as filter glass for color video cameras or as filter glass, e.g., for goggles and color displays, said glass comprising, in % by weight on the oxide basis, 67-77 of P.sub.2 O.sub.5 ; 8-13 of Al.sub.2 O.sub.3 ; 0-5.5 of B.sub.2 O.sub.3 ; 0-2.1 of SiO.sub.2 ; 0-2.5 of Li.sub.2 O; 0-6 of Na.sub.2 O; 0-14 of K.sub.2 O; 0-2.5 of Rb.sub.2 O; 0-2.5 of Cs.sub.2 O; .SIGMA. alkali metal oxide 3-14; 2.5-4.9 of MgO; 0-2.5 of CaO; 0-2.5 of SrO; 0-2.5 of BaO; 0-2.5 of ZnO; .SIGMA. alkaline-earth metal oxides+ZnO less than 5; 2-7.5 of CuO; 0.001-0.5 of V.sub.2 O.sub.5 ; CuO+V.sub.2 O.sub.5 of 2-7.5.

    摘要翻译： 包含在近红外范围内具有陡峭吸收边缘的低透射率以及可见光范围内非常均匀的高透明度的氧化铜（II）的磷酸铝玻璃特别适用于彩色摄像机或过滤玻璃的过滤玻璃， 例如，对于护目镜和彩色显示器，所述玻璃以氧化物为基准的重量％包含67-77的P 2 O 5; 8-13 Al2O3; 0-5.5 B2O3; 0-2.1的SiO2; 0-2.5 Li2O; 0-6的Na2O; 0-14的K2O; 0-2.5的Rb2O; 0-2.5的Cs2O; SIGMA碱金属氧化物3-14; 2.5-4.9的MgO; 0-2.5的CaO; 0-2.5 SrO; 0-2.5 BaO; 0-2.5的ZnO; SIGMA碱土金属氧化物+ ZnO小于5; 2-7.5 CuO; 0.001-0.5 V2O5; CuO + V2O5为2-7.5。

    Method for determination of the radiation stability of crystals
    6.
    发明授权
    Method for determination of the radiation stability of crystals 失效

    公开(公告)号：US06603547B2

    公开(公告)日：2003-08-05

    申请号：US09975173

    申请日：2001-10-11

    申请人： Ewald Moersen ,  Burkhard Speit ,  Lorenz Strenge ,  Joerg Kandler

    发明人： Ewald Moersen ,  Burkhard Speit ,  Lorenz Strenge ,  Joerg Kandler

    IPC分类号： G01J330

    CPC分类号： G01N21/31

    摘要： The method for determining radiation stability of a crystal to radiation of a working wavelength to be employed in a subsequent application includes taking a first absorption spectrum (A) of a cleaved piece of the crystal with a given thickness (D) over a predetermined wavelength range from a first wavelength (&lgr;1) to a second wavelength (&lgr;2) by means of a spectrophotometer. Then the cleaved piece of the crystal is irradiated with an energetic radiation source so as to form all theoretically possible color centers (saturation). After the irradiating a second absorption spectrum (B) of the cleaved piece of crystal is taken over the same predetermined wavelength range. Then a surface integral of a difference spectrum of the first absorption spectrum and the second absorption spectrum over the predetermined wavelength range is formed and divided by the thickness (D) to obtain a scaled surface integral value. The absorption coefficient &Dgr;k at the working wavelength for the subsequent application is then obtained preferably from the scaled surface integral value for the damage induced by the energetic radiation and a calibration curve relating the absorption coefficient at the working wavelength to the surface integral of the absorption coefficient induced by the energetic radiation.

    Glass for rigid disk substrates
    7.
    发明授权
    Glass for rigid disk substrates 失效
    玻璃用于刚性盘基片

    公开(公告)号：US06303528B1

    公开(公告)日：2001-10-16

    申请号：US09574360

    申请日：2000-05-19

    申请人： Burkhard Speit ,  Gerhard Westenberger

    发明人： Burkhard Speit ,  Gerhard Westenberger

    IPC分类号： C03C3085

    CPC分类号： G11B5/7315 ,  C03C3/062 ,  C03C3/085 ,  C03C3/087

    摘要： The glasses used for making rigid disk substrates have the following composition (in % by weight based on oxides): SiO2, 40 to 50.8; Al2O3, 5 to 20; B2O3, 0 to 5; Li2O, 0 to 10; Na2O, 0 to 12, with the proviso that Li2O+Na2O, 5 to 12; K2O, 0 to 5; MgO, 0 to 20; CaO, 0 to 6, with the proviso that MgO+CaO, 4 to 20; SrO+BaO, 0 to 10; ZrO2, 0 to 5; TiO2,0 to 5; CeO2, 0 to 1; La2O3, 0 to 10; Fe2O3, 0 to 10; Nb2O5, 0 to 10; V2O5, 0 to 15, with the proviso that TiO2+ZrO2+La2O3+Fe2O3+Nb2O5+V2O5≧18.7; As2O3+Sb2O3+F. 0,1 to 1. These glasses also fulfill the following inequality formulae (1): (E/&rgr;)·+3,500 R>38.5 and 1000 R>1  (1), wherein R represents the relaxation rate of the glass and E/&rgr; represents specific elasticity modulus of the glass measured in GPA*cm3/g.

    摘要翻译： 用于制造刚性盘基材的玻璃具有以下组成（以氧化物为基准的重量％）：SiO 2，40至50.8; Al2O3，5〜20; B2O3，0〜5; Li2O，0〜10; Na 2 O，0〜12，条件是Li 2 O + Na 2 O，5〜12; K2O，0〜5; MgO，0〜20; CaO，0〜6，条件是MgO + CaO，4〜20; SrO + BaO，0〜10; ZrO 2，0〜5; TiO 2 0〜5; CeO2，0〜1; La2O3，0〜10; Fe2O3，0〜10; Nb2O5,0〜10; V2O5,0〜15，条件是TiO2 + ZrO2 + La2O3 + Fe2O3 + Nb2O5 + V2O5 = 18.7; As2O3 + Sb2O3 + F。 这些玻璃还满足以下不等式（1）：其中R表示玻璃的松弛率，E / rho表示以GPA * cm3 / g测量的玻璃的比弹性模量。

    Radiation-shielding glasses providing safety against electrical discharge and being resistant to discoloration
    8.
    发明授权
    Radiation-shielding glasses providing safety against electrical discharge and being resistant to discoloration 失效
    提供放电安全防辐射防辐射玻璃

    公开(公告)号：US5073524A

    公开(公告)日：1991-12-17

    申请号：US534012

    申请日：1990-06-06

    申请人： Burkhard Speit

    发明人： Burkhard Speit

    IPC分类号： C03C3/07 ,  C03C3/072 ,  C03C3/102 ,  C03C3/108 ,  C03C4/08

    CPC分类号： C03C4/087 ,  C03C3/07 ,  C03C3/072 ,  C03C3/102 ,  C03C3/108

    摘要： Cerium-doped radiation-shielding glasses in the system of SiO.sub.2 -PbO-alkali metal oxides, with a high absorption coefficient for high-energy X-ray and/or gamma- and, respectively, neutron radiation which are resistant to discoloration and exhibit a discharge stability of >5.times.10.sup.8 rad, consist essentially of (in % by weight)______________________________________ SiO.sub.2 35-56 Na.sub.2 O K.sub.2 O 12-21 Cs.sub.2 O PbO.sub.2 24-46 CeO.sub.2 0.5-2.5 CuO + Fe.sub.2 0-0.05; ______________________________________ for absorption of neutrons, the isotope Li.sup.6 can furthermore be onctained therein, and SiO.sub.2 can be substituted by B.sub.2 O.sub.3 and/or Gd.sub.2 O.sub.3 in an amount of up to 10% by weight and Gd.sub.2 O.sub.3 is present.

    摘要翻译： 在SiO2-PbO-碱金属氧化物体系中的铈掺杂辐射屏蔽玻璃，具有高能量X射线和/或γ射线的吸收系数以及分别具有抗变色能力的中子辐射 放电稳定性> 5×10 8 rad，基本上由（以重量％计）-SiO 2 35-56 -Na 2 O -K 2 O 12-21 -C 2 O 2 -PbO 2 24-46 -CeO 2 0.5-2.5 -CuO + Fe 2 O-0.05; - 为了吸收中子，此外可以同时存在同位素Li 6，SiO 2可被B 2 O 3和/或Gd 2 O 3替代，并且存在Gd 2 O 3。