摘要:
Provided is a laminated body comprising a substrate to be ground and a support, where the substrate may be ground to a very small (thin) thickness and can then be separated from the support without damaging the substrate. One embodiment is a laminated body comprising a substrate to be ground, a curable silicone adhesive layer in contact with the substrate to be ground, a photothermal conversion layer comprising a light absorbing agent and a heat decomposable resin, and a light transmitting support. After grinding the substrate surface which is opposite that in contact with the adhesive layer, the laminated body is irradiated through the light transmitting layer and the photothermal conversion layer decomposes to separate the substrate and the light transmitting support.
摘要:
A multi-layered polishing pad for modifying a surface of a workpiece, such as a semiconductor wafer, that reduces the effort, time and cost involved with pad replacement. The polishing pad includes a polishing layer, at least one sub-pad layer adjacent the polishing layer, and an attachment layer interposed between and releasably joining the polishing layer and at least a portion of the at least one sub-pad layer. The at least one sub-pad layer may include a plurality of layers, such as at least one resilient layer, at least one rigid layer, and/or at least one layer that has both rigid and resilient characteristics. The release layer may be interposed between the polishing layer and the sub-pad or between adjacent layers of the sub-pad. Multiple release layers may be included that are interposed between the polishing layer and layers of the sub-pad, as desired. When the polishing layer and/or other sub-pad layers wear out and need to be replaced, the worn layers may be removed from the polishing pad at one or more release layers, leaving the non-worn layers of the sub-pad still attached to a polishing device. A new polishing layer with or without attached sub-pad layers may then be attached to the remaining sub-pad layers on the polishing device for continued polishing processes.
摘要:
The polymers of the invention are characterized by having at least one pendent ester group having a tertiary carbon atom attached to the ester oxygen atom in which at least one substituent of the tertiary carbon atom comprises at least one silicon atom. The polymer compositions of the present invention are useful as resist materials for lithography, in particular as the imaging layer or as the top imaging layer in a bilayer resist scheme for use in the manufacture of integrated circuits. The silicon-containing tertiary alcohols and esters of the present invention enable the preparation of polymers with relatively high silicon content.
摘要:
A system for coating a substrate with an ultra-thin layer includes moving the substrate through a coating station and forming a composite layer including a coming fluid and a carrier fluid. The composite layer flows at a rate that is sufficiently high to form a continuous flowing fluid bridge of composite layer to the substrate surface and to contact the substrate with the flowing composite layer to interpose the coating layer between the substrate and the carrier fluid. The carrier fluid is removed while leaving the coating fluid deposited on the substrate as a coating layer.
摘要:
A composite structure comprising a substrate bearing a layer of release coating prepared from one or more epoxypolysiloxanes together providing cycloaliphatic epoxy group(s) and non-cycloaliphatic (i.e., linear or branched aliphatic) epoxy group(s). The resulting release coating cures quickly and exhibits low release levels to adhesives. An oligomeric epoxypolysiloxane comprising both cycloaliphatic and non-cycloaliphatic epoxy groups is also disclosed.
摘要:
Provided is a laminated body comprising a substrate to be ground and a support, where the substrate may be ground to a very small (thin) thickness and can then be separated from the support without damaging the substrate. One embodiment is a laminated body comprising a substrate to be ground, a curable silicone adhesive layer in contact with the substrate to be ground, a photothermal conversion layer comprising a light absorbing agent and a heat decomposable resin, and a light transmitting support. After grinding the substrate surface which is opposite that in contact with the adhesive layer, the laminated body is irradiated through the light transmitting layer and the photothermal conversion layer decomposes to separate the substrate and the light transmitting support.
摘要:
A composite structure comprising i) a release liner comprising a release composition; and ii) a pressure-sensitive adhesive coated backing wherein the pressure-sensitive adhesive has a relatively high storage modulus. The composite structure exhibits a low unwind noise as a result of the release composition employed.
摘要:
A composite structure comprising a substrate bearing a layer of release coating prepared from one or more epoxypolysiloxanes together providing cycloaliphatic epoxy group(s) and non-cycloaliphatic (i.e., linear or branched aliphatic) epoxy group(s). The resulting release coating cures quickly and exhibits low release levels to adhesives. An oligomeric epoxypolysiloxane comprising both cycloaliphatic and non-cycloaliphatic epoxy groups is also disclosed.
摘要:
Disclosed are C.sub.6 to C.sub.11 branched chain alkoxy monosubstituted diaryl iodonium salts, such as [4-(2-ethylhexyloxy)phenyl]phenyliodonium hexafluoroantimonate. These diaryl iodonium salts are useful as photoinitiators for epoxy containing compounds, especially epoxysilanes.
摘要:
Disclosed are siloxanyl-substituted diaromatic iodonium salts such as 4-[3-1,1,3,3,5,5,5-heptamethyl siloxanyl propoxy]phenyl-phenyliodonium hexafluoroantimonate. These diaryl iodonium salts are useful as photoinitiators for epoxy containing compounds, especially epoxypolysiloxanes. Also disclosed is a process for the preparation of a siloxanyl-substituted diaromatic iodonium salt.