摘要:
A method of fabricating a differential doped solar cell is described. The method includes the following steps. First, a substrate is provided. A doping process is conducted thereon to form a doped layer. A heavy doping portion of the doped layer is partially or fully removed. Subsequently, an anti-reflection coating layer is formed thereon. A metal conducting paste is printed on the anti-reflection coating layer and is fired to form the metal electrodes for the solar cell.
摘要:
A storage structure and method having multiple protocol processor units are disclosed. The storage structure comprises a host CPU, a main memory, a storage device, a switch fabric, and a host bus adapter module. The host bus adapter module includes a plurality of protocol processor nodes for processing frames received from a network, and storing those frames into the storage device. A processing module of the host bus adapter module extracts the session information of each frame and compares it with entries recorded in a look-up table. If the connection information hits one entry of the look-up table, the frame can be bypassed into a corresponding protocol processor node according to the definition of the look-up table. Otherwise, a new entry will be inserted into the look-up table for designating a corresponding protocol processor node.
摘要:
A transistor device with strained Ge layer by selectively growth and a fabricating method thereof are provided. A strained Ge layer is selectively grown on a substrate, so that the material of source/drain region is still the same as that of the substrate, and the strained Ge layer serves as a carry transport channel. Therefore, the performance of the device characteristics can be improved and the leakage current of the transistor may be approximately commensurate with that of a Si substrate field effect transistor (FET).
摘要:
A strained germanium field effect transistor (FET) and method of fabricating the same is related to the strained Ge field effect transistor with a thin and pure Ge layer as a carrier channel. The pure Ge layer with the thickness between 1 nm and 10 nm is formed between an unstrained substrate and a gate insulation layer, and directly contacts with the unstrained substrate. The gate is disposed on the gate insulation layer. The germanium layer is used as a carrier transport channel of the strained Ge FET to improve the drive current and the carrier mobility, and to increase the devices performance effectively. Furthermore, a Si protective layer with extremely thin thickness can be deposed between and directly contacts with the gate insulation layer and the pure Ge layer.
摘要:
A thin-film solar cell having a hetero-junction of semiconductor and the fabrication method thereof are provided. Instead of the conventional hetero-junction of III-V semiconductor or homo-structure of IV semiconductor, the thin-film solar cell according to the present invention adopts a novel hetero-junction structure of IV semiconductor to improve the cell efficiency thereof. By adjusting the amount of layer sequences and the thickness of the hetero-junction structure, the cell efficiency of the thin-film solar cell according to the present invention is also optimized.
摘要:
Fabrication methods for compressive strained-silicon by ion implantation. Ions are implanted into a silicon-containing substrate and high temperature processing converts the vicinity of the ion-contained region into strained-silicon. Transistors fabricated by the method are also provided.
摘要:
A method of fabricating a differential doped solar cell is described. The method includes the following steps. First, a substrate is provided. A doping process is conducted thereon to form a doped layer. A heavy doping portion of the doped layer is partially or fully removed. Subsequently, an anti-reflection coating layer is formed thereon. A metal conducting paste is printed on the anti-reflection coating layer and is fired to form the metal electrodes for the solar cell.
摘要:
Fabrication methods for compressive strained-silicon by ion implantation. Ions are implanted into a silicon-containing substrate and high temperature processing converts the vicinity of the ion-contained region into strained-silicon. Transistors fabricated by the method are also provided.
摘要:
A strained germanium field effect transistor (FET) and method of making the same, comprise forming a germanium layer on a substrate, then forming a Si protective layer on the germanium layer, next forming a gate insulation layer on the Si protective layer, and fmally positioning a gate on the gate insulation layer. The germanium layer is used as a carrier transport channel of the strained germanium FET to improve the drive current and the carrier mobility, and to increase the devices performance effectively. And because the Si protective layer is on the germanium layer, the interface property between the germanium layer and the gate insulation layer is improved.
摘要:
A storage structure and method having multiple protocol processor units are disclosed. The storage structure comprises a host CPU, a main memory, a storage device, a switch fabric, and a host bus adapter module. The host bus adapter module includes a plurality of protocol processor nodes for processing frames received from a network, and storing those frames into the storage device. A processing module of the host bus adapter module extracts the session information of each frame and compares it with entries recorded in a look-up table. If the connection information hits one entry of the look-up table, the frame can be bypassed into a corresponding protocol processor node according to the definition of the look-up table. Otherwise, a new entry will be inserted into the look-up table for designating a corresponding protocol processor node.