公开(公告)号：US09720321B2

公开(公告)日：2017-08-01

申请号：US13297031

申请日：2011-11-15

Applicant: Emad Aqad ,  Mingqi Li ,  Cheng-Bai Xu ,  Cong Liu

Inventor： Emad Aqad ,  Mingqi Li ,  Cheng-Bai Xu ,  Cong Liu

IPC: G03F7/004 ,  C07D493/08 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07D493/08 ,  G03F7/0046 ,  G03F7/0397

Abstract: New lactone-containing photoacid generator compounds (“PAGs”) and photoresist compositions that comprise each PAG compounds are provided. These photoresist compositions are useful in the manufacture of electronic device.

公开(公告)号：US09507259B2

公开(公告)日：2016-11-29

申请号：US13482595

申请日：2012-05-29

Applicant: Mingqi Li ,  Emad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

Inventor： Mingqi Li ,  Emad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0397

Abstract: A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

公开(公告)号：US08603728B2

公开(公告)日：2013-12-10

申请号：US13482559

申请日：2012-05-29

Applicant: Gregory P. Prokopowicz ,  Gerhard Polhers ,  Mingqi Li ,  Chunyi Wu ,  Cong Liu ,  Cheng-bai Xu

Inventor： Gregory P. Prokopowicz ,  Gerhard Polhers ,  Mingqi Li ,  Chunyi Wu ,  Cong Liu ,  Cheng-bai Xu

IPC: G03F7/039 ,  C08F214/18 ,  C08F218/14 ,  C08F22/14

CPC classification number: C08F214/186 ,  C08F214/18 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0397 ,  C08F2220/283 ,  C08F2220/185 ,  C08F220/32

Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising β-diketone, β-ester-ketone, β-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).

Abstract translation: 共聚物包含式（I）的可溶于碱的单体的聚合产物：其中R a是H，F，C 1-10烷基或C 1-10氟代烷基，L 1是m价C 2-30亚烷基，C 3-30亚环烷基 ，C 6-30亚芳基，C 3-30亚烷基，X 1独立地是包含β-二酮，β-酯 - 酮，β-二酯或包含前述的至少一种的组合的基础可溶性有机基团; 和可与式（I）的碱溶性单体共聚的另外的单体。

公开(公告)号：US20130137038A1

公开(公告)日：2013-05-30

申请号：US13482595

申请日：2012-05-29

Applicant: Mingqi Li ,  Amad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

Inventor： Mingqi Li ,  Amad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

IPC: G03F7/004

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0397

Abstract: A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

Abstract translation: 光致抗蚀剂组合物包含酸敏感性聚合物和具有下式的环状锍化合物：（Ra）1-（Ar）-S +（ - CH2-）m·-O3S-（CRb2）n-（L） R a独立地是取代或未取代的C 1-30烷基，C 6-30芳基，C 3-30芳烷基或包含至少一个前述的组合，Ar是单环，多环或稠合多环C 6-30芳基 ，每个R b独立地是H，F，直链或支链C 1-10氟代烷基或含有直链或支链含杂原子的C 1-10氟代烷基，L是任选地包含O，S，N，F 或包含至少一个前述杂原子的组合，X是取代或未取代的C5或更大单环，多环或稠合的多环脂环族基团，任选地包含包含O，S，N，F的杂原子，或包含在 上述中的至少一个，1为0〜4的整数，m为3〜20的整数，n为In 0〜4的整数，p为0〜2的整数。

公开(公告)号：US20120301823A1

公开(公告)日：2012-11-29

申请号：US13482559

申请日：2012-05-29

Applicant: Gregory P. Prokopowicz ,  Gerhard Pohlers ,  Mingqi Li ,  Chunyi Wu ,  Cong Liu ,  Cheng-bai Xu

Inventor： Gregory P. Prokopowicz ,  Gerhard Pohlers ,  Mingqi Li ,  Chunyi Wu ,  Cong Liu ,  Cheng-bai Xu

IPC: C08F224/00 ,  G03F7/004

CPC classification number: C08F214/186 ,  C08F214/18 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0397 ,  C08F2220/283 ,  C08F2220/185 ,  C08F220/32

Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising β-diketone, β-ester-ketone, β-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).

Abstract translation: 共聚物包含式（I）的可溶于碱的单体的聚合产物：其中R a是H，F，C 1-10烷基或C 1-10氟烷基，L 1是m价的C 2-30亚烷基，C 3-30亚环烷基 ，C 6-30亚芳基，C 3-30亚烷基，X 1独立地为包含二 - 二酮，二酯 - 酮，二 - 二酯的基础可溶性有机基团，或包含至少一种 前面的; 和可与式（I）的碱溶性单体共聚的另外的单体。

公开(公告)号：US20110269074A1

公开(公告)日：2011-11-03

申请号：US13077947

申请日：2011-03-31

Applicant: Emad Aqad ,  Cong Liu ,  Cheng-Bai Xu ,  Mingqi Li

Inventor： Emad Aqad ,  Cong Liu ,  Cheng-Bai Xu ,  Mingqi Li

IPC: G03F7/20 ,  C08F12/30

Abstract: New polymers are provided comprising (i) one or more covalently linked photoacid generator moieties and (ii) one or more photoacid-labile groups, wherein the one or more photoacid generator moieties are a component of one or more of the photoacid-labile groups. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-200 nm, particularly 193 nm.

Abstract translation: 提供新的聚合物，其包含（i）一种或多种共价连接的光酸产生剂部分和（ii）一种或多种光致酸不稳定基团，其中所述一种或多种光酸产生剂部分是一种或多种光酸不稳定基团的组分。 本发明优选的聚合物适用于在短波长例如亚200nm，特别是193nm下成像的光致抗蚀剂。

公开(公告)号：US20110269070A1

公开(公告)日：2011-11-03

申请号：US13077943

申请日：2011-03-31

Applicant: Emad Aqad ,  Mingqi Li ,  Cheng-Bai Xu ,  Cong Liu

Inventor： Emad Aqad ,  Mingqi Li ,  Cheng-Bai Xu ,  Cong Liu

IPC: G03F7/004 ,  G03F7/20 ,  C07C61/12

CPC classification number: G03F7/0045 ,  C07C303/32 ,  C07C309/06 ,  C07C309/07 ,  C07C309/12 ,  C07C309/19 ,  C07D313/00 ,  C07D315/00 ,  C07D327/00 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

Abstract: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, photoacid generators that comprise 1) a SO3− moiety; 2) one or more fluorinated carbons; and 3) one or more of the fluorinated carbons either directly or indirectly substituted by an ester keto group.

Abstract translation: 提供了新的方法用于合成光酸产生剂化合物（“PAG”），新的光酸产生剂化合物和包含这种PAG化合物的光致抗蚀剂组合物。 在特定方面，光酸产生剂包含1）SO 3部分; 2）一个或多个氟化碳; 和3）直接或间接被酯酮基取代的一个或多个氟化碳。

公开(公告)号：US20110250538A1

公开(公告)日：2011-10-13

申请号：US12965368

申请日：2010-12-10

Applicant: Mingqi LI ,  Emad AQAD ,  Cong LIU ,  Joseph MATTIA ,  Cheng-Bai XU ,  George G. BARCLAY

Inventor： Mingqi LI ,  Emad AQAD ,  Cong LIU ,  Joseph MATTIA ,  Cheng-Bai XU ,  George G. BARCLAY

IPC: G03F7/004 ,  C07J9/00 ,  C07D493/18 ,  G03F7/20 ,  C07D333/46

CPC classification number: G03F7/0045 ,  C07C303/32 ,  C07C309/06 ,  C07C309/12 ,  C07C321/30 ,  C07C381/12 ,  C07C2603/74 ,  C07D333/46 ,  C07D335/02 ,  C07D337/04 ,  C07D493/20 ,  C07J31/006 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397

Abstract: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.

Abstract translation: 提供了新的方法用于合成光酸产生剂化合物（“PAG”），新的光酸产生剂化合物和包含这种PAG化合物的光致抗蚀剂组合物。 在特定方面，提供含锍（S +）光酸产生剂和合成锍光酸发生剂的方法。

公开(公告)号：US20110223535A1

公开(公告)日：2011-09-15

申请号：US13013780

申请日：2011-01-25

Applicant: Cong Liu ,  Chunyi Wu ,  Gerhard Pohlers ,  Gregory P. Prokopowicz ,  Cheng-Bai Xu

Inventor： Cong Liu ,  Chunyi Wu ,  Gerhard Pohlers ,  Gregory P. Prokopowicz ,  Cheng-Bai Xu

IPC: G03F7/004 ,  G03F7/20 ,  C07C271/16

CPC classification number: C07C271/16 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/32

Abstract: New nitrogen-containing compounds are provided that comprise multiple hydroxyl moieties and photoresist compositions that comprise such nitrogen-containing compounds. Preferred nitrogen-containing compounds comprise 1) multiple hydroxyl substituents (i.e. 2 or more) and 2) one or more photoacid-labile groups.

Abstract translation: 提供新的含氮化合物，其包含多个羟基部分和包含这种含氮化合物的光致抗蚀剂组合物。 优选的含氮化合物包括1）多个羟基取代基（即2个或更多个）和2）一个或多个光致酸不稳定基团。

公开(公告)号：US08012670B2

公开(公告)日：2011-09-06

申请号：US10412640

申请日：2003-04-11

Applicant: Gary N. Taylor ,  Cheng-Bai Xu

Inventor： Gary N. Taylor ,  Cheng-Bai Xu

IPC: G03F7/20 ,  G03F7/11

CPC classification number: G03F7/105

Abstract: New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.

Abstract translation: 提供了新的光致抗蚀剂系统，其包括下面的处理（或阻挡）层组合物和外涂光致抗蚀剂层。 本发明的系统可以显示出对SiON和其它无机表面层的显着粘着。