摘要:
A photodiode device includes a silicon carbide photodiode including a second semiconductor layer on a first semiconductor layer and an integral aluminum gallium nitride filter on the second semiconductor layer. A method for fabricating a photodiode device for combustion flame temperature determination includes fabricating an integral filter over a silicon carbide photodiode. Examples of various filter fabrication techniques include growing an aluminum gallium nitride filter, fabricating a silicon oxynitride filter, and alternating thin film layers of silicon oxide and silicon nitride.
摘要:
A solid state optical spectrometer for combustion flame temperature determination comprises: a first photodiode device for obtaining a first photodiode signal, the first photodiode device comprising a silicon carbide photodiode and having a range of optical responsivity within an OH band; a second photodiode device for obtaining a second photodiode signal, the second photodiode device comprising a silicon carbide photodiode and a filter, the second photodiode device having a range of optical responsivity in a different and overlapping portion of the OH band than the first photodiode device; and a computer for obtaining a ratio using the first and second photodiode signals and using the ratio to determine the combustion flame temperature.
摘要:
A depletion mode MOSFET and resistor are fabricated as a silicon carbide (SiC) integrated circuit (IC). The SiC IC includes a first SiC layer doped to a first conductivity type and a second SiC layer overlaid on the first SiC layer and doped to a second conductivity type. The second SiC layer includes at least four more heavily doped regions of the second conductivity type, with two of such regions comprising MOSFET source and drain electrodes and two other of such regions comprising resistor electrodes. The second SiC layer includes an isolation trench between the MOSFET electrodes and the resistor electrodes. At least two electrically conductive contacts are provided as MOSFET electrode contacts, each being positioned over at least a portion of a respective MOSFET electrode and two other electrically conductive contacts are provided as resistor electrode contacts, each being positioned over at least a portion of a respective resistor electrode. An oxide layer extends over the second SiC layer with at least a portion of the oxide layer positioned between the MOSFET electrode contacts. A MOSFET gate electrode is positioned over the oxide layer, and coupling means are provided for electrically coupling one of the source, drain, and gate electrodes to one of the resistor electrodes.
摘要翻译:耗尽型MOSFET和电阻器被制造为碳化硅(SiC)集成电路(IC)。 SiC IC包括掺杂到第一导电类型的第一SiC层和覆盖在第一SiC层上并掺杂到第二导电类型的第二SiC层。 第二SiC层包括第二导电类型的至少四个更重掺杂区域,其中两个这样的区域包括MOSFET源极和漏极电极以及包括电阻器电极的另外两个这样的区域。 第二SiC层包括在MOSFET电极和电阻器电极之间的隔离沟槽。 提供至少两个导电触点作为MOSFET电极触点,每个至少两个导电触点位于相应MOSFET电极的至少一部分上方,并且另外两个导电触点设置为电阻器电极触点,每个触点都位于相应的至少一部分上 电阻电极。 氧化物层在第二SiC层上延伸,其中氧化物层的至少一部分位于MOSFET电极触点之间。 MOSFET栅电极位于氧化物层上方,并且提供耦合装置用于将源极,漏极和栅电极之一电耦合到电阻器电极之一。
摘要:
A MOSFET includes a first SiC semiconductor contact layer, a SiC semiconductor channel layer supported by the first SiC contact layer, and a second SiC semiconductor contact layer supported by the channel layer. The second contact and channel layers are patterned to form a plurality of gate region grooves therethrough. Each of the gate region grooves includes a base surface and side surfaces which are covered with groove oxide material. A plurality of metal gate layers are provided, each being supported in a respective one of the plurality of grooves. A plurality of deposited oxide layers are provided, each in a respective one of the grooves so as to be supported by a respective one of the plurality of metal gate layers. A first metal contact layer is applied to the surface of the first SiC contact layer, and a second metal contact layer is applied to a portion of the surface of the second SiC contact layer.
摘要:
A SiC MOSFET having a self-aligned gate structure is fabricated upon a monocrystalline substrate layer, such as a p type conductivity .alpha.6H silicon carbide (SiC) substrate. An SiC n+ type conductivity layer is epitaxially grown on the substrate layer. A steep-walled groove is etched through the n+ SiC layer and partially into the p SiC layer at a location on the substrate where a MOSFET gate structure is desired. Subsequently, a thin layer of silicon dioxide and a layer of gate metal are successively deposited over the entire structure. The gate metal layer is deposited with sufficient thickness to substantially fill the groove. A layer of photoresist is applied to the entire surface of the gate metal layer. The photoresist and the underlying gate metal are then reactive ion etched down to the oxide layer, leaving gate metal remaining only in the groove. The gate metal and oxide layer form the self-aligned gate structure wherein the walls of the groove are automatically aligned with the edges of drain and source regions that are formed on either side of the groove.
摘要:
A high temperature photocurrent detector circuit including a transimpedance amplifier having multiple stages of gain, and a driver amplifier which generates a driver current that is proportional to the photocurrent flowing through a photocurrent sensor. The voltage source utilizes source voltage wires to generate a supply current that is proportional to the driver current enabling the photocurrent detector circuit to operate as a two wire photocurrent detector circuit.
摘要:
A SiC MOSFET having a self-aligned gate structure is fabricated upon a monocrystalline substrate layer, such as a p type conductivity .alpha.6H silicon carbide (SiC) substrate. An SiC n+ type conductivity layer, epitaxially grown on the substrate layer, includes a steep-walled groove etched through the n+ SiC layer and partially into the p SiC layer. The groove is lined with a thin layer of silicon dioxide which extends onto the n+ type conductivity layer. A filling of gate metal over the layer of silicon dioxide is contained entirely in the groove. The silicon dioxide layer includes a first window extending to the filling of gate metal in the groove, and second and third windows extending to the n+ type conductivity layer on either side of the groove, respectively. A gate contact extends through the first window to the filling of gate metal in the groove while drain and source contacts extend through the second and third window, respectively, to make contact with the n+ type conductivity layer in drain and source regions on either side of the groove.
摘要:
The present invention provides a method of fabricating a metal oxide semiconductor field effect transistor. The method includes the steps of forming a source region on a silicon carbide layer and annealing the source region. A gate oxide layer is formed on the source region and the silicon carbide layer. The method further includes providing a gate electrode on the gate oxide layer and disposing a dielectric layer on the gate electrode and the gate oxide layer. The method further includes etching a portion of the dielectric layer and a portion of the gate oxide layer to form sidewalls on the gate electrode. A metal layer is disposed on the gate electrode, the sidewalls and the source region. The method further includes forming a gate contact and a source contact by subjecting the metal layer to a temperature of at least about 800° C. The gate contact and the source contact comprise a metal silicide. The distance between the gate contact and the source contact is less than about 0.6 μm. A vertical SiC MOSFET is also provided.
摘要:
An apparatus for detecting flashback occurrences in a premixed combustor system having at least one fuel nozzle includes at least one photodetector and at least one fiber optic element coupled between the at least one photodetector and a test region of the combustor system wherein a respective flame of the fuel nozzle is not present under normal operating conditions. A signal processor monitors a signal of the photodetector. The fiber optic element can include at least one optical fiber positioned within a protective tube. The fiber optic element can include two fiber optic elements coupled to the test region. The optical fiber and the protective tube can have lengths sufficient to situate the photodetector outside of an engine compartment. A plurality of fuel nozzles and a plurality of fiber optic elements can be used with the fiber optic elements being coupled to respective fuel nozzles and either to the photodetector or, wherein a plurality of photodetectors are used, to respective ones of the plurality of photodetectors. The signal processor can include a digital signal processor.
摘要:
An optical spectrometer for combustion flame temperature determination includes at least two photodetectors positioned for receiving light from a combustion flame and having different overlapping optical bandwidths for producing respective output signals; and a computer for obtaining a difference between a first respective output signal of a first one of the at least two photodetectors with and a second respective output signal of a second one of the at least two photodetectors, dividing the difference by one of the first and second respective output signals to obtain a normalized output signal, and using the normalized output signal to determine the combustion flame temperature.