Full-field maskless lithography projection optics

    公开(公告)号:US09411246B2

    公开(公告)日:2016-08-09

    申请号:US13538287

    申请日:2012-06-29

    IPC分类号: G02F1/29 G03F7/20

    CPC分类号: G03F7/70225 G03F7/70291

    摘要: Projection optics for a lithographic projection system is provided that comprises a spatial light modulator (SLM) from which radiation is reflected and directed to a projection lens that projects the radiation to a substrate. The SLM is illuminated by non telecentric off axis illumination (e.g. from laser radiation that has a spectral bandwidth of the order of 1 picometer, and the projection optics is configured for significant reduction (e.g. at least 10× reduction, 20× reduction, or 50× reduction).

    Full-field maskless lithography projection optics
    6.
    发明申请
    Full-field maskless lithography projection optics 有权
    全场无掩模光刻投影光学

    公开(公告)号:US20130003166A1

    公开(公告)日:2013-01-03

    申请号:US13538287

    申请日:2012-06-29

    IPC分类号: G02F1/29

    CPC分类号: G03F7/70225 G03F7/70291

    摘要: Projection optics for a lithographic projection system is provided that comprises a spatial light modulator (SLM) from which radiation is reflected and directed to a projection lens that projects the radiation to a substrate. The SLM is illuminated by non telecentric off axis illumination (e.g. from laser radiation that has a spectral bandwidth of the order of 1 picometer, and the projection optics is configured for significant reduction (e.g. at least 10× reduction, 20× reduction, or 50× reduction).

    摘要翻译: 提供了一种用于光刻投影系统的投影光学器件,其包括空间光调制器(SLM),辐射被反射并引导到将辐射投影到基底的投影透镜。 SLM通过非远心离轴照明(例如,具有1皮秒级光谱带宽的激光辐射)照射,并且投影光学器件被配置为显着减少(例如,至少10×减少,20×减少或50 ×减少)。