EXPOSURE APPARATUS WITH AN ILLUMINATION SYSTEM GENERATING MULTIPLE ILLUMINATION BEAMS
    4.
    发明申请
    EXPOSURE APPARATUS WITH AN ILLUMINATION SYSTEM GENERATING MULTIPLE ILLUMINATION BEAMS 有权
    具有产生多个照明系的照明系统的曝光装置

    公开(公告)号:US20100053583A1

    公开(公告)日:2010-03-04

    申请号:US12547311

    申请日:2009-08-25

    IPC分类号: G03B27/54

    摘要: An exposure apparatus (10) for transferring a mask pattern (12A) from a mask (12) to first and second substrates (14A) (14B) includes an illumination system (18) that generates and simultaneously directs a first beam (32A) at the mask pattern (12A) and a second beam (32B) at the mask pattern (12A). Further, the first beam (32A) is spaced apart from the second beam (32B) at the mask pattern (12A). As provided herein, the first beam (32A) directed at the mask (12) creates a first pattern beam (34A) that is transferred to a first substrate location (33A), and the second beam (32B) directed at the mask (12) creates a second pattern beam (34B) that is transferred to a second substrate location (33B). Moreover, the first substrate location (33A) is spaced apart from the second substrate location (33B). With this design, the first pattern beam (34A) can be transferred to the first substrate (14A) and the second pattern beam (34B) can be simultaneously transferred to the second substrate (14B). As a result thereof, the same mask (12) can be used to simultaneously transfer features to two wafers (14A) (14B) to approximately double the throughput capabilities of the exposure apparatus (10).

    摘要翻译: 一种用于将掩模图案(12A)从掩模(12)传送到第一和第二基板(14A)(14B)的曝光装置(10)包括照明系统(18),其产生并同时将第一光束(32A) 掩模图案(12A)和在掩模图案(12A)处的第二光束(32B)。 此外,第一光束(32A)在掩模图案(12A)处与第二光束(32B)间隔开。 如本文所提供的,指向掩模(12)的第一光束(32A)产生转移到第一衬底位置(33A)的第一图案光束(34A),并且指向掩模(12)的第二光束(32B) )产生传送到第二基板位置(33B)的第二图案光束(34B)。 此外,第一衬底位置(33A)与第二衬底位置(33B)间隔开。 通过这种设计,可以将第一图案光束(34A)传送到第一基板(14A),并且第二图案光束(34B)可以被同时传送到第二基板(14B)。 作为其结果,可以使用相同的掩模(12)来同时将特征传递到两个晶片(14A)(14B),使曝光装置(10)的吞吐能力大致翻倍。

    Optical assembly for laser radar
    5.
    发明授权
    Optical assembly for laser radar 有权
    激光雷达光学组件

    公开(公告)号:US08724095B2

    公开(公告)日:2014-05-13

    申请号:US13281397

    申请日:2011-10-25

    IPC分类号: G01C3/08

    摘要: A compact optical assembly for a laser radar system is provided, that is configured to move as a unit with a laser radar system as the laser radar system is pointed at a target and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the laser radar. The optical assembly comprises a light source, a lens, a scanning reflector and a fixed reflector that are oriented relative to each other such that: (i) a beam from the light source is reflected by the scanning reflector to the fixed reflector; (ii) reflected light from the fixed reflector is reflected again by the scanning reflector and directed along a line of sight through the lens; and (iii) the scanning reflector is moveable relative to the source, the lens and the fixed reflector, to adjust the focus of the beam along the line of sight.

    摘要翻译: 提供了一种用于激光雷达系统的紧凑型光学组件,其被配置为随着激光雷达系统指向目标而与激光雷达系统一起移动,并且消除了对可移动的大扫描(指向)镜的需要 相对于激光雷达的其他部分。 光学组件包括相对于彼此定向的光源,透镜,扫描反射器和固定反射器,使得:(i)来自光源的光束被扫描反射器反射到固定反射器; (ii)来自固定反射器的反射光再次被扫描反射器反射并沿着视线穿过透镜; 和(iii)扫描反射器相对于光源,透镜和固定反射器可移动,以便沿着视线调节光束的焦点。

    Goos-Hanchen compensation in autofocus systems
    6.
    发明申请
    Goos-Hanchen compensation in autofocus systems 审中-公开
    Goos-Hanchen补偿自动对焦系统

    公开(公告)号:US20110071784A1

    公开(公告)日:2011-03-24

    申请号:US12884890

    申请日:2010-09-17

    摘要: A new and useful method is provided for Goos-Hanchen compensation in an optical autofocus (AF) system that uses light reflected from a substrate to determine changes in the z position of a substrate. According to the method of the invention reflected light from the substrate is provided at a plurality of wavelengths and polarizations, detected and used to make corrections that compensate for the errors due to the Goos-Hanchen effect.

    摘要翻译: 在使用从基板反射的光来确定基板的z位置的变化的光学自动对焦(AF)系统中,为Goos-Hanchen补偿提供了一种新的有用的方法。 根据本发明的方法,来自基板的反射光以多个波长和极化被提供,被检测并用于进行修正,以补偿由于Goos-Hanchen效应引起的误差。

    Measurement system and method utilizing high contrast encoder head for measuring relative movement between objects
    7.
    发明授权
    Measurement system and method utilizing high contrast encoder head for measuring relative movement between objects 有权
    使用高对比度编码器头测量物体之间的相对运动的测量系统和方法

    公开(公告)号:US09074911B2

    公开(公告)日:2015-07-07

    申请号:US13593839

    申请日:2012-08-24

    IPC分类号: G01D5/34 G01D5/347 G01D5/38

    CPC分类号: G01D5/34723 G01D5/38

    摘要: A measurement system (22) for measuring the position of a work piece (28) includes a measurement grating (34) and an encoder head (36). The encoder head (36) directs a measurement beam (252) at the measurement grating (34), the measurement beam (252) having an oval shaped cross-section. The encoder head (36) includes a beam shape adjuster (256) positioned in the path of an input measurement beam (240) having a substantially circular cross-sectional shape that transforms the input measurement beam (240) to provide the measurement beam (252) having the oval shaped cross-section.

    摘要翻译: 用于测量工件(28)的位置的测量系统(22)包括测量光栅(34)和编码器头(36)。 编码器头(36)在测量光栅(34)处引导测量光束(252),测量光束(252)具有椭圆形横截面。 编码器头(36)包括位于输入测量光束(240)的路径中的光束形状调节器(256),其具有基本上圆形的横截面形状,其转换输入测量光束(240)以提供测量光束(252) )具有椭圆形横截面。

    Exposure apparatus with an illumination system generating multiple illumination beams
    8.
    发明授权
    Exposure apparatus with an illumination system generating multiple illumination beams 有权
    具有产生多个照明光束的照明系统的曝光装置

    公开(公告)号:US08736813B2

    公开(公告)日:2014-05-27

    申请号:US12547311

    申请日:2009-08-25

    IPC分类号: G03B27/54 G03B27/72 G03F7/20

    摘要: An exposure apparatus (10) for transferring a mask pattern (12A) from a mask (12) to first and second substrates (14A) (14B) includes an illumination system (18) that generates and simultaneously directs a first beam (32A) at the mask pattern (12A) and a second beam (32B) at the mask pattern (12A). Further, the first beam (32A) is spaced apart from the second beam (32B) at the mask pattern (12A). As provided herein, the first beam (32A) directed at the mask (12) creates a first pattern beam (34A) that is transferred to a first substrate location (33A), and the second beam (32B) directed at the mask (12) creates a second pattern beam (34B) that is transferred to a second substrate location (33B). Moreover, the first substrate location (33A) is spaced apart from the second substrate location (33B). With this design, the first pattern beam (34A) can be transferred to the first substrate (14A) and the second pattern beam (34B) can be simultaneously transferred to the second substrate (14B). As a result thereof, the same mask (12) can be used to simultaneously transfer features to two wafers (14A) (14B) to approximately double the throughput capabilities of the exposure apparatus (10).

    摘要翻译: 一种用于将掩模图案(12A)从掩模(12)传送到第一和第二基板(14A)(14B)的曝光装置(10)包括照明系统(18),其产生并同时将第一光束(32A) 掩模图案(12A)和在掩模图案(12A)处的第二光束(32B)。 此外,第一光束(32A)在掩模图案(12A)处与第二光束(32B)间隔开。 如本文所提供的,指向掩模(12)的第一光束(32A)产生转移到第一衬底位置(33A)的第一图案光束(34A),并且指向掩模(12)的第二光束(32B) )产生传送到第二基板位置(33B)的第二图案光束(34B)。 此外,第一衬底位置(33A)与第二衬底位置(33B)间隔开。 通过这种设计,可以将第一图案光束(34A)传送到第一基板(14A),并且第二图案光束(34B)可以被同时传送到第二基板(14B)。 作为其结果,可以使用相同的掩模(12)来同时将特征传递到两个晶片(14A)(14B),使曝光装置(10)的吞吐能力大致翻倍。

    Two dimensional encoder system and method
    9.
    发明授权
    Two dimensional encoder system and method 有权
    二维编码器系统及方法

    公开(公告)号:US08829420B2

    公开(公告)日:2014-09-09

    申请号:US13134461

    申请日:2011-06-08

    摘要: An encoder system and method are provided, that is designed to improve 2D encoder systems and methods in areas such as accuracy, compactness, stability, resolution, and/or light efficiency. Moreover, the system and method of this invention provides a new concept in a retroreflector that while particularly useful in applicants' system and method, is believed to have more general utility in optical imaging systems and methods.

    摘要翻译: 提供了一种编码器系统和方法,其被设计为在诸如精度,紧凑性,稳定性,分辨率和/或光效率的领域中改进2D编码器系统和方法。 此外,本发明的系统和方法提供了一种在回射器中的新概念,其在申请人的系统和方法中特别有用,被认为在光学成像系统和方法中具有更多的一般效用。

    Custom color or polarization sensitive CCD for separating multiple signals in Autofocus projection system
    10.
    发明申请
    Custom color or polarization sensitive CCD for separating multiple signals in Autofocus projection system 有权
    自定义颜色或偏光敏CCD,用于在自动对焦投影系统中分离多个信号

    公开(公告)号:US20130208104A1

    公开(公告)日:2013-08-15

    申请号:US13588919

    申请日:2012-08-17

    IPC分类号: G03B21/53

    摘要: An autofocus (AF) system and method is provided that maps the topography of a substrate such as a semiconductor wafer, in a manner that corrects for Goos Hanchen (GH) effect. In addition, a new and useful detector is provided that is particularly useful in an AF system and method. The detector preferably has both color and polarization filtering integrally associated with the detector, so that polarization and color filtering is provided at the detector, on a pixel by pixel basis.

    摘要翻译: 提供了一种自动对焦(AF)系统和方法,其以校正Goos Hanchen(GH)效应的方式映射诸如半导体晶片的衬底的形貌。 另外,提供了一种在AF系统和方法中特别有用的新的和有用的检测器。 检测器优选地具有与检测器一体地相关联的颜色和偏振滤波,使得在检测器处以像素为单位提供偏振和滤色。