Method of fabricating liquid crystal display
    1.
    发明授权
    Method of fabricating liquid crystal display 失效
    制作液晶显示器的方法

    公开(公告)号:US06999152B2

    公开(公告)日:2006-02-14

    申请号:US09788587

    申请日:2001-02-21

    IPC分类号: G02F1/13 G02F1/1343 G02F1/136

    摘要: A method of fabricating a liquid crystal display using a negative photo-resist. A passivation layer covering a thin film transistor, a data line, and a gate line is formed on a transparent substrate. The passivation layer is patterned to define a contact hole that exposes a drain electrode. A transparent conductive film in electrical contact with the drain electrode via the contact hole is then formed on the passivation layer. A negative-type photoresist is coated on the transparent conductive film. The transparent conductive film is then exposed with an image of the desired pixel electrode. The negative-type photoresist is then developed to expose portions of the transparent conductive film over a data line, a gate line, and the area of the thin film transistor area. The exposed transparent conductive film is then etched.

    摘要翻译: 使用负光致抗蚀剂制造液晶显示器的方法。 在透明基板上形成覆盖薄膜晶体管,数据线和栅极线的钝化层。 图案化钝化层以限定暴露漏电极的接触孔。 然后在钝化层上形成与漏电极经由接触孔电接触的透明导电膜。 在透明导电膜上涂布负型光致抗蚀剂。 然后用所需像素电极的图像曝光透明导电膜。 然后显影负型光致抗蚀剂,以在透明导电膜的一部分透过数据线,栅极线和薄膜晶体管区域的面积曝光。 然后将暴露的透明导电膜蚀刻。

    Electrostatic damage preventing apparatus for liquid crystal display
    2.
    发明授权
    Electrostatic damage preventing apparatus for liquid crystal display 有权
    液晶显示用静电损伤防止装置

    公开(公告)号:US06690433B2

    公开(公告)日:2004-02-10

    申请号:US09923326

    申请日:2001-08-08

    IPC分类号: G02F11333

    CPC分类号: G02F1/136204

    摘要: An electrostatic damage preventing apparatus for a thin film transistor array of a liquid crystal display includes a horizontal ground voltage line disposed at a first perimeter portion of the thin film transistor array, a vertical ground voltage line disposed at a second perimeter portion of the thin film transistor array, and a first electrostatic damage-preventing switching device group including parallel connection of at least two electrostatic damage-preventing switching devices to divide and divert an electrostatic voltage applied over the horizontal ground voltage line.

    摘要翻译: 一种用于液晶显示器的薄膜晶体管阵列的静电破坏防止装置包括设置在薄膜晶体管阵列的第一周边部分处的水平地电压线,设置在薄膜的第二周边部分的垂直接地电压线 晶体管阵列以及包括至少两个静电损伤防止开关装置的并联连接的第一静电损伤防止开关装置组,以分割和转移施加在水平地电压线上的静电电压。

    Liquid crystal display and fabricating method thereof
    5.
    发明授权
    Liquid crystal display and fabricating method thereof 有权
    液晶显示及其制造方法

    公开(公告)号:US06509940B2

    公开(公告)日:2003-01-21

    申请号:US09739824

    申请日:2000-12-20

    IPC分类号: G02F1136

    CPC分类号: G02F1/1368

    摘要: A liquid crystal display device and a fabricating method thereof wherein four masks are used so as to reduce a process. In the device, a gate electrode is formed on a transparent substrate. A gate insulating film is formed on the transparent substrate to cover the gate electrode. An active layer is provided at a portion corresponding to the gate electrode on the gate insulating film. Source and drain electrodes are intervened by an ohmic contact layer on the active layer. A contact portion is connected to and extended from a portion of the drain electrode opposed to the source electrode and has an exposed side surface. A passivation layer is formed on the active layer in such a manner to cover the source and drain electrodes, but to expose the side surface of the contact portion. A pixel electrode is formed on the gate insulating film in such a manner to contact the exposed side surface of the contact portion. Accordingly, the contact portion connected to and extended from a portion of the drain electrode opposed to the source electrode or a plurality of comb-shaped contact portions having the exposed side surfaces are formed in such a manner to overlap with the black matrix of the upper plate provided with color filters. Accordingly, the pixel electrode contacts the side surface of the contact portion overlapping with a black matrix of an upper plate to be electrically connected to the drain electrode, so that an aperture ration can be improved.

    摘要翻译: 一种液晶显示装置及其制造方法,其中使用四个掩模以减少处理。 在该器件中,在透明基板上形成栅电极。 在透明基板上形成栅极绝缘膜以覆盖栅电极。 在与栅极绝缘膜上的栅电极对应的部分设置有源层。 源极和漏极由有源层上的欧姆接触层介入。 接触部分连接到与源电极相对的一部分漏电极,并具有暴露的侧表面。 钝化层以这样的方式形成在有源层上以覆盖源电极和漏电极,但是露出接触部分的侧表面。 像素电极以与接触部的露出侧面接触的方式形成在栅极绝缘膜上。 因此,与源极电极相对的一部分漏电极的接触部分或具有暴露侧面的多个梳形接触部分形成为与上部的黑色矩阵重叠 板上装有彩色滤光片。 因此,像素电极接触与上板的黑矩阵重叠的接触部分的侧表面,以电连接到漏电极,从而可以提高孔径比。

    Liquid crystal display device having more uniform seal heights and its fabricating method
    8.
    发明授权
    Liquid crystal display device having more uniform seal heights and its fabricating method 有权
    具有更均匀的密封高度的液晶显示装置及其制造方法

    公开(公告)号:US07173684B2

    公开(公告)日:2007-02-06

    申请号:US09893970

    申请日:2001-06-29

    IPC分类号: G02F1/1339

    CPC分类号: G02F1/1339 G02F1/133351

    摘要: A liquid crystal display device, and a fabricating method thereof, that is capable of providing uniform liquid cell gaps. A main seal defines a liquid crystal injection area. A first step coverage-compensating layer is provided between a substrate on which the main seal has been coated and the main seal. A plurality of dummy seals is arranged external to the main seal. A second step coverage-compensating layer having the same thickness as the first step coverage-compensating layer is provided between the substrate on which the dummy seals are arranged and the dummy seals. Accordingly, a main seal and dummy seals having the same thickness produce uniform liquid crystal cell gaps. The liquid crystal display device is beneficially made by a fabrication process employing four or five masks.

    摘要翻译: 一种液晶显示装置及其制造方法,其能够提供均匀的液池间隙。 主密封限定了液晶注入区域。 在其上涂覆有主密封件的基板和主密封件之间提供第一级覆盖补偿层。 多个虚拟密封件布置在主密封件的外部。 具有与第一步骤覆盖补偿层相同厚度的第二阶段覆盖补偿层设置在其上布置虚拟密封件的基板和虚拟密封件之间。 因此,具有相同厚度的主密封件和虚拟密封件产生均匀的液晶单元间隙。 液晶显示装置有利地由采用四或五个掩模的制造工艺制成。

    Liquid crystal display device and method for fabricating the same
    10.
    发明授权
    Liquid crystal display device and method for fabricating the same 有权
    液晶显示装置及其制造方法

    公开(公告)号:US06567135B1

    公开(公告)日:2003-05-20

    申请号:US09629794

    申请日:2000-07-31

    申请人: Dug-Jin Park

    发明人: Dug-Jin Park

    IPC分类号: G02F11333

    摘要: The present invention discloses a method of manufacturing a liquid crystal display device, including depositing a first metal layer on a transparent substrate; patterning the metal layer to form a gate line, the gate line having a gate electrode portion; depositing sequentially an insulating layer, an amorphous silicon layer and a doped amorphous silicon layer on the exposed surface of the transparent substrate while covering the gate line; patterning the amorphous silicon layer and the doped amorphous silicon layer to form a semiconductor island; depositing a second metal layer on the exposed surface of the insulating layer while covering the semiconductor island; patterning the second metal layer to form a source electrode, a drain electrode, and a capacitor electrode, the drain electrode spaced apart from the source electrode; etching the doped amorphous silicon layer of the semiconductor island to from an active area; forming a passivation film over the whole surface of the substrate while covering the source electrode, the drain electrode and the capacitor electrode; depositing a transparent conductive material layer on the passivation film; applying a negative photoresist on the transparent conductive material layer; performing a back side exposure to form a first exposed portion of the negative photoresist; aligning a patterning mask with the negative photoresist; performing a front side exposure to form a second exposed portion of the negative photoresist, the second exposed portion overlapping the first exposed portion; baking the transparent conductive material layer; and patterning the transparent conductive material layer to form a pixel electrode.

    摘要翻译: 本发明公开了一种制造液晶显示装置的方法,包括在透明基板上沉积第一金属层; 图案化金属层以形成栅极线,栅极线具有栅电极部分; 在覆盖栅极线的同时,在透明基板的露出表面上依次沉积绝缘层,非晶硅层和掺杂的非晶硅层; 图案化非晶硅层和掺杂的非晶硅层以形成半导体岛; 在覆盖半导体岛的同时在绝缘层的暴露表面上沉积第二金属层; 图案化第二金属层以形成源电极,漏电极和电容器电极,漏电极与源电极间隔开; 将半导体岛的掺杂非晶硅层蚀刻到有源区; 在覆盖源电极,漏电极和电容器电极的同时在衬底的整个表面上形成钝化膜; 在所述钝化膜上沉积透明导电材料层; 在透明导电材料层上施加负性光致抗蚀剂; 进行背面曝光以形成负光致抗蚀剂的第一曝光部分; 将图案化掩模与负性光致抗蚀剂对准; 执行前侧曝光以形成负光致抗蚀剂的第二曝光部分,第二曝光部分与第一曝光部分重叠; 烘烤透明导电材料层; 并且图案化透明导电材料层以形成像素电极。