公开(公告)号：US4312916A

公开(公告)日：1982-01-26

申请号：US186240

申请日：1980-09-11

申请人： Hajime Kakumaru ,  Nobuyuki Hayashi ,  Toshiaki Ishimaru ,  Kiyoshi Nakao ,  Tomohisa Ohta

发明人： Hajime Kakumaru ,  Nobuyuki Hayashi ,  Toshiaki Ishimaru ,  Kiyoshi Nakao ,  Tomohisa Ohta

IPC分类号： C08G18/63 ,  C09D4/06 ,  C09J4/02 ,  C09J4/06 ,  C09J7/02 ,  C09J175/04 ,  B05D3/06

CPC分类号： C09J175/04 ,  C08G18/637 ,  C09D4/06 ,  C09J4/06 ,  C09J7/0246 ,  Y10T428/2809 ,  Y10T428/2896

摘要： A process for producing adhesive film comprising coating on a filmlike substrate a composition comprising (i) a copolymer having a glass transition temperature of -30.degree. C. or lower and obtained from one or more monomers (a) such as alkyl acrylates or methacrylates, or the like, and another monomers (b) containing at least one carboxyl, alcoholic hydroxyl, or glycidyl group, (ii) a crosslinking agent having at least two crosslinkable functional groups which can react with the monomers (b), (iii) one or more monofunctional addition polymerizable monomers having a boiling point of 200.degree. C. or higher, (iv) one or more polyfunctional addition polymerizable monomers having a boiling point of 200.degree. C. or higher, and (v) a photochemical initiator, and irradiating said composition with actinic light, is advantageous in that the amount of solvent to be removed after coating the composition on the substrate can be reduced remarkably without lowering properties of the resulting adhesive film.

摘要翻译： 一种制造粘合剂膜的方法，其包括在膜状基材上涂布组合物，所述组合物包含（i）玻璃化转变温度为-30℃以下并由一种或多种单体（a）如丙烯酸烷基酯或甲基丙烯酸烷基酯获得的共聚物， （b）含有至少一个羧基，醇羟基或缩水甘油基的单体（b），（ii）具有至少两个可与单体（b）反应的交联性官能团的交联剂，（iii）一种 或更多的沸点为200℃以上的单官能加聚单体，（iv）一种或多种沸点为200℃以上的多官能加聚单体和（v）光化学引发剂，以及照射 所述具有光化性光的组合物的优点在于，可以显着降低在基材上涂布组合物后除去的溶剂的量，而不会降低所得粘合剂膜的性能 。

公开(公告)号：US4562142A

公开(公告)日：1985-12-31

申请号：US655435

申请日：1984-09-28

申请人： Hajime Kakumaru ,  Nobuyuki Hayashi

发明人： Hajime Kakumaru ,  Nobuyuki Hayashi

IPC分类号： C08F2/00 ,  C08F2/48 ,  C08F2/50 ,  C08F220/30 ,  C08F290/00 ,  C08F291/06 ,  C08F299/00 ,  C08F299/02 ,  G03F7/004 ,  G03F7/027 ,  G03F7/033 ,  G03C1/68

CPC分类号： G03F7/033 ,  C08F220/30 ,  C08F291/06 ,  C08F299/024 ,  G03F7/027 ,  Y10S430/111

摘要： Photosensitive composition comprising (a) an addition polymerizable compound of the general formula: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are hydrogen atom or methyl group, and n+m=8 to 12, (b) an addition-poymerizable compound of the general formula: ##STR2## wherein Z is a cyclic dibasic acid residue, R.sup.5 is a C.sub.1 to C.sub.3 alkylene group, R.sup.6 is hydrogen atom or methyl group, and R.sup.7 is hydrogen atom, methyl group, ethyl group or CH.sub.2 X in which X is chlorine atom or bromine atom, (c) a photoactivatable polymerization initiator, and (d) a linear copolymer having a carboxy content of 17 to 50% by mole, a water absorption of 4 to 30% by weight and a weight average molecular weight of 30,000 to 400,000. Photosensitive laminate having a photosensitive layer formed from the composition has an excellent resistance to plating liquids as well as excellent etching resistance, chemical resistance, adhesion property to boards and developing property.

摘要翻译： 光敏组合物，其包含（a）通式为：其中R 1，R 2，R 3和R 4为氢原子或甲基，n + m = 8至12的加成聚合化合物，（b）加成 - 可聚合化合物 通式为：其中Z为环状二元酸残基，R5为C1〜C3亚烷基，R6为氢原子或甲基，R7为氢原子，甲基，乙基或CH2X，其中X 是氯原子或溴原子，（c）可光活化的聚合引发剂，和（d）具有羧基含量为17至50摩尔％，吸水率为4至30重量％，重均分子量 30,000到40万。 具有由该组合物形成的感光层的感光层压板具有优异的耐电镀性，以及优异的耐蚀刻性，耐化学性，与板的粘附性和显影性。

公开(公告)号：US4272607A

公开(公告)日：1981-06-09

申请号：US782378

申请日：1977-03-29

申请人： Katsushige Tsukada ,  Nobuyuki Hayashi ,  Hideo Yamada ,  Toshiaki Ishimaru ,  Hajime Kakumaru

发明人： Katsushige Tsukada ,  Nobuyuki Hayashi ,  Hideo Yamada ,  Toshiaki Ishimaru ,  Hajime Kakumaru

IPC分类号： C08F2/00 ,  C08F2/44 ,  C08F2/48 ,  C08F20/00 ,  C08F20/10 ,  G03F7/033 ,  H05K3/28 ,  G03C1/68

CPC分类号： G03F7/033 ,  Y10S430/106

摘要： A photosensitive resin composition comprising (a) a linear polymer or copolymer having tetrahydrofurfuryl groups at side chains, (b) one or more photopolymerizable unsaturated compounds having at least two terminal ethylene groups, and (c) one or more sensitizers which initiate polymerization of said unsaturated compounds by irradiation of active light, has excellent storage stability and photosensitivity. The composition can produce permanent protective films having excellent resistance to solvents, heat resistance and the like and can be used as a solder resist and the like.

摘要翻译： 一种光敏树脂组合物，其包含（a）在侧链具有四氢糠基的直链聚合物或共聚物，（b）一种或多种具有至少两个末端亚乙基的可光聚合的不饱和化合物，和（c）一种或多种引发所述 不饱和化合物通过活性光照射，具有优异的储存稳定性和光敏性。 该组合物可以制造具有优异的耐溶剂性，耐热性等的永久保护膜，并且可以用作阻焊剂等。

公开(公告)号：US06248501B1

公开(公告)日：2001-06-19

申请号：US09521968

申请日：2000-03-09

申请人： Hiroyuki Tanaka ,  Hideyasu Tsuiki ,  Takeshi Nojiri ,  Koichi Kamijima ,  Seiji Tai ,  Seikichi Tanno ,  Hajime Kakumaru

发明人： Hiroyuki Tanaka ,  Hideyasu Tsuiki ,  Takeshi Nojiri ,  Koichi Kamijima ,  Seiji Tai ,  Seikichi Tanno ,  Hajime Kakumaru

IPC分类号： G03F7027

CPC分类号： G03F7/0007 ,  G03F7/027 ,  H01J9/2271 ,  H01J2211/42 ,  Y10S430/111 ,  Y10S430/117

摘要： Disclosed are a photosensitive resin composition which comprises: (C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group; (D) a photopolymerization initiator which produces free radical by irradiation of active light; and (E) a surface treated phosphor, a photosensitive film and a process for preparing a fluorescent pattern using the same, and a plate for a display panel.

摘要翻译： 公开了一种光敏树脂组合物，其包含：（C）具有烯属不饱和基团的光聚合性不饱和化合物;（D）通过活性光照射产生自由基的光聚合引发剂; 和（E）表面处理的荧光体，感光膜和使用其制备荧光图案的方法，以及用于显示面板的板。

公开(公告)号：US5045433A

公开(公告)日：1991-09-03

申请号：US529707

申请日：1990-05-30

申请人： Hajime Kakumaru ,  Yoshitaka Minami ,  Naohiro Kubota ,  Shinya Mashimo

发明人： Hajime Kakumaru ,  Yoshitaka Minami ,  Naohiro Kubota ,  Shinya Mashimo

IPC分类号： C07D401/04 ,  C08F2/50 ,  C08F2/58 ,  G03F7/031

CPC分类号： C08F2/58 ,  G03F7/031 ,  Y10S430/121

摘要： A substituted acridine derivative represented by ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are independently hydrogen atoms, alkyl groups, substituted alkyl groups, aryl groups, substituted aryl groups, halogen atoms, or alkoxy groups, and Z.sub.1 is a six-membered heteroaromatic group which has one or two nitrogen atoms in its ring and may have an alkyl substituent having 1 to 8 carbon atoms, or a quinolyl group; and a photopolymerizable composition comprising 0.01 to 10 parts by weight of said derivative, 100 parts by weight of a photopolymerizable compound having a boiling point of 100.degree. C. or higher at atmospheric pressure and at least one kind of ethylenic unsaturated group, and 0 to 400 parts by weight of a thermoplastic organic polymer.

公开(公告)号：US06416931B2

公开(公告)日：2002-07-09

申请号：US09927548

申请日：2001-08-13

申请人： Takeshi Nojiri ,  Hideyasu Tsuiki ,  Hiroyuki Tanaka ,  Yumiko Wada ,  Seiji Tai ,  Seikichi Tanno ,  Hajime Kakumaru ,  Kazuya Sato ,  Naoki Kimura ,  Ikuo Mukai

发明人： Takeshi Nojiri ,  Hideyasu Tsuiki ,  Hiroyuki Tanaka ,  Yumiko Wada ,  Seiji Tai ,  Seikichi Tanno ,  Hajime Kakumaru ,  Kazuya Sato ,  Naoki Kimura ,  Ikuo Mukai

IPC分类号： G03F7004

CPC分类号： G03F1/56 ,  G03F7/0007 ,  H01J9/2271 ,  H01J2211/42 ,  H01J2217/49

摘要： Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.

摘要翻译： 公开了一种荧光体图案，其包括具有凹凸的衬底和形成在衬底的凹部的内表面上的荧光体层，其中荧光体图案厚度比（x）/（y）满足0.1至1.5的范围，其中 当从凹部的底部到凸部的顶部的长度为L（母）时，（x）是形成在距离底部的0.9×L位置的不平坦壁面上的荧光体图案的厚度 凹部朝向凸部的顶部，（y）是从凹部的底部朝向凸部的顶部的0.4×L的位置处形成在不平坦壁面上的荧光体图案的厚度，并且 为准备相同。

公开(公告)号：US5403698A

公开(公告)日：1995-04-04

申请号：US774809

申请日：1991-10-11

申请人： Sigeo Tachiki ,  Masahiko Hiro ,  Toshihiko Akahori ,  Takuro Kato ,  Hajime Kakumaru ,  Yoshitaka Minami ,  Yuhji Yamazaki ,  Toshiya Takahashi ,  Toshihiko Shiotani ,  Yoshihisa Nagashima

发明人： Sigeo Tachiki ,  Masahiko Hiro ,  Toshihiko Akahori ,  Takuro Kato ,  Hajime Kakumaru ,  Yoshitaka Minami ,  Yuhji Yamazaki ,  Toshiya Takahashi ,  Toshihiko Shiotani ,  Yoshihisa Nagashima

IPC分类号： G03F7/027 ,  G03F7/085 ,  G03F7/16 ,  G03C1/725 ,  C08F2/46 ,  C25D13/00

CPC分类号： G03F7/027 ,  G03F7/085 ,  G03F7/164 ,  Y10S430/109 ,  Y10S430/111 ,  Y10S430/118 ,  Y10S430/136

摘要： A negative type photosensitive electrodepositing resin composition comprising (a) a polymer obtained by neutralizing a copolymer of acrylic or methacrylic acid and having an acid number of 20 to 300 with a basic organic compound, (b) a non-water-soluble monomer having two or more photopolymerizable unsaturated bonds in the molecule, (c) a non-water-soluble photoinitiator, and (d) a benzotriazole derivative having one or more carboxyl groups, is effective for giving electrodeposited films with a low voltage or low electric current in a short time, and usable for forming resist patterns with high degree of resolution.

摘要翻译： 一种负型感光电沉积树脂组合物，其包含（a）通过用碱性有机化合物中和丙烯酸或甲基丙烯酸和酸值为20至300的共聚物而获得的聚合物，（b）具有两个的非水溶性单体 或更多的光聚合性不饱和键，（c）非水溶性光引发剂，和（d）具有一个或多个羧基的苯并三唑衍生物，对于在低电压或低电流下产生电沉积膜是有效的 短时间，可用于形成高分辨率的抗蚀剂图案。

公开(公告)号：US6077647A

公开(公告)日：2000-06-20

申请号：US173008

申请日：1998-10-15

申请人： Hiroyuki Tanaka ,  Hideyasu Tsuiki ,  Takeshi Nojiri ,  Koichi Kamijima ,  Seiji Tai ,  Seikichi Tanno ,  Hajime Kakumaru

发明人： Hiroyuki Tanaka ,  Hideyasu Tsuiki ,  Takeshi Nojiri ,  Koichi Kamijima ,  Seiji Tai ,  Seikichi Tanno ,  Hajime Kakumaru

IPC分类号： C09K11/02 ,  C09K11/08 ,  G03F7/00 ,  G03F7/027 ,  G03F7/032 ,  H01J9/00 ,  H01J9/227 ,  H01J17/49 ,  H01J29/12

CPC分类号： G03F7/0007 ,  G03F7/027 ,  H01J9/2271 ,  H01J2211/42 ,  Y10S430/111 ,  Y10S430/117

摘要： Disclosed are a photosensitive resin composition which comprises:(A) a compound having a carboxyl group;(B) a resin having a carboxyl group;(C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group;(D) a photopolymerization initiator which produces free radical by irradiation of active light; and(E) a phosphor,a photosensitive film and a process for preparing a fluorescent pattern using the same, and a phosphor subjected to surface treatment and a process for preparing the same.

摘要翻译： 公开了一种光敏树脂组合物，其包含：（A）具有羧基的化合物; （B）具有羧基的树脂; （C）具有烯属不饱和基团的光聚合性不饱和化合物; （D）通过活性光照射产生自由基的光聚合引发剂; 和（E）荧光体，感光膜和使用该荧光体的荧光图案的制备方法以及进行表面处理的荧光体及其制备方法。

公开(公告)号：US5858616A

公开(公告)日：1999-01-12

申请号：US729164

申请日：1996-10-11

申请人： Hiroyuki Tanaka ,  Hideyasu Tsuiki ,  Takeshi Nojiri ,  Koichi Kamijima ,  Seiji Tai ,  Seikichi Tanno ,  Hajime Kakumaru

发明人： Hiroyuki Tanaka ,  Hideyasu Tsuiki ,  Takeshi Nojiri ,  Koichi Kamijima ,  Seiji Tai ,  Seikichi Tanno ,  Hajime Kakumaru

IPC分类号： C09K11/02 ,  C09K11/08 ,  G03F7/00 ,  G03F7/027 ,  G03F7/032 ,  H01J9/00 ,  H01J9/227 ,  H01J17/49 ,  H01J29/12 ,  G03C5/00

CPC分类号： G03F7/0007 ,  G03F7/027 ,  H01J9/2271 ,  H01J2211/42 ,  Y10S430/111 ,  Y10S430/117

摘要： Disclosed are a photosensitive resin composition which comprises:(A) a compound having a carboxyl group;(B) a resin having a carboxyl group;(C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group;(D) a photopolymerization initiator which produces free radical by irradiation of active light; and(E) a phosphor,a photosensitive film and a process for preparing a fluorescent pattern using the same, and a phosphor subjected to surface treatment and a process for preparing the same.

公开(公告)号：US06329111B1

公开(公告)日：2001-12-11

申请号：US08787112

申请日：1997-01-22

申请人： Takeshi Nojiri ,  Hideyasu Tsuiki ,  Hiroyuki Tanaka ,  Yumiko Wada ,  Seiji Tai ,  Seikichi Tanno ,  Hajime Kakumaru ,  Kazuya Sato ,  Naoki Kimura ,  Ikuo Mukai

发明人： Takeshi Nojiri ,  Hideyasu Tsuiki ,  Hiroyuki Tanaka ,  Yumiko Wada ,  Seiji Tai ,  Seikichi Tanno ,  Hajime Kakumaru ,  Kazuya Sato ,  Naoki Kimura ,  Ikuo Mukai

IPC分类号： B32B702

CPC分类号： G03F1/56 ,  G03F7/0007 ,  H01J9/2271 ,  H01J2211/42 ,  H01J2217/49

摘要： Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.

摘要翻译： 公开了一种荧光体图案，其包括具有凹凸的衬底和形成在衬底的凹部的内表面上的荧光体层，其中荧光体图案厚度比（x）/（y）满足0.1至1.5的范围，其中 当从凹部的底部到凸部的顶部的长度为L（母）时，（x）是形成在距离底部的0.9×L位置的不平坦壁面上的荧光体图案的厚度 凹部朝向凸部的顶部，（y）是从凹部的底部朝向凸部的顶部的0.4×L的位置处形成在不平坦壁面上的荧光体图案的厚度，并且 为准备相同。