Process for fabricating phase shift mask and process of semiconductor
integrated circuit device
    2.
    发明授权
    Process for fabricating phase shift mask and process of semiconductor integrated circuit device 失效
    制造相移掩模和半导体集成电路器件的工艺

    公开(公告)号:US5677092A

    公开(公告)日:1997-10-14

    申请号:US383839

    申请日:1995-02-06

    CPC分类号: G03F1/30 G03F1/26 Y10S430/143

    摘要: When the data of a mask pattern of a phase shift mask is to be made, the pattern data is separated into a real pattern data layer having the data of real patterns and a phase shift pattern data layer having the data of phase shift patterns. After this, it is verified whether or not the mask pattern satisfies the regulation of the gap of in-phase patterns, in which lights having transmitted through patterns adjacent to each other are in phase. It is also verified whether or not the mask pattern satisfies the regulation of the gap of out-of-phase patterns, in which lights having transmitted through patterns adjacent to each other are out of phase.

    摘要翻译: 当要进行相移掩模的掩模图案的数据时,将图案数据分离成具有实数图案的实际图案数据层和具有相移图案的数据的相移图案数据层。 此后,验证掩模图案是否满足彼此相邻的透过图案的光同相的同相图案的间隙的调节。 还验证了掩模图案是否满足彼此相邻的具有透射图案的光异相的异相图案的间隙的调节。