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公开(公告)号：US07556693B2
公开(公告)日：2009-07-07
申请号：US11843924
申请日：2007-08-23
申请人： Hirofumi Morita , Akio Hirano , Hiroyuki Kohno
发明人： Hirofumi Morita , Akio Hirano , Hiroyuki Kohno
IPC分类号： B05C3/02
CPC分类号： B05C5/005 , B05C9/06 , Y10S118/02 , Y10S118/04
摘要： This invention relates to a curtain applicator on which a two-layer curtain is formed by dispensing two types of coating medium, for example color, from a medium feeder positioned to the upper side of a moving web in order to apply two layers of coating medium onto the web surface. The medium feeder has a middle lip, which is arranged in the flow channels for the two types of medium and has a pointed part projecting toward the web side from the pointed parts of the two side lips which are arranged on the outer side of the flow channels for the two types of medium on the outer side in the width direction of the web. The curtain applicator also includes a convexly formed medium separation device, which adjoins the pointed part of the middle lip and individually separates the two types of surplus medium, for example, color, which are dispensed from the medium feeder.
摘要翻译： 本发明涉及一种帘式涂布器，其上通过从位于移动幅材的上侧的介质进料器分配两种类型的涂布介质（例如颜色）形成双层帘布，以便施加两层涂布介质 到网面上。 介质进料器具有中间唇缘，其设置在用于两种介质的流动通道中，并且具有从布置在流体的外侧上的两个侧唇的尖部朝向腹板侧突出的尖部 在幅材的宽度方向上的外侧的两种介质的通道。 帘式涂布器还包括凸起形成的介质分离装置，其邻接中间唇部的尖锐部分，并且分别分离从介质进料器分配的两种类型的多余介质，例如颜色。
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公开(公告)号：US20080006203A1
公开(公告)日：2008-01-10
申请号：US11843924
申请日：2007-08-23
申请人： Hirofumi Morita , Akio Hirano , Hiroyuki Kohno
发明人： Hirofumi Morita , Akio Hirano , Hiroyuki Kohno
IPC分类号： B05C3/02
CPC分类号： B05C5/005 , B05C9/06 , Y10S118/02 , Y10S118/04
摘要： This invention relates to a curtain applicator on which a two-layer curtain is formed by dispensing two types of coating medium, for example color, from a medium feeder positioned to the upper side of a moving web in order to apply two layers of coating medium onto the web surface. The medium feeder has a middle lip, which is arranged in the flow channels for the two types of medium and has a pointed part projecting toward the web side from the pointed parts of the two side lips which are arranged on the outer side of the flow channels for the two types of medium on the outer side in the width direction of the web. The curtain applicator also includes a convexly formed medium separation device, which adjoins the pointed part of the middle lip and individually separates the two types of surplus medium, for example, color, which are dispensed from the medium feeder.
摘要翻译： 本发明涉及一种帘式涂布器，其上通过从位于移动幅材的上侧的介质进料器分配两种类型的涂布介质（例如颜色）形成双层帘布，以便施加两层涂布介质 到网面上。 介质进料器具有中间唇缘，其设置在用于两种介质的流动通道中，并且具有从布置在流体的外侧上的两个侧唇的尖部朝向腹板侧突出的尖部 在幅材的宽度方向上的外侧的两种介质的通道。 帘式涂布器还包括凸起形成的介质分离装置，其邻接中间唇部的尖锐部分，并且分别分离从介质进料器分配的两种类型的多余介质，例如颜色。
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公开(公告)号：US06482337B1
公开(公告)日：2002-11-19
申请号：US09492183
申请日：2000-01-27
IPC分类号： B29C3300
摘要： In a method for evaluation of abrasion of a forming mold, abrasion amounts of divided pieces which are divided from a mold piece constituting a cavity are measured with the divided pieces removed or not removed from a forming mold body. A layer, a marking-off line or satin is formed on the surfaces of the divided pieces, which are observed visually every predetermined shot to judge a degree of abrasion of the respective divided pieces.
摘要翻译： 在用于评价成型模具的磨损的方法中，测量从构成空腔的模具件分割的分割件的磨损量，其中分离的件从成型模具体中移除或不被移除。 在分割片的表面上形成层，标记线或缎纹，每隔预定射击目视观察，以判断各分割片的磨损程度。
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4.发明授权Abrasive material for polishing a semiconductor wafer, and methods for manufacturing and using the abrasive material 失效用于研磨半导体晶片的研磨材料，以及制造和使用研磨材料的方法
公开(公告)号：US6045605A
公开(公告)日：2000-04-04
申请号：US78668
申请日：1998-05-14
申请人： Kenji Doi , Naoto Miyashita , Masahiro Abe , Hiroyuki Kohno , Hiroshi Kato , Kazuhiko Hayashi
发明人： Kenji Doi , Naoto Miyashita , Masahiro Abe , Hiroyuki Kohno , Hiroshi Kato , Kazuhiko Hayashi
CPC分类号： B24B57/02 , B24B37/04 , C09G1/02 , C09K3/1463
摘要： An abrasive material is prepared by dispersing silicon nitride particles acting as abrasive particles in a solvent such as a pure water or an ultra pure water, followed by adding an adsorptive stickable to the abrasive particles to the dispersion. The resultant abrasive material permits diminishing the polishing rate of a silicon nitride film used as a stopper film, with the result that a CVD SiO.sub.2 film to be polished is selectively polished relative to the Si.sub.3 N.sub.4 film used as the stopper film. This makes it possible to make the stopper film as thin as possible and permits the CVD SiO.sub.2 film to be flattened efficiently without bringing about a dishing problem.
摘要翻译： 研磨材料通过将作为磨料颗粒的氮化硅颗粒分散在诸如纯水或超纯水的溶剂中，然后向分散体中添加粘附到磨料颗粒上的吸附剂来制备。 所得的研磨材料允许减少用作阻挡膜的氮化硅膜的抛光速率，结果是相对于用作阻挡膜的Si 3 N 4膜选择性地抛光待抛光的CVD SiO 2膜。 这使得可以使阻挡膜尽可能薄，并且可以有效地使CVD SiO 2膜平坦化，而不会产生凹陷问题。
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5.发明授权
公开(公告)号：US5736185A
公开(公告)日：1998-04-07
申请号：US687058
申请日：1996-08-07
申请人： Hiroyuki Kohno , Hitomi Yoshimura , Tatsuya Uraji
发明人： Hiroyuki Kohno , Hitomi Yoshimura , Tatsuya Uraji
IPC分类号： A23L19/00 , A23L2/00 , A23L2/02 , A23L2/60 , A23L5/20 , A23L21/10 , A23L23/00 , A23L27/30 , C11B9/02 , A23L2/06
摘要： Disclosed herein is a method of suppressing and masking the grassy smell and acid taste characteristic of vegetables and fruits, thereby making food and drink more palatable, by adding erythritol to food and drink in their production from vegetables and fruits having a strong grassy smell and acid taste. The thus added erythritol also improves the taste of food and drink without adversely affecting the natural taste of vegetables and fruits and without increasing their sweetness. The method comprises adding to food and drink erythritol in an amount of 0.2 to 3.0 wt % of their weight.
摘要翻译： 本文公开了一种抑制和掩蔽蔬菜和水果的草味和酸味特征的方法，从而通过在具有强烈草味和酸性的蔬菜和水果的食品和饮料中添加赤藓糖醇使食物和饮料更可口 味道。 这样添加的赤藓糖醇也可以改善食物和饮料的味道，而不会对蔬菜和水果的天然味道产生不利影响，而不增加甜味。 该方法包括向食品中添加量为其重量的0.2〜3.0重量％的赤藓糖醇。
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公开(公告)号：US5633611A
公开(公告)日：1997-05-27
申请号：US557713
申请日：1995-11-13
申请人： Hiroyuki Kohno , Takahiro Miki
发明人： Hiroyuki Kohno , Takahiro Miki
IPC分类号： G05F3/24 , H03K17/16 , H03K17/687 , H03K17/693 , H03K19/0185 , H03M1/74
CPC分类号： H03K19/018578 , G05F3/24 , H03K17/693
摘要： Driving circuits (6) output driving signals to drive switching transistors (Q 15, Q16). A potential as the high level of the driving signal can be set lower than a power supply voltage (V.sub.DD) by connecting the sources of transistors (Q18, Q20) to a node (X). This configuration prevents an overshoot at a switching time and allows an improvement in a settling time. Therefore, a complementary current source circuit for a high-speed D/A converter can be provided.
摘要翻译： 驱动电路（6）输出驱动信号以驱动开关晶体管（Q15，Q16）。 通过将晶体管（Q18，Q20）的源极连接到节点（X），驱动信号的高电平的电位可以设定为低于电源电压（VDD）。 该配置防止在切换时间的过冲，并且可以提高建立时间。 因此，可以提供用于高速D / A转换器的互补电流源电路。
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公开(公告)号：US07820247B2
公开(公告)日：2010-10-26
申请号：US11130185
申请日：2005-05-17
申请人： Hirofumi Morita , Akio Hirano , Hiroyuki Kohno
发明人： Hirofumi Morita , Akio Hirano , Hiroyuki Kohno
CPC分类号： B05C5/005
摘要： Curtain-type coater and process for coating a web with curtain-type coater. Curtain-type coater includes a curtain head having a slit structured and arranged to supply a coating liquid curtain onto a surface of a web and outside of the edges of the web. At least a portion of the slit forming the coating liquid curtain outside the edges of the web has a width greater than a portion of the slit forming the coating liquid curtain supplied onto the web.
摘要翻译： 帘式涂布机和用幕式涂布机涂布网的方法。 帘式涂布机包括具有狭缝的窗帘头，该狭缝构造并布置成将涂布液幕供应到幅材的表面上并且在幅材的边缘外部。 在幅材边缘之外形成涂布液体帘幕的狭缝的至少一部分宽度大于形成提供到幅材上的涂布液幕的狭缝的一部分。
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公开(公告)号：US20080178799A1
公开(公告)日：2008-07-31
申请号：US11668897
申请日：2007-01-30
申请人： Hiroyuki Kohno , Akio Hirano , Hirofumi Morita
发明人： Hiroyuki Kohno , Akio Hirano , Hirofumi Morita
IPC分类号： B05C5/02
摘要： The present invention provides a 2-layer curtain coater that supplies a 2-layered paint curtain formed from a first paint curtain and a second paint curtain to the surface of a transported web to overcoat a first paint and a second paint in two layers on the surface of the web, the 2-layer curtain coater being able to prevent paint loss during coating preparation. The 2-layer curtain coater includes a first curtain nozzle for the forming of the first paint curtain and a second curtain nozzle for the forming of the second paint curtain and, in addition, in that the first curtain nozzle and the second curtain nozzle are relatively movable between a segregated coating preparation position and a merged coating operation position wherein, in the coating preparation position, the first paint and the second paint are recovered in a state independent of each other by the recovery of the first paint curtain from the first curtain nozzle by way of a first recovery pan and the recovery of the second paint curtain from the second curtain nozzle by way of a second recovery pan and, in the coating operation position, the 2-layered paint curtain is formed from the first paint curtain from the first curtain nozzle and the second paint curtain from the second curtain nozzle to overcoat the first paint and the second paint in two layers on the surface of the web.
摘要翻译： 本发明提供了一种2层帘式涂布机，其将由第一涂料窗帘和第二涂料窗帘形成的2层油漆窗口提供到运送的纸幅的表面上，以在第二涂料上涂覆第一涂料和第二涂料两层 纤维网的表面，2层帘式涂布机能够防止涂料制备过程中的油漆损失。 2层帘式涂布机包括用于形成第一油漆幕的第一帘式喷嘴和用于形成第二油漆幕的第二帘式喷嘴，此外，第一帘式喷嘴和第二帘式喷嘴相对 在分离的涂料制备位置和合并涂覆操作位置之间可移动，其中在涂料制备位置，第一涂料和第二涂料通过从第一帘式喷嘴回收第一涂料帘幕而以彼此独立的状态回收 通过第一回收盘并且通过第二回收盘从第二帘式喷嘴回收第二油漆帘幕，并且在涂布操作位置中，由第一油漆帘幕从第一油漆帘幕 第一帘式喷嘴和来自第二帘式喷嘴的第二漆帘，在网的表面上覆盖第一涂料和第二涂料两层。
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公开(公告)号：US20050271825A1
公开(公告)日：2005-12-08
申请号：US11130185
申请日：2005-05-17
申请人： Hirofumi Morita , Akio Hirano , Hiroyuki Kohno
发明人： Hirofumi Morita , Akio Hirano , Hiroyuki Kohno
CPC分类号： B05C5/005
摘要： Curtain-type coater and process for coating a web with curtain-type coater. Curtain-type coater includes a curtain head having a slit structured and arranged to supply a coating liquid curtain onto a surface of a web and outside of the edges of the web. At least a portion of the slit forming the coating liquid curtain outside the edges of the web has a width greater than a portion of the slit forming the coating liquid curtain supplied onto the web.
摘要翻译： 帘式涂布机和用幕式涂布机涂布网的方法。 帘式涂布机包括具有狭缝的窗帘头，该狭缝构造并布置成将涂布液幕供应到幅材的表面上并且在幅材的边缘外部。 在幅材边缘之外形成涂布液体帘幕的狭缝的至少一部分宽度大于形成提供到幅材上的涂布液幕的狭缝的一部分。
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公开(公告)号：US06354913B1
公开(公告)日：2002-03-12
申请号：US09214431
申请日：1999-01-06
申请人： Naoto Miyashita , Yoshihiro Minami , Kenji Doi , Jun Takayasu , Hiroyuki Kohno , Hiroshi Kato , Kazuhiko Hayashi
发明人： Naoto Miyashita , Yoshihiro Minami , Kenji Doi , Jun Takayasu , Hiroyuki Kohno , Hiroshi Kato , Kazuhiko Hayashi
IPC分类号： B24B100
CPC分类号： B24B37/24 , B24B37/0056 , B24B37/044 , B24D3/20 , B24D3/344 , C09G1/02 , H01L21/3212
摘要： A semiconductor wafer or a film formed thereon is polished by using a polishing agent comprising abrasive containing silica particles as the main component, water as a solvent, and a water-soluble cellulose, an alkali metal impurity content of the polishing agent being 5C ppm or less where the polishing agent contains C % by weight of the water-soluble cellulose, so as to flatten the semiconductor wafer without doing damage to the wafer or the film formed thereon and without bringing about a dishing problem in the polished surface.
摘要翻译： 通过使用包含二氧化硅颗粒作为主要成分的研磨剂，作为溶剂的水和水溶性纤维素，研磨剂的碱金属杂质含量为5ppm或以下，研磨半导体晶片或其上形成的膜 抛光剂含有C％（重量）的水溶性纤维素，以使得半导体晶片平坦化，而不会对晶片或其上形成的膜造成损害，而不会在抛光表面产生凹陷问题。
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