摘要:
An abrasive material is prepared by dispersing silicon nitride particles acting as abrasive particles in a solvent such as a pure water or an ultra pure water, followed by adding an adsorptive stickable to the abrasive particles to the dispersion. The resultant abrasive material permits diminishing the polishing rate of a silicon nitride film used as a stopper film, with the result that a CVD SiO.sub.2 film to be polished is selectively polished relative to the Si.sub.3 N.sub.4 film used as the stopper film. This makes it possible to make the stopper film as thin as possible and permits the CVD SiO.sub.2 film to be flattened efficiently without bringing about a dishing problem.
摘要翻译:研磨材料通过将作为磨料颗粒的氮化硅颗粒分散在诸如纯水或超纯水的溶剂中,然后向分散体中添加粘附到磨料颗粒上的吸附剂来制备。 所得的研磨材料允许减少用作阻挡膜的氮化硅膜的抛光速率,结果是相对于用作阻挡膜的Si 3 N 4膜选择性地抛光待抛光的CVD SiO 2膜。 这使得可以使阻挡膜尽可能薄,并且可以有效地使CVD SiO 2膜平坦化,而不会产生凹陷问题。
摘要:
A semiconductor wafer or a film formed thereon is polished by using a polishing agent comprising abrasive containing silica particles as the main component, water as a solvent, and a water-soluble cellulose, an alkali metal impurity content of the polishing agent being 5C ppm or less where the polishing agent contains C % by weight of the water-soluble cellulose, so as to flatten the semiconductor wafer without doing damage to the wafer or the film formed thereon and without bringing about a dishing problem in the polished surface.
摘要:
A polishing slurry is formed of a silica-dispersed solution obtained by dispersing, in an aqueous solvent, a fumed silica having an average primary particle size of from 5 to 30 nm, the silica-dispersed solution exhibiting a light scattering index (n) of from 3 to 6 at a silica concentration of 1.5% by weight, and the fumed silica dispersed therein having an average secondary particle size of from 30 to 100 nm on the weight basis. The polishing slurry is produced by pulverizing, using a high-pressure homogenizer, a silica-dispersed solution obtained by dispersing a fumed silica in an aqueous solvent, so that the fumed silica possesses an average secondary particle size of from 30 to 100 nm on the weight basis. The polishing slurry is used for polishing semiconductor wafers and inter-layer dielectric in an IC process.
摘要:
Provided is a high purity polishing slurry which provides a material to be polished with a high scratch resistance and has a high polishing efficiency and which less contaminates the material to be polished. The polishing slurry comprises water and silica particles dispersed in water, wherein the above silica particles have an average primary particle size of 50 to 300 nm and a refractive index of 1.41 to 1.44 and are synthesized in a liquid phase and produced without passing through a drying step; and the K value is 5×10−6 mol/m2 or more. Further, a polishing process for a semiconductor wafer using the above polishing slurry is provided.
摘要翻译:提供了一种高纯度抛光浆料,其提供具有高耐刮擦性并且具有高抛光效率并且较少污染待抛光材料的待抛光材料。 抛光浆料包含分散在水中的水和二氧化硅颗粒,其中上述二氧化硅颗粒的平均一次粒径为50〜300nm,折射率为1.41〜1.44,合成液相,不经过干燥 步; K值为5×10 -6 mol / m 2以上。 此外,提供了使用上述抛光浆料的半导体晶片的抛光工艺。
摘要:
By a QTL analysis and so forth using 4-HPPD inhibitor-susceptible rice and 4-HPPD inhibitor-resistant rice, a hypothetical gene (HIS1 gene) of an iron/ascorbate-dependent oxidoreductase gene located on a short arm of chromosome 2 of rice has been identified as a 4-HPPD inhibitor-resistance gene. Further, it has also been revealed that a homologous gene (HSL1 gene) of the HIS1 gene is located on chromosome 6 of rice. Furthermore, it has been found out that utilizations of these genes make it possible to efficiently produce a plant having increased resistance or susceptibility to a 4-HPPD inhibitor and to efficiently determine whether a plant has resistance or susceptibility to a 4-HPPD inhibitor.
摘要:
A portable terminal obtains a first code used to obtain provision information and a second code, different from the first code, from a communication device. The portable terminal transmits the first and second codes to an information processing device, receives the provision information from the information processing device as a response to the transmission, and outputs the received provision information. The information processing device includes a first storage unit storing the first code and a second storage unit storing, by associating, the second code and the provision information. The information processing device receives the first and second codes from the portable terminal, obtains provision information associated with the received second code from the second storage unit when the received first code is stored in the first storage unit, and transmits the obtained provision information to the portable terminal. The first code is deleted in exiting from a specific area.
摘要:
A substrate holding and rotating device includes: a turntable rotatable; a rotative drive unit which rotates the turntable; a holding member which is provided on the turntable and horizontally holds a substrate in upwardly spaced relation to the turntable; a vertically movable protection disk disposed between the turntable and a substrate holding position; and a magnetic levitation mechanism including a first magnet attached to the protection disk, an annular second magnet which generates a repulsive force with respect to the first magnet, a support member which non-rotatably supports the second magnet, and a relative movement mechanism which moves the support member and the turntable relative to each other.
摘要:
There is provided a projection-type display apparatus which solves the problem that when an amount of electric power applied to light sources is adjusted, the amount of electric power involved in the cooling of LEDs becomes greater than necessary. Coolers (107R, 107G, 107B) cool light sources (103R, 103G, 103B). Light sensor (111) detects the brightness of a surrounding area. Light case temperature detectors (112R, 112G, 112B) detect case temperatures which are the temperatures of cases of light sources (103R, 103G, 103B). Light source forward voltage detectors (113R, 113G, 113B) detect forward voltages of light sources (103R, 103G, 103B). Light source forward current detectors (114R, 114G, 114B) detect forward currents of light sources (103R, 103G, 103B). Adjuster (117) adjusts the amount of cooling power of coolers (107R, 107G, 107B) based on the forward voltage, the forward current, and the case temperatures.
摘要:
The present invention relates to a method for producing inorganic oxide particles, comprising at least the following steps of: coagulating a dispersion obtained by carrying out the hydrolysis reaction and the polycodensation reaction of a metal alkoxide in the presence of a basic catalyst; filtering the dispersion to obtain particles; and drying the particles, wherein the step of coagulating the dispersion is carried out by adding a coagulant comprising at least one compound selected from the group consisting of carbon dioxide, ammonium carbonate, ammonium hydrogen carbonate and ammonium carbamate to the dispersion. The inorganic oxide particles obtained by the method of the present invention have high purity and are excellent in flowability.
摘要:
In a power transmission device, a breather chamber having an opening on its one end side and extending coaxially with the countershaft is formed in a countershaft that transmits power from an output shaft of an automatic transmission to a differential mechanism. An inner end of a vent pipe placed so as to extend through a transmission case and that includes the inner end and an outer end each having an opening is inserted in the opening of the breather chamber. A plug, which closes a gap between an inner peripheral surface of the breather chamber and an outer peripheral surface of the inner end of the vent pipe so as to allow air to flow between the inside of the transmission case and the breather chamber and so as to restrict entrance of hydraulic oil into the breather chamber, is placed in the opening of the breather chamber.