SERIAL PLATING SYSTEM
    1.
    发明申请
    SERIAL PLATING SYSTEM 审中-公开
    串联镀层系统

    公开(公告)号:US20140083842A1

    公开(公告)日:2014-03-27

    申请号:US13626769

    申请日:2012-09-25

    CPC classification number: C25D17/12 C25D5/022 C25D5/08 C25D17/06 C25D21/10

    Abstract: A serial plating system includes a plurality of nozzles that are disposed in a plating tank at a position opposite to a plurality of workpieces, and that discharge a plating solution toward the plurality of workpieces, and a plurality of anodes that are disposed in the plating tank at a position opposite to the plurality of workpieces that are serially transferred in the plating tank, one nozzle among the plurality of nozzles and at least one anode among the plurality of anodes being alternately and repeatedly disposed along a transfer direction in which the plurality of workpieces are serially transferred. The plurality of nozzles and the plurality of anodes may be disposed to overlap in a side view along the transfer direction.

    Abstract translation: 串联电镀系统包括多个喷嘴,其布置在与多个工件相对的位置处的镀槽中,并且向多个工件排放电镀液,并且设置在镀槽中的多个阳极 在与电镀槽中串联传送的多个工件相对的位置处,多个喷嘴中的一个喷嘴和多个阳极中的至少一个阳极沿着传送方向交替重复地设置,在该传送方向上,多个工件 连续转移。 多个喷嘴和多个阳极可以设置成沿着传送方向在侧视图中重叠。

Patent Agency Ranking