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39 条记录 (耗时 0.027 秒)

    Test circuit, memory system, and test method of memory system
    1.
    发明授权
    Test circuit, memory system, and test method of memory system 有权
    存储系统的测试电路，存储系统和测试方法

    公开(公告)号：US08918685B2

    公开(公告)日：2014-12-23

    申请号：US13603597

    申请日：2012-09-05

    申请人： Hyung-Gyun Yang ,  Hyung-Dong Lee ,  Yong-Kee Kwon ,  Young-Suk Moon ,  Hong-Sik Kim

    发明人： Hyung-Gyun Yang ,  Hyung-Dong Lee ,  Yong-Kee Kwon ,  Young-Suk Moon ,  Hong-Sik Kim

    IPC分类号： G11C29/00

    CPC分类号： G11C29/56 ,  G11C2029/5606

    摘要： This technology relates to smoothly performing a test on a memory circuit having a high memory capacity while reducing the size of a test circuit. A test circuit according to the present invention includes a test execution unit configured to perform a test on a target test memory circuit, an internal storage unit configured to store data for the test execution unit, and a conversion setting unit configured to set a part of or the entire storage space of the target test memory circuit as an external storage unit for storing the data for the test execution unit.

    摘要翻译： 该技术涉及在减小测试电路的尺寸的同时平滑地对具有高存储容量的存储器电路进行测试。 根据本发明的测试电路包括被配置为对目标测试存储器电路进行测试的测试执行单元，被配置为存储用于测试执行单元的数据的内部存储单元，以及转换设置单元， 或作为用于存储测试执行单元的数据的外部存储单元的目标测试存储器电路的整个存储空间。

    TRANSFLECTIVE TYPE DIODE SUBSTRATE AND A METHOD FOR FABRICATION THE SAME
    3.
    发明申请
    TRANSFLECTIVE TYPE DIODE SUBSTRATE AND A METHOD FOR FABRICATION THE SAME 有权
    转移型二极体基板及其制造方法

    公开(公告)号：US20100279445A1

    公开(公告)日：2010-11-04

    申请号：US12836251

    申请日：2010-07-14

    申请人： Hyung Beom SHIN ,  Hong Sik Kim

    发明人： Hyung Beom SHIN ,  Hong Sik Kim

    IPC分类号： H01L21/28

    CPC分类号： G02F1/133555

    摘要： A transflective diode substrate for a liquid crystal display device, includes: a reflective zone including a diode having a scan electrode, an insulating pattern on the scan electrode and a pixel electrode over the scan electrode, organic patterns around the diode, and a reflection electrode over the organic patterns; and a transmissive zone adjacent to the reflective zone; wherein the pixel electrode is formed in the reflective zone and the transmissive zone.

    摘要翻译： 一种用于液晶显示装置的透反射二极管基板，包括：反射区，包括具有扫描电极的二极管，扫描电极上的绝缘图案和扫描电极上的像素电极，二极管周围的有机图案和反射电极 有机图案; 和与反射区相邻的透射区; 其中像素电极形成在反射区域和透射区域中。

    COMPOSITON FOR PREVENTING OR TREATING OSTEOPOROSIS
    8.
    发明申请
    COMPOSITON FOR PREVENTING OR TREATING OSTEOPOROSIS 有权

    公开(公告)号：US20220118039A1

    公开(公告)日：2022-04-21

    申请号：US17566408

    申请日：2021-12-30

    申请人： PENS CO., LTD. ,  Hong Sik KIM

    发明人： Hong Sik KIM

    IPC分类号： A61K36/515 ,  A61P19/10 ,  A61K36/35

    摘要： A composition for preventing or treating osteoporosis, contains a Gentiana scabra extract and a Sambucus williamsii extract. The composition for preventing or treating osteoporosis is capable of increasing bone formation and inhibiting bone resorption. In addition, the composition increases bioaffinity and has no side effects by containing a Gentiana scabra extract and a Sambucus williamsii extract, which are natural products, thereby stably exhibiting an effect of preventing or treating osteoporosis.

    Preparation method of Ruthenium(Ru) powder for preparation of Ruthenium target
    9.
    发明申请
    Preparation method of Ruthenium(Ru) powder for preparation of Ruthenium target 审中-公开
    用于制备钌靶的钌（Ru）粉末的制备方法

    公开(公告)号：US20140123810A1

    公开(公告)日：2014-05-08

    申请号：US14115597

    申请日：2012-01-31

    申请人： Won Kyu Yoon ,  Seung Ho Yang ,  Gil Su Hong ,  Hong Sik Kim ,  Dong Han Kang

    发明人： Won Kyu Yoon ,  Seung Ho Yang ,  Gil Su Hong ,  Hong Sik Kim ,  Dong Han Kang

    IPC分类号： B22F9/16

    CPC分类号： B22F9/16 ,  B22F9/14 ,  B22F2009/001 ,  B22F2998/10 ,  B22F2999/00 ,  C22C1/0466 ,  Y02P10/24 ,  B22F1/0085 ,  B22F2201/013 ,  B22F1/0088 ,  B22F2201/03 ,  B22F9/04

    摘要： The present invention is related to a manufacturing method of high purity and refined Ru (Ruthenium) powder produced by using a waste Ru target. Yield of the target and physical properties of a thin film are improved by producing tremendously refined in which oxygen content of the target is decreased, and a crystal particle size is reduced.In order to obtain these merits, powder having a hollow inside is produced by applying plasma to a waste Ru target. Carbon impurities are selectively removed through a atmospheric heat process and Ru powder is oxidized. Thereby, Ru oxide (RuOx) powder is produced. High purity and refined Ru powder is acquired through a hydrogen atmospheric heat process after pulverizing the produced Ru oxide (RuOx) powder into refined shape.

    摘要翻译： 本发明涉及通过使用废Ru靶产生的高纯度和精制的Ru（钌）粉末的制造方法。 通过生产目标的氧含量降低，并且晶粒尺寸减小的极好的精炼来提高目标的产率和薄膜的物理性能。 为了获得这些优点，通过向废物Ru靶施加等离子体来制造具有中空的粉末。 通过大气热处理选择性去除碳杂质，并且Ru粉末被氧化。 由此，生成Ru氧化物（RuOx）粉末。 将生成的Ru氧化物（RuOx）粉末粉碎成精炼形状后，通过氢气大气热处理获得高纯度和精制的Ru粉末。

    METHOD OF LIFTING OFF AND FABRICATING ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME
    10.
    发明申请
    METHOD OF LIFTING OFF AND FABRICATING ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME 有权
    使用该液晶显示装置提升关闭和制造阵列基板的方法

    公开(公告)号：US20110250532A1

    公开(公告)日：2011-10-13

    申请号：US13165466

    申请日：2011-06-21

    申请人： Hee-Young Kwack ,  Hyun-Seok Hong ,  Joo-Soo Lim ,  Hong-Sik Kim

    发明人： Hee-Young Kwack ,  Hyun-Seok Hong ,  Joo-Soo Lim ,  Hong-Sik Kim

    IPC分类号： G03F7/20

    CPC分类号： H01L27/1288 ,  G02F1/1368 ,  G02F2001/13625 ,  H01L27/1214 ,  H01L27/124

    摘要： A method of lifting off includes forming a first material layer on a substrate; forming a photoresist pattern including first and second holes and on the first material layer; patterning the first material layer using the photoresist pattern as a patterning mask to form a material pattern having first and second grooves within the material pattern, the first and second grooves corresponding to the first and second holes, respectively; forming a second material layer on an entire surface of the substrate including the photoresist pattern and the first and second grooves; and removing the photoresist pattern and the second material layer on the photoresist pattern at the same time, wherein a portion of the material pattern between the first and second grooves and portions of the material pattern at sides of the first and second grooves constitute a line as a whole.

    摘要翻译： 剥离方法包括在基材上形成第一材料层; 形成包括第一和第二孔的光致抗蚀剂图案，并在第一材料层上形成; 使用光致抗蚀剂图案作为图案掩模来图案化第一材料层，以形成在材料图案内具有第一和第二凹槽的材料图案，第一和第二凹槽分别对应于第一和第二孔; 在包括光致抗蚀剂图案和第一和第二凹槽的基板的整个表面上形成第二材料层; 并且同时去除光致抗蚀剂图案上的光致抗蚀剂图案和第二材料层，其中在第一和第二槽之间的材料图案的一部分和材料图案的部分在第一和第二槽的侧面构成一条直线， 整个。