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公开(公告)号：US07255842B1
公开(公告)日：2007-08-14
申请号：US10664950
申请日：2003-09-22
申请人： James T. Yeh , Henry W. Pennline
发明人： James T. Yeh , Henry W. Pennline
CPC分类号： B01D53/60 , B01D53/68 , B01D2251/2062 , B01D2251/508 , B01D2257/2045 , B01D2257/2047 , B01D2257/302 , B01D2257/404 , Y02A50/2344
摘要： A new method for the removal of environmental compounds from gaseous streams, in particular, flue gas streams. The new method involves first oxidizing some or all of the acid anhydrides contained in the gas stream such as sulfur dioxide (SO2) and nitric oxide (NO) and nitrous oxide (N2O) to sulfur trioxide (SO3) and nitrogen dioxide (NO2). The gas stream is subsequently treated with aqua ammonia or ammonium hydroxide which captures the compounds via chemical absorption through acid-base or neutralization reactions. The products of the reactions can be collected as slurries, dewatered, and dried for use as fertilizers, or once the slurries have been dewatered, used directly as fertilizers. The ammonium hydroxide can be regenerated and recycled for use via thermal decomposition of ammonium bicarbonate, one of the products formed. There are alternative embodiments which entail stoichiometric scrubbing of nitrogen oxides and sulfur oxides with subsequent separate scrubbing of carbon dioxide.
摘要翻译： 用于从气流，特别是烟道气流中去除环境化合物的新方法。 新方法包括首先氧化气流中包含的一些或全部酸酐，例如二氧化硫（SO 2 H 2）和一氧化氮（NO）和一氧化二氮（N 2/2） SO 3）与三氧化硫（SO 3 3）和二氧化氮（NO 2 2）反应。 气流随后用氨水或氢氧化铵处理，其通过酸碱或中和反应通过化学吸收捕获化合物。 反应的产物可以作为浆料收集，脱水并干燥以用作肥料，或者一旦浆液已经脱水，直接用作肥料。 氢氧化铵可以通过碳酸氢铵的热分解再生和循环使用，碳酸氢铵是形成的产物之一。 还有一些替代实施方案，其中需要化学计量地洗涤氮氧化物和硫氧化物，随后分别洗涤二氧化碳。
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公开(公告)号：US4923772A
公开(公告)日：1990-05-08
申请号：US341273
申请日：1989-04-17
申请人： Steven J. Kirch , John R. Lankard , John J. Ritsko , Kurt A. Smith , James L. Speidell , James T. Yeh
发明人： Steven J. Kirch , John R. Lankard , John J. Ritsko , Kurt A. Smith , James L. Speidell , James T. Yeh
CPC分类号： G03F1/58 , G03F1/24 , Y10S430/146
摘要： The present invention is a mask and methods for making masks for use with a laser projection etching system. The unique mask is able to withstand the fluences of the high energy and high power lasers used without degrading. Specifically, the new projection etching masks are fabricated of patterned multiple dielectric layers having alternating high and low indices of refraction on a UV grade synthetic fused silica substrate in order to achieve maximum reflectivity of the laser energy in the opague areas and maximum transmissivity of the laser energy in the transparent areas of the mask.
摘要翻译： 本发明是用于制造用于激光投影蚀刻系统的掩模的掩模和方法。 独特的面罩能够承受高能量和高功率激光器的使用而不降解的能量。 具体来说，新的投影蚀刻掩模由在UV级合成熔融石英基底上具有交替的高折射率和低折射率的图案化多个电介质层制成，以便实现在op区域中激光能量的最大反射率和激光器的最大透射率 能量在面具的透明区域。
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3.发明授权公开(公告)号：US08275422B2
公开(公告)日：2012-09-25
申请号：US13029486
申请日：2011-02-17
申请人： Xiao Y. Chen , Jie X. Jiao , Song Song , Xiao F. Wang , Ying Wang , Yu D. Yang , James T. Yeh
发明人： Xiao Y. Chen , Jie X. Jiao , Song Song , Xiao F. Wang , Ying Wang , Yu D. Yang , James T. Yeh
IPC分类号： H04M1/00
CPC分类号： H04M1/72577 , B60R25/00 , G08G1/205 , H04M1/6075
摘要： The invention provides a system and method for controlling use of handset communication device for communication by driver. A system in accordance with an embodiment includes: an obtaining component for obtaining driving state information of the vehicle; a directional antenna for capturing a wireless communication signal of the handset communication device around the driver; a judging component for judging whether a driving state of the vehicle is in an unstable state based on predefined criteria and the driving state information of the vehicle; and a control component for transmitting a remote control signal, based on a judging result of the judging component, to intervene in a communication of the handset communication device during a call.
摘要翻译： 本发明提供一种用于控制手持通信装置用于驾驶员进行通信的系统和方法。 根据实施例的系统包括：获取车辆的驾驶状态信息的获取部件; 定向天线，用于捕获所述手持通信设备在所述驾驶员周围的无线通信信号; 判断部件，用于基于预定准则和车辆的驾驶状态信息来判断车辆的驾驶状态是否处于不稳定状态; 以及控制部件，用于基于所述判断部件的判断结果发送遥控信号，以在通话期间干预所述手持通信装置的通信。
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公开(公告)号：US4451349A
公开(公告)日：1984-05-29
申请号：US486629
申请日：1983-04-20
申请人： James T. Yeh
发明人： James T. Yeh
IPC分类号： C08J7/00 , G03F7/36 , H01J37/32 , H01L21/302 , H01L21/3065 , C23C15/00 , C23F1/00
CPC分类号： H01J37/32082 , G03F7/36 , H01J37/32559 , H01J2237/334 , Y10S156/914
摘要： This patent specification describes a technique for protectively coating the electrodes in a plasma patterning device so as to minimize the effect of backscattering of electrode material.The potentials present in a patterning chamber are such that electrode sputtering material may occur. If the material of the electrode where the sample is mounted (RIE mode) or the material of the counterelectrode (plasma etch mode) of the reaction chamber is not etchable in the etchant present, electrode material can be sputtered off, backscattered on the polymer surface, and cause incomplete etching.Polymer films, patterned in fine dimensions by masking and etching, are widely used in microelectronics. If backscattered material present in the etch area cannot be etched as fast as the polymer film, the back-scattered material on the polymer film surface will cause partial masking and incomplete etching, leaving spikes of polymer.Coating the electrode with the same polymer, or with a photoresist or different polymer of corresponding etch rate, precludes such incomplete etching; the etched hole is very clean, without spikes. The coating on the electrodes may be very thick so as not to require frequent recoating.
摘要翻译： 该专利说明书描述了一种用于在等离子体图案形成装置中保护性地涂覆电极的技术，以便最小化电极材料的后向散射的影响。 存在于图案化室中的电位使得可能发生电极溅射材料。 如果安装样品的电极材料（RIE模式）或反应室的反电极材料（等离子体蚀刻模式）在蚀刻剂中是不可蚀刻的，则电极材料可以溅射掉，反向散射在聚合物表面上 ，并导致不完全蚀刻。 通过掩模和蚀刻在精细尺寸上图案化的聚合物膜被广泛用于微电子学。 如果存在于蚀刻区域中的背散射材料不能像聚合物膜一样快地蚀刻，则聚合物膜表面上的背散射材料将引起部分掩蔽和不完全蚀刻，留下聚合物的尖峰。 用相同的聚合物或具有相应蚀刻速率的光致抗蚀剂或不同聚合物涂覆电极排除了这种不完全蚀刻; 蚀刻孔很干净，没有尖峰。 电极上的涂层可能非常厚，以免不需要频繁的重涂。
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5.发明申请公开(公告)号：US20110207448A1
公开(公告)日：2011-08-25
申请号：US13029486
申请日：2011-02-17
申请人： Xiao Y. Chen , Jie X. Jiao , Song Song , Xiao F. Wang , Ying Wang , Yu D. Yang , James T. Yeh
发明人： Xiao Y. Chen , Jie X. Jiao , Song Song , Xiao F. Wang , Ying Wang , Yu D. Yang , James T. Yeh
IPC分类号： H04W4/04
CPC分类号： H04M1/72577 , B60R25/00 , G08G1/205 , H04M1/6075
摘要： The invention provides a system and method for controlling use of handset communication device for communication by driver. A system in accordance with an embodiment includes: an obtaining component for obtaining driving state information of the vehicle; a directional antenna for capturing a wireless communication signal of the handset communication device around the driver; a judging component for judging whether a driving state of the vehicle is in an unstable state based on predefined criteria and the driving state information of the vehicle; and a control component for transmitting a remote control signal, based on a judging result of the judging component, to intervene in a communication of the handset communication device during a call.
摘要翻译： 本发明提供一种用于控制手持通信装置用于驾驶员进行通信的系统和方法。 根据实施例的系统包括：获取车辆的驾驶状态信息的获取部件; 定向天线，用于捕获所述手持通信设备在所述驾驶员周围的无线通信信号; 判断部件，用于基于预定准则和车辆的驾驶状态信息来判断车辆的驾驶状态是否处于不稳定状态; 以及控制部件，用于基于所述判断部件的判断结果发送遥控信号，以在通话期间干预所述手持通信装置的通信。
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6.发明授权Nox control for high nitric oxide concentration flows through combustion-driven reduction 失效对于一氧化氮浓度高的NOX控制通过燃烧驱动的还原
公开(公告)号：US4878442A
公开(公告)日：1989-11-07
申请号：US207995
申请日：1988-06-17
CPC分类号： F23J15/006 , F23C9/003 , F23D1/00 , F23J7/00 , F23J2215/101 , F23J2219/40
摘要： An improved method for removing nitrogen oxides from concentrated waste gas streams, in which nitrogen oxides are ignited with a carbonaceous material in the presence of substoichiometric quantities of a primary oxidant, such as air. Additionally, reductants may be ignited along with the nitrogen oxides, carbonaceous material and primary oxidant to achieve greater reduction of nitrogen oxides. A scrubber and regeneration system may also be included to generate a concentrated stream of nitrogen oxides from flue gases for reduction using this method.
摘要翻译： 一种用于从浓缩的废气流中除去氮氧化物的改进方法，其中在亚化学计量的初级氧化剂如空气存在下，碳含量的氮氧化物被点燃。 此外，还原剂可以与氮氧化物，碳质材料和主要氧化剂一起被点燃以实现氮氧化物的更大的还原。 还可以包括洗涤器和再生系统以从烟道气产生浓缩的氮氧化物流，以便使用该方法进行还原。
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公开(公告)号：US06185529B2
公开(公告)日：2001-02-06
申请号：US09153219
申请日：1998-09-14
IPC分类号： G10L1524
CPC分类号： G10L15/25
摘要： An apparatus and a method for imaging the mouth area laterally to produce reliable measurements of mouth and lip shapes for use in assisting the speech recognition task. A video camera is arranged with a headset and a microphone to capture a lateral profile image of a speaker. The lateral profile image is then used to compute features such as lip separation, lip shape and intrusion depth parameters. The parameters are used in real time, during speech recognition process to characterize and discriminate spoken phonemes to produce a high degree of accuracy in automatic speech recognition processing, especially in a noisy environment.
摘要翻译： 一种用于横向成像口腔的装置和方法，以产生用于辅助语音识别任务的口和嘴唇形状的可靠测量。 摄像机布置有耳机和麦克风以捕获扬声器的侧面轮廓图像。 然后使用侧面轮廓图像来计算诸如唇部分离，唇形和侵入深度参数的特征。 这些参数在语音识别过程中被实时地使用，以表征和辨别语音音素，以在自动语音识别处理中产生高度准确性，特别是在嘈杂的环境中。
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公开(公告)号：US5346518A
公开(公告)日：1994-09-13
申请号：US35999
申请日：1993-03-23
申请人： Robert J. Baseman , Charles A. Brown , Benjamin N. Eldridge , Laura B. Rothman , Herman R. Wendt , James T. Yeh , Arthur R. Zingher
发明人： Robert J. Baseman , Charles A. Brown , Benjamin N. Eldridge , Laura B. Rothman , Herman R. Wendt , James T. Yeh , Arthur R. Zingher
IPC分类号： B65D85/86 , B65G1/00 , H01L21/673 , H01L21/677 , B65B5/00 , B65D81/26 , B65D85/62 , F17C11/00
CPC分类号： H01L21/67366 , B65G1/00 , H01L21/67393
摘要： During wafer fabrication, a transportable enclosure, such as a Standard Manufacturing InterFace (SMIF) pod encloses a nascent product, such as a semiconductor wafer, to protect the wafer against contamination during manufacture, storage or transportation. However chemical vapors emitted inside the pod can accumulate in the air and degrade wafers during subsequent fabrication. In order to absorb the vapors inside a closed pod, a vapor removal element typically including an activated carbon absorber, covered by a particulate-filtering vapor-permeable barrier, and covered by a guard plate with holes is disposed within the enclosure. A vapor removal element is disposed closely adjacent to each respective wafer. Alternatively, a single vapor removal element is located inside the enclosure. In certain instances, a fan or thermo-buoyant circulation causes any vapors located inside the enclosure to a vapor removal element for removal. Alternatively a porous vapor removal element may be disposed for removing vapors from air entering the enclosure. In another embodiment a vapor removal element is integrated with the back face of each wafer.
摘要翻译： 在晶片制造期间，诸如标准制造界面（SMIF）的可移动外壳包围新生产品，例如半导体晶片，以在制造，存储或运输期间保护晶片免受污染。 然而，发射在荚内的化学气体可能积聚在空气中，并在随后的制造过程中降解晶片。 为了吸收封闭的容器内的蒸气，通常包括活性炭吸收器的蒸气去除元件被覆盖有颗粒过滤蒸气可透过的屏障并被具有孔的保护板覆盖。 蒸汽去除元件被设置为紧邻每个相应的晶片。 或者，单个蒸气去除元件位于外壳内。 在某些情况下，风扇或热浮动循环使得位于外壳内部的任何蒸气成为除去蒸气的元件。 或者，可以设置多孔蒸气去除元件以从进入外壳的空气中除去蒸汽。 在另一个实施例中，蒸气去除元件与每个晶片的背面一体化。
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公开(公告)号：US4684437A
公开(公告)日：1987-08-04
申请号：US793608
申请日：1985-10-31
IPC分类号： C23F1/00 , C23F4/00 , G03F7/004 , G03F7/20 , H01L21/268 , H01L21/302 , H01L21/311 , H01L21/3213 , H05K3/02 , B44C1/22
CPC分类号： H05K3/027 , B23K26/40 , B23K26/402 , G03F7/0042 , G03F7/2004 , H01L21/268 , H01L21/31127 , H01L21/32131 , B23K2203/08 , B23K2203/10 , B23K2203/12 , B23K2203/14 , B23K2203/172 , B23K2203/42
摘要： A differential material removal process wherein a selected material can be rapidly removed without adverse impact to surrounding layers of different materials. Ultraviolet radiation is used to selectively remove metal without adversely harming adjacent polymer layers, in a metal-polymer multilayer structure. The wavelength (100-400 nm) of the ultraviolet radiation and the energy fluence per pulse are selected so that the removal rate of metal due to thermal processes is significantly greater than the removal rate of the polymer by ablative photodecomposition. This can occur at an energy fluence per pulse level greater than that at which the etch rate of the polymer begins to level off. For example, copper of a thickness less than 5 microns is rapidly etched in one or two pulses while adjacent polyimide layers are substantially unetched by the application of ultraviolet pulses of wave-lengths 248-351 nm, at energy fluences per pulse in excess of approximately 3 or 4 J/cm.sup.2.
摘要翻译： 一种差别材料去除方法，其中可以快速去除所选择的材料，而不会对不同材料的周围层产生不利影响。 在金属 - 聚合物多层结构中，使用紫外线辐射来选择性地去除金属而不会不利地损害相邻的聚合物层。 选择紫外辐射的波长（100-400nm）和每脉冲的能量密度，使得由于热处理而导致的金属的去除率明显大于通过烧蚀光分解的聚合物的去除速率。 这可以以比聚合物的蚀刻速率开始平坦化的脉冲电平更高的能量注量发生。 例如，厚度小于5微米的铜在一个或两个脉冲中快速蚀刻，而相邻的聚酰亚胺层基本上通过施加波长248-351nm的紫外线脉冲基本上未被蚀刻，每脉冲的能量密度超过约 3或4J / cm 2。
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