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    Lithographic apparatus and stage system
    1.
    发明授权
    Lithographic apparatus and stage system 有权
    平版印刷设备和舞台系统

    公开(公告)号：US09097990B2

    公开(公告)日：2015-08-04

    申请号：US13403706

    申请日：2012-02-23

    申请人： Jan-Gerard Cornelis Van Der Toorn ,  Marcel Koenraad Marie Baggen ,  Stefan Geerte Kruijswijk ,  Jeroen Pieter Starreveld ,  Michael Johannes Vervoordeldonk ,  Mark Constant Johannes Baggen

    发明人： Jan-Gerard Cornelis Van Der Toorn ,  Marcel Koenraad Marie Baggen ,  Stefan Geerte Kruijswijk ,  Jeroen Pieter Starreveld ,  Michael Johannes Vervoordeldonk ,  Mark Constant Johannes Baggen

    IPC分类号： G05B13/00 ,  G03F7/20

    CPC分类号： G03F7/70716 ,  G03F7/709

    摘要： A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.

    摘要翻译： 舞台系统包括构造成保持物体的物体表，构造成在第一运动范围上移动物体台的短行程致动器元件，以及长行程致动器元件，构造成在短行程致动器元件的第二范围 大于第一运动范围的运动。 舞台系统还包括气动补偿装置，其包括：传感器，布置成测量代表短行程致动器元件上的气动扰动力的量;致动器，被布置成提供补偿力以至少部分地补偿气动扰动;以及 控制器。 传感器连接到控制器的控制器输入端，致动器连接到控制器的控制器输出端，该控制器被布置成响应于从传感器接收到的信号来驱动致动器。

    Lithographic apparatus and device manufacturing method
    4.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07630059B2

    公开(公告)日：2009-12-08

    申请号：US11491493

    申请日：2006-07-24

    申请人： Hans Butler ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes ,  Wilhelmus Franciscus Johannes Simons

    发明人： Hans Butler ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes ,  Wilhelmus Franciscus Johannes Simons

    IPC分类号： G03B27/58 ,  H02N3/00

    CPC分类号： G03F7/70725

    摘要： A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, the disturbance torque about an axis extending in a second direction, the second direction being substantially perpendicular to the first direction. The control system includes a correction signal calculator, the correction signal calculator provided with the estimated disturbance torque and a signal representative of a position of the stage in a third direction, the third direction being substantially perpendicular to the first and second directions. The correction signal calculator determines a feedforward correction signal to correct a position error of the stage in the first direction due to the disturbance torque, the feedforward correction signal to be fed to the stage.

    摘要翻译： 用于控制光刻设备中的台的位置参数的控制系统包括：阶段控制器，用于至少在第一方向上控制台的位置参数。 所述控制系统包括用于估计所述载物台上的扰动扭矩的扰动扭矩估计器，围绕在第二方向上延伸的轴线的扰动扭矩，所述第二方向基本上垂直于所述第一方向。 所述控制系统包括校正信号计算器，所述校正信号计算器具有估计的干扰转矩和表示所述载物台在第三方向上的位置的信号，所述第三方向基本上垂直于所述第一和第二方向。 校正信号计算器确定前馈校正信号，以由于干扰转矩，馈送到级的前馈校正信号来校正第一方向上的级的位置误差。

    Lithographic apparatus and device manufacturing method
    6.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20080018877A1

    公开(公告)日：2008-01-24

    申请号：US11491493

    申请日：2006-07-24

    申请人： Hans Butler ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes ,  Wilhelmus Franciscus Johannes Simons

    发明人： Hans Butler ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes ,  Wilhelmus Franciscus Johannes Simons

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70725

    摘要： A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, the disturbance torque about an axis extending in a second direction, the second direction being substantially perpendicular to the first direction. The control system includes a correction signal calculator, the correction signal calculator provided with the estimated disturbance torque and a signal representative of a position of the stage in a third direction, the third direction being substantially perpendicular to the first and second directions. The correction signal calculator determines a feedforward correction signal to correct a position error of the stage in the first direction due to the disturbance torque, the feedforward correction signal to be fed to the stage.

    摘要翻译： 用于控制光刻设备中的台的位置参数的控制系统包括：阶段控制器，用于至少在第一方向上控制台的位置参数。 所述控制系统包括用于估计所述载物台上的扰动扭矩的扰动扭矩估计器，围绕在第二方向上延伸的轴线的扰动扭矩，所述第二方向基本上垂直于所述第一方向。 所述控制系统包括校正信号计算器，所述校正信号计算器具有估计的干扰转矩和表示所述载物台在第三方向上的位置的信号，所述第三方向基本上垂直于所述第一和第二方向。 校正信号计算器确定前馈校正信号，以由于干扰转矩，馈送到级的前馈校正信号来校正第一方向上的级的位置误差。