Mask for exposure and method of fabricating substrate using said mask
    1.
    发明授权
    Mask for exposure and method of fabricating substrate using said mask 有权
    用于曝光的掩模和使用所述掩模制造基底的方法

    公开(公告)号:US09005850B2

    公开(公告)日:2015-04-14

    申请号:US13471080

    申请日:2012-05-14

    IPC分类号: G03F1/32

    CPC分类号: G03F1/32

    摘要: Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.

    摘要翻译: 提供了一种能够在不更换或改变曝光器的情况下形成超出曝光机的临界分辨率的精细图案的光刻掩模。 掩模包括至少部分吸光相移层并使用复合波长光源。

    Substrate for an electrowetting display device and method of manufacturing the substrate
    2.
    发明授权
    Substrate for an electrowetting display device and method of manufacturing the substrate 有权
    电润湿显示装置用基板及其制造方法

    公开(公告)号:US08951424B2

    公开(公告)日:2015-02-10

    申请号:US13601297

    申请日:2012-08-31

    IPC分类号: H01B13/00

    CPC分类号: G02B26/005 G02B2207/115

    摘要: A substrate for an electrowetting display device including a pixel electrode, a partition wall pattern and a water-repellent pattern. The pixel electrode is formed on a base substrate. The partition wall pattern is disposed along an edge of the pixel electrode to expose the pixel electrode. The water-repellent pattern is disposed at a space formed by the pixel electrode and the partition wall pattern to be extended along a lower portion of side surfaces of the partition wall pattern from an area on which the pixel electrode is formed. The water-repellent pattern exposes an upper portion of the side surfaces and an upper surface of the partition wall pattern. Thus, a manufacturing reliability of a substrate for an electrowetting display device is improved to prevent a display quality from being reduced.

    摘要翻译: 一种用于电润湿显示装置的基板,包括像素电极,分隔壁图案和拒水图案。 像素电极形成在基底基板上。 分隔壁图案沿像素电极的边缘设置以暴露像素电极。 防水图案设置在由像素电极和分隔壁图案形成的空间中,以沿着形成有像素电极的区域沿分隔壁图案的侧表面的下部延伸。 防水图案露出侧壁的上部和分隔壁图案的上表面。 因此,改善了用于电润湿显示装置的基板的制造可靠性,以防止显示质量降低。

    Method for forming pattern and method for manufacturing display device by using the same
    3.
    发明授权
    Method for forming pattern and method for manufacturing display device by using the same 有权
    用于形成图案的方法和使用该显示装置的方法

    公开(公告)号:US08895439B2

    公开(公告)日:2014-11-25

    申请号:US13486858

    申请日:2012-06-01

    IPC分类号: H01L21/00 G03F7/20

    摘要: A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus.

    摘要翻译: 通过使用遮光部和光透射部的间隔比为2CD:1CD的曝光掩模,首先使光致抗蚀剂曝光,形成图案的宽度和间隔为1CD的微细曝光图案的方法, 4CD:1CD,然后在曝光掩模以预定间隔移动之后第二次曝光光致抗蚀剂,或者通过使用形成在光透射部分以预定间隔移动的位置处的曝光掩模来第二次曝光光致抗蚀剂, 光致抗蚀剂,使得可以形成具有像素电极的显示装置,该像素电极包括具有比曝光装置的分辨率更小的宽度和间隔的多个细分支电极。

    DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME
    4.
    发明申请
    DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME 有权
    显示面板及其制造方法

    公开(公告)号:US20130248868A1

    公开(公告)日:2013-09-26

    申请号:US13604242

    申请日:2012-09-05

    IPC分类号: H01L27/15 H01L33/50

    摘要: A display panel includes a base substrate, a common electrode, a liquid crystal layer, a pixel electrode, a gate line, a data line, a switching element, a color filter and a light blocking pattern. The base substrate includes a trench. The common electrode is disposed in the trench. The liquid crystal layer is disposed in the trench and disposed on the common electrode. The pixel electrode is disposed on the base substrate and the liquid crystal layer. The gate line, the data line and the switching element are disposed on the base substrate and the pixel electrode. The color filter and the light blocking pattern are disposed on the gate line, the data line and the switching element.

    摘要翻译: 显示面板包括基底基板,公共电极,液晶层,像素电极,栅极线,数据线,开关元件,滤色器和遮光图案。 基底衬底包括沟槽。 公共电极设置在沟槽中。 液晶层设置在沟槽中并设置在公共电极上。 像素电极设置在基底基板和液晶层上。 栅极线,数据线和开关元件设置在基底基板和像素电极上。 滤色器和遮光图案设置在栅极线,数据线和开关元件上。

    Method for manufacturing a thin film transistor array panel
    5.
    发明授权
    Method for manufacturing a thin film transistor array panel 有权
    薄膜晶体管阵列面板的制造方法

    公开(公告)号:US08324003B2

    公开(公告)日:2012-12-04

    申请号:US12767667

    申请日:2010-04-26

    IPC分类号: H01L21/311 H01L33/44

    摘要: A thin film transistor display panel includes gate wiring formed on an insulation substrate and including gate lines, and gate electrodes and gate pads connected to the gate lines; a gate insulation layer covering the gate wiring; a semiconductor pattern formed over the gate insulation layer; data wiring formed over the gate insulation layer or the semiconductor pattern and including source electrodes, drain electrodes, and data pads; a protection layer including a Nega-PR type of organic insulating layer formed all over the semiconductor pattern and the data wiring, wherein the thickness of the Nega-PR type of organic insulating layer in both the gate and data pad regions is smaller than in the other regions; and a pixel electrode connected to the drain electrode. When exposing the Nega-PR type of passivation layer in the pad region during a photolithography process, a photomask having a lattice pattern made of a metal such as Cr that has a line width of less than the resolution of a light exposer is used. Thus, the resulting post-etch height of the passivation layer can be selectively controlled so as to provide reduced effective thickness in the pad regions.

    摘要翻译: 薄膜晶体管显示面板包括形成在绝缘基板上并包括栅极线的栅极布线,以及连接到栅极线的栅电极和栅极焊盘; 覆盖栅极布线的栅极绝缘层; 形成在所述栅极绝缘层上的半导体图案; 数据线形成在栅极绝缘层或半导体图案上,并且包括源电极,漏电极和数据焊盘; 包括形成在整个半导体图案上的Nega-PR型有机绝缘层和数据布线的保护层,其中栅极和数据焊盘区域中的Nega-PR类型的有机绝缘层的厚度小于 其他地区; 以及连接到漏电极的像素电极。 在光刻工艺中,当在焊盘区域中曝光Nega-PR类型的钝化层时,使用具有由诸如Cr之类的金属制成的格子图案的光掩模,该栅极图案的线宽小于曝光器的分辨率。 因此,可以选择性地控制所得到的钝化层的蚀刻后高度,以便在焊盘区域中提供减小的有效厚度。

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
    6.
    发明申请
    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
    显示装置及其制造方法

    公开(公告)号:US20120248480A1

    公开(公告)日:2012-10-04

    申请号:US13211360

    申请日:2011-08-17

    IPC分类号: H01L33/50 H01L33/58

    摘要: Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value.

    摘要翻译: 提供了显示装置和显示装置的制造方法。 显示装置包括经受一次预处理的基板; 形成在基板上并进行二次预处理的导体; 以及形成在所述基板和所述导体上的绝缘层,其中对所述第一基板的表面能进行高于第一参考值的所述初步预处理,并且对于所述导体的表面能进行二次预处理,所述表面能低于第二基准 参考值。

    PHOTOMASK INCLUDING SUPER LENS AND MANUFACTURING METHOD THEREOF
    8.
    发明申请
    PHOTOMASK INCLUDING SUPER LENS AND MANUFACTURING METHOD THEREOF 有权
    照片包括超级镜头及其制造方法

    公开(公告)号:US20120156594A1

    公开(公告)日:2012-06-21

    申请号:US13110024

    申请日:2011-05-18

    IPC分类号: G03F1/00

    CPC分类号: G03F1/50

    摘要: A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.

    摘要翻译: 光掩模包括基板,掩模图案层和超透镜。 基板包括包括突出部分和突出部分之间的开口部分的图案。 掩模图案层位于图案的开口部分并填充图案的开口部分。 超透镜位于基板和掩模图案层上。

    Method of manufacturing a thin film transistor array panel
    10.
    发明授权
    Method of manufacturing a thin film transistor array panel 失效
    制造薄膜晶体管阵列面板的方法

    公开(公告)号:US07425479B2

    公开(公告)日:2008-09-16

    申请号:US11777042

    申请日:2007-07-12

    IPC分类号: H01L21/00

    摘要: The present invention provides a thin film transistor array panel comprising: an insulating substrate; a first signal line formed on the insulating substrate and extending in a first direction; a second signal line formed on the insulating substrate, extending in a second direction, and intersecting the first signal line; a thin film transistor connected to the first and second signal lines; a passivation layer formed on the second signal line and having a contact hole exposing a portion of the second signal line; and a pixel electrode formed on the passivation layer and connected to the thin film transistor through the contact hole, wherein the passivation layer is formed by coating an organic solution that includes an organic insulating material and a solvent including at least one of PGMEP, EEP, and nBA.

    摘要翻译: 本发明提供一种薄膜晶体管阵列板,包括:绝缘基板; 形成在所述绝缘基板上并沿第一方向延伸的第一信号线; 形成在所述绝缘基板上的第二信号线,沿第二方向延伸并与所述第一信号线相交; 连接到第一和第二信号线的薄膜晶体管; 钝化层,其形成在所述第二信号线上并且具有暴露所述第二信号线的一部分的接触孔; 以及形成在所述钝化层上并通过所述接触孔连接到所述薄膜晶体管的像素电极,其中所述钝化层通过涂覆包括有机绝缘材料的有机溶液和包含至少一种PGMEP,EEP的溶剂形成, 和nBA。