摘要:
In one aspect, the present invention is a system for preparing a patient for an endoscopy procedure, such as a colonoscopy. The endoscopic preparation and examination system includes an endoscope, a source of irrigation and aspiration, and a control unit. The endoscope includes an elongated flexible shaft with a distal tip and a proximal end, at least one aspiration lumen and at least one irrigation lumen. A plurality of irrigation ports are functionally connected to the at least one irrigation lumen and a plurality of aspiration ports are functionally connected to the at least one aspiration lumen. In another aspect, the invention provides a method of clearing an obstructed view in a patient prior to, or during an endoscopic examination.
摘要:
One or more techniques and/or systems described herein provide for examining an object (e.g., a tumor in a patient) and subsequently treating the object. The examination and treatment generally occur very close to one another in time, with the patient remaining on a support article (e.g., on a bed or in a chair) during both the examination and the treatment. In this way, a position of the tumor and/or orientation of the tumor relative to the patient is substantially fixed during both the examination and the treatment. In one embodiment, a support article is configured to rotate during the examination and/or treatment. In this way, the object can be examined (e.g., and volumetric data related to the object can be acquired) and/or treated without moving portions of the imaging and/or treatment apparatus, for example.
摘要:
Systems, apparatus, methods, and articles of manufacture that provide for outputting and utilization of risk zone information are provided. In some embodiments, risk zone information may be utilized to select, price, and/or manage an insurance policy.
摘要:
Systems, methods, and products made by a deposition process are shown and described. A work piece is supported in a main deposition chamber so that the work piece is positioned above each container of deposition material as the container is moved into and out of the deposition chamber. One or more containers are sequentially moved from each of a plurality of auxiliary chambers into and out of the deposition chamber so as to deposit material from each of the containers onto the work piece in a sequential manner.
摘要:
A hybrid MRI-particle-based therapy system can include as components both a particle radiation therapy system configured to apply a charged particle beam to a region of application in a predetermined direction and also a MRI system including a magnetic field generator for generating a magnetic field in an imaging volume which includes the region of application at the same time that the charged particle beam is applied. The MRI system can be configured with two torroidal magnets or a magnet having apertures to provide access to the region of application for the charged particle beam, and to provide a homogeneous magnetic field in the region of application of the charged particle beam. The particle beam can be positioned to pass through a relatively low-strength portion of the main magnetic B0 field of the MRI system. Related methods of image-guided therapy are also provided by embodiments of the present disclosure.
摘要:
A process and system for managing business, technical and operational data uses a single interface in a shared space environment over the Internet, including a common authentication and environment. A supplier portal creates a central repository for registration process information, company information, and user information, making this information available to all applications that open into the supplier portal.
摘要:
During ion implantation, beam heating of the substrates must be reduced to eliminate self-annealing of the wafers during implant and to eliminate damager to masking materials, principally photoresist, that is mounted on the surface of the wafers. In this work, we describe a technique which may be used with both single-wafer and batch ion implantation systems to reduce transient wafer temperatures during implant.
摘要:
One or more techniques and/or systems are described herein for cleaning a portion of a radiographic examination apparatus whereon debris may accumulate. Typically, the portion being cleaned is within a scanning field of the radiographic examination device (e.g., within a portion of the radiographic examination device through which radiation traverses). Activation of a cleaning mechanism, or a portion thereof, may be timed to miss radiation emitted during a scan, and thus not interfere with a scan. Also, the cleaning mechanism, or a portion thereof, may be located so as to not attenuate radiation. If radiation is attenuated by the cleaning mechanism corrective techniques can be implemented to account for such attenuation.
摘要:
A fluid delivery system for use with an endoscope. Certain embodiments of the invention include a single, large fluid source and pump installed upon an operator console, in combination with a small fluid reservoir and pump installed within a proximal connector of the imaging endoscope, multiple fluid sources that feed a common fluid channel that are pressurized by a common pump, multiple fluid sources that feed dedicated fluid channels that are pressurized by dedicated pumps, and a small fluid reservoir and pump installed within a handheld manual controller of the imaging endoscope. The fluid delivery endoscopic systems of the present invention provide the user with the flexibility of changing fluids either in advance of a procedure or on-the-fly as needed, instead of relying on fixed fluid sources only.
摘要:
A package that resists creation of particles in a package cavity. A package according to one embodiment of the present invention contains a mechanical device attached to the floor of the package substrate. Epoxy typically is used to attach the device. Electrical connections are provided by bond wires connecting bond pads on the substrate with bond pads on the device. A window is attached to the substrate to form a cavity around the device. A thin masking layer on portions of the package cavity surface prevents the surface from generating particles. The thin masking layer may be any material that resists particle generation. The masking layer on the cavity walls optionally extends out of the cavity and onto the upper surface of the package.