CLEANING OF SEMICONDUCTOR PROCESSING SYSTEMS
    1.
    发明申请
    CLEANING OF SEMICONDUCTOR PROCESSING SYSTEMS 有权
    半导体加工系统的清洁

    公开(公告)号:US20100154835A1

    公开(公告)日:2010-06-24

    申请号:US12298727

    申请日:2007-04-26

    IPC分类号: B08B5/00

    摘要: A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part. Particularly preferred gas-phase reactive materials utilized comprise gaseous compounds such as XeF2, XeF4, XeF6, NF3, IF5, IF7, SF6, C2F6, F2, CF4, KrF2, Cl2, HCl, ClF3, ClO2, N2F4, N2F2, N3F, NFH2, NH2F, HOBr, Br2, C3F8, C4F8, C5F8, CHF3, CH2F2, CH3F, COF2, HF, C2HF5, C2H2F4, C2H3F3, C2H4F2, C2H5F, C3F6, and organochlorides such as COCl2, CCl4, CHCl3, CH2Cl2 and CH3Cl.

    摘要翻译: 一种清洁残留物的方法和装置,用于制造微电子装置中使用的半导体处理系统的组件。 为了有效地除去残留物,将组分与气相反应性材料接触足够的时间和足够的条件以至少部分地除去残余物。 当残留物和构成组分的材料不同时,气相反应性材料与残余物选择性反应,并与构成离子注入机的组分的材料具有最低的反应性。 当残留物和构成组分的材料相同时,气相反应性材料可以与残留物和组分部分反应。 使用的特别优选的气相反应性材料包括气态化合物如XeF 2,XeF 4,XeF 6,NF 3,IF 5,IF 7,SF 6,C 2 F 6,F 2,CF 4,KrF 2,Cl 2,HCl,ClF 3,ClO 2,N 2 F 4,N 2 F 2,N 3 F, ,NH2F,HOBr,Br2,C3F8,C4F8,C5F8,CHF3,CH2F2,CH3F,COF2,HF,C2HF5,C2H2F4,C2H3F3,C2H4F2,C2H5F,C3F6和有机氯化物,如COCl2,CCl4,CHCl3,CH2Cl2和CH3Cl。

    INFRARED GAS DETECTION SYSTEMS AND METHODS
    2.
    发明申请
    INFRARED GAS DETECTION SYSTEMS AND METHODS 审中-公开
    红外检测系统和方法

    公开(公告)号:US20080006775A1

    公开(公告)日:2008-01-10

    申请号:US11767382

    申请日:2007-06-22

    IPC分类号: G01N21/00

    摘要: Thermopile-based detection and monitoring/control systems are described, in applications such as inferring concentration of a multicomponent gas by sensing a tracer gas therein, utilizing fiber optic cables to provide multiple sensing paths in a cell, utilizing a modulated IR source switched in on/off cycles, verifying chemical reagent identities, and sensing of effluent following discharge from a contamination removal 8 element or cold trap. A thermopile infrared (TPIR) detector of highly compact character is described for such applications, and permits monitoring of species that may be problematic or otherwise deleterious in such environments. In one implementation, light source modulation and signal processing techniques are employed to improve signal to noise ratio and minimize calibration and complexity of the TPIR detector.

    摘要翻译: 在基于热电堆检测和监测/控制系统的应用中,例如通过在其中感测示踪气体来推断多组分气体的浓度,利用光纤缆线在单元中提供多个感测路径,利用开启的调制IR源 /关闭循环,验证化学试剂标识,以及从排除污染物8元素或冷阱排出后的污染物检测。 对于这种应用描述了具有高度紧密特性的热电堆红外(TPIR)检测器,并且允许监视在这种环境中可能是有问题或其它有害的物种。 在一个实施方案中,采用光源调制和信号处理技术来提高信噪比并最小化TPIR检测器的校准和复杂性。

    MONITORING SYSTEM COMPRISING INFRARED THERMOPILE DETECTOR
    3.
    发明申请
    MONITORING SYSTEM COMPRISING INFRARED THERMOPILE DETECTOR 有权
    包含红外热敏探测器的监测系统

    公开(公告)号:US20070200065A1

    公开(公告)日:2007-08-30

    申请号:US11555094

    申请日:2006-10-31

    申请人: Jose Arno

    发明人: Jose Arno

    IPC分类号: G01J5/02

    摘要: The present invention relates to a semiconductor processing system that employs infrared-based thermopile detector for process control, by analyzing a material of interest, based on absorption of infrared light at a characteristic wavelength by such material. Specifically, an infrared light beam is transmitted through a linear transmission path from an infrared light source through a sampling region containing material of interest into the thermopile detector. The linear transmission path reduces the risk of signal loss during transmission of the infrared light. The transmission path of the infrared light may comprise a highly smooth and reflective inner surface for minimizing such signal loss during transmission.

    摘要翻译: 本发明涉及一种采用基于红外线热电堆检测器进行过程控制的半导体处理系统,通过利用这种材料对特征波长的红外光的吸收来分析感兴趣的材料。 具体地说,将红外光束从红外光源通过包含感兴趣的材料的采样区域传送到热电堆检测器的线性传输路径。 线性传输路径降低了红外光传输期间信号丢失的风险。 红外光的传输路径可以包括高度平滑和反射的内表面,用于在传输期间最小化这种信号损失。

    Optical sensor system and method for detection of hydrides and acid gases
    4.
    发明申请
    Optical sensor system and method for detection of hydrides and acid gases 审中-公开
    光学传感器系统和检测氢化物和酸性气体的方法

    公开(公告)号:US20060012794A1

    公开(公告)日:2006-01-19

    申请号:US11230409

    申请日:2005-09-20

    申请人: Jose Arno

    发明人: Jose Arno

    IPC分类号: G01N21/00

    CPC分类号: G01N21/78

    摘要: A gas sensor for detection of hydride and/or acid gas species, featuring a color changing material that changes color in exposure to hydride and/or acid gas species, component(s) for impinging radiation on the color changing material for reflection therefrom, and component(s) for receiving reflected radiation from the color changing material and responsively generating an output upon a change of color of the color changing material indicative of a presence of hydride and/or acid gas species in gas contacting the color changing material. The gas sensor may be embodied in a compact and efficient probe assembly, utilizing optical fibers to transmit incident radiation to the color changing material and to transmit reflected radiation to a detector and signal processing circuitry.

    摘要翻译: 一种用于检测氢化物和/或酸性气体种类的气体传感器,其特征在于在暴露于氢化物和/或酸性气体物质时改变颜色的变色材料,用于将变色材料上的辐射照射的组分用于反射,以及 用于接收来自颜色变化材料的反射辐射的部件,并且响应于颜色变化材料的颜色变化而响应地产生指示在与变色材料接触的气体中存在氢化物和/或酸性气体物质的输出。 气体传感器可以体现在紧凑且有效的探针组件中,利用光纤将入射辐射传输到变色材料并将反射的辐射传输到检测器和信号处理电路。

    Photometrically modulated delivery of reagents
    5.
    发明申请
    Photometrically modulated delivery of reagents 有权
    光度调制递送试剂

    公开(公告)号:US20050246107A1

    公开(公告)日:2005-11-03

    申请号:US11157760

    申请日:2005-06-21

    申请人: Jose Arno

    发明人: Jose Arno

    CPC分类号: H01L22/20 G01N21/3504

    摘要: A process system adapted for processing of or with a material therein. The process system includes: a sampling region for the material; an infrared photometric monitor constructed and arranged to transmit infrared radiation through the sampling region and to responsively generate an output signal correlative of the material in the sampling region, based on its interaction with the infrared radiation; and process control means arranged to receive the output of the infrared photometric monitor and to responsively control one or more process conditions in and/or affecting the process system.

    摘要翻译: 一种适于处理其中或与其中的材料一起的过程系统。 处理系统包括:材料的采样区域; 红外测光监测器,其构造和布置成基于其与红外辐射的相互作用,将红外辐射透射通过采样区域并且响应地产生与采样区域中的材料相关的输出信号; 以及过程控制装置,其布置成接收红外测光监视器的输出并且响应地控制处理系统中的一个或多个处理条件和/或影响处理系统。

    FLUID STORAGE AND DISPENSING VESSELS HAVING COLORIMETRICALLY VERIFIABLE LEAK-TIGHTNESS, AND METHOD OF MAKING SAME
    7.
    发明申请
    FLUID STORAGE AND DISPENSING VESSELS HAVING COLORIMETRICALLY VERIFIABLE LEAK-TIGHTNESS, AND METHOD OF MAKING SAME 有权
    具有可彩色透明透明度的流体储存和分配容器及其制造方法

    公开(公告)号:US20070284379A1

    公开(公告)日:2007-12-13

    申请号:US11772157

    申请日:2007-06-30

    IPC分类号: B65D79/02 G01N21/78

    摘要: A fluid storage and dispensing vessel having associated therewith a colorimetric member that is effective to change color in exposure to leakage of a gas contained in the vessel. The colorimetric member may be constituted by a film, e.g., of a shrink-wrap character, that contains or is otherwise associated with a colorimetric agent undergoing color change in exposure to fluid leaking from the vessel. Such shrink-wrap film may be applied to a portion of the vessel susceptible to leakage, or alternatively to the entire vessel, so that the film is colorimetrically effective to indicate the occurrence of a leakage event by visually perceptible change of color.

    摘要翻译: 一种流体存储和分配容器,其具有与其相关联的比色构件,该比色构件在暴露于容纳在容器中的气体的泄漏时有效地改变颜色。 比色构件可以由例如收缩包装性质的膜构成,其包含或以其它方式与在暴露于从容器泄漏的流体的颜色变化中的比色剂相关联。 这种收缩包装膜可以施加到易于泄漏的容器的一部分上,或者替代整个容器,使得该膜通过视觉上可察觉的颜色变化来指示泄漏事件的发生是比色的。

    Controlled flow of source material via droplet evaporation
    9.
    发明申请
    Controlled flow of source material via droplet evaporation 审中-公开
    通过液滴蒸发控制源材料的流动

    公开(公告)号:US20060144332A1

    公开(公告)日:2006-07-06

    申请号:US11028743

    申请日:2005-01-04

    IPC分类号: C23C16/00

    CPC分类号: C23C14/48 C23C16/4486

    摘要: A system for delivering a controlled and stable flow of vaporizable source material for use in semiconductor manufacturing applications. The system includes a droplet generator, which includes a plurality of nozzles and a pressure producing means. When sufficient pressure is applied to a liquefied or liquefiable source material, droplets of the source material are generated and ejected from the nozzles into a downstream processing tool or source/vaporization chamber. The pressure is applied either through the use of a heating element or an electromechanical transducer.

    摘要翻译: 一种用于提供受控且稳定的可蒸发源材料流的系统,用于半导体制造应用。 该系统包括液滴发生器,其包括多个喷嘴和压力产生装置。 当对液化或可液化的源材料施加足够的压力时,产生源材料的液滴并从喷嘴喷射到下游处理工具或源/蒸发室中。 压力通过使用加热元件或机电换能器施加。