公开(公告)号：US08748932B2

公开(公告)日：2014-06-10

申请号：US13358145

申请日：2012-01-25

申请人： Jong Pil Jeong ,  Jung Hyun Hwang ,  Chong Cook Kim ,  Sung Jin Son

发明人： Jong Pil Jeong ,  Jung Hyun Hwang ,  Chong Cook Kim ,  Sung Jin Son

IPC分类号： H01L33/00

CPC分类号： H01L33/145 ,  H01L33/025 ,  H01L33/04 ,  H01L33/10 ,  H01L33/32 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2924/00014

摘要： Provided are a light emitting device, a method of fabricating the light emitting device, a light emitting device package, and a lighting system. The light emitting device comprises a first conductive type semiconductor layer, a light emitting layer over the first conductive type semiconductor layer, an electron blocking layer over the light emitting layer, and a second conductive type semiconductor layer over the electron blocking layer. The electron blocking layer comprises a pattern having a height difference.

摘要翻译： 提供了发光器件，制造发光器件的方法，发光器件封装和照明系统。 发光器件包括第一导电类型半导体层，第一导电类型半导体层上的发光层，发光层上的电子阻挡层，以及电子阻挡层上的第二导电类型半导体层。 电子阻挡层包括具有高度差的图案。

公开(公告)号：US20130168711A1

公开(公告)日：2013-07-04

申请号：US13732694

申请日：2013-01-02

申请人： Jeong Pil JEONG ,  Jung Hyun HWANG ,  Chong Cook KIM

发明人： Jeong Pil JEONG ,  Jung Hyun HWANG ,  Chong Cook KIM

IPC分类号： H01L33/32

CPC分类号： H01L33/32 ,  F21K9/232 ,  F21Y2115/10 ,  H01L33/04 ,  H01L33/20 ,  H01L33/382 ,  H01L33/42 ,  H01L33/44 ,  H01L2224/48091 ,  H01L2924/0002 ,  H01L2924/00014 ,  H01L2924/00

摘要： Disclosed are a light emitting device, a method of manufacturing the same, a light emitting device package, and a lighting system. The light emitting device includes: a substrate; a first conductive semiconductor layer on the substrate; an active layer on the first conductive semiconductor layer; a second conductive semiconductor layer; and a nitride semiconductor layer having a refractive index less than a refractive index of the second conductive semiconductor layer on the second conductive semiconductor layer.

摘要翻译： 公开了一种发光器件，其制造方法，发光器件封装和照明系统。 发光装置包括：基板; 在所述基板上的第一导电半导体层; 在第一导电半导体层上的有源层; 第二导电半导体层; 以及氮化物半导体层，其折射率小于第二导电半导体层上的第二导电半导体层的折射率。

公开(公告)号：US08295994B2

公开(公告)日：2012-10-23

申请号：US12567363

申请日：2009-09-25

申请人： Jung-Hyun Hwang ,  Jung-Hak Ryu ,  Jin-Seok Choi

发明人： Jung-Hyun Hwang ,  Jung-Hak Ryu ,  Jin-Seok Choi

IPC分类号： G05D1/00

CPC分类号： G07C5/008 ,  G07C5/0816

摘要： A vehicle, vehicle control apparatus and method of a telematics terminal are disclosed to allow a user to quickly determine and cope with a vehicle event. The vehicle control method includes: when an event informing about a vehicle event occurs, transmitting notification information corresponding to the event and/or control information previously determined for processing the event to a mobile communication terminal via a wireless communication network; and when user request information with respect to the control information is received from the mobile communication terminal, controlling a vehicle according to the received user request information.

摘要翻译： 公开了一种远程信息处理终端的车辆，车辆控制装置和方法，以允许用户快速地确定和处理车辆事件。 车辆控制方法包括：当发生通知车辆事件的事件时，经由无线通信网络向移动通信终端发送对应于事件和/或先前确定的用于处理事件的控制信息的通知信息; 并且当从移动通信终端接收到关于控制信息的用户请求信息时，根据接收到的用户请求信息控制车辆。

公开(公告)号：US07497963B2

公开(公告)日：2009-03-03

申请号：US11032393

申请日：2005-01-10

申请人： Kwang-Myung Lee ,  Ki-Young Yun ,  Seung-Ki Chae ,  No-Hyun Huh ,  Wan-Goo Hwang ,  Jung-Hyun Hwang ,  Shinji Yanagisawa ,  Kengo Tsutsumi ,  Seiichi Takahashi

发明人： Kwang-Myung Lee ,  Ki-Young Yun ,  Seung-Ki Chae ,  No-Hyun Huh ,  Wan-Goo Hwang ,  Jung-Hyun Hwang ,  Shinji Yanagisawa ,  Kengo Tsutsumi ,  Seiichi Takahashi

IPC分类号： B44C1/22

CPC分类号： H01L21/67063 ,  H01L21/31116

摘要： In this etching method, since an etching gas is introduced before introduction of free radicals into a processing chamber, the etching gas has been adsorbed on the surface of substrates when the free radicals are introduced. Accordingly, the free radicals react with the etching gas adsorbed on the surface of the substrates, and the reaction proceeds uniformly on the surface of the substrate. As a result, nonuniform etching does not occur on the surface of the substrate. Moreover, since the reaction between the etching gas and the free radicals occurs on the surface of the substrate, an intermediate product produced according to the reaction between the etching gas and the free radicals reacts with an etching object promptly. Therefore, the intermediate product is not exhausted from the processing chamber 12 excessively, and hence the etching efficiency is high. As a result, according to this etching method, not only the in-plane distribution of the etching amount becomes more uniform, but also the etching rate is increased more than in the conventional etching method.

摘要翻译： 在该蚀刻方法中，由于在将自由基引入处理室之前引入蚀刻气体，当引入自由基时，蚀刻气体已被吸附在基板的表面上。 因此，自由基与吸附在基板表面的蚀刻气体反应，反应在基板表面上均匀地进行。 结果，在基板的表面上不会发生不均匀的蚀刻。 此外，由于蚀刻气体和自由基之间的反应发生在基板的表面上，所以根据蚀刻气体和自由基之间的反应产生的中间产物迅速与蚀刻对象反应。 因此，中间产品没有过度地从处理室12中排出，因此蚀刻效率高。 结果，根据该蚀刻方法，不仅蚀刻量的面内分布变得更均匀，而且比常规蚀刻方法更多地提高蚀刻速率。

公开(公告)号：US06922209B1

公开(公告)日：2005-07-26

申请号：US09273643

申请日：1999-03-23

申请人： Jung-Hyun Hwang ,  Woon Na

发明人： Jung-Hyun Hwang ,  Woon Na

IPC分类号： H04N5/235 ,  G06K9/00 ,  H04N1/40

CPC分类号： H04N5/235

摘要： An imaging apparatus and method provides a wide dynamic range and is capable of displaying an improved color in low-luminance regions, and an image signal processing method thereof. In the imaging apparatus, a first process divides the voltage level of an analog image signal into a plurality of sections and amplifies the analog image signal with a plurality of different gains according to each section, and a second process converts the analog image signal amplified with the different gains into a digital signal, and non-linearly gamma-corrects the digital signal according to each section. The plurality of different gains may be inversely proportional to the luminance level of the analog image signal. Thus, the level of an analog signal in a low-luminance region is amplified with a gain greater than in a high-luminance region before gamma correction, so that signal-to-noise (S/N) ratio in the low-luminance region of an image is increased, thereby improving sensitivity of the image following gamma correction. Accordingly, a wide dynamic range is provided. An optional chrominance controller of the imaging apparatus controls chrominance gain of the digital signal and outputs the result, thereby displaying an improved color in low-luminance regions of the image.

摘要翻译： 成像装置和方法提供了宽的动态范围，并且能够在低亮度区域中显示改进的颜色，以及其图像信号处理方法。 在成像装置中，第一处理将模拟图像信号的电压电平分割为多个部分，并且根据每个部分以多个不同的增益放大模拟图像信号，并且第二处理将模拟图像信号放大 数字信号的不同增益，并根据每个部分非线性地对数字信号进行伽马校正。 多个不同的增益可以与模拟图像信号的亮度水平成反比。 因此，低亮度区域的模拟信号的电平以伽马校正之前的高亮度区域的增益增大，从而低亮度区域的信噪比（S / N） 增加了图像，从而提高了伽马校正后的图像的灵敏度。 因此，提供了宽的动态范围。 成像装置的可选色度控制器控制数字信号的色度增益并输出结果，从而在图像的低亮度区域中显示改进的颜色。

公开(公告)号：US20050153553A1

公开(公告)日：2005-07-14

申请号：US11032393

申请日：2005-01-10

申请人： Kwang-Myung Lee ,  Ki-Young Yun ,  Seung-Ki Chae ,  No-Hyun Huh ,  Wan-Goo Hwang ,  Jung-Hyun Hwang ,  Shinji Yanagisawa ,  Kengo Tsutsumi ,  Seiichi Takahashi

发明人： Kwang-Myung Lee ,  Ki-Young Yun ,  Seung-Ki Chae ,  No-Hyun Huh ,  Wan-Goo Hwang ,  Jung-Hyun Hwang ,  Shinji Yanagisawa ,  Kengo Tsutsumi ,  Seiichi Takahashi

IPC分类号： H01L21/3065 ,  H01L21/00 ,  H01L21/302 ,  H01L21/311 ,  H01L21/461 ,  H01L21/768 ,  H01L23/522

CPC分类号： H01L21/67063 ,  H01L21/31116

摘要： In this etching method, since an etching gas is introduced before introduction of free radicals into a processing chamber, the etching gas has been adsorbed on the surface of substrates when the free radicals are introduced. Accordingly, the free radicals react with the etching gas adsorbed on the surface of the substrates, and the reaction proceeds uniformly on the surface of the substrate. As a result, nonuniform etching does not occur on the surface of the substrate. Moreover, since the reaction between the etching gas and the free radicals occurs on the surface of the substrate, an intermediate product produced according to the reaction between the etching gas and the free radicals reacts with an etching object promptly. Therefore, the intermediate product is not exhausted from the processing chamber 12 excessively, and hence the etching efficiency is high. As a result, according to this etching method, not only the in-plane distribution of the etching amount becomes more uniform, but also the etching rate is increased more than in the conventional etching method.

摘要翻译： 在该蚀刻方法中，由于在将自由基引入处理室之前引入蚀刻气体，当引入自由基时，蚀刻气体已被吸附在基板的表面上。 因此，自由基与吸附在基板表面的蚀刻气体反应，反应在基板表面上均匀地进行。 结果，在基板的表面上不会发生不均匀的蚀刻。 此外，由于蚀刻气体和自由基之间的反应发生在基板的表面上，所以根据蚀刻气体和自由基之间的反应产生的中间产物迅速与蚀刻对象反应。 因此，中间产品没有过度地从处理室12中排出，因此蚀刻效率高。 结果，根据该蚀刻方法，不仅蚀刻量的面内分布变得更均匀，而且比常规蚀刻方法更多地提高蚀刻速率。

公开(公告)号：US06351285B1

公开(公告)日：2002-02-26

申请号：US08917702

申请日：1997-08-26

申请人： Jung Hyun Hwang ,  Chul Ho Lee

发明人： Jung Hyun Hwang ,  Chul Ho Lee

IPC分类号： H04N5225

CPC分类号： H04N5/23258 ,  H04N5/23248 ,  H04N5/23267

摘要： A motion correction device for images recorded by a camcorder from incident light having an incident direction. The device comprises at least one of horizontal and vertical component pick-ups. Each component pick-up comprises a converter for converting light into electrical signals, and a thin transmitter-reflector for transmitting a portion of the incident light at substantially the incident direction and for reflecting a remaining portion of the incident light at a range of other directions such that substantially all the reflected light impinges on the converter. The thin transmitter-reflector may be a curved transmission mirror for focusing the reflected light on the converter or a flat transmitter-reflector with a condenser disposed between the thin transmitter-reflector and the converter for focusing the reflected light onto the converter.

摘要翻译： 一种用于摄像机从具有入射方向的入射光记录的图像的运动校正装置。 该装置包括水平和垂直部件拾取器中的至少一个。 每个组件拾取器包括用于将光转换成电信号的转换器，以及用于在大致入射方向上传输入射光的一部分的薄发射器 - 反射器，并用于将入射光的剩余部分反射在其它方向 使得基本上所有的反射光都照射在转换器上。 薄发射器 - 反射器可以是用于将反射光聚焦在转换器上的弯曲透射镜，或者具有设置在薄发射器 - 反射器和转换器之间的聚光器的平坦发射器 - 反射器，用于将反射光聚焦到转换器上。

公开(公告)号：US5832101A

公开(公告)日：1998-11-03

申请号：US712608

申请日：1996-09-13

申请人： Jung-Hyun Hwang ,  Yong-Cheol Park

发明人： Jung-Hyun Hwang ,  Yong-Cheol Park

IPC分类号： H04N5/208 ,  G06K9/00 ,  H03M7/36 ,  H04N5/232 ,  H04N19/20 ,  H04N19/423 ,  H04N19/426 ,  H04N19/50 ,  H04N19/543 ,  H04N19/57 ,  H04N19/80

CPC分类号： H04N19/14 ,  H04N19/43 ,  H04N5/144 ,  H04N5/23254

摘要： A device and method for detecting a motion vector of an image. The device comprises a horizontal edge extractor, a one-line accumulator, a delay register, a vertical line memory, a sign decision memory, a vertical correlation arithmetic unit, a horizontal edge extractor, a first horizontal line memory, a second horizontal line memory, a comparator, and a horizontal correlation arithmetic unit. Directional edges are used to enhance the accuracy of a motion vector. Since correlation values are calculated as soon as a scan is completed for a field image, it is possible to detect a motion vector at high speed. The device realizes a simple circuit by economizing memory.

摘要翻译： 一种用于检测图像的运动矢量的装置和方法。 该装置包括水平边缘提取器，单行累加器，延迟寄存器，垂直行存储器，符号判定存储器，垂直相关运算单元，水平边缘提取器，第一水平行存储器，第二水平行存储器 ，比较器和水平相关运算单元。 方向边用于提高运动矢量的精度。 由于一旦对于场图像的扫描完成，就计算相关值，所以可以高速检测运动矢量。 该器件通过节省内存实现简单的电路。

公开(公告)号：US08748867B2

公开(公告)日：2014-06-10

申请号：US13359064

申请日：2012-01-26

申请人： Jong Pil Jeong ,  Jung Hyun Hwang ,  Sang Hyun Lee ,  Se Hwan Sim ,  Sung Yi Jung

发明人： Jong Pil Jeong ,  Jung Hyun Hwang ,  Sang Hyun Lee ,  Se Hwan Sim ,  Sung Yi Jung

IPC分类号： H01L29/06

CPC分类号： H01L33/12 ,  H01L33/04 ,  H01L33/32 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2924/00014

摘要： Provided are a light emitting device, a method of fabricating the light emitting device, a light emitting device package, and a lighting system. The light emitting device comprises a substrate, a first semiconductor layer containing indium (In) over the substrate, and a light emitting structure over the first semiconductor layer. A dislocation mode is disposed on a top surface of the first semiconductor layer.

摘要翻译： 提供了发光器件，制造发光器件的方法，发光器件封装和照明系统。 发光器件包括衬底，在衬底上包含铟（In）的第一半导体层和在第一半导体层上的发光结构。 位错模式设置在第一半导体层的顶表面上。

公开(公告)号：US20120187365A1

公开(公告)日：2012-07-26

申请号：US13358145

申请日：2012-01-25

申请人： Jong Pil JEONG ,  Jung Hyun HWANG ,  Chong Cook KIM ,  Sung Jin SON

发明人： Jong Pil JEONG ,  Jung Hyun HWANG ,  Chong Cook KIM ,  Sung Jin SON

IPC分类号： H01L33/04

CPC分类号： H01L33/145 ,  H01L33/025 ,  H01L33/04 ,  H01L33/10 ,  H01L33/32 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2924/00014

摘要： Provided are a light emitting device, a method of fabricating the light emitting device, a light emitting device package, and a lighting system. The light emitting device comprises a first conductive type semiconductor layer, a light emitting layer over the first conductive type semiconductor layer, an electron blocking layer over the light emitting layer, and a second conductive type semiconductor layer over the electron blocking layer. The electron blocking layer comprises a pattern having a height difference.

摘要翻译： 提供了发光器件，制造发光器件的方法，发光器件封装和照明系统。 发光器件包括第一导电类型半导体层，第一导电类型半导体层上的发光层，发光层上的电子阻挡层，以及电子阻挡层上的第二导电类型半导体层。 电子阻挡层包括具有高度差的图案。