摘要:
A power assist robot apparatus is disclosed which is capable of assisting heavy-object lifting action and walking movement with fewer driving sources, and a method is disclosed for controlling the power assist robot apparatus. Two power-assist electric motors are located near opposite lateral sides in a right-left direction of the wearer's waist, respectively. Each lower-limb assist arm has one end fixed to a rotary shaft of the power-assist electric motor and the other end to which a lateral side of the thigh is attached. An upper-body assist arm placed at the wearer's chest and a main frame that holds the two power-assist electric motors at both ends thereof and is placed at the wearer's waist are connected by a driven rotary shaft which is rotatable about a vertical axis and a driven rotary shaft which is rotatable about a right-left axis.
摘要:
A power assist robot apparatus is disclosed which is capable of assisting heavy-object lifting action and walking movement with fewer driving sources, and a method is disclosed for controlling the power assist robot apparatus. Two power-assist electric motors are located near opposite lateral sides in a right-left direction of the wearer's waist, respectively. Each lower-limb assist arm has one end fixed to a rotary shaft of the power-assist electric motor and the other end to which a lateral side of the thigh is attached. An upper-body assist arm placed at the wearer's chest and a main frame that holds the two power-assist electric motors at both ends thereof and is placed at the wearer's waist are connected by a driven rotary shaft which is rotatable about a vertical axis and a driven rotary shaft which is rotatable about a right-left axis.
摘要:
A plane diffraction grating based on surface normal rotation according to the present invention is designed so that the profile of the grooves at a radial area is determined depending on a rotational position of the area about a rotational center defined as a foot of the rotational axis on the surface of the plane diffraction grating. An optical system such as a spectrometer or a monochromator according to the present invention uses such a plane diffraction grating, and requires a special arrangement. The optical system includes: a plane diffraction grating as described above; a mechanism for rotating the plane diffraction grating about the rotational axis; an incidence optical system for casting a converging beam of light on a point of the surface of the plane diffraction grating, where the point is set apart from the rotational center. As the diffraction grating is rotated about the rotational center, the point on which the incident converging beam of light is cast rotates about the rotation center, where the diffracting condition is optimized anywhere around the rotational center or for any scanning wavelength. The surface of the plane diffraction grating can be covered with a multiple-layer coating to improve diffraction efficiency. When such a multiple-layer is coated, the unit thickness of the multiple-layer coating at an area is also determined depending on the rotational position of the area about the rotational center.
摘要:
A projection exposure apparatus for transferring, by projection exposure, a pattern of a first object onto a second object while scanning the first and second objects in synchronism with each other. The apparatus includes an illumination optical system having (i) a secondary light source forming device for forming a secondary light source and (ii) a slit disposed with a space from the first object and from a plane conjugate thereto. The illumination optical system is operable to illuminate the first object with light supplied from a light source of a pulse light emission type and having a slit-like irradiation region defined through the slit on a light path of the illumination optical system. The slit-like irradiation region on the first object has a light intensity distribution of a trapezoidal shape with respect to the scan direction. The apparatus further includes a projection optical system for projecting the pattern of the first object onto the second object and a control device for controlling an exposure parameter in accordance with a contour of a slant of the trapezoidal shape of the light intensity distribution. The exposure parameter is one of d, f, F and V, where d is an optical distance from the slit to the first object or the conjugate plane thereof, f is a focal length of an optical member disposed between the secondary light source and the slit, F is a pulse emission frequency of the light source, and V is a scan speed of the first object in the scan exposure.
摘要:
An apparatus for measuring shapes, comprises a scanner, having a plurality of arms for holding an object the shape of which is to be measured, and a turntable to which one end of each of the arms is fixed; and a device for forming a silhouette image of the object including a first optical system which has an optical axis parallel to a rotating axis of the turntable and which has a light source and a light receiving unit confronting each other to allow the object to be in between the light source and the light receiving unit of the first optical system, and a second optical system which has another optical axis substantially at a right angle to the rotating axis of the turntable and which has another light source and another light receiving unit confronting each other to allow the object to be in between the light source and the light receiving unit of the second optical system. A calculating device calculates a shape of the object, based on electric signals converted from an intensity pattern of light which has been formed by the device for forming a silhouette image of the object.
摘要:
A projection exposure apparatus for transferring, by projection exposure, a pattern of a first object onto a second object while scanning the first and second objects in synchronism with each other, includes an illumination optical system having a secondary light source forming system for forming a secondary light source and a slit disposed with a space from the first object or a plane conjugate thereto, the illumination optical system being operable to illuminate the first object with light supplied from a light source of a pulse light emission type aid having a slit-like irradiation region defined through the slit on a light path of the illumination optical system, a projection optical system for projecting the pattern of the first object onto the second object, and a control system for controlling an exposure parameter so that an integrated exposure intensity upon the first object and in the scan direction in accordance with a change in size of the secondary light source.
摘要:
The colorimetric value at a specified temperature is determined by measuring the colorimetric value of a colored material sample at an arbitrary temperature using a color meter such as a spectrophotometer, colorimeter, or densitometer, and by correcting the measured colorimetric value on the basis of the change in colorimetric value with temperature, which change in colorimetric value is computed from the difference in colorimetric values observed for a single colored material sample at a minimum of two different temperatures. When a spectrophotometer is applied, the spectral reflectance or the spectral transmittance of the colored material sample is measured. On the other hand, spectral reflectance or spectral transmittance is measured in advance for a dye or pigment at a minimum of two different temperatures. The difference (.DELTA.K) of absorption coefficient (K), the difference (.DELTA.S) in the scattering coefficient (S), and the difference (.DELTA.D) in absorbance (D) at each wavelength are computed from the preliminarily observed spectral reflectance or spectral transmittance. The spectral transmittance or spectral reflectance observed at an arbitrary temperature is corrected to define the colorimetric value at a specified temperature using the obtained values of K, S, and D.
摘要:
The present invention discloses diffraction gratings which do not generate any thermal strain and can perform extremely high-precision and high-efficiency diffraction nearly free from scattered beams. The diffraction gratings are built by allowing the chemically deposited film of silicon carbide whose crystal planes are strongly oriented to the (220) planes in terms of Miller indices to form on the substrate comprising sintered silicon carbide, polishing the surface of the deposited film to 5 .ANG. RMS or less, and directly etched laminar-type grating grooves on that surface by using ion-beam etching.
摘要:
A metal is attached on a passage-forming core by electrocasting to provide a primary metal layer. A plurality of grooves are formed on the primary metal layer and are filled with filler of low melting point. A metal is attached on the primary metal layer by electrocasting to provide a secondary metal layer. Openings are formed on the secondary metal layer adjacent to its opposite ends so as to communicate with the grooves. The filler in the grooves is melted to provide a plurality of coolant passages. The openings are filled with manifold-forming cores made of filler with low melting point. A metal is attached on the manifold-forming cores by electrocasting to provide tertiary metal layers. Through holes are formed on the tertiary metal layers. The passage-forming core is dissolved and the manifold-forming cores are melted to provide a gas passage and manifolds.
摘要:
Under the conditions that there are 2 or more samples produced in a CCM toning or visual toning process by which colors are adapted to the target color and respective components such as a coloring agent defining the sample color are registered in a CCM system, the reproducibility of the samples is evaluated based on the difference ΔR−n (n denotes a sample number) between spectral reflectance RST−n obtained by actually measuring the respective samples and spectral reflectance RPR−n obtained by the CCM simulation corresponding to the coloring agent recipe for the sample color at the same n, and determination whether toning work should be continued or not is rapidly and simply performed. On the other hand, when an abnormal sample is perceived, the difference ΔR′−b of the sample obtained from the specified equations is determined and, by comparison of the difference between the target color and a color of a toning sample in the color matching process, components such as a coloring agent mixed into the abnormal sample is presumed and its mixed amount is presumed.