公开(公告)号：US5022961A

公开(公告)日：1991-06-11

申请号：US557550

申请日：1990-07-24

申请人： Akira Izumi ,  Keiji Toei ,  Nobuatsu Watanabe ,  Yong-Bo Chong

发明人： Akira Izumi ,  Keiji Toei ,  Nobuatsu Watanabe ,  Yong-Bo Chong

IPC分类号： C04B41/53 ,  H01L21/306 ,  H01L21/311

CPC分类号： H01L21/02049 ,  C04B41/5346 ,  H01L21/31116 ,  Y10S438/906

摘要： A method for removing a film on a silicon layer formed on a surface of a substrate includes the steps of: (a) placing a substrate in a reaction chamber to be isolated hermetically from the outside air, and (b) feeding anhydrous hydrogen fluoride and alcohol simultaneously into the reaction chamber. Preferably, the method further includes the step of feeding only alcohol into the reaction chamber prior to and/or subsequent to the step (b). An alcohol layer is formed on the substrate surface, whereby the film can be removed uniformly by anhydrous hydrogen fluoride. A by-product of the reaction is taken out from the system of reaction by means of the alcohol on the substrate. No by-product remains on the substrate after the reaction. Since the silicon layer after the reaction is covered with alcohol, re-growth of a native oxide film thereon is also suppressed and on ionic contamination such as fluorine remains on the substrate surface.

摘要翻译： 一种除去形成在基板表面上的硅层上的膜的方法，包括以下步骤：（a）将基板放置在反应室内，与外部空气密封隔离，（b）供给无水氟化氢和 酒精同时进入反应室。 优选地，该方法还包括在步骤（b）之前和/或之后仅将醇进料到反应室中的步骤。 在基板表面上形成醇层，由此可以通过无水氟化氢均匀地除去膜。 反应的副产物通过基体上的醇从反应体系中取出。 反应后基板上不会残留副产物。 由于反应后的硅层被醇覆盖，其上的自然氧化膜的再生长也被抑制，并且离子污染如氟残留在基材表面上。

公开(公告)号：US4599295A

公开(公告)日：1986-07-08

申请号：US532105

申请日：1983-09-14

申请人： Syuzi Kondo ,  Akira Yamano ,  Keiji Toei

发明人： Syuzi Kondo ,  Akira Yamano ,  Keiji Toei

IPC分类号： G03F7/26 ,  G03F3/10 ,  G03F7/095 ,  G03C1/46 ,  G03C1/52 ,  G03C1/71

CPC分类号： G03F7/0952 ,  G03F3/10

摘要： Disclosed is a photosensitive material which has a first photosensitive layer formed on a support body such as an aluminum plate, a peel-off layer thereon and a second photosensitive layer formed on the peel-off layer in such a manner that the second layer can be photographically exposed to light and photographically developed independently from the first photosensitive layer and the first photosensitive layer may be subsequently photographically exposed with the picture image formed on the second photosensitive layer acting as a photographic mask. After the first photosensitive layer has been photographically developed, the two photosensitive layers may be used for different purposes, for instance, using the first photosensitive layer as a printing plate and the second photosensitive layer as a photographic film for making duplicate printing plates. Since the first photosensitive layer may be photographically exposed with uncontrolled light while the second photosensitive layer may be photographically exposed with a laser beam of small intensity, this photosensitive material is highly useful for use on a scanning image processing device. Also, a method of conveniently utilizing the photosensitive material is additionally disclosed.

摘要翻译： 公开了一种感光材料，其具有形成在诸如铝板的支撑体上的第一感光层，其上的剥离层和形成在剥离层上的第二感光层，使得第二层可以 照相曝光和照相显影独立于第一感光层，第一感光层可随后用作为照相掩模的第二感光层上形成的图像照相曝光。 在照相显影第一感光层之后，两个感光层可以用于不同的目的，例如，使用第一感光层作为印版，第二感光层作为用于制造重复印版的照相胶片。 由于第一感光层可以用不受控制的光照相曝光，而第二感光层可以用强度较小的激光束照相曝光，所以该感光材料对于在扫描图像处理装置上使用是非常有用的。 此外，还公开了方便地利用感光材料的方法。

公开(公告)号：US5200025A

公开(公告)日：1993-04-06

申请号：US762587

申请日：1991-09-19

申请人： Keiji Toei ,  Yasuyoshi Miyaji ,  Masanobu Sato ,  Akihiro Inagaki ,  Seiji Tonogai ,  Koichi Omoto

发明人： Keiji Toei ,  Yasuyoshi Miyaji ,  Masanobu Sato ,  Akihiro Inagaki ,  Seiji Tonogai ,  Koichi Omoto

IPC分类号： C23F1/02 ,  C23F1/04 ,  H01J9/14 ,  H01L21/68

CPC分类号： H01L21/6835 ,  C23F1/02 ,  C23F1/04 ,  H01J9/142 ,  H01L2221/68377

摘要： A method of forming small through-holes in a thin metal layer including the steps of forming resist films having openings formed in accordance with a predetermined pattern; etching one or both sides of the thin metal plate and stopping etching before through-holes are formed; removing the overhang of the resist film by spraying high pressure fluid onto the etched side of the thin metal plate; covering the surface by an etch-resisting layer; forming through-holes by etching the side not covered; and stripping the etch-resisting layer and the resist film.

公开(公告)号：US5112437A

公开(公告)日：1992-05-12

申请号：US658054

申请日：1991-02-20

申请人： Nobuatsu Watanabe ,  Yong-Bo Chong ,  Toshio Tatsuno ,  Tomoyoshi Okada ,  Akira Izumi ,  Keiji Toei

发明人： Nobuatsu Watanabe ,  Yong-Bo Chong ,  Toshio Tatsuno ,  Tomoyoshi Okada ,  Akira Izumi ,  Keiji Toei

IPC分类号： H01L21/302 ,  C03C15/00 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306

CPC分类号： H01L21/02049 ,  C03C15/00 ,  H01L21/6704

摘要： In oxide film removing equipment for removing a SiO.sub.2 film on a semiconductor substrate by using hydrogen fluoride, a liquid mixture of hydrogen fluoride and methyl alcohol is prepared in a chemical factory beforehand. The liquid mixture of hydrogen fluoride and methyl alcohol is heated to generate azeotropic vapor at a semiconductor works and the vapor is used to remove the SiO.sub.2 film on the substrate. The liquid mixture of hydrogen fluoride and methyl alcohol previously prepared in the chemical factory increases safety during an operation at the semiconductor works.

摘要翻译： 在通过使用氟化氢除去半导体基板上的SiO 2膜的氧化膜去除设备中，预先在化学工厂中制备氟化氢和甲醇的液体混合物。 加热氟化氢和甲醇的液体混合物以在半导体工艺下产生共沸蒸气，并且使用蒸气去除衬底上的SiO 2膜。 在化学工厂预先制备的氟化氢和甲醇的液体混合物在半导体工厂的操作过程中增加了安全性。

公开(公告)号：US4568627A

公开(公告)日：1986-02-04

申请号：US511331

申请日：1983-07-05

申请人： Tokujiro Ishida ,  Syuzi Kondo ,  Keiji Toei

发明人： Tokujiro Ishida ,  Syuzi Kondo ,  Keiji Toei

IPC分类号： G03C1/46 ,  G03F3/06 ,  G03F3/10 ,  G03F7/095 ,  G03C1/52

CPC分类号： G03F3/10 ,  G03F7/0952 ,  Y10S430/153

摘要： Disclosed is a chromatic proofreading film which may be conveniently used for the process of ascertaining the color quality in multi-color printing by overlaying color picture images produced from the corresponding color separated picture images. The chromatic proofreading film of this invention has two photosensitive layers, the outer one consisting of a silver halide photosensitive material and the inner one consisting of a non silver salt photosensitive material such as diazo or azide resin, and the inner photosensitive layer is divided into a plurality of regions dyed to different basic colors so that the chromatic proofreading film may be cut apart into a plurality of separate sheets which may be overlaid for the purpose of chromatic proofreading after the film is photographically developed.

摘要翻译： 公开了一种色彩校正膜，其可以方便地用于通过覆盖从相应的分色图像图像产生的彩色图像图像来确定多色打印中的颜色质量的过程。 本发明的色彩校正膜具有两个感光层，外部由卤化银感光材料和由非银盐感光材料如重氮或叠氮化物树脂组成的内部光敏材料组成，内部感光层分为 多个区域被染色成不同的基色，使得彩色校正膜可以被切割成多个单独的片，其可以在照相显影之后为了色彩校正而被重叠。