公开(公告)号：US07307262B2

公开(公告)日：2007-12-11

申请号：US11019524

申请日：2004-12-23

申请人： Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Robertus Johannes Marinus De Jongh ,  Jacob Kleijn ,  Bastiaan S H Jansen ,  Marc Van Der Wijst

发明人： Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Robertus Johannes Marinus De Jongh ,  Jacob Kleijn ,  Bastiaan S H Jansen ,  Marc Van Der Wijst

IPC分类号： G21G5/00

CPC分类号： G03F7/709 ,  G03F7/70266 ,  G03F7/70825

摘要： A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.

摘要翻译： 光刻设备包括包括可移动光学元件的投影系统。 可移动光学元件能够通过其位移来影响由投影系统投射的辐射束的位置量。 提供控制装置以驱动光学元件致动器来影响可移动光学元件的位置量，从而影响由投影系统投射的辐射束的位置量。 控制装置适于移动可移动光学元件以将投影系统相对于基板投射的辐射束定位，或者校正由任何类型的扰动引起的由投影系统投影的辐射束的位置量 在投影系统上。

公开(公告)号：US08908144B2

公开(公告)日：2014-12-09

申请号：US11527729

申请日：2006-09-27

申请人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans

发明人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/709 ,  G03F7/70833

摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

摘要翻译： 公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及构造成保持衬底的衬底台。 此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从 投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。

公开(公告)号：US20080074629A1

公开(公告)日：2008-03-27

申请号：US11527729

申请日：2006-09-27

申请人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Wijckmans

发明人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Wijckmans

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70833

摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

摘要翻译： 公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及被构造成保持衬底的衬底台。 此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从 投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。

公开(公告)号：US20120044471A1

公开(公告)日：2012-02-23

申请号：US13266565

申请日：2010-03-18

申请人： Bob Streefkerk ,  Robertus Johannes Marinus De Jongh

发明人： Bob Streefkerk ,  Robertus Johannes Marinus De Jongh

IPC分类号： G03B27/42

CPC分类号： G03F7/70333 ,  G03F7/70233 ,  G03F7/70266

摘要： A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system including a plurality of mirrors. The method includes the following steps. Using the projection system to project the patterned beam onto the substrate while moving a final mirror of the projection system in a direction substantially perpendicular to the surface of the substrate. Rotating the final mirror to substantially compensate for unwanted translation of the projected patterned radiation beam on the substrate due to the movement of the mirror.

摘要翻译： 使用具有包括多个反射镜的投影系统的EUV光刻设备将图案化光束投影到基板上的方法。 该方法包括以下步骤。 使用投影系统将图案化的光束投影到基板上，同时在基本上垂直于基板的表面的方向上移动投影系统的最终反射镜。 旋转最终的反射镜以基本上补偿由于反射镜的运动而导致的图案化辐射束在基板上的不期望的平移。

公开(公告)号：US08144310B2

公开(公告)日：2012-03-27

申请号：US12409919

申请日：2009-03-24

申请人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US20090262325A1

公开(公告)日：2009-10-22

申请号：US12409919

申请日：2009-03-24

申请人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etienne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etienne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58 ,  H05K7/02

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US09164401B2

公开(公告)日：2015-10-20

申请号：US13061792

申请日：2009-07-17

申请人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

发明人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/70825

摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

摘要翻译： 提供了一种投影系统（PS），在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架（200）上。 使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。 第二测量系统（920）用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常，框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

公开(公告)号：US09122173B2

公开(公告)日：2015-09-01

申请号：US13398890

申请日：2012-02-17

申请人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US06992752B2

公开(公告)日：2006-01-31

申请号：US10360989

申请日：2003-02-10

申请人： Robertus Johannes Marinus De Jongh

发明人： Robertus Johannes Marinus De Jongh

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03F9/00

CPC分类号： G03F7/70716 ,  G03F7/70725

摘要： In a lithographic projection apparatus, modified control of a moveable component within the apparatus is provided to improve control of the position and velocity of a point on the component that is set apart from the center of mass of the component. The force required to provide the center of mass of the component with the acceleration required for the point on the component is determined. The force in a given direction is corrected by an amount proportional to the product of the velocity of the point in an orthogonal direction and the angular velocity about an axis perpendicular to the two orthogonal directions.

公开(公告)号：US20110194088A1

公开(公告)日：2011-08-11

申请号：US13002840

申请日：2009-07-13

申请人： Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van der Wijst ,  Robertus Leonardus Tousain ,  Marco Hendrikus Hermanu Oude Nijhuis ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van der Wijst ,  Robertus Leonardus Tousain ,  Marco Hendrikus Hermanu Oude Nijhuis ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/54

CPC分类号： G03F7/70833 ,  G03F7/70258 ,  G03F7/70483

摘要： A projection system (PS) is provided that includes a sensor system (20) that measures at least one parameter that relates to the physical deformation of a frame (10) that supports the optical elements (11) within the projection system (PS), and a control system (30) that, based on the measurements from the sensor system (20), determines an expected deviation of the position of the beam of radiation projected by the projection system (PS) that is caused by the physical deformation of the frame (10).

摘要翻译： 提供了一种投影系统（PS），其包括测量与投影系统（PS）内的支撑光学元件（11）的框架（10）的物理变形有关的至少一个参数的传感器系统（20） 以及控制系统（30），其基于来自所述传感器系统（20）的测量，确定由所述投影系统（PS）投射的辐射束的位置对由所述投影系统（PS）的物理变形引起的预期偏差 框架（10）。