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公开(公告)号：US20060060799A1
公开(公告)日：2006-03-23
申请号：US11263012
申请日：2005-11-01
申请人： Dominicus Jacobus Franken , Erik Loopstra , Pertrus Bartray , Marc Van Der Wijst , Michael Jozefa Renkens , Gerard Van Schothorst , Johan Dries
发明人： Dominicus Jacobus Franken , Erik Loopstra , Pertrus Bartray , Marc Van Der Wijst , Michael Jozefa Renkens , Gerard Van Schothorst , Johan Dries
IPC分类号： G21K5/10
CPC分类号： G03F7/70833 , G03F7/709
摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
摘要翻译： 光刻设备包括安装在参考框架上的投影系统，投影系统又安装在支撑设备的基座上。 基座中的振动和位移误差通过两组隔离安装件在基座和参考框架之间以及参考框架和投影系统的投影框架之间进行过滤，因此减小了投影系统的干扰。
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公开(公告)号：US20050024611A1
公开(公告)日：2005-02-03
申请号：US10876786
申请日：2004-06-25
申请人： Pertrus Bartray , Wilhelmus Box , Dominicus Jacobus Franken , Bernardus Luttikhuis , Engelbertus Van Der Pasch , Marc Van Der Wijst , Marc Engels
发明人： Pertrus Bartray , Wilhelmus Box , Dominicus Jacobus Franken , Bernardus Luttikhuis , Engelbertus Van Der Pasch , Marc Van Der Wijst , Marc Engels
CPC分类号： G03F7/70716 , G03F7/70775
摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.
摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于将图案化的辐射束投影到基板的目标部分上的投影系统和用于确定图案形成装置相对于投影系统的空间位置的组件。 组件包括具有安装在投影系统上的多个传感器的测量单元。
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3.发明申请Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US20050018154A1
公开(公告)日：2005-01-27
申请号：US10844570
申请日：2004-05-13
申请人： Wilhelmus Box , Antonius Van Dijsseldonk , Dominicus Jacobus Franken , Martinus Leenders , Erik Loopstra , Josephus Smits , Marc Van Der Wijst
发明人： Wilhelmus Box , Antonius Van Dijsseldonk , Dominicus Jacobus Franken , Martinus Leenders , Erik Loopstra , Josephus Smits , Marc Van Der Wijst
CPC分类号： G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70858 , G03F7/70891 , G03F7/709 , G03F7/70991
摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.
摘要翻译： 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。
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公开(公告)号：US20060139585A1
公开(公告)日：2006-06-29
申请号：US11022936
申请日：2004-12-28
IPC分类号： G03B27/68
CPC分类号： G03F7/70266 , G03F7/70825
摘要： A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
摘要翻译： 公开了一种光刻设备，其具有可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过，并且具有被配置为透射基本上平行于投影系统的光轴的力的组合的可变形透镜致动器，以及 围绕可变形透镜元件上的多个子区域处于基本上垂直于光轴的轴线的局部扭矩。
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公开(公告)号：US20060110665A1
公开(公告)日：2006-05-25
申请号：US10994201
申请日：2004-11-22
CPC分类号： G03F7/709 , G03F7/70258 , G03F7/70308
摘要： A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.
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公开(公告)号：US20050134821A1
公开(公告)日：2005-06-23
申请号：US10968467
申请日：2004-10-20
IPC分类号： G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70825
摘要： A lithographic apparatus includes a projection optics assembly for projecting a patterned beam onto a target portion of a substrate. The projection optics assembly includes a first element having a predetermined functionality that is positioned with respect to a second element in a spaced relationship on a support frame. The support frame has an interface surface formed on or in the support frame for receiving the first element. The interface surface determines the position of the first element with respect to the second element, and is configured in accordance with the predetermined functionality so that the first element is positionable with respect to the second element with at least three degrees of freedom.
摘要翻译： 光刻设备包括用于将图案化的光束投影到基板的目标部分上的投影光学组件。 投影光学组件包括具有预定功能的第一元件，其相对于在支撑框架上以间隔开的关系相对于第二元件定位。 支撑框架具有形成在支撑框架上或其中的界面，用于接收第一元件。 界面表面确定第一元件相对于第二元件的位置，并且根据预定的功能来配置，使得第一元件可相对于具有至少三个自由度的第二元件定位。
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7.发明申请公开(公告)号：US20050140950A1
公开(公告)日：2005-06-30
申请号：US10932303
申请日：2004-09-02
IPC分类号： G02B7/00 , G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70258 , G02B7/008 , G03F7/70825 , G03F7/70891
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a thermal compensation deformation unit for compensating for a deformation of an element caused by a thermal load. The thermal compensation deformation unit includes at least one temperature sensor for sensing a temperature in at least one location on the element, and a processing unit for calculating the deformation of the element caused by the thermal load as a function of the temperature sensed at the location. The deformation is calculated using data from a computer-generated model of the element so that an appropriate correction for the deformation can be made or taken into account.
摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于支撑衬底的衬底支撑件，用于将图案化的辐射束投影到衬底的目标部分上的投影系统，以及 热补偿变形单元，用于补偿由热负荷引起的元件的变形。 热补偿变形单元包括至少一个温度传感器，用于感测元件上的至少一个位置的温度，以及处理单元，用于计算由热负荷引起的元件的变形作为在该位置处感测到的温度的函数 。 使用来自计算机生成的元件模型的数据计算变形，使得可以进行或考虑变形的适当校正。
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公开(公告)号：US20060119815A1
公开(公告)日：2006-06-08
申请号：US11005231
申请日：2004-12-07
申请人： Dominicus Jacobus Franken , Arno Bleeker , Wilhelmus Box , Martinus Hendricus Hoeks , Henricus Tegenbosch , Kars Troost , Lambertus Kessels
发明人： Dominicus Jacobus Franken , Arno Bleeker , Wilhelmus Box , Martinus Hendricus Hoeks , Henricus Tegenbosch , Kars Troost , Lambertus Kessels
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70291
摘要： A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.
摘要翻译： 使用系统和方法来补偿单独可控元件阵列的热输出。 这可以通过在不使用阵列投影光束来控制阵列的温度时将控制信号输入到阵列来完成。 可以提供加热元件以保持阵列的温度。 可以提供热储存器以保持阵列的温度或者可以提供冷却元件以在使用期间降低阵列的温度。
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