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公开(公告)号：US20110194306A1
公开(公告)日：2011-08-11
申请号：US13125979
申请日：2009-10-26
IPC分类号： F21V7/22
CPC分类号： G02B6/102 , G02B6/0031 , G02B6/004 , G02B6/0055
摘要： The invention relates to a light-emitting device (1) comprising: a light source (2) for emitting light of a first wavelength range; a light guide (3) having a light receiving surface (4) for receiving at least part of said light emitted by the light source (2), a front surface (31) and a rear surface (32), for guiding light of said first wavelength range by total internal reflection at said front surface and said rear surface; a plurality of outcoupling elements (5) for outcoupling light from the light guide such that at least part of the light that is outcoupled by the outcoupling elements exits the light guide through said rear surface; a reflective member (6) arranged in rear of said light guide to reflect light that is outcoupled from the light guide; and a wavelength converting member (8) comprising a wavelength converting material arranged outside the light guide to convert light of said first wavelength range to light of a second wavelength range. Advantageously, in the light-emitting device according to the invention, the color, color temperature and/or color rendering index may be tuned by modifying the wavelength converting member. As a result, white light which is perceived as warm may be obtained.
摘要翻译： 本发明涉及一种发光装置（1），包括：用于发射第一波长范围的光的光源（2）; 具有用于接收由光源（2）发射的所述光的至少一部分的光接收表面（4）的光导（3），前表面（31）和后表面（32），用于引导所述光源 在所述前表面和所述后表面处的全内反射的第一波长范围; 多个外耦合元件（5），用于将来自所述光导的光耦合出来，使得所述外耦合元件外耦合的至少一部分光通过所述后表面离开所述光导; 布置在所述光导的后部的反射构件（6），以反射从所述导光体输出的光; 以及波长转换构件（8），其包括布置在光导外部的波长转换材料，以将所述第一波长范围的光转换成第二波长范围的光。 有利地，在根据本发明的发光装置中，可以通过修改波长转换构件来调整颜色，色温和/或显色指数。 结果，可以获得感觉为温暖的白光。
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2.发明授权Method of forming a quadrupole device for projection lithography by means of charged particles 失效通过带电粒子形成用于投影光刻的四极装置的方法公开(公告)号：US06365903B2
公开(公告)日：2002-04-02
申请号：US09824620
申请日：2001-04-02
IPC分类号： H01J37153
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3175 , H01J2237/04928 , H01J2237/31788
摘要： According to a known projection lithography method an object is imaged on an imaging surface by means of a telescopic system of rotationally symmetrical electron lenses. The throughput during the production of integrated circuits by means of projection lithography is determined by the amount of current in the imaging electron beam; this current is limited by the resolution-limiting interaction of the electrons (Coulomb interaction). The invention allows for a larger beam current in that areas with a high current concentration are avoided. To this end, the imaging system includes five mutually perpendicular quadrupoles, so that the electrons are concentrated in line-shaped focal spots instead of a (small) circular cross-over. The system is telescopic and the imaging is stigmatic with equal magnifications in the x-z plane and the y-z plane.
摘要翻译： 根据已知的投影光刻方法，通过旋转对称电子透镜的伸缩系统将物体成像在成像表面上。 通过投影光刻生产集成电路期间的吞吐量由成像电子束中的电流量决定; 该电流受限于电子的分辨率限制相互作用（库仑相互作用）。 在避免具有高电流浓度的区域中，本发明允许较大的束流。 为此，成像系统包括五个相互垂直的四极，使得电子集中在线状焦点而不是（小）圆形交叉。 该系统是可伸缩的，成像在x-z平面和y-z平面上具有相同的放大倍数。
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3.发明授权公开(公告)号：US06236052B1
公开(公告)日：2001-05-22
申请号：US09392686
申请日：1999-09-09
IPC分类号： H01J37153
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3175 , H01J2237/04928 , H01J2237/31788
摘要： According to a known projection lithography method an object is imaged on an imaging surface by means of a telescopic system of rotationally symmetrical electron lenses. The throughput during the production of integrated circuits by means of projection lithography is determined by the amount of current in the imaging electron beam; this current is limited by the resolution-limiting interaction of the electrons (Coulomb interaction). The invention allows for a larger beam current in that areas with a high current concentration are avoided. To this end, the imaging system includes five mutually perpendicular quadrupoles, so that the electrons are concentrated in line-shaped focal spots instead of a (small) circular cross-over (18). The system is telescopic and the imaging is stigmatic with equal magnifications in the x-z plane and the y-z plane.
摘要翻译： 根据已知的投影光刻方法，通过旋转对称电子透镜的伸缩系统将物体成像在成像表面上。 通过投影光刻生产集成电路期间的吞吐量由成像电子束中的电流量决定; 该电流受限于电子的分辨率限制相互作用（库仑相互作用）。 在避免具有高电流浓度的区域中，本发明允许较大的束流。 为此，成像系统包括五个相互垂直的四极，使得电子集中在线状焦点而不是（小）圆形交叉（18）。 该系统是可伸缩的，成像在x-z平面和y-z平面上具有相同的放大倍数。
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公开(公告)号：US07798648B2
公开(公告)日：2010-09-21
申请号：US10596882
申请日：2005-01-06
IPC分类号： G03B21/00
CPC分类号： G02B27/283 , G02B27/2278 , H04N13/395
摘要： An optical path length adjuster enables electro-optical control of a physical path length between two optical elements, suitable for use in the adjustment of an optical path length within three dimensional display devices that generate a virtual image within a defined imaging volume. The adjuster varies an optical path length between an input optical path and an output optical path and includes: a first polarization switch for selecting a polarization state for an input beam on the input optical path; first and second beam splitters having at least two possible optical paths of different lengths therebetween, for passing the input beam along a selected one of said at least two possible optical paths according to the selected polarization state of the input beam and for providing an output beam of light, on said optical output path, that has traveled along the selected optical path.
摘要翻译： 光路长度调节器能够对两个光学元件之间的物理路径长度进行电光控制，适用于在限定的成像体积内产生虚像的三维显示装置内的光程长度的调整中使用。 调节器改变输入光路和输出光路之间的光程长度，包括：第一偏振开关，用于选择输入光路上的输入光束的偏振状态; 第一和第二分束器具有至少两个不同长度的可能的光路，用于根据所选择的输入光束的偏振态使所述输入光束沿所选择的所述至少两个可能的光路中的所选择的光路传播，并且用于提供输出光束 在所述光学输出路径上沿着所选择的光路行进的光。
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公开(公告)号：US07619604B2
公开(公告)日：2009-11-17
申请号：US10566548
申请日：2004-07-22
IPC分类号： G09G3/36
CPC分类号： H04N13/359 , H04N13/31
摘要： A display device comprises a backlight (6) and a light modulating layer (5) such as an LCD device. The backlight (6) can be controlled to operate as a single homogenous light source for producing 2D images or a series of narrow parallel light sources for producing 3D images. Preferably, the backlight (6) is an OLED device and the 2D/3D mode switching is achieved by selectively energising all or a subset of parallel control electrodes (11) of the OLED device.
摘要翻译： 显示装置包括背光（6）和诸如LCD装置的光调制层（5）。 可以控制背光（6）作为单个同质光源，以产生2D图像或一系列用于产生3D图像的窄平行光源。 优选地，背光（6）是OLED器件，并且通过选择性地激励OLED器件的并行控制电极（11）的全部或一个子集来实现2D / 3D模式切换。
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6.发明授权Correction device for correcting chromatic aberration in particle-optical apparatus 失效用于校正颗粒光学装置中的色差的校正装置
公开(公告)号：US5986269A
公开(公告)日：1999-11-16
申请号：US932981
申请日：1997-09-18
IPC分类号： H01J37/153 , H01J37/10 , H01J37/145
CPC分类号： H01J37/153 , H01J2237/1534
摘要： Particle-optical rotationally symmetrical lenses inevitably have chromatic aberration. This lens fault determines the limit of the resolution of known particle-optical apparatus at a comparatively low acceleration voltage (0.5 kV to 5 kV) of the particle beam. This lens fault cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to enhance the resolution of the particle-optical apparatus nevertheless, it has already been proposed to mitigate said lens fault by means of a Wien type corrector. Such a known configuration is provided with a number of electrical and magnetic multipoles. In order to achieve easier adjustment of the various multipole fields, the pole faces (30-i) governing the multipole fields according to the invention have a specific length L=(2.pi..sup.2 n.sup.2)/(K.sub.obj.sup.2 C.sub.c,obj), in which K.sub.obj is the strength of the focusing lens to be corrected and C.sub.c,obj is the coefficient of chromatic aberration of this lens.
摘要翻译： 颗粒光学旋转对称透镜不可避免地具有色差。 这种镜片故障在粒子束的相对低的加速电压（0.5kV至5kV）下确定了已知的粒子光学装置的分辨率的极限。 这种透镜故障不能通过旋转对称场的补偿来消除。 然而，为了提高粒子光学装置的分辨率，已经提出通过维恩型校正器来减轻所述透镜故障。 这种已知的配置设置有多个电和磁多极。 为了实现各种多极场的更容易的调整，根据本发明的控制多极场的极面（30-i）具有特定长度L =（2πnn2）/（Kobj2Cc，obj），其中Kobj是 要校正的聚焦透镜的强度和Cc，obj是该透镜的色差系数。
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公开(公告)号：US07876397B2
公开(公告)日：2011-01-25
申请号：US10573084
申请日：2004-09-23
IPC分类号： G02F1/1335
CPC分类号： G02B6/0038 , G02B6/0056
摘要： A backlight (5) for a 3D display device, the backlight (5) comprising a planar light guide (7) through which light is guided transversely by internal reflection. The light guide (7) is provided with a plurality of grooves (8), which are configured to direct light propagating within the light guide (7), out of a face (7f) of the light guide (7) so as to form a plurality of line light sources.
摘要翻译： 一种用于3D显示装置的背光（5），所述背光源（5）包括平面光导（7），光线通过所述平面光导（7）通过内部反射横向引导。 导光体（7）设置有多个凹槽（8），其构造成将在导光体（7）内传播的光引导出光导（7）的面（7f），从而形成 多条线光源。
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公开(公告)号：US06689626B2
公开(公告)日：2004-02-10
申请号：US09902221
申请日：2001-07-10
申请人： Marcellinus P. C. M. Krijn , Marinus J. J. Dona , Johannes M. M. Swinkels , Jeroen J. M. Vleggaar
发明人： Marcellinus P. C. M. Krijn , Marinus J. J. Dona , Johannes M. M. Swinkels , Jeroen J. M. Vleggaar
IPC分类号： H01L2100
CPC分类号： H01L51/52 , B32B17/10018 , B32B17/10055 , C03C17/32 , G02F1/133305 , G02F2001/133374
摘要： The invention relates to a substrate comprising a glass sheet (1) having a thickness which is smaller than or equal to 0.1 mm, the glass sheet (1) being provided with a layer of a synthetic resin material (2) having a thickness which is smaller than or equal to that of the glass sheet (1). This substrate proves to be flexible. In addition, the substrate cracks less easily, so that it can be processed more readily. The substrate may be used, for example, in light-emitting devices, such as a poly-LED or PALC.
摘要翻译： 本发明涉及一种包括厚度小于或等于0.1mm的玻璃板（1）的基板，所述玻璃板（1）设置有合成树脂材料层（2），所述合成树脂材料层的厚度为 小于或等于玻璃板（1）的厚度。 这种底物被证明是灵活的。 此外，基板不容易裂纹，从而可以更容易地加工。 衬底可以用于例如诸如多LED或PALC的发光器件中。
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公开(公告)号：US06281525B1
公开(公告)日：2001-08-28
申请号：US09351380
申请日：1999-07-13
申请人： Marcellinus P. C. M. Krijn , Marinus J. J. Dona , Johannes M. M. Swinkels , Jeroen J. M. Vleggaar
发明人： Marcellinus P. C. M. Krijn , Marinus J. J. Dona , Johannes M. M. Swinkels , Jeroen J. M. Vleggaar
IPC分类号： H01L3300
CPC分类号： H01L51/52 , B32B17/10018 , B32B17/10055 , C03C17/32 , G02F1/133305 , G02F2001/133374
摘要： The invention relates to a substrate comprising a glass sheet (1) having a thickness which is smaller than or equal to 0.1 mm, the glass sheet (1) being provided with a layer of a synthetic resin material (2) having a thickness which is smaller than or equal to that of the glass sheet (1). This substrate proves to be flexible. In addition, the substrate cracks less easily, so that it can be processed more readily. The substrate may be used, for example, in light-emitting devices, such as a poly-LED or PALC.
摘要翻译： 本发明涉及一种包括厚度小于或等于0.1mm的玻璃板（1）的基板，所述玻璃板（1）设置有合成树脂材料层（2），所述合成树脂材料层的厚度为 小于或等于玻璃板（1）的厚度。 这种底物被证明是灵活的。 此外，基板不容易裂纹，从而可以更容易地加工。基板可以用于例如多LED或PALC等发光装置。
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公开(公告)号：US5512773A
公开(公告)日：1996-04-30
申请号：US359375
申请日：1994-12-20
IPC分类号： G11C11/22 , G11C11/38 , H01L21/8246 , H01L21/8247 , H01L27/10 , H01L27/105 , H01L27/115 , H01L29/47 , H01L29/788 , H01L29/792 , H01L29/872 , H01L29/88 , H01L49/00 , H01L27/095
CPC分类号： H01L27/11502 , G11C11/22 , G11C11/38 , H01L29/872 , H01L29/88
摘要： A switching element is provided with two electrodes (1, 2) with a semiconducting dielectric (3) therebetween, one electrode (2) having a material which forms a Schottky contact with the semiconducting dielectric (3), while a space charge region (3') of the Schottky contact forms a tunnelling barrier for electrons during operation. It is desirable in many applications for the switching element to hold a certain switching state, such as open or closed, during a longer period. The switching element may then be used, for example, as a memory element. The dielectric (3) includes a ferroelectric material with a remanent polarization which influences a dimension of the tunnelling barrier. In this manner the switching element has various switching states depending on the remanent polarization of the dielectric (3). These switching states are held until the polarization of the dielectric (3) changes.
摘要翻译： 开关元件设置有在其间具有半导体电介质（3）的两个电极（1,2），一个电极（2）具有与半导体电介质（3）形成肖特基接触的材料，而空间电荷区域（3） '）的肖特基接触在操作期间形成电子的隧道势垒。 在许多应用中期望开关元件在更长的时间段内保持一定的开关状态，例如开路或闭合。 然后，开关元件可以用作例如存储元件。 电介质（3）包括具有残留极化的铁电材料，其影响隧道势垒的尺寸。 以这种方式，取决于电介质（3）的剩余极化，开关元件具有各种开关状态。 保持这些开关状态，直到电介质（3）的极化发生变化。
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