公开(公告)号：US20110005603A1

公开(公告)日：2011-01-13

申请号：US12820991

申请日：2010-06-22

申请人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendricus Martinus Johannes Bloks

发明人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendricus Martinus Johannes Bloks

IPC分类号： F03B11/00

CPC分类号： H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。

公开(公告)号：US08472003B2

公开(公告)日：2013-06-25

申请号：US12820991

申请日：2010-06-22

申请人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Geradus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendrikus Martinus Johannes Bloks

发明人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Geradus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendrikus Martinus Johannes Bloks

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。

公开(公告)号：US20110181849A1

公开(公告)日：2011-07-28

申请号：US13010002

申请日：2011-01-20

申请人： Hrishikesh PATEL ,  Johannes Henricus Wilhelmus Jacobs ,  Gerardus Adrianus Antonius Maria Kusters ,  Thibault Simon Mathieu Laurent ,  Marcio Alexandre Cano Miranda ,  Ruud Hendricus Martinus Johannes Bloks ,  Peng Feng ,  Johan Gertrudis Cornelis Kunnen

发明人： Hrishikesh PATEL ,  Johannes Henricus Wilhelmus Jacobs ,  Gerardus Adrianus Antonius Maria Kusters ,  Thibault Simon Mathieu Laurent ,  Marcio Alexandre Cano Miranda ,  Ruud Hendricus Martinus Johannes Bloks ,  Peng Feng ,  Johan Gertrudis Cornelis Kunnen

IPC分类号： G03B27/52 ,  B23P17/04

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/0274 ,  H01L21/67098 ,  Y10T29/49

摘要： An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

摘要翻译： 提供一种浸没式光刻设备，其具有衬底台，该衬底台包括被配置为接收泄漏到衬底台上的衬底的边缘与衬底所在的凹部的边缘之间的间隙中的浸没流体的漏极。 提供热调节系统以通过将一个或多个流体射流引导到支撑衬底的部分的相反侧来至少对支撑衬底的凹部的部分进行热调节。

公开(公告)号：US08780321B2

公开(公告)日：2014-07-15

申请号：US12631113

申请日：2009-12-04

申请人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

发明人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70925 ,  G03B27/52 ,  G03F7/70341

摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。

公开(公告)号：US20110273679A1

公开(公告)日：2011-11-10

申请号：US13187086

申请日：2011-07-20

申请人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

发明人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03B27/52 ,  G03F7/70341

摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。

公开(公告)号：US20100157260A1

公开(公告)日：2010-06-24

申请号：US12631113

申请日：2009-12-04

申请人： Thijs Egidius Johannes KNAAPEN ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

发明人： Thijs Egidius Johannes KNAAPEN ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03B27/52 ,  G03F7/70341

摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。

公开(公告)号：US09618858B2

公开(公告)日：2017-04-11

申请号：US13010002

申请日：2011-01-20

申请人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Gerardus Adrianus Antonius Maria Kusters ,  Thibault Simon Mathieu Laurent ,  Marcio Alexandre Cano Miranda ,  Ruud Hendrikus Martinus Johannes Bloks ,  Peng Feng ,  Johan Gertrudis Cornelis Kunnen

发明人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Gerardus Adrianus Antonius Maria Kusters ,  Thibault Simon Mathieu Laurent ,  Marcio Alexandre Cano Miranda ,  Ruud Hendrikus Martinus Johannes Bloks ,  Peng Feng ,  Johan Gertrudis Cornelis Kunnen

IPC分类号： G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/0274 ,  H01L21/67098 ,  Y10T29/49

摘要： An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

公开(公告)号：US08462313B2

公开(公告)日：2013-06-11

申请号：US12818724

申请日：2010-06-18

申请人： Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Gerardus Adrianus Antonius Maria Kusters ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

发明人： Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Gerardus Adrianus Antonius Maria Kusters ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.

摘要翻译： 一种浸没式光刻设备，其包括弯曲的表面，使得表面张力引流力沿表面上的浸没液体的膜上的方向作用。

公开(公告)号：US08675173B2

公开(公告)日：2014-03-18

申请号：US13044325

申请日：2011-03-09

申请人： Paulus Martinus Maria Liebregts ,  Johannes Henricus Wilhelmus Jacobs ,  Tammo Uitterdijk

发明人： Paulus Martinus Maria Liebregts ,  Johannes Henricus Wilhelmus Jacobs ,  Tammo Uitterdijk

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.

摘要翻译： 公开了一种浸没式光刻设备，其中一个或多个液体转向器位于由液体限制结构包围的空间中。 液体转向器的功能是妨碍形成一个或多个浸没液体的再循环区域，这可能导致浸没液体在空间中的折射率变化，从而造成误差。

公开(公告)号：US07126664B2

公开(公告)日：2006-10-24

申请号：US10888513

申请日：2004-07-12

申请人： Bernardus Antonius Johannes Luttikhuis ,  Petrus Rutgerus Bartray ,  Johannes Henricus Wilhelmus Jacobs ,  Thijs Harink ,  Paulus Martinus Maria Liebregts

发明人： Bernardus Antonius Johannes Luttikhuis ,  Petrus Rutgerus Bartray ,  Johannes Henricus Wilhelmus Jacobs ,  Thijs Harink ,  Paulus Martinus Maria Liebregts

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/62

CPC分类号： G03F7/70841

摘要： A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.

摘要翻译： 公开了一种光刻设备。 该装置包括构造成支撑图案形成装置的支撑件，该图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 第一真空环境包含投影系统，第二真空环境包含图案形成装置支撑件，分离器分离第一和第二真空环境。 分离器包括用于使投影束从第一真空环境朝向图案形成装置传递的孔，和/或反之亦然。 图案形成装置形成用于基本上密封隔膜的孔的密封件的至少一部分。