公开(公告)号：US08294071B2

公开(公告)日：2012-10-23

申请号：US12109505

申请日：2008-04-25

Applicant: Masami Taguchi ,  Noboru Baba ,  Tomokatsu Oguro ,  Toshio Ogura ,  Masumi Kuga

Inventor： Masami Taguchi ,  Noboru Baba ,  Tomokatsu Oguro ,  Toshio Ogura ,  Masumi Kuga

IPC: H05B6/70

CPC classification number: H05B6/701 ,  H05B6/688 ,  H05B6/704 ,  H05B6/705 ,  H05B6/707 ,  H05B6/806 ,  H05B2206/044 ,  Y02B40/143

Abstract: In a microwave irradiation apparatus, an applicator portion has an interior space for housing an object to be irradiated. A first microwave irradiation system outputs a first microwave to the interior space in a first mode so as to generate a large electric field and a small magnetic field at a specific place of the interior space. A second microwave irradiation system outputs a second microwave having a polarization plane crossing a polarization plane of the first microwave to the interior space in a second mode so as to generate a large magnetic field and small electric field at the specific place of the interior space.

Abstract translation: 在微波照射装置中，涂敷部具有容纳待照射物体的内部空间。 第一微波辐射系统以第一模式将第一微波输出到内部空间，以便在内部空间的特定位置处产生大的电场和小的磁场。 第二微波辐射系统以第二模式将具有与第一微波的偏振面交叉的偏振面的第二微波输出到内部空间的特定位置处产生大的磁场和小的电场。

公开(公告)号：US06827755B2

公开(公告)日：2004-12-07

申请号：US10187367

申请日：2002-07-02

Applicant: Masami Taguchi ,  Ryo Ishibashi ,  Yasuhisa Aono ,  Hidehiko Sumitomo ,  Hiroki Masumoto ,  Masakuni Fujikura

Inventor： Masami Taguchi ,  Ryo Ishibashi ,  Yasuhisa Aono ,  Hidehiko Sumitomo ,  Hiroki Masumoto ,  Masakuni Fujikura

IPC: C22C3302

CPC classification number: C22C38/28 ,  B22F2009/041 ,  B22F2998/00 ,  B22F2998/10 ,  B22F2999/00 ,  C22C33/02 ,  C22C33/0285 ,  C22C38/002 ,  C22C38/004 ,  C22C38/22 ,  B22F1/0044 ,  B22F9/04 ,  B22F3/1208 ,  B22F3/14 ,  B22F3/15 ,  B22F3/17 ,  B22F3/20 ,  B22F2201/11

Abstract: A high-strength and high-toughness ferritic steel having a tensile strength of not less than 1,000 MPA and a Charpy impact value of not less than 1 MJ/m2 is provided. A ferritic steel comprising, by weight, not more than 1% Si, not more than 1.25% Mn, 8 to 30% Cr, not more than 0.2% C, not more than 0.2% N, not more than 0.4% O, a total amount of not more than 12% of at least one compound-forming element selected from the group of Ti, Zr, Hf, V and Nb in amounts of not more than 3% Ti, not more than 6% Zr, not more than 10% Hf, not more than 1.0% V and not more than 2.0% Nb, also containing where necessary not more than 0.3% Mo, not more than 4% W and not more than 1.6% Ni, and the balance consisting of Fe and unavoidable impurities, and having an average crystal grain size of not more than 1 &mgr;m, can be obtained by a method comprising encapsulating a steel powder produced by mechanical alloying, and subjecting the encapsulated steel powder to plastic deformation.

Abstract translation: 提供抗拉强度不小于1,000MPA和夏比冲击值不小于1MJ / m 2的高强度和高韧性的铁素体钢。 一种铁素体钢，其含有不超过1％的Si，不超过1.25％的Mn，8-30％的Cr，不超过0.2％的C，不超过0.2％的N，不超过0.4％的O，a 不少于12％的选自Ti，Zr，Hf，V和Nb中的至少一种化合物形成元素的量不超过3％Ti，不超过6％Zr，不大于 10％Hf，不大于1.0％V和不超过2.0％的Nb，还含有必要时不超过0.3％的Mo，不大于4％W和不超过1.6％的Ni，余量由Fe和 不可避免的杂质，平均结晶粒径不大于1μm，可以通过包括将通过机械合金化制造的钢粉末包封并使密封的钢粉末发生塑性变形的方法获得。

公开(公告)号：US08480783B2

公开(公告)日：2013-07-09

申请号：US12840369

申请日：2010-07-21

Applicant: Kazutaka Okamoto ,  Masami Taguchi

Inventor： Kazutaka Okamoto ,  Masami Taguchi

IPC: C22C1/05 ,  C22C21/00

CPC classification number: C22C1/08 ,  B22F3/105 ,  B22F2998/10 ,  Y10T428/12153 ,  Y10T428/25 ,  C22C1/1084 ,  B22F3/02 ,  B22F2003/1054 ,  B22F3/101

Abstract: A sintered porous metal body, which has a sintered structure having a volumetric porosity of 10 to 90%, wherein there are at least one powder particles selected from the group consisting of dielectric material powders and semiconductor material powders that absorb energy of electromagnetic wave having a frequency of 300 MHz to 300 GHz among the metal crystalline particles constituting the sintered body, wherein the particles are substantially homogeneously dispersed in the sintered body, and wherein the metal particles are sintered to bond each other to be united to constitute pores. The invention discloses a method of manufacturing the sintered porous metal body.

Abstract translation: 一种烧结多孔金属体，其具有体积孔隙率为10〜90％的烧结体，其中，存在至少一种选自电介质材料粉末和半导体材料粉末的粉末颗粒，所述介电材料粉末和半导体材料粉末吸收具有 构成烧结体的金属结晶粒子的频率为300MHz〜300GHz，其特征在于，所述粒子基本上均匀地分散在所述烧结体中，并且所述金属粒子被烧结成彼此结合以构成孔。 本发明公开了一种制造多孔金属烧结体的方法。

公开(公告)号：US20110020662A1

公开(公告)日：2011-01-27

申请号：US12840369

申请日：2010-07-21

Applicant: Kazutaka OKAMOTO ,  Masami TAGUCHI

Inventor： Kazutaka OKAMOTO ,  Masami TAGUCHI

IPC: B32B5/18 ,  B22F3/11

CPC classification number: C22C1/08 ,  B22F3/105 ,  B22F2998/10 ,  Y10T428/12153 ,  Y10T428/25 ,  C22C1/1084 ,  B22F3/02 ,  B22F2003/1054 ,  B22F3/101

Abstract: A sintered porous metal body, which has a sintered structure having a volumetric porosity of 10 to 90%, wherein there are at least one powder particles selected from the group consisting of dielectric material powders and semiconductor material powders that absorb energy of electromagnetic wave having a frequency of 300 MHz to 300 GHz among the metal crystalline particles constituting the sintered body, wherein the particles are substantially homogeneously dispersed in the sintered body, and wherein the metal particles are sintered to bond each other to be united to constitute pores. The invention discloses a method of manufacturing the sintered porous metal body.

Abstract translation: 一种烧结多孔金属体，其具有体积孔隙率为10〜90％的烧结体，其中，存在至少一种选自电介质材料粉末和半导体材料粉末的粉末颗粒，所述介电材料粉末和半导体材料粉末吸收具有 构成烧结体的金属结晶粒子的频率为300MHz〜300GHz，其特征在于，所述粒子基本上均匀地分散在所述烧结体中，并且所述金属粒子被烧结成彼此结合以构成孔。 本发明公开了一种制造多孔金属烧结体的方法。

公开(公告)号：US20050067566A1

公开(公告)日：2005-03-31

申请号：US10937337

申请日：2004-09-10

Applicant: Takanori Koshikawa ,  Takashi Ikuta ,  Tsuneo Yasue ,  Masami Taguchi ,  Ibuki Tanaka

Inventor： Takanori Koshikawa ,  Takashi Ikuta ,  Tsuneo Yasue ,  Masami Taguchi ,  Ibuki Tanaka

IPC: G01N23/227 ,  G01N21/17 ,  G01N21/19 ,  G01N21/21 ,  G21K7/00 ,  H01J37/252 ,  H01J37/26 ,  H01J37/285

CPC classification number: H01J37/285 ,  H01J2237/2482

Abstract: A photoemission electron microscopy having a light source system for carrying out a high-resolution measurement such as work function distribution measurement or magnetic domain distribution with reliability, and a high-sensitivity measurement method using the photoemission electron microscopy. A photoemission electron microscopy having an excitation light source system in which a specimen is irradiated with irradiation light from a light source uses a vacuum chamber in which the specimen is placed and an objective lens which collects the irradiation light on a specimen surface. The objective lens is accommodated in the vacuum chamber. The light source may be placed outside the vacuum chamber. A condenser lens which makes the irradiation light from the light source generally parallel may be placed between the light source and the vacuum chamber. A transmission window which transmits the irradiation light while the vacuum chamber is sealed may be placed between the condenser lens and the objective lens. If a diffraction grating for selecting the wavelength of the irradiation light or a polarizing filter for selecting the direction of circularly polarized light in the irradiation light is used between the condenser lens and the transmission window, a high-resolution measurement of a work function distribution or a magnetic domain distribution on the specimen surface can be carried out.

Abstract translation: 具有用于进行诸如功函数分布测量或功能磁场分布的高分辨率测量的光源系统的光电子显微镜以及使用该光电子显微镜的高灵敏度测量方法。 具有激发光源系统的照射电子显微镜，其中用来自光源的照射光照射样本的激发光源系统使用其中放置有样本的真空室和将样品表面上的照射光聚集的物镜。 物镜容纳在真空室中。 光源可以放置在真空室外。 使来自光源的照射光大致平行的聚光透镜可以设置在光源和真空室之间。 在真空室被密封的同时透射照射光的透射窗可以放置在聚光透镜和物镜之间。 如果在聚光透镜和透射窗之间使用用于选择照射光的波长的衍射光栅或用于选择照射光中的圆偏振光的方向的偏振滤光器，则可以进行功函数分布的高分辨率测量或 可以在样品表面上进行磁畴分布。

公开(公告)号：US08932516B2

公开(公告)日：2015-01-13

申请号：US13078040

申请日：2011-04-01

Applicant: Masami Taguchi ,  Kazutaka Okamoto ,  Akio Hamaoka ,  Kouji Sasaki

Inventor： Masami Taguchi ,  Kazutaka Okamoto ,  Akio Hamaoka ,  Kouji Sasaki

IPC: B22F3/11 ,  C22C1/08 ,  B22F3/10 ,  B22F3/105

CPC classification number: C22C1/08 ,  B22F3/1003 ,  B22F3/105 ,  B22F2003/1014 ,  B22F2003/1054

Abstract: It is an objective of the present invention to provide an aluminum porous body which is formed of a pure aluminum and/or aluminum alloy base material and has excellent sinterability and high dimensional accuracy without employing metal stamping. There is provided an aluminum porous body having a relative density of from 5 to 80% with respect to the theoretical density of pure aluminum, in which the aluminum porous body contains 50 mass % or more of aluminum (Al) and from 0.001 to 5 mass % of at least one selected from chlorine (Cl), sodium (Na), potassium (K), fluorine (F), and barium (Ba). It is preferred that the aluminum porous body further contains from 0.1 to 20 mass % of at least one selected from carbon (C), silicon carbide (SiC), iron (II) oxide (FeO), iron (III) oxide (Fe2O3), and iron (II,III) oxide (Fe3O4).

Abstract translation: 本发明的目的是提供一种由纯铝和/或铝合金基材形成的铝多孔体，并且在不使用金属冲压的情况下具有优异的可烧结性和高尺寸精度。 提供相对于纯铝的理论密度为5〜80％的铝多孔体，其中铝多孔体含有铝（Al）的50质量％以上且0.001〜5质量％ 选自氯（Cl），钠（Na），钾（K），氟（F）和钡（Ba）中的至少一种的％。 优选铝多孔体还含有0.1〜20质量％的选自碳（C），碳化硅（SiC），氧化铁（II）（FeO），氧化铁（III）（Fe 2 O 3） ，和氧化铁（II，III）（Fe 3 O 4）。

公开(公告)号：US20120211485A1

公开(公告)日：2012-08-23

申请号：US13397760

申请日：2012-02-16

Applicant: Masami TAGUCHI ,  Kazutaka Okamoto

Inventor： Masami TAGUCHI ,  Kazutaka Okamoto

IPC: H05B6/64 ,  C04B35/64

CPC classification number: H05B6/6408 ,  C04B35/117 ,  C04B35/14 ,  C04B35/488 ,  C04B35/632 ,  C04B35/63416 ,  C04B35/63424 ,  C04B35/636 ,  C04B35/6365 ,  C04B41/009 ,  C04B41/5089 ,  C04B41/85 ,  C04B2235/422 ,  H05B6/80 ,  C04B35/10 ,  C04B35/48

Abstract: A heat insulation material for microwave heating with excellent heating efficiency is provided. A heat insulation material for microwave heating includes a base material formed of an inorganic oxide, and fine carbon particles are dispersed in the heat insulation material. Preferably, the heat insulation material includes the carbon in an amount of 0.001 to 6 wt% . Preferably, the heat insulationmaterial has a density of 2 to 6 g/cm3.

Abstract translation: 提供了一种具有优良加热效率的微波加热隔热材料。 用于微波加热的绝热材料包括由无机氧化物形成的基材，并且细碳颗粒分散在绝热材料中。 优选地，绝热材料包括0.001至6重量％的碳。 优选地，绝热材料的密度为2〜6g / cm 3。

公开(公告)号：US08222579B2

公开(公告)日：2012-07-17

申请号：US12846433

申请日：2010-07-29

Applicant: Masami Taguchi ,  Noboru Baba ,  Kazutaka Okamoto ,  Tomokatsu Oguro ,  Toshio Ogura ,  Masumi Kuga

Inventor： Masami Taguchi ,  Noboru Baba ,  Kazutaka Okamoto ,  Tomokatsu Oguro ,  Toshio Ogura ,  Masumi Kuga

IPC: H05B6/64 ,  H05B6/70

CPC classification number: H05B6/701 ,  H05B6/707 ,  H05B6/806 ,  H05B2206/044

Abstract: A microwave irradiation system includes first and second microwave generators, and an applicator which includes: a microwave transmission part connected to the first and second microwave generators; a reflecting plane, at an other end of the microwave transmission part of the applicator, configured to reflect microwaves from the first and the second microwave generators at such a location that a space of an object, in the microwave transmission part of the applicator between the end and the other end is irradiated with both a greater intensity of electric field and a smaller intensity of magnetic field generated by the first microwave generator and with both a greater intensity of magnetic field and a smaller intensity of electric field generated by the second microwave generator; and a filter part through which at least one of the first and second microwave generators is connected to the applicator.

Abstract translation: 微波照射系统包括第一和第二微波发生器和施加器，其包括：微波传输部分，连接到第一和第二微波发生器; 在施加器的微波传输部分的另一端处的反射平面被配置为在来自第一和第二微波发生器的微波的位置处反射微波发生器的微波传播部分中的物体的空间 并且另一端用较大的电场强度和由第一微波发生器产生的较小的磁场强度照射，并且具有较大的磁场强度和由第二微波发生器产生的较小的电场强度 ; 以及过滤器部件，第一和第二微波发生器中的至少一个与涂布器连接。

公开(公告)号：US20110248205A1

公开(公告)日：2011-10-13

申请号：US13078040

申请日：2011-04-01

Applicant: Masami TAGUCHI ,  Kazutaka Okamoto ,  Akio Hamaoka ,  Kouji Sasaki

Inventor： Masami TAGUCHI ,  Kazutaka Okamoto ,  Akio Hamaoka ,  Kouji Sasaki

IPC: E04B1/88 ,  B22F3/10 ,  B22F3/11 ,  C09K5/14 ,  C09K3/00

CPC classification number: C22C1/08 ,  B22F3/1003 ,  B22F3/105 ,  B22F2003/1014 ,  B22F2003/1054

Abstract: It is an objective of the present invention to provide an aluminum porous body which is formed of a pure aluminum and/or aluminum alloy base material and has excellent sinterability and high dimensional accuracy without employing metal stamping. There is provided an aluminum porous body having a relative density of from 5 to 80% with respect to the theoretical density of pure aluminum, in which the aluminum porous body contains 50 mass % or more of aluminum (Al) and from 0.001 to 5 mass % of at least one selected from chlorine (Cl), sodium (Na), potassium (K), fluorine (F), and barium (Ba). It is preferred that the aluminum porous body further contains from 0.1 to 20 mass % of at least one selected from carbon (C), silicon carbide (SiC), iron (II) oxide (FeO), iron (III) oxide (Fe2O3), and iron (II,III) oxide (Fe3O4).

Abstract translation: 本发明的目的是提供一种由纯铝和/或铝合金基材形成的铝多孔体，并且在不使用金属冲压的情况下具有优异的可烧结性和高尺寸精度。 提供相对于纯铝的理论密度为5〜80％的铝多孔体，其中铝多孔体含有铝（Al）的50质量％以上且0.001〜5质量％ 选自氯（Cl），钠（Na），钾（K），氟（F）和钡（Ba）中的至少一种的％。 优选铝多孔体还含有0.1〜20质量％的选自碳（C），碳化硅（SiC），氧化铁（II）（FeO），氧化铁（III）（Fe 2 O 3） ，和氧化铁（II，III）（Fe 3 O 4）。

公开(公告)号：US20110031239A1

公开(公告)日：2011-02-10

申请号：US12846433

申请日：2010-07-29

Applicant: Masami TAGUCHI ,  Noboru Baba ,  Kazutaka Okamoto ,  Tomokatsu Oguro ,  Toshio Ogura ,  Masumi Kuga

Inventor： Masami TAGUCHI ,  Noboru Baba ,  Kazutaka Okamoto ,  Tomokatsu Oguro ,  Toshio Ogura ,  Masumi Kuga

IPC: H05B6/64

CPC classification number: H05B6/701 ,  H05B6/707 ,  H05B6/806 ,  H05B2206/044

Abstract: A microwave irradiation system includes first and second microwave generators, and an applicator which includes: a microwave transmission part connected to the first and second microwave generators; a reflecting plane, at an other end of the microwave transmission part of the applicator, configured to reflect microwaves from the first and the second microwave generators at such a location that a space of an object, in the microwave transmission part of the applicator between the end and the other end is irradiated with both a greater intensity of electric field and a smaller intensity of magnetic field generated by the first microwave generator and with both a greater intensity of magnetic field and a smaller intensity of electric field generated by the second microwave generator; and a filter part through which at least one of the first and second microwave generators is connected to the applicator.

Abstract translation: 微波照射系统包括第一和第二微波发生器和施加器，其包括：微波传输部分，连接到第一和第二微波发生器; 在施加器的微波传输部分的另一端处的反射平面被配置为在来自第一和第二微波发生器的微波的位置处反射微波发生器的微波传播部分中的物体的空间 并且另一端用较大的电场强度和由第一微波发生器产生的较小的磁场强度照射，并且具有较大的磁场强度和由第二微波发生器产生的较小的电场强度 ; 以及过滤器部件，第一和第二微波发生器中的至少一个与涂布器连接。