Polymer wrapped carbon nanotube near-infrared photoactive devices
    4.
    发明授权
    Polymer wrapped carbon nanotube near-infrared photoactive devices 有权
    聚合物包裹碳纳米管近红外光活性器件

    公开(公告)号:US08017863B2

    公开(公告)日:2011-09-13

    申请号:US12419846

    申请日:2009-04-07

    IPC分类号: H01L31/00

    摘要: A photoactive device includes a photoactive region disposed between and electrically connected to two electrodes where the photoactive region includes a first organic photoactive layer comprising a first donor material and a second organic photoactive layer comprising a first acceptor material. The first donor material contains photoactive polymer-wrapped carbon nanotubes and the photoactive region includes one or more additional organic photoactive material layers disposed between the first donor material layer and the acceptor material layer. The photoactive region creates excitons upon absorption of light in the range of about 400 nm to 1450 nm.

    摘要翻译: 光活性器件包括设置在两个电极之间并电连接到两个电极的光活性区域,其中光活性区域包括包含第一施主材料的第一有机光活性层和包含第一受主材料的第二有机光活性层。 第一供体材料含有光聚合物包裹的碳纳米管,光活性区包括一个或多个另外的有机光活性材料层,其设置在第一施主材料层和受主材料层之间。 光吸收区域在约400nm至1450nm的范围内吸收光时产生激子。

    METHODS OF FABRICATING LARGE-AREA, SEMICONDUCTING NANOPERFORATED GRAPHENE MATERIALS
    6.
    发明申请
    METHODS OF FABRICATING LARGE-AREA, SEMICONDUCTING NANOPERFORATED GRAPHENE MATERIALS 有权
    制备大面积方法,半导体纳米石墨材料

    公开(公告)号:US20120325405A1

    公开(公告)日:2012-12-27

    申请号:US13592466

    申请日:2012-08-23

    IPC分类号: C23F1/02

    摘要: Methods for forming a nanoperforated graphene material are provided. The methods comprise forming an etch mask defining a periodic array of holes over a graphene material and patterning the periodic array of holes into the graphene material. The etch mask comprises a pattern-defining block copolymer layer, and can optionally also comprise a wetting layer and a neutral layer. The nanoperforated graphene material can consist of a single sheet of graphene or a plurality of graphene sheets.

    摘要翻译: 提供了形成纳米石墨烯材料的方法。 所述方法包括在石墨烯材料上形成限定孔周期性阵列的蚀刻掩模,并且将周期性阵列的孔图案化成石墨烯材料。 蚀刻掩模包括图案界定的嵌段共聚物层,并且还可任选地包含润湿层和中性层。 纳米孔石墨烯材料可以由单片石墨烯或多个石墨烯片组成。