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公开(公告)号：US08637776B2
公开(公告)日：2014-01-28
申请号：US13148251
申请日：2010-02-08
申请人： Ji-Young Hwang , In-Seok Hwang , Dong-Wook Lee , Min-Choon Park , Seung-Heon Lee , Sang-Ki Chun , Yong-Koo Son , Beom-Mo Koo
发明人： Ji-Young Hwang , In-Seok Hwang , Dong-Wook Lee , Min-Choon Park , Seung-Heon Lee , Sang-Ki Chun , Yong-Koo Son , Beom-Mo Koo
CPC分类号： H05K1/0296 , C23F1/02 , G03F7/40 , G06F3/045 , G06F2203/04103 , H01L31/022425 , H05K3/0079 , H05K3/061 , H05K3/10 , H05K2203/0108 , H05K2203/0143 , H05K2203/0537 , H05K2203/0571 , H05K2203/1105 , H05K2203/1184 , Y02E10/50 , Y10T29/49155 , Y10T29/49156
摘要： The present invention provides a method for manufacturing a conductive pattern, comprising the steps of: a) forming a conductive film on a substrate; b) forming an etching resist pattern on the conductive film; and c) forming a conductive pattern having a smaller line width than a width of the etching resist pattern by over-etching the conductive film by using the etching resist pattern, and a conductive pattern manufactured by using the same. According to the exemplary embodiment of the present invention, it is possible to effectively and economically provide a conductive pattern having a ultrafine line width.
摘要翻译： 本发明提供一种制造导电图案的方法，包括以下步骤：a）在基片上形成导电膜; b）在导电膜上形成抗蚀剂图案; 以及c）通过使用所述抗蚀剂图案对所述导电膜进行过蚀刻来形成具有比所述抗蚀剂图案的宽度小的线宽的导电图案，以及通过使用所述导电图案制造的导电图案。 根据本发明的示例性实施例，可以有效和经济地提供具有超细线宽度的导电图案。
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公开(公告)号：US20140016278A1
公开(公告)日：2014-01-16
申请号：US14008245
申请日：2012-03-28
申请人： Ji Young Hwang , Min Choon Park , Yong Goo Son , Beom Mo Koo
发明人： Ji Young Hwang , Min Choon Park , Yong Goo Son , Beom Mo Koo
CPC分类号： H05K1/0274 , G06F3/041 , G06F2203/04103 , H05K1/09 , H05K3/002 , H05K3/06 , H05K3/10 , H05K3/285 , H05K7/02 , H05K2201/2054 , Y10T29/49155
摘要： Provided are a conductive structure including a) a base. b) a conductive pattern provided on at least one side of the base. and c) a darkening layer provided on the upper surface and lower surface of the conductive pattern, provided on at least a part of the side of the conductive pattern, and provided in an area corresponding to the conductive pattern area, and a touch panel including the same and a manufacturing method thereof.
摘要翻译： 提供一种导电结构，其包括a）基底。 b）设置在基座的至少一侧上的导电图案。 以及c）设置在所述导电图案的至少一部分上并设置在与所述导电图案区域对应的区域中的所述导电图案的上表面和下表面上的变暗层，以及包括 相同及其制造方法。
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公开(公告)号：US20130192872A1
公开(公告)日：2013-08-01
申请号：US13878537
申请日：2011-12-29
申请人： Ji Young Hwang , In-Seok Hwang , Yong Goo Son , Min Choon Park , Sungjoon Min , Jiehyun Seong
发明人： Ji Young Hwang , In-Seok Hwang , Yong Goo Son , Min Choon Park , Sungjoon Min , Jiehyun Seong
CPC分类号： H01B13/34 , G02F1/13439 , G06F3/041 , G06F2203/04103 , H01B5/00
摘要： The present invention relates to an electrode comprising an auxiliary electrode comprising a conductive pattern and a main electrode provided on at least a portion of the auxiliary electrode to be electrically connected to the auxiliary electrode, and a manufacturing method thereof.
摘要翻译： 本发明涉及一种包括辅助电极的电极及其制造方法，所述辅助电极包括导电图案和设置在所述辅助电极的至少一部分上以与辅助电极电连接的主电极。
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公开(公告)号：US20120031746A1
公开(公告)日：2012-02-09
申请号：US13148220
申请日：2010-02-08
申请人： Ji-Young Hwang , In-Seok Hwang , Sang-Ki Chun , Dong-Wook Lee , Yong-Koo Son , Min-Choon Park , Seung-Heon Lee , Beom-Mo Koo , Young-Jun Hong , Ki-Hwan Kim , Su-Jin Kim , Hyeon Choi
发明人： Ji-Young Hwang , In-Seok Hwang , Sang-Ki Chun , Dong-Wook Lee , Yong-Koo Son , Min-Choon Park , Seung-Heon Lee , Beom-Mo Koo , Young-Jun Hong , Ki-Hwan Kim , Su-Jin Kim , Hyeon Choi
CPC分类号： G06F3/041 , G06F3/044 , G06F3/045 , G06F2203/04103 , G06F2203/04112 , H05K3/061 , H05K3/4611
摘要： The present invention provides a method of manufacturing a touch screen, comprising the steps of: a) forming a conductive layer on a substrate; b) forming an etching resist pattern on the conductive layer; and c) forming a conductive pattern having a line width smaller than the line width of the etching resist pattern by over-etching the conductive layer by using the etching resist pattern and a touch screen manufactured by the method. According to the present invention, a touch screen comprising a conductive pattern having an ultrafine line width can be economically and efficiently provided.
摘要翻译： 本发明提供一种制造触摸屏的方法，包括以下步骤：a）在基片上形成导电层; b）在导电层上形成抗蚀剂图案; 以及c）通过使用所述抗蚀剂图案和由所述方法制造的触摸屏过度蚀刻所述导电层，形成具有小于所述抗蚀剂图案的线宽的线宽的导电图案。 根据本发明，可以经济有效地提供包括具有超细线宽度的导电图案的触摸屏。
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公开(公告)号：US06797621B2
公开(公告)日：2004-09-28
申请号：US09801804
申请日：2001-03-09
申请人： Hyung-Soo Song , Ky-Sub Kim , Min-Choon Park , Sok-Joo Lee
发明人： Hyung-Soo Song , Ky-Sub Kim , Min-Choon Park , Sok-Joo Lee
IPC分类号： H01L21302
CPC分类号： C23F1/26
摘要： An etchant composition for molybdenum includes: 5 to 20% by weight of hydrogen peroxide (H2O2); 75 to 94% by weight of water; and an additive including a pH controlling agent. The etching composition is particularly useful for the fabrication of semiconductor devices. Molybdenum may be etched from a substrate by applying the etchant composition, preferably by spraying or immersion, and preferably at a temperature range of 30° C. to 45° C.
摘要翻译： 用于钼的蚀刻剂组合物包括：5至20重量％的过氧化氢（H 2 O 2）; 75至94重量％的水; 和包含pH控制剂的添加剂。 蚀刻组合物特别适用于制造半导体器件。 可以通过施加蚀刻剂组合物，优选通过喷涂或浸渍，优选在30℃至45℃的温度范围内从基底上蚀刻钼。
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公开(公告)号：US20120031647A1
公开(公告)日：2012-02-09
申请号：US13148251
申请日：2010-02-08
申请人： Ji-Young Hwang , In-Seok Hwang , Dong-Wook Lee , Min-Choon Park , Seung-Heon Lee , Sang-Ki Chun , Yong-Koo Son , Beom-Mo Koo
发明人： Ji-Young Hwang , In-Seok Hwang , Dong-Wook Lee , Min-Choon Park , Seung-Heon Lee , Sang-Ki Chun , Yong-Koo Son , Beom-Mo Koo
CPC分类号： H05K1/0296 , C23F1/02 , G03F7/40 , G06F3/045 , G06F2203/04103 , H01L31/022425 , H05K3/0079 , H05K3/061 , H05K3/10 , H05K2203/0108 , H05K2203/0143 , H05K2203/0537 , H05K2203/0571 , H05K2203/1105 , H05K2203/1184 , Y02E10/50 , Y10T29/49155 , Y10T29/49156
摘要： The present invention provides a method for manufacturing a conductive pattern, comprising the steps of: a) forming a conductive film on a substrate; b) forming an etching resist pattern on the conductive film; and c) forming a conductive pattern having a smaller line width than a width of the etching resist pattern by over-etching the conductive film by using the etching resist pattern, and a conductive pattern manufactured by using the same. According to the exemplary embodiment of the present invention, it is possible to effectively and economically provide a conductive pattern having a ultrafine line width.
摘要翻译： 本发明提供一种制造导电图案的方法，包括以下步骤：a）在基片上形成导电膜; b）在导电膜上形成抗蚀剂图案; 以及c）通过使用所述抗蚀剂图案对所述导电膜进行过蚀刻来形成具有比所述抗蚀剂图案的宽度小的线宽的导电图案，以及通过使用所述导电图案制造的导电图案。 根据本发明的示例性实施例，可以有效和经济地提供具有超细线宽度的导电图案。
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公开(公告)号：US20050020081A1
公开(公告)日：2005-01-27
申请号：US10925003
申请日：2004-08-25
申请人： Hyung-Soo Song , Ky-Sub Kim , Min-Choon Park , Sok-Joo Lee
发明人： Hyung-Soo Song , Ky-Sub Kim , Min-Choon Park , Sok-Joo Lee
IPC分类号： C23F1/26 , H01L21/302 , H01L21/461 , H01L23/48 , H01L23/52 , H01L29/40
CPC分类号： C23F1/26
摘要： An etchant composition for molybdenum includes: 5 to 20% by weight of hydrogen peroxide (H2O2); 75 to 94% by weight of water; and an additive including a pH controlling agent. The etching composition is particularly useful for the fabrication of semiconductor devices. Molybdenum may be etched from a substrate by applying the etchant composition, preferably by spraying or immersion, and preferably at a temperature range of 30° C. to 45° C.
摘要翻译： 用于钼的蚀刻剂组合物包括：5至20重量％的过氧化氢（H 2 O 2）; 75至94重量％的水; 和包含pH控制剂的添加剂。 蚀刻组合物特别适用于制造半导体器件。 可以通过施加蚀刻剂组合物，优选通过喷涂或浸渍，优选在30℃至45℃的温度范围内，从基底上蚀刻钼。
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公开(公告)号：US09307633B2
公开(公告)日：2016-04-05
申请号：US14008245
申请日：2012-03-28
申请人： Ji Young Hwang , Min Choon Park , Yong Goo Son , Beom Mo Koo
发明人： Ji Young Hwang , Min Choon Park , Yong Goo Son , Beom Mo Koo
CPC分类号： H05K1/0274 , G06F3/041 , G06F2203/04103 , H05K1/09 , H05K3/002 , H05K3/06 , H05K3/10 , H05K3/285 , H05K7/02 , H05K2201/2054 , Y10T29/49155
摘要： Provided are a conductive structure including a) a base, b) a conductive pattern provided on at least one side of the base, and c) a darkening layer provided on the upper surface and lower surface of the conductive pattern, provided on at least a part of the side of the conductive pattern, and provided in an area corresponding to the conductive pattern area, and a touch panel including the same and a manufacturing method thereof.
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公开(公告)号：US08921726B2
公开(公告)日：2014-12-30
申请号：US13148220
申请日：2010-02-08
申请人： Ji-Young Hwang , In-Seok Hwang , Sang-Ki Chun , Dong-Wook Lee , Yong-Koo Son , Min-Choon Park , Seung-Heon Lee , Beom-Mo Koo , Young-Jun Hong , Ki-Hwan Kim , Su-Jin Kim , Hyeon Choi
发明人： Ji-Young Hwang , In-Seok Hwang , Sang-Ki Chun , Dong-Wook Lee , Yong-Koo Son , Min-Choon Park , Seung-Heon Lee , Beom-Mo Koo , Young-Jun Hong , Ki-Hwan Kim , Su-Jin Kim , Hyeon Choi
IPC分类号： H03K17/975 , G06F3/041 , G06F3/045 , G06F3/044
CPC分类号： G06F3/041 , G06F3/044 , G06F3/045 , G06F2203/04103 , G06F2203/04112 , H05K3/061 , H05K3/4611
摘要： The present invention provides a method of manufacturing a touch screen, comprising the steps of: a) forming a conductive layer on a substrate; b) forming an etching resist pattern on the conductive layer; and c) forming a conductive pattern having a line width smaller than the line width of the etching resist pattern by over-etching the conductive layer by using the etching resist pattern and a touch screen manufactured by the method. According to the present invention, a touch screen comprising a conductive pattern having an ultrafine line width can be economically and efficiently provided.
摘要翻译： 本发明提供一种制造触摸屏的方法，包括以下步骤：a）在基片上形成导电层; b）在导电层上形成抗蚀剂图案; 以及c）通过使用所述抗蚀剂图案和由所述方法制造的触摸屏过度蚀刻所述导电层，形成具有小于所述抗蚀剂图案的线宽的线宽的导电图案。 根据本发明，可以经济有效地提供包括具有超细线宽度的导电图案的触摸屏。
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公开(公告)号：US08766097B2
公开(公告)日：2014-07-01
申请号：US13878537
申请日：2011-12-29
申请人： Ji Young Hwang , In-Seok Hwang , Yong Goo Son , Min Choon Park , Sungjoon Min , Jiehyun Seong
发明人： Ji Young Hwang , In-Seok Hwang , Yong Goo Son , Min Choon Park , Sungjoon Min , Jiehyun Seong
CPC分类号： H01B13/34 , G02F1/13439 , G06F3/041 , G06F2203/04103 , H01B5/00
摘要： The present invention relates to an electrode comprising an auxiliary electrode comprising a conductive pattern and a main electrode provided on at least a portion of the auxiliary electrode to be electrically connected to the auxiliary electrode, and a manufacturing method thereof.
摘要翻译： 本发明涉及一种包括辅助电极的电极及其制造方法，所述辅助电极包括导电图案和设置在所述辅助电极的至少一部分上以与辅助电极电连接的主电极。
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