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14 条记录 (耗时 0.016 秒)

    Photoresists and processes for microlithography
    1.
    发明授权
    Photoresists and processes for microlithography 失效
    用于微光刻的光致抗蚀剂和工艺

    公开(公告)号：US06884562B1

    公开(公告)日：2005-04-26

    申请号：US09807298

    申请日：1999-10-26

    申请人： Frank Leonard Schadt, III ,  Michael Fryd ,  Mookkan Periyasamy

    发明人： Frank Leonard Schadt, III ,  Michael Fryd ,  Mookkan Periyasamy

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03C1/492

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

    摘要： Positive photoresists and associated processes for microlithography in the ultraviolet (UV) and violet are disclosed. The photoresists comprise (a) a branched copolymer containing protected acid groups and (b) at least one photoacid generator. The photoresists have high transparency throughout the UV, good development properties, high plasma etch resistance and other desirable properties, and are useful for microlithography in the near, far, and extreme UV, particularly at wavelengths less than or equal to 365 nm.

    摘要翻译： 公开了用于紫外（UV）和紫色的微光刻的正光致抗蚀剂和相关工艺。 光致抗蚀剂包括（a）含有保护的酸基的支链共聚物和（b）至少一种光酸产生剂。 光致抗蚀剂在整个UV中具有高透明度，良好的显影性能，高耐等离子体蚀刻性和其它所需性质，并且可用于近紫外，远紫外和极紫外，特别是波长小于或等于365nm的微光刻。

    Photoresists and processes for microlithography
    4.
    发明申请
    Photoresists and processes for microlithography 失效
    用于微光刻的光致抗蚀剂和工艺

    公开(公告)号：US20050058940A1

    公开(公告)日：2005-03-17

    申请号：US10970133

    申请日：2004-10-21

    申请人： Frank Schadt ,  Michael Fryd ,  Mookkan Periyasamy

    发明人： Frank Schadt ,  Michael Fryd ,  Mookkan Periyasamy

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03C1/76

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

    摘要： Positive photoresists and associated processes for microlithography in the ultraviolet (UV) and violet are disclosed. The photoresists comprise (a) a branched polymer containing protected acid groups and (b) at least one photoacid generator. The photoresists have high transparency throughout the UV, good development properties, high plasma etch resistance and other desirable properties, and are useful for microlithography in the near, far, and extreme UV, particularly at wavelengths less than or equal to 365 nm.

    摘要翻译： 公开了用于紫外（UV）和紫色的微光刻的正光致抗蚀剂和相关工艺。 光致抗蚀剂包括（a）含有保护的酸基的支链聚合物和（b）至少一种光酸产生剂。 光致抗蚀剂在整个UV中具有高透明度，良好的显影性能，高耐等离子体蚀刻性和其它所需性质，并且可用于近紫外，远紫外和极紫外，特别是波长小于或等于365nm的微光刻。

    Photoresists and processes for microlithography
    7.
    发明授权
    Photoresists and processes for microlithography 失效
    用于微光刻的光致抗蚀剂和工艺

    公开(公告)号：US07261993B2

    公开(公告)日：2007-08-28

    申请号：US10970133

    申请日：2004-10-21

    申请人： Frank Leonard Schadt, III ,  Michael Fryd ,  Mookkan Periyasamy

    发明人： Frank Leonard Schadt, III ,  Michael Fryd ,  Mookkan Periyasamy

    IPC分类号： G03C1/73 ,  G03F7/039

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

    摘要： Positive photoresists and associated processes for microlithography in the ultraviolet (UV) and violet are disclosed. The photoresists comprise (a) a branched polymer containing protected acid groups and (b) at least one photoacid generator. The photoresists have high transparency throughout the UV, good development properties, high plasma etch resistance and other desirable properties, and are useful for microlithography in the near, far, and extreme UV, particularly at wavelengths less than or equal to 365 nm.

    摘要翻译： 公开了用于紫外（UV）和紫色的微光刻的正光致抗蚀剂和相关工艺。 光致抗蚀剂包括（a）含有保护的酸基的支链聚合物和（b）至少一种光酸产生剂。 光致抗蚀剂在整个UV中具有高透明度，良好的显影性能，高耐等离子体蚀刻性和其它所需性质，并且可用于近紫外，远紫外和极紫外，特别是波长小于或等于365nm的微光刻。

    MEMBRANE ELECTRODE ASSEMBLY FOR ORGANIC/AIR FUEL CELLS
    10.
    发明申请
    MEMBRANE ELECTRODE ASSEMBLY FOR ORGANIC/AIR FUEL CELLS 审中-公开
    用于有机/空气燃料电池的膜电极组件

    公开(公告)号：US20100304266A1

    公开(公告)日：2010-12-02

    申请号：US12158357

    申请日：2006-12-21

    申请人： Mookkan Periyasamy ,  Jo-Ann T. Schwartz ,  Mohamed Abdou ,  Harvey P. Tannenbaum

    发明人： Mookkan Periyasamy ,  Jo-Ann T. Schwartz ,  Mohamed Abdou ,  Harvey P. Tannenbaum

    IPC分类号： H01M8/10

    CPC分类号： D21H13/20 ,  C09K3/1028 ,  D21B1/12 ,  F16D69/026

    摘要： A membrane electrode assembly for an organic/air fuel cell is provided comprising a proton exchange membrane, an anode electrode, and a cathode electrode. The proton exchange membrane is made of a highly fluorinated ion-exchange polymer. The anode electrode is comprised of an anode electrocatalyst of platinum and ruthenium supported on particulate carbon and a highly fluorinated ion-exchange polymer binder, and the metal loading in the anode electrode is less than 3 mg/cm2. The cathode electrode is comprised of a cathode electrocatalyst of platinum supported on particulate carbon and a highly fluorinated ion-exchange polymer binder, and the metal loading in the cathode electrode is less than 3 mg/cm2. Organic/air fuel cells comprised of such membrane electrode assemblies are also provided. A process for operating such membrane electrode assemblies of an organic/air fuel cell is also provided.

    摘要翻译： 提供了一种用于有机/空气燃料电池的膜电极组件，其包括质子交换膜，阳极电极和阴极电极。 质子交换膜由高度氟化的离子交换聚合物制成。 阳极由铂和负载在颗粒碳上的钌阳极电极和高度氟化的离子交换聚合物粘合剂组成，阳极电极中的金属负载小于3mg / cm 2。 阴极由负载在颗粒碳上的铂阴极电极催化剂和高度氟化的离子交换聚合物粘合剂组成，阴极电极中的金属负载小于3mg / cm 2。 还提供了由这样的膜电极组件构成的有机/空气燃料电池。 还提供了用于操作有机/空气燃料电池的这种膜电极组件的方法。