公开(公告)号：US06458518B1

公开(公告)日：2002-10-01

申请号：US10045062

申请日：2002-01-15

申请人： Sang-sik Moon ,  Mi-sook Jeon ,  Pil-kwon Jun ,  June-ing Kil ,  Je-eung Park ,  Sang-mun Chun

发明人： Sang-sik Moon ,  Mi-sook Jeon ,  Pil-kwon Jun ,  June-ing Kil ,  Je-eung Park ,  Sang-mun Chun

IPC分类号： G03F742

CPC分类号： C11D7/5022 ,  C11D11/0047 ,  G03F7/422 ,  H01L21/31133

摘要： A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.

公开(公告)号：US07625695B2

公开(公告)日：2009-12-01

申请号：US11844365

申请日：2007-08-24

申请人： Sang-Sik Moon ,  Ji-Young Kim ,  Joon-Seok Oh

发明人： Sang-Sik Moon ,  Ji-Young Kim ,  Joon-Seok Oh

IPC分类号： G03F7/40 ,  C08F16/02 ,  C08F116/02 ,  C08F216/02 ,  G03F7/11

CPC分类号： G03F7/091 ,  C08F8/14 ,  C08F2810/20 ,  C08F8/30 ,  C08F20/20

摘要： An anti-reflective coating composition includes a solvent and about 20 to about 35 percent by weight of a polymer prepared by a condensation reaction of an acrylate polymer including a hydroxyl group with a derivative of muramic acid and a derivative of mandelic acid.

摘要翻译： 抗反射涂料组合物包括溶剂和约20至约35重量％的通过包含羟基与间苯三酸衍生物的丙烯酸酯聚合物缩合反应制备的聚合物。

公开(公告)号：US20080050678A1

公开(公告)日：2008-02-28

申请号：US11844365

申请日：2007-08-24

申请人： Sang-Sik MOON ,  Ju-Young KIM ,  Joon-Seok OH

发明人： Sang-Sik MOON ,  Ju-Young KIM ,  Joon-Seok OH

IPC分类号： C08F20/04 ,  G03C5/00

CPC分类号： G03F7/091 ,  C08F8/14 ,  C08F2810/20 ,  C08F8/30 ,  C08F20/20

摘要： An anti-reflective coating composition includes a solvent and about 20 to about 35 percent by weight of a polymer prepared by a condensation reaction of an acrylate polymer including a hydroxyl group with a derivative of muramic acid and a derivative of mandelic acid.

摘要翻译： 抗反射涂料组合物包括溶剂和约20至约35重量％的通过包含羟基与间苯三酸衍生物的丙烯酸酯聚合物缩合反应制备的聚合物。

公开(公告)号：US06432622B1

公开(公告)日：2002-08-13

申请号：US09679558

申请日：2000-10-06

申请人： Sang-sik Moon ,  Mi-sook Jeon ,  Pil-kwon Jun ,  June-ing Kil ,  Je-eung Park ,  Sang-mun Chun

发明人： Sang-sik Moon ,  Mi-sook Jeon ,  Pil-kwon Jun ,  June-ing Kil ,  Je-eung Park ,  Sang-mun Chun

IPC分类号： G03F742

CPC分类号： C11D7/5022 ,  C11D11/0047 ,  G03F7/422 ,  H01L21/31133

摘要： A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.

公开(公告)号：US20080213699A1

公开(公告)日：2008-09-04

申请号：US12101745

申请日：2008-04-11

申请人： Sang-Sik MOON

发明人： Sang-Sik MOON

IPC分类号： G03F7/004 ,  G03F7/00

CPC分类号： G03F7/0392

摘要： In a photoresist composition and a method of forming a photoresist pattern using the photoresist composition, the photoresist composition includes a photosensitive polymer having a first repeating unit of p-hydroxystyrene and a second repeating unit of an acrylate at a molar ratio of from about 40:60 to about 60:40, a photosensitive material and an organic solvent. The photoresist composition having good reproducibility and stability may form a photoresist film having a substantially uniform thickness, and may form a fine pattern with accuracy.

摘要翻译： 在光致抗蚀剂组合物和使用光致抗蚀剂组合物形成光致抗蚀剂图案的方法中，光致抗蚀剂组合物包括具有对羟基苯乙烯的第一重复单元的光敏聚合物和丙烯酸酯的第二重复单元，摩尔比为约40： 60至约60:40，感光材料和有机溶剂。 具有良好的再现性和稳定性的光致抗蚀剂组合物可以形成具有基本均匀厚度的光致抗蚀剂膜，并且可以精确地形成精细图案。

公开(公告)号：US07528188B2

公开(公告)日：2009-05-05

申请号：US10862338

申请日：2004-06-08

申请人： Seok Bong Park ,  Myung Sun Kim ,  Won Mi Kim ,  Jae Hyun Kim ,  Sang Sik Moon ,  Chang Ho Lee ,  Young Hoon Kim

发明人： Seok Bong Park ,  Myung Sun Kim ,  Won Mi Kim ,  Jae Hyun Kim ,  Sang Sik Moon ,  Chang Ho Lee ,  Young Hoon Kim

IPC分类号： C08K5/10 ,  C08K5/09 ,  C08L71/10

CPC分类号： C08L61/06

摘要： A resin solution usable for forming a protection layer, including an organic solvent and a resol resin. The resin solution may further include any combination of a cross-linking agene or agent(s), a photo active compound (PAC) or compounds(s), and/or development accelerator or accelerator(s) a method forming a cured resin layer, including applying a resin solution, including a resol resin, directly or indirectly on a substrate and hard baking the resin solution to form the cured resin layer. The resin solution may include a resol resin and/or a novolac resin.

摘要翻译： 可用于形成保护层的树脂溶液，包括有机溶剂和甲阶酚醛树脂。 树脂溶液还可以包括交联的一个或多个化合物，光活性化合物（PAC）或化合物和/或显影促进剂或促进剂的任何组合，形成固化树脂层 包括将包含甲阶酚醛树脂的树脂溶液直接或间接地施加到基板上，并硬化烘烤树脂溶液以形成固化树脂层。 树脂溶液可以包括甲阶酚醛树脂和/或酚醛清漆树脂。

公开(公告)号：US20060134549A1

公开(公告)日：2006-06-22

申请号：US11303592

申请日：2005-12-15

申请人： Sang-Sik Moon

发明人： Sang-Sik Moon

IPC分类号： G03C1/76

CPC分类号： G03F7/0392

摘要： In a photosensitive polymer, a photoresist composition including the photosensitive polymer and a method of forming a photoresist pattern using the photoresist composition, the photosensitive polymer has a weight average molecular weight of from about 1,000 up to about 100,000 and a repeating unit represented by the following chemical formula (1). wherein R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms, R2 represents an acid-labile hydrocarbon group having 3 to 12 carbon atoms, and n represents an integer greater than or equal to 1. The photoresist composition having good reproducibility and stability may form a photoresist film having a substantially uniform thickness, and may form a fine pattern with accuracy.

摘要翻译： 在光敏聚合物中，包含光敏聚合物的光致抗蚀剂组合物和使用该光致抗蚀剂组合物形成光致抗蚀剂图案的方法，光敏聚合物的重均分子量为约1,000至约100,000，重复单元由以下 化学式（1）。 其中R 1表示氢或碳原子数为1〜10的烷基，R 2表示碳原子数3〜12的酸不稳定烃基，n表示 整数大于或等于1.具有良好重现性和稳定性的光致抗蚀剂组合物可以形成具有基本均匀厚度的光致抗蚀剂膜，并且可以精确地形成精细图案。