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    Autotetraploid Vetiveria zizaniodes plant useful for carbon sequestration and soil conservation named ‘CIMAP-KH 40’
    5.
    植物专利
    Autotetraploid Vetiveria zizaniodes plant useful for carbon sequestration and soil conservation named ‘CIMAP-KH 40’ 有权
    用于碳固存和土壤保持的四倍体香根草zizaniodes植物命名为“CIMAP-KH 40”

    公开(公告)号：USPP26474P3

    公开(公告)日：2016-03-08

    申请号：US13506598

    申请日：2012-04-30

    Applicant: Umesh Chandra Lavania ,  Santosh Kumar Rai ,  Seshu Lavania ,  Surochita Basu ,  Basant Kumar Dubey ,  Ram Ujagir

    Inventor： Umesh Chandra Lavania ,  Santosh Kumar Rai ,  Seshu Lavania ,  Surochita Basu ,  Basant Kumar Dubey ,  Ram Ujagir

    IPC: A01H5/06 ,  A01H5/12 ,  A01H5/10

    CPC classification number: A01H5/12 ,  A01H5/10

    Abstract: The present invention relates to the development of a novel clone of Vetiver [Vetveria zizaniodes (L) Nash. syn. Chrysopogon zizaniodes (L.) Roberty; family Poaceae], named ‘CIMAP-KHUS 40’ characterised by somatic chromosome number 4x=40, larger stomata, fast growing deep penetrating roots, and seed infertility disabling its spread as a weed. This clone has unique ISSR and RAPD profiles that serve as DNA-fingerprints, and is developed from a unique diploid plant (2n=20). The invention document details all the pertinent data relating to this clone, its biological features and usefulness, and the method of its development.

    Abstract translation: 本发明涉及一种新颖的香根草克隆（Vetveria zizaniodes（L）Nash）的开发。 同步 金枪鱼（L.）Roberty; 家族禾本科]，命名为“CIMAP-KHUS 40”，其特征在于体细胞染色体数目4x = 40，气孔较大，生长深深的根部，以及种子不育不能作为杂草传播。 该克隆具有独特的ISSR和RAPD谱，用作DNA指纹图谱，由独特的二倍体植物（2n = 20）开发。 本发明文件详细说明了与该克隆有关的所有相关数据，其生物学特征和用途及其发展方法。

    Apparatus for automatically testing and tuning radio frequency coil
    6.
    发明授权
    Apparatus for automatically testing and tuning radio frequency coil 有权
    用于自动测试和调谐射频线圈的装置

    公开(公告)号：US09201127B2

    公开(公告)日：2015-12-01

    申请号：US13290493

    申请日：2011-11-07

    Applicant: Santosh Kumar ,  Prasidh Ramabadran ,  Rohit Parakh

    Inventor： Santosh Kumar ,  Prasidh Ramabadran ,  Rohit Parakh

    IPC: G01R33/36 ,  G01R33/58

    CPC classification number: G01R33/3628 ,  G01R33/3657 ,  G01R33/583

    Abstract: In one embodiment, an apparatus for automatically testing and tuning a RF coil is provided. The apparatus comprises a digital frequency generator for generating a stimulus, the stimulus comprising a range of radio frequency signals having different frequencies, a radio frequency coupler configured for applying the stimulus to the RF coil so as to enable the RF coil to generate a reflected signal in response to the stimulus applied, a radio frequency detector for detecting the reflected signal and a signal processing unit for processing the reflected signal, so as to identify the tuned resonant frequency of the RF coil and further configured for calculating return loss at the RF coil based on the reflected signal.

    Abstract translation: 在一个实施例中，提供了用于自动测试和调谐RF线圈的装置。 该装置包括用于产生刺激的数字频率发生器，所述刺激包括具有不同频率的射频信号的范围;射频耦合器，被配置为将激励施加到RF线圈，以使RF线圈能够产生反射信号 响应于所施加的刺激，用于检测反射信号的射频检测器和用于处理反射信号的信号处理单元，以便识别RF线圈的调谐谐振频率，并进一步被配置为计算RF线圈处的回波损耗 基于反射信号。

    Dynamically-lubricated bearing and method of dynamically lubricating a bearing
    8.
    发明授权
    Dynamically-lubricated bearing and method of dynamically lubricating a bearing 有权
    动态润滑轴承和动态润滑轴承的方法

    公开(公告)号：US08979383B2

    公开(公告)日：2015-03-17

    申请号：US13269686

    申请日：2011-10-10

    Applicant: Bruce Alan Carter ,  Pradeep Hemant Sangli ,  Santosh Kumar Potnuru ,  Laxmikant Chourasia

    Inventor： Bruce Alan Carter ,  Pradeep Hemant Sangli ,  Santosh Kumar Potnuru ,  Laxmikant Chourasia

    IPC: F16C19/00 ,  F16C33/66 ,  F16C33/38 ,  F16C33/58

    CPC classification number: F16C33/6681 ,  F16C19/06 ,  F16C33/3843 ,  F16C33/3887 ,  F16C33/583 ,  F16C33/6662 ,  F16C33/6677 ,  F16C2240/40 ,  F16C2360/23

    Abstract: Dynamically-lubricated bearings and methods of dynamically lubricating bearings, including bearings used in gas turbine engines. Such a bearing includes an inner race having an inner race groove, an outer race having an outer race groove that opposes the inner race groove, rolling elements disposed between the inner and outer races and in rolling contact with the inner and outer race grooves, and a cage disposed between the inner and outer races to maintain separation between the rolling elements. A lubricant is introduced into a cavity between the inner and outer races, and rotation of the inner race relative to the outer race causes air to enter pockets of the cage that contain the rolling elements, which in turn causes the lubricant to exit the cavity of the bearing.

    Abstract translation: 动态润滑轴承和动态润滑轴承的方法，包括用于燃气涡轮发动机的轴承。 这种轴承包括具有内圈槽的内圈，具有与内圈槽相对的外座圈槽的外圈，设置在内座圈和外座圈之间并与内圈和外座圈滚动接触的滚动元件，以及 设置在内座圈和外座圈之间的笼子，以保持滚动元件之间的分离。 润滑剂被引入到内圈和外圈之间的空腔中，并且内座圈相对于外圈的旋转使得空气进入容纳滚动元件的保持架的凹部，这进而使得润滑剂离开空腔 轴承。

    CLEANING ELECTROPLATING SUBSTRATE HOLDERS USING REVERSE CURRENT DEPLATING
    9.
    发明申请
    CLEANING ELECTROPLATING SUBSTRATE HOLDERS USING REVERSE CURRENT DEPLATING 有权
    使用反向电流去除清洁电镀基板支架

    公开(公告)号：US20130256146A1

    公开(公告)日：2013-10-03

    申请号：US13853935

    申请日：2013-03-29

    Applicant: Lee Peng Chua ,  Steven T. Mayer ,  Thomas A. Ponnuswamy ,  Santosh Kumar

    Inventor： Lee Peng Chua ,  Steven T. Mayer ,  Thomas A. Ponnuswamy ,  Santosh Kumar

    IPC: C25F1/00

    CPC classification number: C25F1/00 ,  C25D17/001 ,  C25D17/06 ,  C25D21/00 ,  C25D21/12 ,  C25F7/00 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/68707 ,  Y10S901/02

    Abstract: Provided are cleaning methods and systems to remove unintended metallic deposits from electroplating apparatuses using reverse current deplating techniques. Such cleaning involves positioning a cleaning (deplating) disk in an electroplating cup similar to a regular processed substrate. The front surface of the cleaning disk includes a corrosion resistant conductive material to form electrical connections to deposits on the cup's surfaces. The disk is sealed in the cup and submerged into a plating solution. A reverse current is then applied to the front conductive surface of the disk to initiate deplating of the deposits. Sealing compression in the cup may change during cleaning to cause different deformation of the lip seal and to form new electrical connections to the deposits. The proposed cleaning may be applied to remove deposits formed during electroplating of alloys, in particular, tin-silver alloys widely used for semiconductor and wafer level packaging.

    Abstract translation: 提供了使用反向电流去除技术从电镀设备中除去非预期的金属沉积物的清洁方法和系统。 这样的清洁包括将清洁（脱落）盘定位在类似于经常处理的基底的电镀杯中。 清洁盘的前表面包括耐腐蚀的导电材料以形成电连接以沉积在杯的表面上。 将盘密封在杯中并浸没在电镀液中。 然后将反向电流施加到盘的前导电表面以开始沉积物的脱落。 杯子内的密封压缩可能在清洁过程中发生变化，导致唇形密封件发生不同的变形，并形成与沉积物的新的电气连接。 所提出的清洁可以用于去除在电镀期间形成的沉积物，特别是广泛用于半导体和晶片级封装的锡 - 银合金。

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