Uniform multilayer graphene by chemical vapor deposition

    公开(公告)号:US10886126B2

    公开(公告)日:2021-01-05

    申请号:US13225135

    申请日:2011-09-02

    Abstract: A method of producing uniform multilayer graphene by chemical vapor deposition (CVD) is provided. The method is limited in size only by CVD reaction chamber size and is scalable to produce multilayer graphene films on a wafer scale that have the same number of layers of graphene throughout substantially the entire film. Uniform bilayer graphene may be produced using a method that does not require assembly of independently produced single layer graphene. The method includes a CVD process wherein a reaction gas is flowed in the chamber at a relatively low pressure compared to conventional processes and the temperature in the reaction chamber is thereafter decreased relatively slowly compared to conventional processes. One application for uniform multilayer graphene is transparent conductors. In processes that require multiple transfers of single layer graphene to achieve multilayer graphene structures, the disclosed method can reduce the number of process steps by at least half.

    UNIFORM MULTILAYER GRAPHENE BY CHEMICAL VAPOR DEPOSITION
    2.
    发明申请
    UNIFORM MULTILAYER GRAPHENE BY CHEMICAL VAPOR DEPOSITION 审中-公开
    通过化学蒸气沉积法制成均匀的多层石墨

    公开(公告)号:US20120225296A1

    公开(公告)日:2012-09-06

    申请号:US13225135

    申请日:2011-09-02

    Abstract: A method of producing uniform multilayer graphene by chemical vapor deposition (CVD) is provided. The method is limited in size only by CVD reaction chamber size and is scalable to produce multilayer graphene films on a wafer scale that have the same number of layers of graphene throughout substantially the entire film. Uniform bilayer graphene may be produced using a method that does not require assembly of independently produced single layer graphene. The method includes a CVD process wherein a reaction gas is flowed in the chamber at a relatively low pressure compared to conventional processes and the temperature in the reaction chamber is thereafter decreased relatively slowly compared to conventional processes. One application for uniform multilayer graphene is transparent conductors. In processes that require multiple transfers of single layer graphene to achieve multilayer graphene structures, the disclosed method can reduce the number of process steps by at least half.

    Abstract translation: 提供了通过化学气相沉积(CVD)制造均匀的多层石墨烯的方法。 该方法仅通过CVD反应室尺寸限制,并且可扩展以在基片上生产具有相同数量的石墨烯层的多晶石墨烯薄膜。 可以使用不需要组装独立生产的单层石墨烯的方法来生产均匀的双层石墨烯。 该方法包括CVD方法,其中与常规方法相比,反应气体在相对低的压力下在室中流动,然后与常规方法相比,反应室中的温度相对较慢地降低。 均匀多层石墨烯的一个应用是透明导体。 在需要多次转移单层石墨烯以实现多层石墨烯结构的方法中,所公开的方法可以将工艺步骤的数量减少至少一半。

    METHOD AND APPARATUS FOR CONTROLLING LUMINANCE

    公开(公告)号:US20220383791A1

    公开(公告)日:2022-12-01

    申请号:US17750078

    申请日:2022-05-20

    Abstract: Provided is an electronic apparatus including a first display, a second display, a lens array between the first display and the second display, a first polarization modulation array between the first display and the lens array, a second polarization modulation array between the lens array and the second display, a memory, and at least one processor configured to identify a first area having a luminance lower than a reference luminance in the second display, identify, to control a first luminance of the first area in the second display to be the reference luminance, a first polarization angle variation corresponding to a first area in the first polarization modulation array and a second polarization angle variation corresponding to a first area in the second polarization modulation array, control the first polarization modulation array based on the first polarization angle variation, and control the second polarization modulation array based on the second polarization angle variation.

Patent Agency Ranking