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    Substrate processing apparatus and substrate processing method
    1.
    发明授权
    Substrate processing apparatus and substrate processing method 有权
    基板加工装置及基板处理方法

    公开(公告)号：US08585830B2

    公开(公告)日：2013-11-19

    申请号：US12698870

    申请日：2010-02-02

    申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

    发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

    IPC分类号： B08B3/00 ,  H01L21/31 ,  G03F7/00 ,  G03F1/00

    CPC分类号： G03F7/70991 ,  G03F7/70341

    摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.

    摘要翻译： 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括以下步骤：通过所述第一处理在基板上形成由感光材料制成的感光膜 所述曝光装置进行曝光处理之前的单元。 该方法还包括在由所述第一处理单元形成所述感光膜之后并且在所述曝光装置进行曝光处理之前，通过所述第二处理单元对所述基板进行洗涤处理，并将所述基板在所述清洗处理之后传送到所述曝光装置。 所述方法还包括从所述曝光装置运送所述基板并将所述第三处理单元的显影处理应用于由所述曝光装置进行曝光处理之后运送的所述基板。

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    3.
    发明申请
    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
    基板处理装置和基板处理方法

    公开(公告)号：US20100136492A1

    公开(公告)日：2010-06-03

    申请号：US12698870

    申请日：2010-02-02

    申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

    发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70991 ,  G03F7/70341

    摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.

    摘要翻译： 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括以下步骤：通过所述第一处理在基板上形成由感光材料制成的感光膜 所述曝光装置进行曝光处理之前的单元。 该方法还包括在由所述第一处理单元形成所述感光膜之后并且在所述曝光装置进行曝光处理之前，通过所述第二处理单元对所述基板进行洗涤处理，并将所述基板在所述清洗处理之后传送到所述曝光装置。 所述方法还包括从所述曝光装置运送所述基板并将所述第三处理单元的显影处理应用于由所述曝光装置进行曝光处理之后运送的所述基板。

    SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
    4.
    发明申请
    SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS 有权
    基板处理方法和基板处理装置

    公开(公告)号：US20090165828A1

    公开(公告)日：2009-07-02

    申请号：US12397632

    申请日：2009-03-04

    申请人： Masanobu Sato ,  Sadao Hirae ,  Shuichi Yasuda

    发明人： Masanobu Sato ,  Sadao Hirae ,  Shuichi Yasuda

    IPC分类号： B08B3/02

    CPC分类号： H01L21/02052 ,  H01L21/67051

    摘要： A substrate treatment method including the steps of: generating droplets of a treatment liquid by mixing the treatment liquid with a gas; and causing the treatment liquid droplets generated in the liquid droplet generating step to impinge on a surface of a substrate being treated. The treatment liquid droplets have a volume median diameter of 5 μm to 40 μm.

    摘要翻译： 一种基板处理方法，包括以下步骤：通过将处理液与气体混合来产生处理液的液滴; 并且使得在液滴产生步骤中产生的处理液滴撞击正被处理的基板的表面。 处理液滴的体积中值粒径为5〜40μm。

    SUBSTRATE PROCESSING APPARATUS WITH MULTI-SPEED DRYING
    5.
    发明申请
    SUBSTRATE PROCESSING APPARATUS WITH MULTI-SPEED DRYING 有权
    具有多速干燥的基板加工装置

    公开(公告)号：US20090073394A1

    公开(公告)日：2009-03-19

    申请号：US12208925

    申请日：2008-09-11

    申请人： Tadashi Miyagi ,  Masashi Kanaoka ,  Kazuhito Shigemori ,  Shuichi Yasuda ,  Masakazu Sanada

    发明人： Tadashi Miyagi ,  Masashi Kanaoka ,  Kazuhito Shigemori ,  Shuichi Yasuda ,  Masakazu Sanada

    IPC分类号： G03B27/32 ,  B08B13/00

    CPC分类号： H01L21/67034 ,  H01L21/67051 ,  H01L21/67225

    摘要： After a substrate is cleaned, a liquid supply nozzle moves outward from above the center of the substrate while discharging a rinse liquid with the substrate rotated. In this case, a drying region where no rinse liquid exists expands on the substrate. When the liquid supply nozzle moves to above a peripheral portion of the substrate, the rotational speed of the substrate is reduced. The movement speed of the liquid supply nozzle is maintained as it is. Thereafter, the discharge of the rinse liquid is stopped while the liquid supply nozzle moves outward from the substrate. Thus, the drying region spreads over the whole substrate so that the substrate is dried.

    摘要翻译： 在清洁基板之后，液体供应喷嘴从衬底的中心向外移动，同时在衬底旋转的同时排出冲洗液体。 在这种情况下，不存在冲洗液的干燥区域在基板上膨胀。 当液体供给喷嘴移动到基板的周边部分上方时，基板的旋转速度降低。 液体供应喷嘴的运动速度保持原样。 此后，在液体供给喷嘴从基板向外移动的同时停止冲洗液的排出。 因此，干燥区域遍及整个基板，使得基板被干燥。

    APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE
    6.
    发明申请
    APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE 审中-公开
    装置和处理基板的方法

    公开(公告)号：US20090070946A1

    公开(公告)日：2009-03-19

    申请号：US12211549

    申请日：2008-09-16

    申请人： Osamu Tamada ,  Masakazu Sanada ,  Tadashi Miyagi ,  Shuichi Yasuda

    发明人： Osamu Tamada ,  Masakazu Sanada ,  Tadashi Miyagi ,  Shuichi Yasuda

    IPC分类号： B08B3/04 ,  B08B3/12

    CPC分类号： B08B3/02 ,  B08B2203/0288 ,  H01L21/67051

    摘要： A cleaning processing part including an edge cleaning processing unit for cleaning an edge of a substrate is provided in an indexer block. An indexer robot provided in the indexer block transports an unprocessed substrate taken out of a cassette to the cleaning processing part before transporting the unprocessed substrate to an anti-reflection film processing block serving as a processor. The cleaning processing part cleans an edge and a back surface of a substrate.

    摘要翻译： 在分度块中设置有包括用于清洁基板的边缘的边缘清洁处理单元的清洁处理部。 设置在分度器块中的分度器机器人将将未处理的基板输送到用作处理器的防反射膜处理块之前，将从盒中取出的未处理基板输送到清洁处理部。 清洁处理部件清洁基板的边缘和背面。

    SUBSTRATE PROCESSING APPARATUS
    7.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 审中-公开
    基板加工设备

    公开(公告)号：US20070190437A1

    公开(公告)日：2007-08-16

    申请号：US11670108

    申请日：2007-02-01

    申请人： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda ,  Tetsuya Hamada

    发明人： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda ,  Tetsuya Hamada

    IPC分类号： G03C5/00

    CPC分类号： G03F7/70925 ,  G03F7/168 ,  G03F7/7075 ,  G03F7/70916 ,  G03F7/70991 ,  G11B5/8404 ,  G11B7/261 ,  H01L21/67051 ,  H01L21/67225 ,  Y10S134/902

    摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a blush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.

    摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块，清洁/干燥处理块，以及 一个接口块。 曝光装置被布置成与基板处理装置中的界面块相邻。 曝光装置通过浸渍方法使基板进行曝光处理。 在清洁/干燥处理块中的边缘清洁单元中，腮红与旋转基板的端部抵接，从而清洁曝光处理之前的基板的边缘。 此时，校正基板被清洁的位置。

    Cleaning nozzle and substrate cleaning apparatus
    10.
    发明授权
    Cleaning nozzle and substrate cleaning apparatus 有权
    清洗喷嘴和基材清洗装置

    公开(公告)号：US06729561B2

    公开(公告)日：2004-05-04

    申请号：US09976134

    申请日：2001-10-11

    申请人： Sadao Hirae ,  Masanobu Sato ,  Shuichi Yasuda

    发明人： Sadao Hirae ,  Masanobu Sato ,  Shuichi Yasuda

    IPC分类号： B05B704

    CPC分类号： H01L21/67051 ,  B05B7/0433 ,  Y10S239/08

    摘要： A cleaning nozzle includes a mixing portion with inner walls thereof formed of quartz given smoothing treatment. As a result, the inner walls of the mixing portion have smooth surfaces. This construction effectively suppresses abrasion of the inner walls of the mixing portion, and particle generation from the cleaning nozzle. Further, the cleaning nozzle has a supply pipe surrounding a gas introduction pipe. This reduces areas of contact in the mixing portion between a gas and inner walls of the cleaning nozzle, to suppress particle generation with increased effect.

    摘要翻译： 清洁喷嘴包括具有由其进行平滑处理的由石英形成的内壁的混合部分。 结果，混合部分的内壁具有光滑的表面。 这种结构有效地抑制了混合部分的内壁磨损，并且从清洗喷嘴产生颗粒。 此外，清洁喷嘴具有围绕气体导入管的供给管。 这减少了气体与清洁喷嘴的内壁之间的混合部分的接触面积，从而以增加的效果抑制了颗粒的产生。