公开(公告)号：US06461445B1

公开(公告)日：2002-10-08

申请号：US09481504

申请日：2000-01-12

Applicant: Yoshio Hirayama ,  Masao Kawaguchi ,  Toshimichi Morizane ,  Tadao Tokushima

Inventor： Yoshio Hirayama ,  Masao Kawaguchi ,  Toshimichi Morizane ,  Tadao Tokushima

IPC: B08B304

CPC classification number: G11B23/505 ,  B08B3/08 ,  G11B5/8404

Abstract: A glass substrate is cleaned by contacting a preliminarily polished glass surface with functional water having a positive ORP potential for a predetermined period of time in the last rinsing step in order to repair the structure of the glass so as to achieve higher surface hardness and improved corrosion resistance.

Abstract translation: 在最后一个漂洗步骤中，通过使预先抛光的玻璃表面与正ORP电位的官能水接触预定时间来清洁玻璃基板，以便修复玻璃的结构，从而获得更高的表面硬度和改善的腐蚀 抵抗性。

公开(公告)号：US6002196A

公开(公告)日：1999-12-14

申请号：US942027

申请日：1997-10-01

Applicant: Masao Sumita ,  Tadao Tokushima

Inventor： Masao Sumita ,  Tadao Tokushima

IPC: G10K11/165 ,  H01L41/08

CPC classification number: G10K11/165

Abstract: A damping material having a loss factor tan .delta..gtoreq.1 and a small strain amplitude dependence, which is formed by dispersing an organic series dielectric or ferroelectric material in a non-dielectric polymer to have an acicular form wherein the acicular ratio is 5 or more, and the diameter of the acicular dielectric or ferroelectric material is 20 .mu.m or less when it takes a circular acicular form, or a side in cross section of the acicular dielectric or ferroelectric material is 20 .mu.m or less when it takes a rectangular acicular form. The volume ratio of the dielectric or the ferroelectric material to the non-dielectric polymer is preferably 0.3 to 0.7.

Abstract translation: 通过将有机系列电介质或铁电材料分散在非电介质聚合物中以形成针状形式而形成的具有损耗因子tanδ> / = 1的小应变幅度依赖性的阻尼材料，其中针状比为5或 针状电介质或铁电体的直径为圆形针状时为20μm以下，针状电介质或铁电体的横截面为20μm以下时， 针状形式 电介质或铁电体与非电介质聚合物的体积比优选为0.3〜0.7。

公开(公告)号：US5273836A

公开(公告)日：1993-12-28

申请号：US885906

申请日：1992-05-18

Applicant: Toshitaka Fujii ,  Naoshi Horiai ,  Tadao Tokushima ,  Michihiko Kubota

Inventor： Toshitaka Fujii ,  Naoshi Horiai ,  Tadao Tokushima ,  Michihiko Kubota

IPC: G11B11/105 ,  G11B5/66

CPC classification number: G11B11/10586 ,  Y10S428/90

Abstract: Significant improvement in corrosion resistance of a magnetooptic material for electric and electronic applications is achieved by a composition (RE.sub.a, TM.sub.b)1-c-.sub.d M.sub.c Be.sub.d of specified content ratios of the components, typically a Tb-Fe-Co type alloy with combined addition of M and Be.

Abstract translation: 用于电气和电子应用的磁光材料的耐腐蚀性的显着改善通过组分（REa，TMb）1-c-dMcBed来实现，所述组合物通过组分的特定含量比（通常为Tb-Fe-Co型合金）与组合添加 M和Be。

公开(公告)号：US5108812A

公开(公告)日：1992-04-28

申请号：US408385

申请日：1989-09-18

Applicant: Toshiro Takahashi ,  Noboru Tsuya ,  Tadao Tokushima

Inventor： Toshiro Takahashi ,  Noboru Tsuya ,  Tadao Tokushima

IPC: G11B5/82 ,  G11B5/73 ,  G11B5/738 ,  G11B5/84

CPC classification number: G11B5/7305 ,  G11B5/8404 ,  Y10S428/90 ,  Y10T428/12028 ,  Y10T428/12042 ,  Y10T428/12389 ,  Y10T428/12396 ,  Y10T428/12479 ,  Y10T428/12493 ,  Y10T428/12736 ,  Y10T428/12993 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/2457 ,  Y10T428/24612 ,  Y10T428/24802 ,  Y10T428/24917 ,  Y10T428/31678

Abstract: A substrate for a magnetic disk, having fine roughness formed on its surface by subjecting aluminum or an aluminum alloy to anodic oxidation, packing pores in the anodized layer thereby formed, with a material different in the physicochemical properties from the anodized layer, and letting a plating material grow selectively by an epitaxial method.

Abstract translation: 通过使铝或铝合金进行阳极氧化，在其表面上形成微细的粗糙度的基板，由此形成的阳极氧化层中的孔与来自阳极氧化层的物理化学性质不同的材料，使 电镀材料通过外延法选择性地生长。

公开(公告)号：US4985306A

公开(公告)日：1991-01-15

申请号：US462381

申请日：1990-01-09

Applicant: Toshinori Morizane ,  Tadao Tokushima

Inventor： Toshinori Morizane ,  Tadao Tokushima

IPC: C03C15/00 ,  G11B5/82 ,  G11B5/84

CPC classification number: G11B5/82 ,  C03C15/00 ,  G11B5/8404 ,  Y10T428/24479

Abstract: Herein disclosed is a method for manufacturing a base plate for a recording disc, which comprises steps of: subjecting a base plate containing therein SiO.sub.2 -Li.sub.2 O-Al.sub.2 O.sub.3 series crystallized glass to crystallizing treatment; then polishing the surface of said base plate; and thereafter subjecting the base plate to etching treatment with use of etching agents having different rates of etching between the crystallized layer and the amorphous layer, and also a base plate for a recording disc which is produced by the method as described above.

Abstract translation: 这里公开了一种用于制造记录盘用基板的方法，其包括以下步骤：将含有SiO 2 -Li 2 O-Al 2 O 3系列结晶玻璃的底板进行结晶处理; 然后抛光所述基板的表面; 然后使用在结晶层和非晶层之间具有不同蚀刻速率的蚀刻剂以及通过上述方法制造的用于记录盘的基板对基板进行蚀刻处理。

公开(公告)号：US4895762A

公开(公告)日：1990-01-23

申请号：US132929

申请日：1987-12-15

Applicant: Tadao Tokushima ,  Makoto Shiraki ,  Yoshifumi Suzuki ,  Yukio Wakui

Inventor： Tadao Tokushima ,  Makoto Shiraki ,  Yoshifumi Suzuki ,  Yukio Wakui

IPC: G11B5/66 ,  G11B5/64 ,  G11B5/65 ,  G11B5/73 ,  G11B5/738 ,  G11B5/82

CPC classification number: G11B5/7325 ,  G11B5/738 ,  Y10S428/90

Abstract: In construction of a magnetic recording material having overlaid anodic oxide layers and well suited for perpendicular magnetic recording, a substrate is made of a hard material and Al predominant layers of 0.1 to 2 .mu.m thickness and formed on the substrate as a base for the overlaid anodic oxide layers for improvement in mechanical properties with acceptable magnetic recording characteristics.

Abstract translation: 在具有重叠的阳极氧化层并且非常适合于垂直磁记录的磁记录材料的构造中，衬底由硬质材料制成，并且具有0.1至2μm厚度的Al主要层，并形成在衬底上作为覆盖的基底 阳极氧化层，用于改善具有可接受的磁记录特性的机械性能。

公开(公告)号：US06531047B1

公开(公告)日：2003-03-11

申请号：US09588225

申请日：2000-06-06

Applicant: Takamitsu Kato ,  Mitsugi Maekawa ,  Yuichi Hyakusoku ,  Tadao Tokushima ,  Masaaki Kato

Inventor： Takamitsu Kato ,  Mitsugi Maekawa ,  Yuichi Hyakusoku ,  Tadao Tokushima ,  Masaaki Kato

IPC: B05D500

CPC classification number: G11B5/8404 ,  C23C18/1689 ,  C23C18/32 ,  G11B5/012 ,  G11B5/74 ,  G11B5/82 ,  G11B2005/001

Abstract: A surface modification method for an aluminum substrate, which comprises treating a Ni—P plated aluminum substrate with a functional water having a plus or minus oxidation-reduction potential for a predetermined period of time in a washing step after a polishing step of the Ni—P plated aluminum substrate.

Abstract translation: 一种铝基板的表面改性方法，其特征在于，在Ni- P电镀铝基板的研磨工序后，在洗涤工序中，将具有正或负的氧化还原电位的官能水处理规定时间， P镀铝基板。

公开(公告)号：US5209837A

公开(公告)日：1993-05-11

申请号：US735945

申请日：1991-07-25

Applicant: Noboru Tsuya ,  Tadao Tokushima ,  Toshiro Takahashi

Inventor： Noboru Tsuya ,  Tadao Tokushima ,  Toshiro Takahashi

IPC: G11B5/73 ,  G11B5/84

CPC classification number: G11B5/84 ,  G11B5/73

Abstract: This invention relates to a process for preparing a magnetic disk, which comprises (a) subjecting a substrate having an anodized aluminum film to mirror surface-finishing, (b) widening pores of the anodized aluminum film by chemical dissolution treatment so that the total area of pores becomes from 20 to 80% of the entire surface area, thereby retaining crystalline alumina of the anodized aluminum film extruded after the chemical dissolution treatment, and (c) coating the resultant substrate with a magnetic continuous thin film.

Abstract translation: 本发明涉及一种制备磁盘的方法，该方法包括：（a）对具有阳极氧化铝膜的基板进行镜面整理，（b）通过化学溶解处理使阳极氧化铝膜的孔扩大，使得总面积 的孔变成整个表面积的20至80％，从而保持化学溶解处理后挤出的阳极化铝膜的结晶氧化铝，（c）用磁性连续薄膜涂覆所得基材。

公开(公告)号：US5047274A

公开(公告)日：1991-09-10

申请号：US218202

申请日：1988-07-13

Applicant: Noboru Tsuya ,  Tadao Tokushima ,  Toshiro Takahashi

Inventor： Noboru Tsuya ,  Tadao Tokushima ,  Toshiro Takahashi

IPC: G11B5/73 ,  G11B5/84

CPC classification number: G11B5/84 ,  G11B5/7315 ,  Y10S428/90

Abstract: A substrate for a magnetic recording disk, made of anodized aluminum having its pores packed with a non magnetic material and having been subjected to polishing followed by an etching treatment to form a finely roughened surface due to preferential etching of either the aluminum or the non magnetic material.

公开(公告)号：US4911987A

公开(公告)日：1990-03-27

申请号：US388096

申请日：1989-08-01

Applicant: Kimiko Sakata ,  Tadao Tokushima

Inventor： Kimiko Sakata ,  Tadao Tokushima

IPC: B32B18/00 ,  C04B37/02 ,  C04B41/50 ,  C04B41/87 ,  C04B41/88 ,  C23C4/18

CPC classification number: C04B41/009 ,  C04B35/5611 ,  C04B35/5626 ,  C04B35/565 ,  C04B35/58 ,  C04B35/58014 ,  C04B35/6269 ,  C04B35/63452 ,  C04B37/026 ,  C04B37/028 ,  C04B41/5025 ,  C04B41/87 ,  C23C4/18 ,  C04B2235/528 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/658 ,  C04B2235/6581 ,  C04B2237/06 ,  C04B2237/08 ,  C04B2237/083 ,  C04B2237/09 ,  C04B2237/121 ,  C04B2237/122 ,  C04B2237/123 ,  C04B2237/343 ,  C04B2237/346 ,  C04B2237/348 ,  C04B2237/402 ,  C04B2237/406 ,  C04B2237/52 ,  C04B2237/55 ,  C04B2237/61 ,  C04B2237/704 ,  C04B2237/706 ,  C04B2237/708

Abstract: A bonded structure of a metal and a ceramic, in which a layer of the ceramic is coated on the surface of the metal as a substrate through an interlayer, or in which a layer of the metal is coated on the surface of the ceramic as a substrate through an interlayer, wherein said interlayer consists of(a) a composition composed of 0.2 to 4 mole % of yttria and a balanced mole % of the main component of the metal to bonded in which a powder of said metal and a powder of yttria are intimately mixed and then given a mechanical impact whereby the two powders are bonded to each other to form a nearly spherical composite powder or(b) a composite composed of 0.2 to 4 mole % of yttria, up to 2 mole % of the main component of the ceramic to be bonded and a balanced mole % of the main component of the metal to be bonded, in which a powder of said metal, a powder of yttria and a powder of said ceramic are intimately mixed and then given a mechanical impact, whereby these powders are bonded to one another to form a nearly spherical composite powder,said interlayer is formed by plasma-spraying the components of said composition onto the ceramic or metal to be bonded, or by coating the components of said composition on the ceramic or metal to be bonded and then heat-treating the resulting structure at a high temperature in vacuum or in an inert gas.

Abstract translation: 金属和陶瓷的结合结构，其中通过中间层将陶瓷层作为基板涂覆在金属的表面上，或者在陶瓷的表面上涂覆有金属层作为 基材通过中间层，其中所述中间层由（a）由0.2至4摩尔％的氧化钇组成的组合物和所键合的金属主要组分的平衡摩尔％，其中所述金属的粉末和氧化钇粉末 紧密混合，然后给予机械冲击，由此将两种粉末彼此粘合以形成近似球形的复合粉末，或（b）由0.2至4摩尔％的氧化钇组成的复合材料，至多2摩尔％的主要组分 的待结合的陶瓷和待结合的金属的主要成分的平衡摩尔％，其中所述金属的粉末，氧化钇的粉末和所述陶瓷的粉末紧密混合，然后进行机械冲击， 由此这些粉末与一个a结合 通过将所述组合物的组分等离子体喷涂到待粘合的陶瓷或金属上，或者通过将所述组合物的组分涂覆在待粘合的陶瓷或金属上，然后加热，形成近似球形的复合粉末 在真空中或在惰性气体中，在高温下将所得结构加热。