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公开(公告)号：US5074971A
公开(公告)日：1991-12-24
申请号：US483895
申请日：1990-02-23
申请人： Noboru Tsuya , Tadao Tokushima , Toshiro Takahashi
发明人： Noboru Tsuya , Tadao Tokushima , Toshiro Takahashi
CPC分类号： G11B5/84 , G11B5/7315
摘要： This invention relates to a process for preparing a magnetic disk, which comprises (a) subjecting a substrate having an anodized aluminum film to mirror surface-finishing, (b) widening pores of the anodized aluminum film by chemical dissolution treatment so that the total area of pores becomes from 20 to 80% of the entire surface area, thereby retaining crystalline alumina of the anodized aluminum film extruded after the chemical dissolution treatment, and (c) coating the resultant substrate with a magnetic continuous thin film.
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公开(公告)号：US4925738A
公开(公告)日：1990-05-15
申请号：US250088
申请日：1988-09-28
申请人： Noboru Tsuya , Tadao Tokushima , Toshiro Takahashi
发明人： Noboru Tsuya , Tadao Tokushima , Toshiro Takahashi
CPC分类号： G11B5/84 , G11B5/7315
摘要： A substrate for a magnetic disk, having an anodized aluminum coating layer with pores widened by chemical dissolution so that the total area of pores is from 20 to 80% of the entire surface area.
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公开(公告)号：US5108812A
公开(公告)日：1992-04-28
申请号：US408385
申请日：1989-09-18
申请人： Toshiro Takahashi , Noboru Tsuya , Tadao Tokushima
发明人： Toshiro Takahashi , Noboru Tsuya , Tadao Tokushima
CPC分类号： G11B5/7305 , G11B5/8404 , Y10S428/90 , Y10T428/12028 , Y10T428/12042 , Y10T428/12389 , Y10T428/12396 , Y10T428/12479 , Y10T428/12493 , Y10T428/12736 , Y10T428/12993 , Y10T428/24355 , Y10T428/24479 , Y10T428/2457 , Y10T428/24612 , Y10T428/24802 , Y10T428/24917 , Y10T428/31678
摘要： A substrate for a magnetic disk, having fine roughness formed on its surface by subjecting aluminum or an aluminum alloy to anodic oxidation, packing pores in the anodized layer thereby formed, with a material different in the physicochemical properties from the anodized layer, and letting a plating material grow selectively by an epitaxial method.
摘要翻译： 通过使铝或铝合金进行阳极氧化，在其表面上形成微细的粗糙度的基板，由此形成的阳极氧化层中的孔与来自阳极氧化层的物理化学性质不同的材料，使 电镀材料通过外延法选择性地生长。
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公开(公告)号：US5209837A
公开(公告)日：1993-05-11
申请号：US735945
申请日：1991-07-25
申请人： Noboru Tsuya , Tadao Tokushima , Toshiro Takahashi
发明人： Noboru Tsuya , Tadao Tokushima , Toshiro Takahashi
摘要： This invention relates to a process for preparing a magnetic disk, which comprises (a) subjecting a substrate having an anodized aluminum film to mirror surface-finishing, (b) widening pores of the anodized aluminum film by chemical dissolution treatment so that the total area of pores becomes from 20 to 80% of the entire surface area, thereby retaining crystalline alumina of the anodized aluminum film extruded after the chemical dissolution treatment, and (c) coating the resultant substrate with a magnetic continuous thin film.
摘要翻译： 本发明涉及一种制备磁盘的方法，该方法包括：（a）对具有阳极氧化铝膜的基板进行镜面整理，（b）通过化学溶解处理使阳极氧化铝膜的孔扩大，使得总面积 的孔变成整个表面积的20至80％，从而保持化学溶解处理后挤出的阳极化铝膜的结晶氧化铝，（c）用磁性连续薄膜涂覆所得基材。
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5.发明授权Annodized aluminum substrate for a magnetic recording disk in which pores are filled with a non magnetic material and the surface polished and etched 失效用于磁记录盘的蜂窝状铝基板，其中孔被非磁性材料填充并且表面被抛光和蚀刻
公开(公告)号：US5047274A
公开(公告)日：1991-09-10
申请号：US218202
申请日：1988-07-13
申请人： Noboru Tsuya , Tadao Tokushima , Toshiro Takahashi
发明人： Noboru Tsuya , Tadao Tokushima , Toshiro Takahashi
CPC分类号： G11B5/84 , G11B5/7315 , Y10S428/90
摘要： A substrate for a magnetic recording disk, made of anodized aluminum having its pores packed with a non magnetic material and having been subjected to polishing followed by an etching treatment to form a finely roughened surface due to preferential etching of either the aluminum or the non magnetic material.
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公开(公告)号：US4681669A
公开(公告)日：1987-07-21
申请号：US798234
申请日：1985-11-14
CPC分类号： C25D11/20 , G11B5/84 , Y10S205/922
摘要： In production of magnetic recording media by anode oxidation of an Al predominant substrate, deposition of ferromagnetic substance in substrate pores and final grinding, use of a substrate having a surface K-value of 0.5 or larger enables easy production of media with surface roughness well suited for ideal high density magnetic recording. The K-value is the ratio of X-ray reflection intensity of the crystal plane S(1,1,1) and the toal X-ray reflection intensity of all crystal planes.
摘要翻译： 在通过Al主要衬底的阳极氧化生产磁记录介质时，将铁磁性物质沉积在衬底孔中并进行最终研磨，使用表面K值为0.5或更大的衬底使得能够容易地制备表面粗糙度非常好的介质 用于理想的高密度磁记录。 K值是晶面S（1,1,1）的X射线反射强度与所有晶面的X射线反射强度之比。
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公开(公告)号：US06913685B2
公开(公告)日：2005-07-05
申请号：US10172909
申请日：2002-06-18
CPC分类号： C08J7/045 , C02F1/467 , C02F2001/46195 , C02F2209/04 , C02F2305/023 , C08J7/12
摘要： A plastic substrate is processed by a functional water obtained by electrolysis of water or functional water containing active oxygen or active hydrogen for a predetermined time period to selectively remove an alkali and/or halogen component in a surface layer of the plastic substrate to stabilize or remove oligomer in a resin matrix, whereby deterioration of resin and deterioration of properties of a recording medium caused by a remaining unreacted catalyst used for processing the plastic substrate surface or the like can be prevented and the adhesion strength and the durability of a recoding coating to be formed on the substrate are improved.
摘要翻译： 塑料基板由通过电解水或含有活性氧或活性氢的官能水预定时间段而获得的官能水进行处理，以选择性地除去塑料基材的表面层中的碱和/或卤素组分以稳定或除去 可以防止树脂基体中的低聚物，由此可以防止树脂的劣化和由用于处理塑料基材表面等的剩余的未反应催化剂引起的记录介质的性能劣化，并且可以将记录涂层的粘合强度和耐久性 在基板上形成的改善。
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8.发明授权Method of cleaning glass substrate for magnetic disk or semiconductor substrate 失效清洁磁盘或半导体衬底的玻璃衬底的方法
公开(公告)号：US6048466A
公开(公告)日：2000-04-11
申请号：US44228
申请日：1998-03-19
CPC分类号： G11B5/8404
摘要： To propose a method of cleaning a surface of a glass substrate fabricated by a process of strengthening a surface thereof by alkaline ion exchange reaction by selectively removing alkaline metal on the surface by cleaning the surface by using an activated ionic water produced by electric polarization and as a result, to provide a glass substrate for a magnetic disk having a magnetic medium with insignificant corrosion and excellent S/N ratio, in cleaning a glass substrate for a magnetic disk using a glass substrate pulled up from a chemically strengthening treatment solution produced by an alkaline ion exchange reaction, after a final polishing step of fabricating the glass substrate for a magnetic disk, the glass substrate is cleaned by an activated anodically electrolyzed water produced by electric polarization to thereby selectively remove the alkaline metal at the vicinity of the surface.
摘要翻译： 提出一种通过碱性离子交换反应来强化其表面的方法来清洗玻璃基板的表面的方法，通过使用由电极化产生的活化离子水清洗表面，并且通过选择性地除去表面上的碱金属 结果是，提供一种具有磁性介质的玻璃基板，该磁盘具有不可忽视的腐蚀和优异的S / N比，在使用从由化学强化处理液生产的化学强化处理溶液提拉的玻璃基板上清洁用于磁盘的玻璃基板 碱性离子交换反应，在制造用于磁盘的玻璃基板的最终研磨步骤之后，通过由电极化产生的活性阳极电解水来清洗玻璃基板，从而选择性地除去表面附近的碱金属。
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公开(公告)号：US06461445B1
公开(公告)日：2002-10-08
申请号：US09481504
申请日：2000-01-12
IPC分类号： B08B304
CPC分类号： G11B23/505 , B08B3/08 , G11B5/8404
摘要： A glass substrate is cleaned by contacting a preliminarily polished glass surface with functional water having a positive ORP potential for a predetermined period of time in the last rinsing step in order to repair the structure of the glass so as to achieve higher surface hardness and improved corrosion resistance.
摘要翻译： 在最后一个漂洗步骤中，通过使预先抛光的玻璃表面与正ORP电位的官能水接触预定时间来清洁玻璃基板，以便修复玻璃的结构，从而获得更高的表面硬度和改善的腐蚀 抵抗性。
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公开(公告)号：US6002196A
公开(公告)日：1999-12-14
申请号：US942027
申请日：1997-10-01
申请人： Masao Sumita , Tadao Tokushima
发明人： Masao Sumita , Tadao Tokushima
IPC分类号： G10K11/165 , H01L41/08
CPC分类号： G10K11/165
摘要： A damping material having a loss factor tan .delta..gtoreq.1 and a small strain amplitude dependence, which is formed by dispersing an organic series dielectric or ferroelectric material in a non-dielectric polymer to have an acicular form wherein the acicular ratio is 5 or more, and the diameter of the acicular dielectric or ferroelectric material is 20 .mu.m or less when it takes a circular acicular form, or a side in cross section of the acicular dielectric or ferroelectric material is 20 .mu.m or less when it takes a rectangular acicular form. The volume ratio of the dielectric or the ferroelectric material to the non-dielectric polymer is preferably 0.3 to 0.7.
摘要翻译： 通过将有机系列电介质或铁电材料分散在非电介质聚合物中以形成针状形式而形成的具有损耗因子tanδ> / = 1的小应变幅度依赖性的阻尼材料，其中针状比为5或 针状电介质或铁电体的直径为圆形针状时为20μm以下，针状电介质或铁电体的横截面为20μm以下时， 针状形式 电介质或铁电体与非电介质聚合物的体积比优选为0.3〜0.7。
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