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公开(公告)号：US09994685B2
公开(公告)日：2018-06-12
申请号：US14129426
申请日：2012-06-27
申请人： Takahiro Sakaguchi
发明人： Takahiro Sakaguchi
IPC分类号： C08J5/18 , C08F212/08 , C08F212/02 , C08F220/28 , C08F220/32 , C08F220/34 , C08F220/36 , G02B1/04 , G02B3/00 , C08G59/02 , C08L25/04 , C08L25/14 , C08L63/00
CPC分类号： C08J5/18 , C08F212/08 , G02B1/041 , C08F220/34 , C08F2220/282 , C08F2220/281 , C08F2220/325 , C08F220/32 , C08F2220/343 , C08F220/20 , C08F220/58 , C08L25/14
摘要： There is provided a resin composition including a copolymer having structural units of Formula (1), Formula (2), and Formula (3), and a solvent; or a resin composition including a copolymer having structural units of Formula (1), Formula (4), and Formula (5), and a solvent.
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公开(公告)号：US08940470B2
公开(公告)日：2015-01-27
申请号：US12451474
申请日：2008-05-14
CPC分类号： G03F7/0233 , G02B3/00 , G03F7/0005 , G03F7/38
摘要： A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.
摘要翻译： 提供了具有耐热性，高分辨率和高光提取效率的微透镜材料。 正型抗蚀剂组合物包含含有具有芳香稠合环或其衍生物的单元结构的碱溶性聚合物和具有经历光分解以产生碱溶性基团的有机基团的化合物。 正型抗蚀剂组合物具有在633nm的折射率为1.6以上的折射率和400〜730nm的波长的透射率为80％以上的涂膜性质。 图案形成方法包括施加正性抗蚀剂组合物，干燥组合物，使组合物曝光并显影组合物。
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公开(公告)号：US08867824B2
公开(公告)日：2014-10-21
申请号：US13408024
申请日：2012-02-29
CPC分类号： G06T7/90 , G06T5/003 , G06T5/008 , G06T7/593 , G06T2207/10021 , G06T2207/10024 , G06T2207/10028 , G06T2207/20076 , G06T2207/20172 , G06T2207/30201 , H04N13/128 , H04N13/271
摘要： An image processing apparatus includes a depth control signal generation unit generating a depth control signal controlling emphasis of the feel of each region of an input image based on the depth position of a subject in each region of the input image; a face skin region control signal generation unit generating a face skin region control signal controlling emphasis of the feel of each region in the input image based on the human face skin region in the input image; a person region control signal generation unit generating a person region control signal controlling emphasis of the feel of each region in the input image based on the region of the person in the input image; and a control signal synthesis unit synthesizing the depth control signal, the face skin region control signal, and the person region control signal to generate a control signal.
摘要翻译： 图像处理装置包括：深度控制信号生成单元，根据输入图像的各区域中的被摄体的深度位置，生成控制输入图像的各区域的感觉强度的深度控制信号; 面部皮肤区域控制信号生成单元，基于输入图像中的人脸皮肤区域生成控制输入图像中的各区域的感觉的强调的面部皮肤区域控制信号; 人物区域控制信号生成单元，基于输入图像中的人的区域，生成控制输入图像中的各区域的感觉的强调的人物区域控制信号; 以及合成深度控制信号，面部皮肤区域控制信号和人物区域控制信号的控制信号合成单元，以产生控制信号。
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公开(公告)号：US08766158B2
公开(公告)日：2014-07-01
申请号：US13574897
申请日：2011-01-20
申请人： Shinya Arase , Takahiro Sakaguchi
发明人： Shinya Arase , Takahiro Sakaguchi
CPC分类号： G02B3/0012 , G02B3/0056 , H01L27/14627 , H01L27/14685
摘要： A production method of a solid-state imaging device in which microlenses are arranged adjacent to each other on a substrate, includes: a first process of forming first microlenses on a surface of the substrate leaving space therebetween for providing second microlenses; and a second process of applying an overcoating material onto the surface of the substrate on which the first microlenses are formed, drying the overcoating material, exposing the overcoating material to light using a gray scale mask, and developing the exposed overcoating material, so as to form second microlenses in the space between the first microlenses adjacent to each other.
摘要翻译： 其中微透镜在衬底上彼此相邻布置的固态成像器件的制造方法包括：在衬底的表面上形成第一微透镜并在其间留出空间以提供第二微透镜的第一工艺; 以及将外涂层材料施加到其上形成有第一微透镜的基板的表面上的第二过程，干燥外涂层材料，使用灰度掩模将外涂层材料暴露于光，并显影曝光的外涂层材料，以便 在彼此相邻的第一微透镜之间的空间中形成第二微透镜。
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公开(公告)号：US20130310480A1
公开(公告)日：2013-11-21
申请号：US13982316
申请日：2012-01-12
申请人： Takahiro Sakaguchi
发明人： Takahiro Sakaguchi
IPC分类号： G02B1/04
CPC分类号： G02B1/041 , C08F12/24 , C08F212/12 , C08F212/14 , C08F212/32 , C08F216/1416 , C08F222/40 , G03F7/0382 , C08F2222/402 , C08F2216/1433
摘要： There is provided a photosensitive resin composition for forming a microlens. A photosensitive resin composition for forming a microlens, the photosensitive resin composition comprising: a component (A), a component (B), a component (C) and a solvent. The component (A) is a copolymer having a maleimide structural unit of formula (1) below, a vinyl ether structural unit of formula (2) below, and at least one of the three structural units of formula (3), formula (4), and formula (5) below, the component (B) is a photosensitizer, and the component (C) is a cross-linking agent (where X is a C1-20 hydrocarbon group that optionally has an ether bond or a cyclic structure; Y is an organic group that optionally has a substituent; and Z is an aromatic hydrocarbon group or an alkoxy group that optionally has a substituent).
摘要翻译： 提供了一种用于形成微透镜的感光性树脂组合物。 用于形成微透镜的感光性树脂组合物，所述感光性树脂组合物包含：成分（A），成分（B），成分（C）和溶剂。 组分（A）是具有下式（1）的马来酰亚胺结构单元，下式（2）的乙烯基醚结构单元和式（3），式（4）的三个结构单元中的至少一个的共聚物 ）和下式（5）中，成分（B）为光敏剂，成分（C）为交联剂（其中X为任选具有醚键或环状结构的C 1-20烃基 Y是任选具有取代基的有机基团; Z是任选具有取代基的芳族烃基或烷氧基）。
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公开(公告)号：US08361694B2
公开(公告)日：2013-01-29
申请号：US12450599
申请日：2008-04-04
申请人： Takahiro Sakaguchi , Tetsuya Shinjo
发明人： Takahiro Sakaguchi , Tetsuya Shinjo
CPC分类号： G03F7/11 , G03F7/091 , H01L21/0271 , H01L21/0276
摘要： It is a problem to provide a resist underlayer film forming composition containing a fullerene derivative, which is easily applied on a substrate and from which a resist underlayer film excellent in dry etching properties can be obtained. The problem is solved by for example a resist underlayer film forming composition comprising: a fullerene derivative represented by Formula (3): (where, R4 represents one group selected from a group consisting of a hydrogen atom, an alkyl group which optionally has a substituent, an aryl group which optionally has a substituent and a heterocyclic group which optionally has a substituent; and R5 represents an alkyl group which optionally has a substituent or an aryl group which optionally has a substituent); and an organic solvent.
摘要翻译： 提供含有富勒烯衍生物的抗蚀剂下层膜形成组合物是容易施加在基材上并且可以获得干蚀刻性能优异的抗蚀剂下层膜的问题。 该问题通过例如抗蚀剂下层膜形成组合物来解决，该组合物包含：由式（3）表示的富勒烯衍生物：（其中，R4表示选自氢原子，任选具有取代基的烷基， 任选具有取代基的芳基和任选具有取代基的杂环基; R5表示任选具有取代基的烷基或任选具有取代基的芳基; 和有机溶剂。
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7.发明授权Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative 有权含有乙烯基萘树脂衍生物的光刻用涂布型下层涂料组合物公开(公告)号：US08257908B2
公开(公告)日：2012-09-04
申请号：US11990855
申请日：2006-08-15
摘要： [Object] To provide a coating-type underlayer coating forming composition that is applied for multi-ply coating process by thin film resist in order to prevent collapse of resist pattern after development with miniaturization of resist pattern, and that shows a sufficient etching resistance against a semiconductor substrate to be processed on processing of the substrate by having a low dry etching rate compared with the photoresist and substrate.[Means for solving problems] A coating-type underlayer coating forming composition that is used for lithography process by multi-ply coating, comprising a polymer containing a vinylnaphthalene based structural unit and an acrylic acid based structural unit containing an aromatic hydroxy group or a hydroxy-containing ester. A coating-type underlayer coating forming composition further comprising an acrylic acid based structural unit containing an aliphatic cyclic compound-containing ester or an aromatic compound-containing ester.
摘要翻译： 本发明提供一种涂布型下层涂料组合物，其通过薄膜抗蚀剂施加于多层涂布工艺，以防止抗蚀剂图案的小型化后显影后的抗蚀剂图案的塌陷，并且显示出足够的耐蚀刻性 通过与光致抗蚀剂和基板相比具有低的干蚀刻速率来处理基板的半导体基板。 解决问题的手段一种涂布型下层涂料形成用组合物，其用于通过多层涂布的光刻工艺，其包含含有乙烯基萘基结构单元的聚合物和含有芳族羟基或羟基的丙烯酸基结构单元 含酯。 一种涂布型下层涂料形成组合物，还包含含有含脂族环状化合物的酯或含芳族化合物的酯的基于丙烯酸的结构单元。
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公开(公告)号：US20120156598A1
公开(公告)日：2012-06-21
申请号：US13391761
申请日：2010-06-21
CPC分类号： C08F26/06 , G02B1/043 , G03F7/0005 , G03F7/0233 , G03F7/40 , C08L33/24
摘要： There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.
摘要翻译： 提供了用于微透镜的感光性树脂组合物。 包含组分（A），组分（B）和组分（C）的微透镜感光树脂组合物，其中组分（A）是具有式（1）的马来酰亚胺结构单元，组分（ B）是交联剂，组分（C）是光敏剂。
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公开(公告)号：US20110291605A1
公开(公告)日：2011-12-01
申请号：US13105480
申请日：2011-05-11
IPC分类号： H02P1/50
摘要： There is provided a single-phase AC synchronized motor that does not need smooth of rectifier waves but stably performs shift from a starting operation to a synchronized operation. In the motor, based on detected signals of a position sensor, rectified current is reciprocally flowed to each direction of a single-phase coil which starts the motor. The motor includes a start-up operation circuit with a sensor starting period that increases a rotational speed until reaching to a first predetermined rotational speed; and a control device that controls operation of the motor as that shift to synchronized operation is performed when a rotational speed of a permanent magnetic rotor is reached to a second predetermined rotational speed nearby a synchronized rotational speed but not exceeding the synchronized rotational speed, and when the rise and fall of detected signals of the position sensor and the zero-cross point of AC current are approximately correspondent to each other.
摘要翻译： 提供了单相AC同步电动机，其不需要整流波的平滑，而是稳定地执行从启动操作到同步操作的移位。 在电动机中，基于位置传感器的检测信号，整流电流往复地流向启动电动机的单相线圈的各个方向。 电动机包括具有传感器启动时段的启动操作电路，其增加转速直到达到第一预定转速; 以及当永磁转子的转速达到同步转速附近的第二预定转速而不超过同步转速时，执行转向同步操作的电动机的操作的控制装置，何时 位置传感器的检测信号和交流电流的过零点的上升和下降大致对应。
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公开(公告)号：US20110096986A1
公开(公告)日：2011-04-28
申请号：US12869115
申请日：2010-08-26
申请人： Kazuki YOKOYAMA , Takahiro Sakaguchi , Tomoichi Fujisawa , Masayuki Tsumura , Mitsuharu Hoshino
发明人： Kazuki YOKOYAMA , Takahiro Sakaguchi , Tomoichi Fujisawa , Masayuki Tsumura , Mitsuharu Hoshino
IPC分类号： G06K9/46
CPC分类号： G06K9/00228 , G06K9/00221 , G06K9/00261 , H04N5/142 , H04N5/23219 , H04N5/2351 , H04N5/243
摘要： An image processing apparatus includes: a data processing section which processes input image data and obtains output image data; a face detecting section which detects a face image on the basis of the input image data and obtains information about a face image region in which the face image exists; and a processing controller which controls the process of the data processing section on the basis of the information about the face image region obtained in the face detecting section.
摘要翻译： 一种图像处理装置，包括：处理输入图像数据并获得输出图像数据的数据处理部; 面部检测部，其基于输入图像数据检测面部图像，并获取关于面部图像存在的面部图像区域的信息; 以及处理控制器，其基于在面部检测部中获得的关于面部图像区域的信息来控制数据处理部分的处理。
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