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公开(公告)号:US07113841B2
公开(公告)日:2006-09-26
申请号:US10227224
申请日:2002-08-26
申请人: Keita Abe , Shingo Shiotani , Motomasa Kato , Takamitsu Yoshida
发明人: Keita Abe , Shingo Shiotani , Motomasa Kato , Takamitsu Yoshida
CPC分类号: G05B19/4097 , A61F2/2875 , A61F2/30942 , A61F2002/2817 , A61F2002/30948 , A61F2002/30968 , A61F2002/30971 , A61F2310/00293 , B29C64/165 , B29L2031/7532 , B33Y80/00 , G05B2219/35062 , G05B2219/35069 , G05B2219/45168 , Y02P90/265 , Y10S623/901
摘要: An implant designing method to be applied to a body of bone which has a bone deficient portion, wherein the bone being substantially symmetric with respect to a plane of symmetry, includes generating three-dimensional data of the bone based on a plurality of pieces of tomographic data of the bone, and estimating a shape of a bone that is to exist at the bone deficient portion using part of the three-dimensional data corresponding to a symmetrical part of the bone deficient portion.
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公开(公告)号:US06491725B1
公开(公告)日:2002-12-10
申请号:US09691158
申请日:2000-10-19
IPC分类号: A61F244
CPC分类号: A61B17/688 , A61F2/2875 , A61F2002/30112 , A61F2002/30153 , A61F2002/30224 , A61F2002/30299 , A61F2002/30878 , A61F2002/30968 , A61F2230/0004 , A61F2230/0019 , A61F2230/0069 , A61F2230/0093 , A61F2310/00293 , A61L27/12
摘要: A keyhole button used as a supplement of a keyhole portion formed on a cranium is constituted to have a brim portion having front and back surfaces, and a shaft portion integrally provided on the back surface of the brim portion. The front surface of the brim portion is convexed in a first direction, and concaved in a second direction that is perpendicular to the first direction.
摘要翻译: 用作形成在颅骨上的锁眼部分的补充物的键孔按钮构成为具有前后表面的边缘部分和一体地设置在边缘部分的后表面上的轴部。 边缘部的前表面在第一方向上凸起,并且在垂直于第一方向的第二方向上凹陷。
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公开(公告)号:US5571578A
公开(公告)日:1996-11-05
申请号:US372325
申请日:1995-01-13
申请人: Naruhiko Kaji , Riichirou Aoki , Hiroyuki Toyama , Hidemitsu Egawa , Takamitsu Yoshida , Yukio Nishiyama
发明人: Naruhiko Kaji , Riichirou Aoki , Hiroyuki Toyama , Hidemitsu Egawa , Takamitsu Yoshida , Yukio Nishiyama
IPC分类号: H01L21/205 , C23C16/40 , C23C16/509 , H01L21/31 , H01L21/316 , H05H1/24
CPC分类号: H01J37/32165 , C23C16/402 , C23C16/5096 , H01L21/02131 , H01L21/02274 , H01L21/02362 , H01L21/31608
摘要: A plasma CVD device having a chamber, an upper electrode provided in the chamber, an under electrode provided in the chamber to be opposite to the upper electrode and to mount a sample thereon, and a plurality of power sources having a different frequency connected to the upper electrode. Gas is introduced into the chamber of the plasma CVD device, the gas contains at least an organic silicon compound, CF.sub.4 and O.sub.2, and has an element ratio (F/Si) of silicon (Si), constituting the organic silicon compound, to fluorine (F), constituting CF.sub.4, to be set to 15 or more. Si(OC.sub.2 H.sub.5).sub.4 or Si(OCH.sub.3).sub.4 is used as an organic silicon compound.
摘要翻译: 一种等离子体CVD装置,其具有室,设置在室中的上电极,设置在室中的与上电极相对的底电极,并在其上安装样品,以及具有不同频率的多个电源连接到 上电极。 将气体引入到等离子体CVD装置的室中,气体至少含有有机硅化合物CF4和O2,并且构成有机硅化合物的硅(Si)的元素比(F / Si)与氟 (F),构成CF4,设定为15以上。 Si(OC2H5)4或Si(OCH3)4用作有机硅化合物。
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