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公开(公告)号：US08035285B2
公开(公告)日：2011-10-11
申请号：US12499394
申请日：2009-07-08
Applicant: Zhibo Zhao , Tianji Zhao , Rajasingh Schwartz Israel , Jiawei Li
Inventor： Zhibo Zhao , Tianji Zhao , Rajasingh Schwartz Israel , Jiawei Li
Abstract: Disclosed herein are optical interference multilayer coatings having region provided by a physical vapor deposition process and region provided by a chemical vapor deposition process. Also disclosed herein are methods of making such coatings, as well as lamps comprising a light-transmissive envelope, at least a portion of the surface of the light-transmissive envelope being provided with the optical interference multilayer coating noted above. Such coatings, when used on lamps, may advantageously offer improved energy efficiencies for such lamps.
Abstract translation: 本文公开了具有通过物理气相沉积工艺提供的区域和通过化学气相沉积工艺提供的区域的光学干涉多层涂层。 本文还公开了制造这种涂层的方法以及包括透光外壳的灯，透光外壳的表面的至少一部分设置有上述的光学干涉多层涂层。 这种涂层当用于灯时可有利地为这种灯提供改善的能量效率。
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公开(公告)号：US08023609B2
公开(公告)日：2011-09-20
申请号：US11024952
申请日：2004-12-30
Applicant: Catherine Procik Dulka , Young Jin Kim , Rajasingh Schwartz Israel , David Wesley Sandusky , Kevin H. Janora , Peter W. Brown , Tianji Zhao
Inventor： Catherine Procik Dulka , Young Jin Kim , Rajasingh Schwartz Israel , David Wesley Sandusky , Kevin H. Janora , Peter W. Brown , Tianji Zhao
CPC classification number: C23C28/044 , C23C16/0272 , C23C16/405 , C23C28/042 , C23C30/00 , G21C15/28 , G21C19/30 , Y02E30/40
Abstract: Disclosed is a method for reducing electrostatic deposition of charged particles on wetted surfaces that are exposed, periodically or substantially continuously to high velocity fluid flow within a coolant flow path in a nuclear reactor. The method includes depositing a first or base dielectric layer and a second or outer dielectric layer on a conductive surface that forms a portion of a high velocity flow path. The first dielectric layer material is selected to provide improved adhesion and insulation to the conductive surface and the second dielectric layer material is selected to provide suitable adhesion to the first dielectric layer and improved corrosion and/or mechanical resistance in the anticipated operating environment.
Abstract translation: 公开了一种减少在湿表面上的带电粒子的静电沉积的方法，其暴露，周期地或基本上连续地在核反应堆内的冷却剂流动路径内的高速流体流动。 该方法包括在形成高速度流动路径的一部分的导电表面上沉积第一或基底电介质层和第二或外部电介质层。 选择第一介电层材料以提供对导电表面的改进的粘合性和绝缘性，并且选择第二介电层材料以在预期的操作环境中提供对第一介电层的合适的粘合性和改善的腐蚀和/或机械阻力。
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公开(公告)号：US20070138962A1
公开(公告)日：2007-06-21
申请号：US11303284
申请日：2005-12-16
Applicant: Ashfaqul Chowdhury , Roger Hume , Barry Preston , Rajasingh Israel , Tianji Zhao
Inventor： Ashfaqul Chowdhury , Roger Hume , Barry Preston , Rajasingh Israel , Tianji Zhao
Abstract: An improved seal for an electric lamp is provided. An oxidation-resistant coating is provided on the current conductor where the outer lead joins the seal foil, preferably at the pinch seal. The coating is preferably a chromium layer covered by a chromium layer or a silver layer covered by a layer of hydrogenated silicon oxy carbon polymer. The coating is preferably applied via sputtering where the coating is subject to high energy electron or ion bombardment during sputtering. Preferably the coating is applied via sputtering at increased deposition pressure.
Abstract translation: 提供了一种用于电灯的改进的密封件。 在电流导体上提供抗氧化涂层，其中外引线连接密封箔，优选地在夹紧密封处。 涂层优选是由铬层或被一层氢氧化硅氧烷聚合物覆盖的银层覆盖的铬层。 涂层优选通过溅射施加，其中涂层在溅射期间经受高能电子或离子轰击。 优选地，涂层通过溅射在增加的沉积压力下施加。
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公开(公告)号：US06586864B2
公开(公告)日：2003-07-01
申请号：US09862877
申请日：2001-05-22
Applicant: Yutao Zhou , Denis A. Lynch, Jr. , Tianji Zhao , Thomas M. Golz , Rolf S. Bergman , Frank E. Zalar
Inventor： Yutao Zhou , Denis A. Lynch, Jr. , Tianji Zhao , Thomas M. Golz , Rolf S. Bergman , Frank E. Zalar
IPC: H01J516
CPC classification number: F21V7/09 , H01J61/025
Abstract: The invention is related to a reflector lamp comprising a parabolic primary reflecting section, a parabolic or spheric secondary reflecting section joined to the primary reflecting section, a parabolic or spheric tertiary reflecting section joined to the secondary reflecting section, and an incandescent or discharge light source. The secondary and tertiary reflecting sections have faceted surfaces which longitudinally extend along the surface thereof so that most (at least 50%) or substantially all the light reflected by the faceted surfaces avoids the light source and thus the light, which would be absorbed or scattered by the light source, is minimized or substantially eliminated.
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公开(公告)号：US20140029712A1
公开(公告)日：2014-01-30
申请号：US13234578
申请日：2011-09-16
Applicant: Catherine Procik DULKA , Young Jin Kim , Rajasingh Schwartz Israel , David Wesley Sandusky , Kevin H. Janora , Peter W. Brown , Tianji Zhao
Inventor： Catherine Procik DULKA , Young Jin Kim , Rajasingh Schwartz Israel , David Wesley Sandusky , Kevin H. Janora , Peter W. Brown , Tianji Zhao
CPC classification number: C23C28/044 , C23C16/0272 , C23C16/405 , C23C28/042 , C23C30/00 , G21C15/28 , G21C19/30 , Y02E30/40
Abstract: Example embodiments relate to a method and apparatus for reducing electrostatic deposition of charged particles on wetted surfaces that are exposed, periodically or substantially continuously, to high velocity fluid flow within a coolant flow path in a nuclear reactor. The method may include depositing a first or base dielectric layer and a second or outer dielectric layer on a conductive surface that forms a portion of a high velocity flow path to attain the apparatus. The first dielectric layer material is selected to provide improved adhesion and insulation to the conductive surface and the second dielectric layer material is selected to provide suitable adhesion to the first dielectric layer and improved corrosion and/or mechanical resistance in the anticipated operating environment.
Abstract translation: 示例性实施例涉及一种用于减少暴露，周期性或基本连续的润湿表面上的带电粒子在核反应堆内的冷却剂流动路径内的高速流体流动的静电沉积的方法和装置。 该方法可以包括在形成高速流动路径的一部分的导电表面上沉积第一或基底电介质层和第二或外部电介质层以获得该装置。 选择第一介电层材料以提供对导电表面的改进的粘合性和绝缘性，并且选择第二介电层材料以在预期的操作环境中提供对第一介电层的合适的粘合性和改善的腐蚀和/或机械阻力。
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Patent Agency Ranking
公开(公告)号：US20050265512A1
公开(公告)日：2005-12-01
申请号：US11024952
申请日：2004-12-30
Applicant: Catherine Dulka , Young Kim , Rajasingh Israel , David Sandusky , Kevin Janora , Peter Brown , Tianji Zhao
Inventor： Catherine Dulka , Young Kim , Rajasingh Israel , David Sandusky , Kevin Janora , Peter Brown , Tianji Zhao
IPC: G21K4/00 , A61B6/00 , A61B6/02 , C23C16/02 , C23C16/40 , C23C28/04 , C23C30/00 , G01T1/00 , G01T1/20 , G02B27/02 , G21C15/28 , G21C19/30 , H04N5/30 , G21C9/00
CPC classification number: C23C28/044 , C23C16/0272 , C23C16/405 , C23C28/042 , C23C30/00 , G21C15/28 , G21C19/30 , Y02E30/40
Abstract: Disclosed is a method for reducing electrostatic deposition of charged particles on wetted surfaces that are exposed, periodically or substantially continuously to high velocity fluid flow within a coolant flow path in a nuclear reactor. The method includes depositing a first or base dielectric layer and a second or outer dielectric layer on a conductive surface that forms a portion of a high velocity flow path. The first dielectric layer material is selected to provide improved adhesion and insulation to the conductive surface and the second dielectric layer material is selected to provide suitable adhesion to the first dielectric layer and improved corrosion and/or mechanical resistance in the anticipated operating environment.
Abstract translation: 公开了一种减少在湿表面上的带电粒子的静电沉积的方法，其暴露，周期地或基本上连续地在核反应堆内的冷却剂流动路径内的高速流体流动。 该方法包括在形成高速度流动路径的一部分的导电表面上沉积第一或基底电介质层和第二或外部电介质层。 选择第一介电层材料以提供对导电表面的改进的粘合性和绝缘性，并且选择第二介电层材料以在预期的操作环境中提供对第一介电层的合适的粘合性和改善的腐蚀和/或机械阻力。
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公开(公告)号：US06773141B2
公开(公告)日：2004-08-10
申请号：US10098772
申请日：2002-03-14
Applicant: Tianji Zhao , Rajasingh Schwartz Israel , Frederick Walter Dynys , Thomas Gene Parham
Inventor： Tianji Zhao , Rajasingh Schwartz Israel , Frederick Walter Dynys , Thomas Gene Parham
IPC: H01J316
Abstract: A reflector lamp has a generally parabolic shaped housing (12) with an interior surface coated with a layer (14) of silver having a protective layer (16) of a stable protective oxide, such as silica, disposed thereon. An intermediate layer (18), such as a layer of elemental silicon, protects the silver layer during deposition of the silica layer and is completely or substantially consumed during formation of the silica layer. The lamp includes a light source (48) having a longitudinal axis (x) disposed on the parabolic reflector axis and preferably disposed outward of the parabolic focus (F). During lamp fabrication, the protective coating is preferably annealed to improve reflectance. The preferred lamp will have a lumens per watt greater than 14.
Abstract translation: 反射灯具有通常为抛物面形的壳体（12），其内表面涂覆有银层（14），其具有设置在其上的稳定的保护性氧化物（例如二氧化硅）的保护层（16）。 诸如元素硅层的中间层（18）在沉积二氧化硅层期间保护银层，并且在形成二氧化硅层期间完全或基本上被消耗。 灯包括光源（48），其具有设置在抛物面反射器轴线上并且优选地设置在抛物线焦点（F）的外侧的纵向轴线（x）。 在灯制造期间，保护涂层优选退火以提高反射率。 优选的灯将具有大于14的每瓦特流明。
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公开(公告)号：US06382816B1
公开(公告)日：2002-05-07
申请号：US09471354
申请日：1999-12-23
Applicant: Tianji Zhao , Rajasingh Schwartz Israel , Frederick Walter Dynys , Thomas Gene Parham
Inventor： Tianji Zhao , Rajasingh Schwartz Israel , Frederick Walter Dynys , Thomas Gene Parham
IPC: H01J316
Abstract: A reflector lamp has a generally parabolic shaped housing (12) with an interior surface coated with a layer (14) of silver having a protective layer (16) of a stable protective oxide, such as silica, disposed thereon. An intermediate layer (18), such as a layer of elemental silicon, protects the silver layer during deposition of the silica layer and is completely or substantially consumed during formation of the silica layer. The lamp includes a light source (48) having a longitudinal axis (x) disposed on the parabolic reflector axis and preferably disposed outward of the parabolic focus (F). During lamp fabrication, the protective coating is preferably annealed to improve reflectance. The preferred lamp will have a lumens per watt greater than 14.
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公开(公告)号：US06494997B1
公开(公告)日：2002-12-17
申请号：US09641308
申请日：2000-08-18
Applicant: Rajasingh Israel , Tianji Zhao , Rolf Sverre Bergman , Kenneth Marsik
Inventor： Rajasingh Israel , Tianji Zhao , Rolf Sverre Bergman , Kenneth Marsik
IPC: C23C1435
CPC classification number: C23C14/568 , C23C14/352 , C23C14/505
Abstract: A magnetron sputtering device and method for applying an interference layer to a substrate includes a magnetron sputtering chamber (A) which houses a substrate carrying assembly (B). The substrate carrying assembly comprises a primary rotation table (10), rotating about its central vertical axis (12) and at least one secondary table (36) mounted to an upper surface (14) of the primary rotation table. Substrates (42) are either horizontally or vertically loaded on to the secondary table. The substrates rotate about their symmetrical axis. First and second targets (50a, 50b) are housed by the chamber and are disposed on opposite sides of the chamber. The primary rotation table rotates the substrates between a position adjacent a first target where a layer having a low refractive index is applied to the substrates and a position adjacent a second target where a layer having a high refractive index is applied to the substrates.
Abstract translation: 磁控溅射装置和用于将衬底施加到衬底的方法包括容纳衬底承载组件（B）的磁控溅射室（A）。 衬底承载组件包括围绕其中心垂直轴线（12）旋转的主旋转台（10）和安装到主旋转台的上表面（14）的至少一个副工作台（36）。 基板（42）水平或垂直装载到辅助工作台上。 基板围绕其对称轴线旋转。 第一和第二目标（50a，50b）由腔室容纳并且设置在腔室的相对侧上。 主旋转台将基板在与第一目标相邻的位置之间旋转，其中具有低折射率的层被施加到基板，并且与第二目标相邻的位置，其中具有高折射率的层被施加到基板。
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公开(公告)号：US08675806B2
公开(公告)日：2014-03-18
申请号：US13234578
申请日：2011-09-16
Applicant: Catherine Procik Dulka , Young Jin Kim , Rajasingh Schwartz Israel , David Wesley Sandusky , Kevin H. Janora , Peter W. Brown , Tianji Zhao
Inventor： Catherine Procik Dulka , Young Jin Kim , Rajasingh Schwartz Israel , David Wesley Sandusky , Kevin H. Janora , Peter W. Brown , Tianji Zhao
IPC: G21C9/00
CPC classification number: C23C28/044 , C23C16/0272 , C23C16/405 , C23C28/042 , C23C30/00 , G21C15/28 , G21C19/30 , Y02E30/40
Abstract: Example embodiments relate to a method and apparatus for reducing electrostatic deposition of charged particles on wetted surfaces that are exposed, periodically or substantially continuously, to high velocity fluid flow within a coolant flow path in a nuclear reactor. The method may include depositing a first or base dielectric layer and a second or outer dielectric layer on a conductive surface that forms a portion of a high velocity flow path to attain the apparatus. The first dielectric layer material is selected to provide improved adhesion and insulation to the conductive surface and the second dielectric layer material is selected to provide suitable adhesion to the first dielectric layer and improved corrosion and/or mechanical resistance in the anticipated operating environment.
Abstract translation: 示例性实施例涉及一种用于减少暴露，周期性或基本连续的润湿表面上的带电粒子对核反应堆内的冷却剂流动路径内的高速流体流动的静电沉积的方法和装置。 该方法可以包括在形成高速流动路径的一部分的导电表面上沉积第一或基底电介质层和第二或外部电介质层以获得该装置。 选择第一介电层材料以提供对导电表面的改进的粘合性和绝缘性，并且选择第二介电层材料以在预期的操作环境中提供对第一介电层的合适的粘合性和改善的腐蚀和/或机械阻力。
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