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1.发明授权
公开(公告)号：US4916038A
公开(公告)日：1990-04-10
申请号：US237816
申请日：1988-08-29
CPC分类号： C07F7/0818 , C07F7/0812 , C08F30/08 , C08G59/306 , Y10T428/31663
摘要： A new group of silane compounds in which silicon atoms are linked together by a hydrocarbon chain and which comprise phenyl groups substituted with an epoxy group or an ethenyl group. The compounds of the present invention have the formula ##STR1## where R.sub.1 is selected from the group consisting of: (a) an aliphatic hydrocarbon group containing 2 to 10 carbon atoms, and(b) a group having the formula ##STR2## where n=1 to 3m=0 to 5;R.sub.2 and R.sub.2 ' are each selected from the group consisting of an alkyl group containing 1 to 4 carbon atoms, an unsubstituted aryl group, and a substituted aryl group; and R.sub.3 is selected from the group consisting of: ##STR3## where R.sub.4, R.sub.5, and R.sub.6 ae each selected from the group consisting of H, an alkyl group containing 1 to 4 carbon atoms, and an aryl group; and n=0 to 10.
摘要翻译： 一组新的硅烷化合物，其中硅原子通过烃链连接在一起并且包含被环氧基或乙烯基取代的苯基。 本发明的化合物具有式（IMAGE），其中R 1选自：（a）含有2至10个碳原子的脂族烃基，和（b）具有下式的基团：其中n = 1〜3m = 0〜5; R2和R2'各自选自含有1至4个碳原子的烷基，未取代的芳基和取代的芳基; 并且R 3选自：其中R 4，R 5和R 6各自选自H，含有1至4个碳原子的烷基和芳基组成的组。 n = 0〜10。
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2.发明授权Method for selectively forming small diameter holes in polyimide/Kevlar substrates 失效在聚酰亚胺/凯夫拉基材中选择性地形成小直径孔的方法
公开(公告)号：US4889585A
公开(公告)日：1989-12-26
申请号：US205010
申请日：1988-05-31
IPC分类号： H01L21/311 , H05K1/03 , H05K3/00 , H05K3/42
CPC分类号： H01L21/31133 , H05K3/002 , H05K1/0346 , H05K1/0366 , H05K2201/0154 , H05K2201/0278 , H05K2203/0554 , H05K2203/0789 , H05K3/0041 , H05K3/0055 , H05K3/427
摘要： Methods for forming small diameter holes in polyimide/Kelvar.RTM. substrates utilize hot concentrated sulfuric acid and then honing, as necessary, with liquid abradant slurries to smooth uneven edges of the openings.
摘要翻译： 在聚酰亚胺/ Kelvar TM基材中形成小直径孔的方法使用热浓硫酸，然后根据需要用液体研磨剂浆料珩磨以平滑开口的不均匀边缘。
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3.发明授权(alpha, omega)phenylethynyl siloxane monomers, oligomers, and polymers thereof 失效（α，ω）苯乙炔基硅氧烷单体，低聚物及其聚合物
公开(公告)号：US5329036A
公开(公告)日：1994-07-12
申请号：US939326
申请日：1992-09-02
IPC分类号： C07F7/08 , C07F7/18 , C08F38/00 , C08F290/00 , C08F299/08 , C08G77/04 , C08G77/20 , C08G77/22 , C08G77/455 , C08F7/08
CPC分类号： C07F7/0896 , C07F7/0836 , C07F7/0847 , C07F7/1844 , C08G77/045 , C08G77/20 , C08G77/455
摘要： Novel acetylene-terminated silicone monomers with (a) silane (Si--H) functionalities, (b) silanol (Si--OH) functionalities, or (c) (alpha,omega)phenylethynyl terminated siloxanes, and a novel synthetic route. The (alpha,omega)phenylethynyl-terminated siloxane monomers are prepared, starting with 1,3-bromobenzene, which is converted to 3-TMS-ethynylbromobenzene, where TMS represents the trimethylsilyl group, by reacting 1,3-dibromobenzene with trimethylsilylacetylene and triethylamine in the presence of a palladium catalyst. The 3-bromo-TMS protected phenyl acetylene is then reacted with an alkyllithium compound, such as n-butyllithium, or with magnesium to form the corresponding lithio or Grignard compound, respectively, followed by reaction with a halogenated compound, such as chlorodimethylsilane, to form 3-trimethylsilyl-ethynylphenyldimethyl silane. Next, the TMS protected ethynylphenyl silane is subjected to deprotection and methanolysis of the Si--H bond to form 3-ethynylphenyldimethyl methoxy silane, employing methanol. This silane is then hydrolyzed to form the corresponding silanol. Finally, the silanol is then condensed by known methods to form the disiloxane. The disiloxane monomer can be reacted with a cyclic siloxane, having .gtoreq.3 silicon atoms, each independently substituted with hydrogen, C.sub.1 to C.sub.6 alkyl, phenyl, or phenyl substituted with one or more alkyl or halogen groups, to form oligomers. Both monomers and oligomers form thermoset polymers by heating to a temperature of at least about 250.degree. C.
摘要翻译： 具有（a）硅烷（Si-H）官能团，（b）硅烷醇（Si-OH）官能团或（c）（α，ω））苯基乙炔基封端的硅氧烷的新型乙炔封端的有机硅单体和新的合成路线。 制备（α，ω）苯基乙炔基封端的硅氧烷单体，通过1,3-二溴苯与三甲基甲硅烷基乙炔和三乙胺反应，由1,3-溴苯转化成3-TMS-乙炔基溴苯，其中TMS代表三甲基甲硅烷基 在钯催化剂存在下。 然后将3-溴-TT保护的苯基乙炔与烷基锂化合物如正丁基锂或与镁反应，分别形成相应的锂或格利雅化合物，随后与卤代化合物如氯二甲基硅烷反应， 形成3-三甲基甲硅烷基 - 乙炔基苯基二甲基硅烷。 接着，使用甲醇对TMS保护的乙炔基苯基硅烷进行Si-H键的去保护和甲醇分解以形成3-乙炔基苯基二甲基甲氧基硅烷。 然后将该硅烷水解形成相应的硅烷醇。 最后，通过已知的方法使硅烷醇缩合形成二硅氧烷。 二硅氧烷单体可与具有大于或等于3个硅原子的环状硅氧烷，各自独立地被氢取代，C1至C6烷基，苯基或被一个或多个烷基或卤素基团取代的苯基，以形成低聚物。 单体和低聚物通过加热至至少约250℃的温度形成热固性聚合物
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4.发明授权Epoxy end-capped diolefin derivatives, polymers thereof, and processes for forming same 失效环氧封端二烯烃衍生物，其聚合物及其形成方法
公开(公告)号：US4977220A
公开(公告)日：1990-12-11
申请号：US485925
申请日：1990-02-20
CPC分类号： C08G59/027 , C08C19/40 , C08C19/44 , C08G59/02
摘要： Epoxy end-capped oligomers of 1,3-diolefin compounds of Formula I ##STR1## These oligomers are formed by: (a) reacting a 1,3-diolefin compound having 4 to 12 carbon atoms per molecule with a difunctional initiator comprising anionic reactive sites to form an intermediate living oligomer comprising two anionic end groups; and(b) reacting the intermediate living oligomer with a halohydrin compound to epoxidize the two anionic end groups and form the desired oligomer.The oligomers are subsequently reacted with an epoxidizing agent to form a polymer having epoxy-derived linkages at regular intervals along the chain of the polymer.
摘要翻译： 式I的1,3-二烯烃化合物的环氧封端的低聚物R 2 =具有2至20个碳原子的芳基，环己基或芳族基团R 1，R 2，R 3，R 4，R 5，或R 6 这些低聚物通过以下方法形成：（a）使每分子具有4至12个碳原子的1,3-二烯烃化合物与包含阴离子反应性的二官能引发剂反应 形成包含两个阴离子端基的中间活性低聚物的位点; 和（b）使中间活性低聚物与卤代醇化合物反应以使两个阴离子端基环氧化并形成所需的低聚物。 随后将低聚物与环氧化剂反应以形成具有环氧基键的聚合物，该聚合物具有沿聚合物链的规则间隔。
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公开(公告)号：US4874643A
公开(公告)日：1989-10-17
申请号：US218177
申请日：1988-07-13
CPC分类号： C07F7/0812 , C07F7/0818 , C08F30/08 , C08G59/306 , Y10T428/31663
摘要： A method for rendering a substrate resistant to erosion by a plasma comprising oxygen by providing on the surface of the substrate a layer of a cured polymer of a compound having the formula ##STR1## where: R.sub.1 is selected from the group consisting of:(a) an aliphatic hydrocarbon group containing 2 to 10 carbon atoms, and(b) a group having the formula ##STR2## wherein n=1 to 3 m=0 to 5R.sub.2 and R.sub.2 ' are each selected from the group consisting of an alkyl group containing 1 to 4 carbon atoms, an unsubstituted aryl group, and a substituted aryl group; and R.sub.3 comprises: ##STR3## n=0 to 10
摘要翻译： 一种通过在衬底的表面上提供具有下式的化合物的固化聚合物层的方法，其中：R1选自：（a） ）含有2至10个碳原子的脂族烃基，和（b）具有式“IMAGE”的基团，其中n = 1至3m = 0至5个R 2和R 2'各自选自烷基 含有1至4个碳原子，未取代的芳基和取代的芳基; 和R3包括：
n = 0至10 -
6.发明授权
公开(公告)号：US4861901A
公开(公告)日：1989-08-29
申请号：US46013
申请日：1987-05-05
CPC分类号： C08F30/08 , C07F7/0812 , C07F7/0818 , C08G59/306
摘要： A new group of silane compounds in which silicon atoms are linked together by a hydrocarbon chain and which comprise phenyl groups substituted with an epoxy group or an ethenyl group. The compounds of the present invention have the formula ##STR1## where R.sub.1 is selected from the group consisting of:(a) an aliphatic hydrocarbon group containing 2 to 10 carbon atoms, and(b) a group having the formula ##STR2## where n=1 to 3m=0 to 5;R.sub.2 and R.sub.2 ' are each selected from the group consisting of an alkyl group containing 1 to 4 carbon atoms, an unsubstituted aryl group, and a substituted aryl group;and R.sub.3 is selected from the group consisting of: ##STR3## where R.sub.4, R.sub.5, and R.sub.6 are each selected from the group consisting of H, an alkyl group containing 1 to 4 carbon atoms, and an aryl group; and n=0 to 10.
摘要翻译： 一组新的硅烷化合物，其中硅原子通过烃链连接在一起并且包含被环氧基或乙烯基取代的苯基。 本发明的化合物具有式（IMAGE），其中R 1选自：（a）含有2至10个碳原子的脂族烃基，和（b）具有下式的基团：其中n = 1〜3m = 0〜5; R2和R2'各自选自含有1至4个碳原子的烷基，未取代的芳基和取代的芳基; 并且R 3选自：其中R 4，R 5和R 6各自选自H，含有1至4个碳原子的烷基和芳基组成的组。 n = 0〜10。
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7.发明授权Metal-filled, plateable structural adhesives for cyanate ester composites 失效用于氰酸酯复合材料的金属填充的可平板结构粘合剂公开(公告)号：US06270616B1
公开(公告)日：2001-08-07
申请号：US09109011
申请日：1998-07-01
申请人： Brian M. Punsly , Andre Wallace , William E. Elias
发明人： Brian M. Punsly , Andre Wallace , William E. Elias
IPC分类号： C09J500
CPC分类号： C09J163/00 , C08L63/00 , C08L2666/54 , C09J179/04 , Y10T428/31515
摘要： A family of adhesives is provided for bonding cyanate ester composite articles together which is also plateable with metal once chemically etched. The adhesives comprise a polymeric matrix and a filler of metal powder or metal flakes. The polymeric matrix comprises at least one polyepoxide resin and at least one curing agent. In practice, the present adhesive is applied to the surface of cyanate ester composite articles to be bonded and is allowed to cure in air at a temperature less than 125° C. Thereafter, the surface of the assembly is chemically etched and then plated with metal. The present adhesives enable the complete coverage of the cyanate ester composite assembly with the plated metal, including the adhesive bondlines. A cyanate ester resin structure assembled with the present adhesive composition may, upon plating, replace certain metallic components in such applications as aircraft, spacecraft, and automobiles given its highly conductive and comprehensive metallic coating.
摘要翻译： 提供一系列粘合剂用于将氰酸酯复合制品粘合在一起，其一旦化学蚀刻也可用金属镀敷。 粘合剂包括聚合物基质和金属粉末或金属薄片的填料。 聚合物基质包含至少一种聚环氧树脂和至少一种固化剂。 实际上，将本发明的粘合剂施加到要接合的氰酸酯复合制品的表面上，并在低于125℃的温度下在空气中固化。然后，将该组件的表面进行化学蚀刻，然后用金属镀 。 本发明的粘合剂使得能够完全覆盖含有电镀金属的氰酸酯复合组合物，包括粘合剂粘结线。 与本发明的粘合剂组合物组合的氰酸酯树脂结构可以在电镀时替代飞行器，航天器和汽车中的某些金属组分，因为它具有高导电性和全面的金属涂层。
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公开(公告)号：US5139704A
公开(公告)日：1992-08-18
申请号：US654866
申请日：1991-02-12
CPC分类号： B23K35/26 , B23K35/262
摘要： A fluxless solder for application to metal surfaces which include contaminants such as metal oxides. The fluxless solder includes a reducing agent which reacts with interfering metal oxides to form essentially inert compounds which require no further cleaning. Reducing agents, such as lithium, calcium, strontium and cesium are disclosed for use in lead-tin solders, in amounts ranging from about 0.5 to 10 atom percent. Various methods for forming the fluxless solder are also disclosed.
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9.发明授权Resin composition and process for investment casting using stereolithography 失效使用立体光刻的熔模铸造的树脂组合物和工艺
公开(公告)号：US5391460A
公开(公告)日：1995-02-21
申请号：US089544
申请日：1993-07-12
CPC分类号： B22C1/08 , G03F7/0037 , G03F7/0048
摘要： A resin composition for investment casting contains a moderate boiling temperature liquid inert diluent, having a boiling point in the range of about 200.degree. to 300.degree. C. The presence of the liquid inert diluent allows the resin to be used as a pattern, or model, in investment casting by preventing breaking of the mold during burnout of the resin. Any of the conventional resins suitable for stereolithography may be employed in the practice of the invention. To the resin is added a moderate boiling point solvent in the amount of about 5 to 30 wt %. Use of the moderate boiling point solvent in conjunction with the resin allows the pattern to shrink and crack at moderate temperature before final burnout. The shrinkage occurs faster and at a lower temperature as compared to the prior art.
摘要翻译： 用于熔模铸造的树脂组合物含有中等沸点温度的液体惰性稀释剂，其沸点在约200℃至300℃的范围内。液体惰性稀释剂的存在允许树脂用作图案或模型 ，通过防止树脂烧坏期间模具断裂而进行熔模铸造。 适用于立体光刻的任何常规树脂可用于本发明的实践中。 向树脂中加入约5至30重量％的中等沸点溶剂。 使用中等沸点溶剂与树脂一起使得图案在最终烧坏之前在中等温度下收缩和裂纹。 与现有技术相比，收缩发生得更快并且处于较低的温度。
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10.发明授权Process for making a solid optical limiter containing a graded distribution of reverse saturable material 失效制造含有反向饱和材料的分级分布的固体光学限制器的方法
公开(公告)号：US5391329A
公开(公告)日：1995-02-21
申请号：US109884
申请日：1993-08-23
CPC分类号： B32B27/08 , B29D11/00634
摘要： An improved process is provided for making optical limiters having a graded axial distribution of a reverse saturable absorber compound, such as a buckminsterfullerene, in a host matrix, such as polymethyl methacrylate or polycarbonate. The process of the invention includes: (a) dissolving the reverse saturable absorber and the host matrix in a suitable solvent to form a solution having a preselected ratio of reverse saturable absorber to host matrix; (b) casting the solution onto a surface to form a film; (c) evaporating the solvent to form a free-standing film; (d) performing steps (a)-(c) for each different desired ratio of reverse saturable absorber to host matrix; (e) stacking the free-standing films in a desired order; and (f) hot-pressing the stack to form the optical limiter having a graded distribution of the reverse saturable absorber in the host matrix. If desired, the stack of films can be placed in a die for hot-pressing. The films can be pre-cut to the shape of the die.
摘要翻译： 提供了一种改进的方法，用于制造在主体基质例如聚甲基丙烯酸甲酯或聚碳酸酯中具有反饱和吸收剂化合物如buckminsterfullerene的渐变轴向分布的光学限制器。 本发明的方法包括：（a）将反向可饱和吸收剂和主体基质溶解在合适的溶剂中以形成具有反向可饱和吸收剂与宿主基质的预选比例的溶液; （b）将溶液浇注到表面上以形成膜; （c）蒸发溶剂以形成独立的膜; （d）对于反向可饱和吸收器与主体基质的每种不同的期望比例，执行步骤（a） - （c） （e）以所需顺序堆叠独立的薄膜; 和（f）热压堆叠以形成在主体基质中具有反向可饱和吸收体的分级分布的光学限制器。 如果需要，可以将一叠薄膜放置在用于热压的模具中。 这些胶片可以预先切割成模具的形状。
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