公开(公告)号：US07321654B2

公开(公告)日：2008-01-22

申请号：US10857927

申请日：2004-06-02

Applicant: Yong Min Cho ,  Daesoo Han

Inventor： Yong Min Cho ,  Daesoo Han

IPC: G21K3/00

CPC classification number: A61B6/482 ,  A61B6/032 ,  A61B6/4014 ,  A61B6/4035 ,  B82Y10/00 ,  G21K1/062 ,  G21K1/10

Abstract: A narrow band x-ray filter can include: a substrate; and a sheaf of one or more reflection units stacked upon each other on the substrate. Each reflection unit can include: a first set of at least two discrete spacers on a respective underlying structures, a reflector disposed on the first set of spacers so as to form a void between the respective underlying structure and the reflector; and a first set of at least two discrete shims disposed on the first set of at least two spacers, each shim being at least substantially the same thickness as the reflector. A first device to produce a narrow band x-ray beam may include such a filter or an x-ray telescope. A second device to make an x-ray image of a subject may include the first device.

Abstract translation: 窄带x射线滤波器可以包括：基底; 以及在基板上彼此堆叠的一个或多个反射单元的一对组合。 每个反射单元可以包括：在相应的下面结构上的第一组至少两个分立的间隔物，设置在第一组间隔物上的反射体，以便在相应的下面的结构和反射体之间形成空隙; 以及设置在所述第一组至少两个间隔件上的至少两个离散垫片的第一组，每个垫片至少具有与所述反射器基本相同的厚度。 用于产生窄带x射线束的第一装置可以包括这种滤光器或x射线望远镜。 用于制作被摄体的X射线图像的第二装置可以包括第一装置。

公开(公告)号：US20120268159A1

公开(公告)日：2012-10-25

申请号：US13416098

申请日：2012-03-09

Applicant: Yong Min Cho ,  Dong-Ryul Lee

Inventor： Yong Min Cho ,  Dong-Ryul Lee

IPC: G01R31/26

CPC classification number: G11C29/022 ,  G01R31/2884 ,  G01R31/307 ,  G11C11/40 ,  G11C2029/5002 ,  H01L22/30 ,  H01L27/10855 ,  H01L27/10894 ,  H01L28/40 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of detecting a defect of a semiconductor device includes forming test patterns and unit cell patterns in a test region a cell array region of a substrate, respectively, obtaining reference data with respect to the test patterns by irradiating an electron beam into the test region, obtaining cell data by irradiating the electron beam into the cell array region, and detecting defects of the unit cell patterns by comparing the obtained cell data with the obtained reference data.

Abstract translation: 检测半导体器件的缺陷的方法包括分别在基板的单元阵列区域的测试区域中形成测试图案和单元格图案，通过将电子束照射到测试区域中来获得关于测试图案的参考数据 通过将电子束照射到单元阵列区域来获得单元数据，并且通过将获得的单元数据与获得的参考数据进行比较来检测单元单元图案的缺陷。

公开(公告)号：US07257197B2

公开(公告)日：2007-08-14

申请号：US11132305

申请日：2005-05-19

Applicant: Yong Min Cho

Inventor： Yong Min Cho

IPC: G21K3/00 ,  G02B5/28 ,  G02B5/26

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/10 ,  G21K2201/067

Abstract: A stackable rack may comprise: at least two rails, a cross-section of each rail having a shape resembling a staircase, first step portion of which represents a first surface upon which a reflector can be disposed; and a second step portion of which represents a second surface which can support another rail. A method of making a narrow band x-ray filter may comprise: providing a substrate; and stacking one or more reflection units in succession upon the substrate, each reflection unit including a rack (such as mentioned above) and a reflector held by the rack. An apparatus to produce a substantially narrow band x-ray beam may include such a filter. An apparatus to make an x-ray image of a subject may include: the apparatus to produce a substantially narrow band x-ray beam, e.g., as set forth above, and an x-ray detector arranged to receive the narrow band x-ray.

Abstract translation: 可堆叠的架可以包括：至少两个轨道，每个轨道的横截面具有类似楼梯的形状，其第一阶梯部分表示可以设置反射器的第一表面; 并且其第二台阶部分表示可以支撑另一轨道的第二表面。 制造窄带x射线滤光器的方法可以包括：提供衬底; 并且将一个或多个反射单元相继地堆叠在基板上，每个反射单元包括机架（如上所述）和由机架保持的反射器。 产生基本上窄带X射线束的装置可以包括这种滤光器。 用于制作受试者的X射线图像的装置可以包括：产生基本上窄带的X射线束的装置，例如如上所述，以及x射线检测器，被布置成接收窄带x射线 。

公开(公告)号：US20120155740A1

公开(公告)日：2012-06-21

申请号：US13290240

申请日：2011-11-07

Applicant: Yong-Min CHO ,  Jin-Seo CHOI ,  Dong-Ryul LEE

Inventor： Yong-Min CHO ,  Jin-Seo CHOI ,  Dong-Ryul LEE

IPC: G06K9/64

CPC classification number: G06T7/001 ,  G06K9/38 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: A method and apparatus for detecting a defect in a pattern are provided. The method includes: obtaining a pattern image from a pattern in a region of interest on a semiconductor substrate and obtaining a reference image are obtained; matching the obtained pattern image and the obtained reference image to select a pixel group including pixels indicating defect information of the pattern image; adjusting a defect detection threshold of the selected pixel group; comparing the obtained pattern image and the obtained reference image to detect a pattern defect in a detection region corresponding to the selected pixel group of the pattern image, according to the adjusted defect detection threshold.

Abstract translation: 提供了用于检测图案中的缺陷的方法和装置。 该方法包括：获得在半导体衬底上的感兴趣区域中的图案并获得参考图像的图案图像; 匹配获得的图案图像和所获得的参考图像，以选择包括表示图案图像的缺陷信息的像素的像素组; 调整所选择的像素组的缺陷检测阈值; 根据所调整的缺陷检测阈值，比较所获得的图案图像和所获得的参考图像以检测与图案图像的所选像素组对应的检测区域中的图案缺陷。

公开(公告)号：US07315611B2

公开(公告)日：2008-01-01

申请号：US11139655

申请日：2005-05-31

Applicant: Yong Min Cho ,  Thomas Joseph Fox

Inventor： Yong Min Cho ,  Thomas Joseph Fox

IPC: G21K3/00

CPC classification number: A61B6/032 ,  A61B6/4014 ,  A61B6/4035 ,  A61B6/482 ,  B82Y10/00 ,  G21K1/062 ,  G21K1/10 ,  G21K2201/067

Abstract: An x-ray reflector may include: a substrate; a first layer formed on the substrate, the first layer including a relatively higher-Z material, where Z represents the atomic number; and a second layer formed on the first layer, the second layer including a relatively lower-Z material; at least one of the first layer and the second layer exhibiting a taper in an axial direction extending between a first end of the substrate and a second end of the substrate.

Abstract translation: x射线反射器可以包括：基底; 形成在所述基板上的第一层，所述第一层包括相对较高的Z材料，其中Z表示原子序数; 以及形成在所述第一层上的第二层，所述第二层包括相对较低的Z材料; 第一层和第二层中的至少一层在基板的第一端和基板的第二端之间呈轴向延伸。

公开(公告)号：US07281879B2

公开(公告)日：2007-10-16

申请号：US11273250

申请日：2005-11-15

Applicant: Yong Min Cho ,  Philip Yong Kim

Inventor： Yong Min Cho ,  Philip Yong Kim

IPC: E02B3/10

CPC classification number: E02B3/106

Abstract: A portable flood-barrier-system can include a portable block of substantial mass; and a deflatable bladder, a first portion of which is disposed on a substrate; the block being disposed at least partly on the first portion of the bladder so as to releasably compress the first portion between the block and the substrate and so releasably hold the first portion therebetween due to friction.

Abstract translation: 便携式防洪系统可以包括大量的便携式块; 和可放气的囊，其第一部分设置在基底上; 所述块至少部分地设置在所述囊的所述第一部分上，以便可释放地压缩所述块和所述基底之间的所述第一部分，并且由于摩擦而可释放地将所述第一部分保持在其间。

公开(公告)号：US08952716B2

公开(公告)日：2015-02-10

申请号：US13416098

申请日：2012-03-09

Applicant: Yong Min Cho ,  Dong-Ryul Lee

Inventor： Yong Min Cho ,  Dong-Ryul Lee

IPC: G01R31/327 ,  G11C29/02 ,  H01L27/108 ,  G01R31/28 ,  G01R31/307 ,  G11C11/40 ,  H01L21/66 ,  H01L49/02 ,  G11C29/50

CPC classification number: G11C29/022 ,  G01R31/2884 ,  G01R31/307 ,  G11C11/40 ,  G11C2029/5002 ,  H01L22/30 ,  H01L27/10855 ,  H01L27/10894 ,  H01L28/40 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of detecting a defect of a semiconductor device includes forming test patterns and unit cell patterns in a test region a cell array region of a substrate, respectively, obtaining reference data with respect to the test patterns by irradiating an electron beam into the test region, obtaining cell data by irradiating the electron beam into the cell array region, and detecting defects of the unit cell patterns by comparing the obtained cell data with the obtained reference data.

Abstract translation: 检测半导体器件的缺陷的方法包括分别在基板的单元阵列区域的测试区域中形成测试图案和单元格图案，通过将电子束照射到测试区域中来获得关于测试图案的参考数据 通过将电子束照射到单元阵列区域来获得单元数据，并且通过将获得的单元数据与获得的参考数据进行比较来检测单元单元图案的缺陷。

公开(公告)号：US20120082367A1

公开(公告)日：2012-04-05

申请号：US13237993

申请日：2011-09-21

Applicant: Jung-hoon Byun ,  Yong-min Cho ,  Soo-bok Chin ,  Jae-kwan Park ,  Seok-woo Nam ,  Tae-yong Lee ,  Kee-Hong Lee ,  Young-min Kim

Inventor： Jung-hoon Byun ,  Yong-min Cho ,  Soo-bok Chin ,  Jae-kwan Park ,  Seok-woo Nam ,  Tae-yong Lee ,  Kee-Hong Lee ,  Young-min Kim

IPC: G06K9/48 ,  G06K9/00 ,  G06K9/36

CPC classification number: G06T7/0002 ,  G06T2207/10016 ,  G06T2207/10061 ,  G06T2207/30148 ,  G06T2207/30168

Abstract: A method forms an ultimate or final image of a sample by selecting some of a plurality of image frames and integrating the selected frames. The method includes providing a semiconductor device including a region of interest and a peripheral region; obtaining a plurality of image frames each including a region of interest image and a peripheral region image respectively corresponding to the region of interest and the peripheral region; selecting at least some of the plurality of image frames based on a contrast between the region of interest image and the peripheral region image; and obtaining an image of the semiconductor device by integrating the selected image frames.

Abstract translation: 方法通过选择多个图像帧中的一些并且对所选择的帧进行积分来形成样本的最终或最终图像。 该方法包括提供包括感兴趣区域和周边区域的半导体器件; 获得各自包括分别对应于感兴趣区域和周边区域的感兴趣区域图像和周边区域图像的多个图像帧; 基于感兴趣区域与外围区域图像之间的对比度来选择多个图像帧中的至少一些; 以及通过对所选择的图像帧进行积分来获得半导体器件的图像。