Semiconductor integrated circuit devices
    1.
    发明授权
    Semiconductor integrated circuit devices 有权
    半导体集成电路器件

    公开(公告)号:US09595523B2

    公开(公告)日:2017-03-14

    申请号:US15074195

    申请日:2016-03-18

    摘要: A semiconductor integrated circuit device may include a standard cell region on a surface of a substrate and a first active region on the surface of the substrate in the standard cell region, wherein the first active region has a length in a first direction. A second active region may be on the surface of the substrate in the standard cell region, the second active region may have a length in the first direction, the length of the second active region may be greater than the length of the first active region, and an axis in a second direction may intersect centers of the first and second active regions so that the first and second active regions are symmetric about the axis in the second direction. A first gate electrode may extend across the first active region in the first direction, and a second gate electrode may extend across the second active region in the first direction.

    摘要翻译: 半导体集成电路器件可以包括在基板的表面上的标准单元区域和标准单元区域中的基板的表面上的第一有源区域,其中第一有源区域具有沿第一方向的长度。 第二有源区可以在标准单元区域中的衬底的表面上,第二有源区可以具有在第一方向上的长度,第二有源区的长度可以大于第一有源区的长度, 并且第二方向上的轴线可以与第一和第二有源区域的中心相交,使得第一和第二有源区域在第二方向上关于轴对称。 第一栅电极可以在第一方向上延伸穿过第一有源区,并且第二栅电极可以在第一方向上延伸穿过第二有源区。

    Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith
    2.
    发明授权
    Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith 有权
    在光学光刻期间减少杂散光的影响的方法,其获得的装置和与其一起使用的掩模

    公开(公告)号:US07838209B2

    公开(公告)日:2010-11-23

    申请号:US11185539

    申请日:2005-07-20

    IPC分类号: G03C5/00 G03F1/00 G03F7/00

    摘要: A method of reducing the influence of the spread of the transmitted light on the feature size during optical lithography is disclosed. The method comprises at least two irradiation steps. During a first irradiation the resist is exposed with the original mask, i.e., comprising substantially the pattern to be obtained in the layer. Thereafter, without developing the exposed resist, an irradiation with at least one exposure is performed whereby the resist is exposed with a second mask, being at least partly the inverse of the original mask. The exposures of the second irradiation step are defocused compared to the first irradiation.

    摘要翻译: 公开了一种在光学光刻期间减小透射光的扩展对特征尺寸的影响的方法。 该方法包括至少两个照射步骤。 在第一次照射期间,抗蚀剂用原始掩模曝光,即基本上包含在该层中获得的图案。 此后,在不显影曝光的抗蚀剂的情况下,进行至少一次曝光的照射,由此用第二掩模曝光抗蚀剂,至少部分地与原始掩模相反。 与第一次照射相比,第二次照射步骤的曝光散焦。

    Refrigerator door push button switch system
    3.
    发明授权
    Refrigerator door push button switch system 失效
    冰箱门按钮开关系统

    公开(公告)号:US5847343A

    公开(公告)日:1998-12-08

    申请号:US865981

    申请日:1997-05-30

    申请人: Young-Chang Kim

    发明人: Young-Chang Kim

    IPC分类号: F25D29/00 H01H3/16

    CPC分类号: H01H3/161 F25D2700/02

    摘要: A refrigerator door switch system for sensing opening of a freezer compartment door and a fresh food compartment door comprises a push button switch installed at the freezer compartment door or the fresh food compartment door, being positioned at a first position for stopping a fan motor for a cool air supply and turning on a cabinet lamp when the freezer compartment door or the fresh food compartment door is opened, and being positioned at a second position for driving the fan motor and turning off the cabinet lamp when the freezer compartment door and the fresh food compartment door are closed; and a switch operation cam installed at the fresh food compartment door or the freezer compartment door, corresponding to the push button switch for positioning the push button switch to the first position when the freezer compartment door or the fresh food compartment door is opened, and for positioning the push button switch to the second position when the freezer compartment door and the fresh food compartment door are closed.

    摘要翻译: 一种用于感测冷冻室门和新鲜食物室门的开口的冰箱门开关系统,包括安装在冷冻室门或新鲜食品室门处的按钮开关,其位于用于停止风扇电动机的第一位置 当冷冻室门或新鲜食物室门打开时,冷气供应并打开橱柜灯,并且当冷冻室门和新鲜食物被置于驱动风扇电机的第二位置并关闭橱柜灯 隔间门关闭; 以及安装在新鲜食品室门或冷冻室门处的开关操作凸轮,对应于当冷冻室门或新鲜食物室门打开时将按钮开关定位到第一位置的按钮开关,并且 当冷冻室门和新鲜食物室门关闭时,将按钮开关定位到第二位置。

    SERVICE PROVIDING METHOD AND DEVICE USING THE SAME
    5.
    发明申请
    SERVICE PROVIDING METHOD AND DEVICE USING THE SAME 审中-公开
    服务提供方法和使用该设备的设备

    公开(公告)号:US20120158816A1

    公开(公告)日:2012-06-21

    申请号:US13325301

    申请日:2011-12-14

    IPC分类号: G06F9/46 G06F15/16

    CPC分类号: G06F9/4881

    摘要: Disclosed are service providing method and device, including: collecting execution state information about a plurality of tasks that constitute at least one service, and are dynamically distributed and arranged over a plurality of nodes; and performing scheduling based on the collected execution state information about the plurality of tasks, wherein each of the plurality of tasks has at least one input source and output source, and a unit of data to be processed for each input source and a data processing operation are defined by a user, and the scheduling is to delete at least a portion of data input into at least one task or to process the at least a portion of input data in at least one duplicate task by referring to the defined unit of data. In particular, the present invention may effectively provide a service of analyzing and processing large stream data in semi-real time.

    摘要翻译: 公开的是服务提供方法和装置,包括:收集关于构成至少一个服务的多个任务的执行状态信息,并且动态地分布和布置在多个节点上; 以及基于所收集的关于所述多个任务的执行状态信息执行调度,其中所述多个任务中的每一个具有至少一个输入源和输出源以及要针对每个输入源处理的数据单元和数据处理操作 由用户定义,并且调度是将输入到至少一个任务中的数据的至少一部分删除,或者通过参考所定义的数据单元来处理至少一个重复任务中的至少一部分输入数据。 特别地,本发明可以有效地提供半实时分析和处理大流数据的服务。

    Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same
    6.
    发明授权
    Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same 有权
    使用掩模的补偿掩模,多光学系统以及使用其掩模的三维掩模效应的补偿方法

    公开(公告)号:US07940373B2

    公开(公告)日:2011-05-10

    申请号:US11925014

    申请日:2007-10-26

    IPC分类号: G03B27/52 G03B27/72 G03B27/32

    CPC分类号: G03F1/36

    摘要: Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.

    摘要翻译: 提供了补偿掩模,使用补偿掩模的多光学系统以及使用补偿掩模来补偿三维(3-D)掩模效应的方法。 使用补偿掩模补偿3-D掩模效应的方法可以包括生成对应于用于形成微图案的正常掩模的第一内核,生成与补偿掩码相对应的第二内核,将与正常对应的第一内核混合 掩模与第二核对应于补偿掩模,并且生成对应于混合第一内核和第二内核的多光学系统内核。

    Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the Same
    7.
    发明申请
    Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the Same 有权
    补偿面膜,使用面膜的多光学系统以及使用该面膜补偿三维掩模效果的方法

    公开(公告)号:US20080106719A1

    公开(公告)日:2008-05-08

    申请号:US11925014

    申请日:2007-10-26

    IPC分类号: G03B27/54 G03F1/00

    CPC分类号: G03F1/36

    摘要: Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.

    摘要翻译: 提供了补偿掩模,使用补偿掩模的多光学系统以及使用补偿掩模来补偿三维(3-D)掩模效应的方法。 使用补偿掩模补偿3-D掩模效应的方法可以包括生成对应于用于形成微图案的正常掩模的第一内核,生成与补偿掩码相对应的第二内核,将与正常对应的第一内核混合 掩模与第二核对应于补偿掩模,并且生成对应于混合第一内核和第二内核的多光学系统内核。

    SECONDARY BATTERY
    8.
    发明申请
    SECONDARY BATTERY 审中-公开
    二次电池

    公开(公告)号:US20110123853A1

    公开(公告)日:2011-05-26

    申请号:US12953383

    申请日:2010-11-23

    申请人: Young-Chang Kim

    发明人: Young-Chang Kim

    IPC分类号: H01M2/04 H01M2/10

    摘要: A secondary battery including an electrode assembly, a can to house the electrode assembly, and electrical insulators that expand to secure the electrode assembly in the can, by absorbing a significant amount of liquid.

    摘要翻译: 包括电极组件,容纳电极组件的罐和通过吸收大量液体而膨胀以将电极组件固定在罐中的电绝缘体的二次电池。

    ANTITHEFT METHOD AND SYSTEM FOR MOTORCYCLES
    9.
    发明申请
    ANTITHEFT METHOD AND SYSTEM FOR MOTORCYCLES 审中-公开
    摩托车的防盗方法与系统

    公开(公告)号:US20110060481A1

    公开(公告)日:2011-03-10

    申请号:US12877763

    申请日:2010-09-08

    IPC分类号: G06F19/00

    摘要: An antitheft method and system for motorcycles are provided. The antitheft method and system for motorcycles authenticate an electronic identifier when power-up of a motorcycle or engine start-up is sensed and cut off the power-up or engine start-up if the power-up or engine start-up is not authenticated. An electronic control unit can generate a theft alarm signal in case of unauthenticated power-up or engine start-up. The motorcycle engine is automatically stopped if the engine is started through an illegal method, and thus the motorcycle is prevented from being stolen. Further, a user can confirm the electronic identifier and start the motorcycle without inserting a key into a key cylinder, and thus the user can start the motorcycle easily and rapidly.

    摘要翻译: 提供了一种用于摩托车的防盗方法和系统。 摩托车的防盗方法和系统在检测到摩托车或发动机启动时启动时对电子识别符进行认证,如果上电或发动机启动未通过认证,则断开上电或发动机起动 。 电子控制单元可以在未经认证的上电或发动机启动的情况下产生盗窃报警信号。 如果发动机通过非法方法启动,摩托车发动机将自动停止,从而防止摩托车被盗。 此外,用户可以确认电子标识符并启动摩托车而不将钥匙插入钥匙筒,因此用户可以容易且快速地启动摩托车。

    Semiconductor wafer bearing alignment mark for use in aligning the wafer with exposure equipment, alignment system for producing alignment signals from the alignment mark, and method of determining the aligned state of a wafer from the alignment mark
    10.
    发明授权
    Semiconductor wafer bearing alignment mark for use in aligning the wafer with exposure equipment, alignment system for producing alignment signals from the alignment mark, and method of determining the aligned state of a wafer from the alignment mark 有权
    用于将晶片与曝光设备对准的半导体晶片轴承对准标记,用于从对准标记产生对准信号的对准系统和从对准标记确定晶片的对准状态的方法

    公开(公告)号:US07038777B2

    公开(公告)日:2006-05-02

    申请号:US10290282

    申请日:2002-11-08

    IPC分类号: G01B11/00 H01L23/544

    摘要: A semiconductor wafer has an alignment mark for use in aligning the wafer with exposure equipment during the manufacturing of a semiconductor device. The wafer is made by forming a chemical mechanical polishing target layer over an alignment mark layer, chemically-mechanically polishing the target layer to planarize the same, and prior to forming the chemical mechanical polishing target layer over the alignment mark layer, forming a dense pattern of lands or trenches in the alignment layer of dimensions and an inter-spacing preselected to inhibit a dishing phenomenon from occurring in the target layer as the result of its being chemically-mechanically polished. The lands or trenches may be disposed in at least a 2×2 array of rows and columns. An alignment system for use with this wafer irradiates the mark with light, and includes an image sensor which produces both a Y-axis alignment waveform signal from light reflecting from the column(s) of lands or trenches and an X-axis alignment waveform signal from light reflecting from the row(s) of lands or trenches. Alternatively, the lands or trenches may be disposed along at least two lines arranged in the shape of a chevron. In this case, the alignment system scans an illuminated cross-shaped pattern of a reticle across the alignment mark. A photo-detection unit collects the reflected light and determines the relative amounts of light coming from the wafer surface, from one of the lines of lands or trenches of the alignment mark, and from the other such line of lands or trenches.

    摘要翻译: 半导体晶片具有用于在制造半导体器件期间将晶片与曝光设备对准的对准标记。 通过在对准标记层上形成化学机械抛光目标层,化学机械地抛光目标层以使其平坦化,以及在对准标记层之上形成化学机械抛光目标层之前,形成致密图案 的尺寸对准层中的焊盘或沟槽,并且预先选择的间隔,以抑制由于其被化学机械抛光而在目标层中发生凹陷现象。 焊盘或沟槽可以设置在行和列的至少2×2阵列中。 与该晶片一起使用的对准系统用光照射标记,并且包括图像传感器,该图像传感器产生来自从焊盘或沟槽的列反射的光的Y轴对准波形信号和X轴对准波形信号 从反映从陆地或沟渠的一行的光。 或者,焊盘或沟槽可以沿着以V形形状布置的至少两条线设置。 在这种情况下,对准系统通过对准标记扫描标线的照明十字形图案。 光检测单元收集反射光并且确定来自晶片表面的光的相对量,来自对准标记的焊盘或沟槽的一条线以及另一条这样的焊盘或沟槽线。