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    Method of making a nanostructure and nanostructured articles
    4.
    发明授权
    Method of making a nanostructure and nanostructured articles 有权

    公开(公告)号：US10119190B2

    公开(公告)日：2018-11-06

    申请号：US15354086

    申请日：2016-11-17

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Moses M. David ,  Ta-Hua Yu ,  Daniel S. Bates ,  Jayshree Seth ,  Michael S. Berger ,  Carsten Franke ,  Sebastian F. Zehentmaier

    IPC: B32B3/10 ,  C23C16/02 ,  B81C1/00 ,  C23C16/50 ,  H01J37/32 ,  C09J7/22

    Abstract: A method of making a nanostructure and nanostructured articles by depositing a layer to a major surface of a substrate by plasma chemical vapor deposition from a gaseous mixture while substantially simultaneously etching the surface with a reactive species. The method includes providing a substrate; mixing a first gaseous species capable of depositing a layer onto the substrate when formed into a plasma, with a second gaseous species capable of etching the substrate when formed into a plasma, thereby forming a gaseous mixture; forming the gaseous mixture into a plasma; and exposing a surface of the substrate to the plasma, wherein the surface is etched and a layer is deposited on at least a portion of the etched surface substantially simultaneously, thereby forming the nanostructure. The substrate can be a (co)polymeric material, an inorganic material, an alloy, a solid solution, or a combination thereof. The deposited layer can include the reaction product of plasma chemical vapor deposition using a reactant gas comprising a compound selected from the group consisting of organosilicon compounds, metal alkyl compounds, metal isopropoxide compounds, metal acetylacetonate compounds, metal halide compounds, and combinations thereof. Nanostructures of high aspect ratio and optionally with random dimensions in at least one dimension and preferably in three orthogonal dimensions can be prepared.

    METHODS OF MAKING METAL BOND AND VITREOUS BOND ABRASIVE ARTICLES, AND ABRASIVE ARTICLE PRECURSORS
    6.
    发明申请
    METHODS OF MAKING METAL BOND AND VITREOUS BOND ABRASIVE ARTICLES, AND ABRASIVE ARTICLE PRECURSORS 有权

    公开(公告)号：US20210316503A1

    公开(公告)日：2021-10-14

    申请号：US17304596

    申请日：2021-06-23

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Carsten Franke ,  Maiken Givot ,  Malte Korten ,  Robert L.W. Smithson ,  Brian D. Goers ,  Negus B. Adefris ,  Thomas J. Anderson ,  Brian A. Shukla ,  Michael C. Harper ,  Elizaveta Y. Plotnikov

    IPC: B29C64/153 ,  B24D3/06 ,  B24D3/14 ,  B24D5/10 ,  B24D18/00 ,  B24D7/10 ,  B24D5/06 ,  B22F12/00 ,  B29C64/393

    Abstract: The present disclosure provides methods of making a vitreous bond abrasive article and a metal bond abrasive article. The methods include sequential steps. Step a) includes a subprocess including sequentially: i) depositing a layer of loose powder particles in a confined region; and ii) selectively applying heat via conduction or irradiation, to heat treat an area of the layer of loose powder particles. The loose powder particles include abrasive particles and organic compound particles, as well as vitreous bond precursor particles or metal particles. The layer of loose powder particles has substantially uniform thickness. Step b) includes independently carrying out step a) a number of times to generate an abrasive article preform comprising the bonded powder particles and remaining loose powder particles. Step c) includes separating remaining loose powder particles from the abrasive article preform. Step d) includes heating the abrasive article preform to provide the vitreous bond abrasive article comprising the abrasive particles retained in a vitreous bond material, or to provide the metal bond abrasive article. A method of making a metal bond abrasive optionally includes infusing an abrasive article preform with a molten lower melting metal and solidifying the molten lower melting metal to provide the metal bond abrasive article. The present disclosure further provides a vitreous bond abrasive article precursor and a metal bond abrasive article precursor. Also, methods including receiving, by a manufacturing device having a processor, a digital object specifying data for an abrasive article, and generating the abrasive article with the manufacturing device.

    THREE-DIMENSIONAL ARTICLE AND METHOD OF MAKING A THREE-DIMENSIONAL ARTICLE
    8.
    发明申请
    THREE-DIMENSIONAL ARTICLE AND METHOD OF MAKING A THREE-DIMENSIONAL ARTICLE 审中-公开

    公开(公告)号：US20200164572A1

    公开(公告)日：2020-05-28

    申请号：US16627533

    申请日：2018-06-29

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Jeffrey N. Bartow ,  Carsten Franke ,  Alexander J. Huffman

    IPC: B29C64/165 ,  B33Y10/00 ,  B33Y70/10 ,  B33Y50/02 ,  B29C64/393 ,  B29C64/245 ,  B29C64/264 ,  B33Y30/00

    Abstract: A method includes obtaining a composition (1016) disposed on a surface of a substrate (1010), irradiating a first portion (1017a) of the composition for a first irradiation dosage, and irradiating a second portion (1017b) of the composition for a second irradiation dosage. The composition (1016) includes fluoropolymer particles and a binder material that is polymerizable upon exposure to radiation. The first portion (1017a) and the second portion (1017b) are adjacent to or overlapping with each other, and the first irradiation dosage and second irradiation dosage are different. Irradiating the first and second portions of the composition (1016) polymerizes the binder material and forms a three-dimensional article (1017) having a first portion (1017a) and a second portion (1017b) on the surface of the substrate (1010). The first portion (1017a) and second portion (1017b) of the three-dimensional article have different thicknesses in an axis normal to the surface of the substrate (1010). Three-dimensional articles are also described. The article (1017) can be. for example, a structured film.

    METHOD OF MAKING A NANOSTRUCTURE AND NANOSTRUCTURED ARTICLES
    10.
    发明申请
    METHOD OF MAKING A NANOSTRUCTURE AND NANOSTRUCTURED ARTICLES 审中-公开
    制备纳米结构和纳米结构的方法

    公开(公告)号：US20170067150A1

    公开(公告)日：2017-03-09

    申请号：US15354086

    申请日：2016-11-17

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Moses M. David ,  Ta-Hua Yu ,  Daniel S. Bates ,  Jayshree Seth ,  Michael S. Berger ,  Carsten Franke ,  Sebastian F. Zehentmaier

    IPC: C23C16/02 ,  C23C16/50 ,  H01J37/32

    CPC classification number: C23C16/0245 ,  B81C1/00031 ,  B81C2201/0132 ,  C09J7/22 ,  C09J2201/606 ,  C23C16/50 ,  H01J37/32082 ,  H01J37/32541 ,  H01J2237/3321 ,  H01J2237/3341

    Abstract: A method of making a nanostructure and nanostructured articles by depositing a layer to a major surface of a substrate by plasma chemical vapor deposition from a gaseous mixture while substantially simultaneously etching the surface with a reactive species. The method includes providing a substrate; mixing a first gaseous species capable of depositing a layer onto the substrate when formed into a plasma, with a second gaseous species capable of etching the substrate when formed into a plasma, thereby forming a gaseous mixture; forming the gaseous mixture into a plasma; and exposing a surface of the substrate to the plasma, wherein the surface is etched and a layer is deposited on at least a portion of the etched surface substantially simultaneously, thereby forming the nanostructure. The substrate can be a (co)polymeric material, an inorganic material, an alloy, a solid solution, or a combination thereof. The deposited layer can include the reaction product of plasma chemical vapor deposition using a reactant gas comprising a compound selected from the group consisting of organosilicon compounds, metal alkyl compounds, metal isopropoxide compounds, metal acetylacetonate compounds, metal halide compounds, and combinations thereof. Nanostructures of high aspect ratio and optionally with random dimensions in at least one dimension and preferably in three orthogonal dimensions can be prepared.

    Abstract translation: 一种通过从气体混合物的等离子体化学气相沉积而将基底沉积到基底的主表面上而形成纳米结构和纳米结构化制品的方法，同时基本上同时用反应性物质蚀刻该表面。 该方法包括提供基板; 当形成等离子体时，能够将能够沉积到衬底上的第一气态物质混合，当形成等离子体时，能够蚀刻衬底的第二气态物质，从而形成气态混合物; 将气态混合物形成等离子体; 以及将所述衬底的表面暴露于所述等离子体，其中所述表面被蚀刻并且基本上同时地在所述蚀刻表面的至少一部分上沉积层，从而形成所述纳米结构。 基底可以是（共）聚合物材料，无机材料，合金，固溶体或其组合。 沉积层可以包括使用包含选自有机硅化合物，金属烷基化合物，金属异丙醇化合物，金属乙酰丙酮化合物，金属卤化物化合物及其组合的化合物的反应气体的等离子体化学气相沉积的反应产物。 可以制备高纵横比的纳米结构，并且任选地在至少一个维度，优选三个正交尺寸的随机尺寸。

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